Target profile for a physical vapor deposition chamber target

Information

  • Patent Grant
  • D798248
  • Patent Number
    D798,248
  • Date Filed
    Thursday, June 18, 2015
    8 years ago
  • Date Issued
    Tuesday, September 26, 2017
    6 years ago
Abstract
Description


FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;



FIG. 2 is a top plan view thereof;



FIG. 3 is a bottom plan view thereof;



FIG. 4 is a right side view thereof;



FIG. 5 is a left side view thereof;



FIG. 6 is a front view thereof;



FIG. 7 is a back view thereof; and,



FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.


The dashed lines in FIGS. 1-8 represent disclaimed matter forming no part of the claimed design.


Claims
  • The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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6659850 Korovin Dec 2003 B2
D557226 Uchino Dec 2007 S
D614593 Lee Apr 2010 S
D616390 Sato May 2010 S
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D691974 Osada Oct 2013 S
D716742 Jang Nov 2014 S
D724553 Choi Mar 2015 S
D741823 Tateno Oct 2015 S
D769200 Fukushima Oct 2016 S
D770992 Tauchi Nov 2016 S
Non-Patent Literature Citations (2)
Entry
U.S. Appl. No. 29/524,109, filed Apr. 16, 2015, Riker et al.
U.S. Appl. No. 29/524,557, filed Apr. 21, 2015, Zhang et al.