Target profile for a physical vapor deposition chamber target

Information

  • Patent Grant
  • D1007449
  • Patent Number
    D1,007,449
  • Date Filed
    Friday, May 7, 2021
    3 years ago
  • Date Issued
    Tuesday, December 12, 2023
    a year ago
  • US Classifications
    Field of Search
    • US
    • D23 249
    • D23 259
    • D23 262
    • D23 269
    • D15 138
    • D15 139
    • D15 143
    • D15 144
    • D15 1441
    • D15 1442
    • D15 150
    • D15 199
    • D13 118
    • D13 122
    • D13 133
    • D13 162
    • D13 182
    • D13 184
    • D13 199
    • D22 113
    • D22 119
    • CPC
    • H01J37/3414
    • H01J37/3423
    • H01L21/02631
    • H01L2221/68363
    • H01L2224/75186-75189
    • H01L21/67742
    • H01L21/0226
    • H01L21/02263
    • H01L21/02266
    • H01L21/02269
    • H01L21/02271
    • F16J7/00
    • E04D13/14
    • C23C14/3407
    • C23C14/35
  • International Classifications
    • 1303
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.



FIG. 2 is a top plan view thereof.



FIG. 3 is a bottom plan view thereof.



FIG. 4 is a right side elevation view thereof.



FIG. 5 is a left side elevation view thereof.



FIG. 6 is a front elevation thereof.



FIG. 7 is a back elevation view thereof; and,



FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.


The dash-dash broken lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.


The short dash-dot lines on FIG. 4 and FIG. 8 depict the bounds of the region taken from FIG. 4 to be enlarged on FIG. 8 and form no part of the claimed design.


Claims
  • We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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