Target profile for a physical vapor deposition chamber target

Abstract

Description

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target;

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right elevation view thereof.

FIG. 7 is a left elevation view thereof.

FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.

FIG. 9 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a front elevation view thereof.

FIG. 13 is a back elevation view thereof.

FIG. 14 is a right elevation view thereof.

FIG. 15 is a left elevation view thereof; and,

FIG. 16 is an enlarged partial front elevation view showing portions of the design in greater detail.

The broken lines shown in the drawings depict portions of the target profile for a physical vapor deposition chamber target that form no part of the claimed design. The dot-dash lines encircling portions of the target profile for a physical vapor deposition chamber target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.