Target profile for a physical vapor deposition chamber target

Abstract

Description

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right side elevation view thereof.

FIG. 5 is a left side elevation view thereof.

FIG. 6 is a front elevation thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.

The dash-dash broken lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.

The short dash-dot lines on FIG. 4 and FIG. 8 depict the bounds of the region taken from FIG. 4 to be enlarged on FIG. 8 and form no part of the claimed design.

Claims

We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.