Telomerization processes

Information

  • Patent Application
  • 20080076948
  • Publication Number
    20080076948
  • Date Filed
    November 20, 2007
    17 years ago
  • Date Published
    March 27, 2008
    16 years ago
Abstract
Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.
Description
TECHNICAL FIELD

The disclosure pertains to compositions, halogenated compositions, chemical production and telomerization processes.


BACKGROUND

Compositions such as surfactants, polymers, and urethanes have incorporated halogenated functional groups. These functional groups have been incorporated to affect the performance of the composition when the composition is used as a treatment for materials and when the composition is used to enhance the performance of materials. For example, surfactants incorporating halogenated functional groups can be used as fire extinguishants either alone or in formulations such as aqueous film forming foams (AFFF). Polymers and/or urethanes incorporating halogenated functional groups have also been used to treat materials. To prepare these compositions, halogenated intermediate compositions can be synthesized.


SUMMARY

Compositions are provided that can include RF(RT)nQ and/or one or both of


Within these compositions the RF group can have at least four fluorine atoms, the RT group can include at least one C-2 group having at least one pendant —CF3 group, n can be at least 1, the R1 group can include at least one carbon atom, and the Q group can include one or more atoms of the periodic table of elements. Compositions are provided that can also include RCl(RT)nH, with the RCl group having at least one —CCl3 group.


Telomerization processes are also provided that include exposing at least one CF3-comprising taxogen to a fluorine-comprising telogen to produce a telomer, with the fluorine-comprising telogen including at least four fluorine atoms.




BRIEF DESCRIPTION OF THE DRAWING

The FIGURE is a diagram of a system according to an exemplary embodiment of an exemplary aspect of the invention.




DETAILED DESCRIPTION OF THE-PREFERRED EMBODIMENTS

This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws “to promote the progress of science and useful arts” (Article 1, Section 8).


Compositions and methods of making compositions are described with reference to the FIGURE. Referring to the FIGURE, a system 10 is shown for preparing halogenated compositions that includes reagents such as a taxogen 2, a telogen 4, and an initiator 6 being provided to reactor 8 to form a product such as a telomer 9. In exemplary embodiments system 10 can perform a telomerization process. According to an embodiment, taxogen 2 can be exposed to telogen 4 to form telomer 9. In accordance with another embodiment, taxogen 2 can be exposed to telogen 4 in the presence of initiator 6. Reactor 8 can also be configured to provide heat to the reagents during the exposing.


Taxogen 2 can include at least one CF3-comprising compound. The CF3-comprising compound can have a C-2 group having at least one pendant —CF3 group. In exemplary embodiments taxogen 2 can comprise an olefin, such as 3,3,3-trifluoropropene (TFP, trifluoropropene).


Telogen 4 can include halogens such as fluorine and/or chlorine. Telogen 4 can include at least four fluorine atoms and can be represented as RFQ and/or RClQ. The RF group can include at least four fluorine atoms and the Q group can include one or more atoms of the periodic table of elements. The Q group can be H or I with the RF group being (CF3)2CF— and/or —C6F13, for example. The RCl group can include at least one —CCl3 group. Exemplary telogens can include (CF3)2CFI, C6F13I, trichloromethane, HP(O)(OEt)2, BrCFClCF2Br, R—SH (R being a group having carbon), and/or MeOH. In exemplary embodiments, taxogen 2 can include trifluoropropene and telogen 4 can include (CF3)2CFI, with a mole ratio of taxogen 2 to telogen 4 being from about 1:1 to about 1:10, 1:4 to about 4:1, and/or to about 2:1 to about 4:1.


Reactor 8 can be any lab-scale or industrial-scale reactor and, in certain embodiments, reactor 8 can be configured to control the temperature of the reagents therein. According to exemplary embodiments reactor 8 can be used to provide a temperature during the exposing of the reagents of from about 130° C. to about 150° C.


Telomer 9, produced upon exposing taxogen 2 to telogen 4, can include RF(RT)nQ and/or RCl(RT)nH. The RT group can include at least one C-2 group having a pendant —CF3 group, such as


Exemplary products include


and/or one or both of


with R1 including at least one carbon atom, such as —CH2—, for example. In exemplary embodiments, n can be at least 1 and in other embodiments n can be at least 2 and the product can include one or more of


In an exemplary embodiment, the taxogen trifluoropropene can be exposed to the telogen (CF3)2CFI to form the telomer


and, by way of another example, trifluoropropene can be exposed to the telogen C6F13I to form the telomer


In accordance with another embodiment, the taxogen trifluoropropene can also be exposed to the telogen CCl3Z, (Z=H, Br, and/or Cl, for example) to form the telomer CF3
Products having n being at least 2 can be formed when utilizing an excess of the taxogen as compared to the telogen. For example, at least a 2:1 mole ratio of the taxogen to the telogen can be utilized to obtain products having n being at least 2. For example and by way of example only, at least two moles of the taxogen trifluoropropene can be exposed to at least one mole of the telogen (CF3)2CFI to form one or both of the telomers


In additional embodiments initiator 6 may be provided to reactor 8 during the exposing of the reagents. Initiator 6 can include thermal, photochemical (UV), radical, and/or metal complexes, for example, including a peroxide such as di-tert-butyl peroxide. Initiator 6 can also include catalysts, such as Cu. Initiator 6 and telogen 4 can be provided to reactor 8 at a mole ratio of initiator 6 to taxogen 2 of from between about 0.001 to about 0.05 and/or from between about 0.01 to about 0.03, for example.


According to exemplary embodiments, various initiators 6 and telogens 4 can be used to telomerize taxogen 2 as referenced in Table 1 below. Telomerizations utilizing photochemical and/or metal-complex initiators 6 can be carried out in batch conditions using Carius tube reactors 8. Telomerizations utilizing thermal and/or peroxide initiators 6 can be carried out in 160 and/or 500 cm3 Hastelloy reactors 8. Telogen 4 (neat and/or as a peroxide solution) can be provided as a gas at a temperature from about 60° C. to about 180° C. and a telogen 4 [T]0/taxogen 2 [Tx]0 initial molar ratio R0 can be varied from 0.25 to 1.5 and the reaction time from 4 to 24 hrs as dictated in Table 1 below. The product mixture can be analyzed by gas chromatography and/or the product can be distilled into different fractions and analyzed by 1H and 19F NMR and/or 13C NMR. MonoAdduct (n=1) and DiAdduct (n=2) products can be recognized as shown in Table 1 below.

TABLE 1Telomerization of Trifluoropropene TaxogenYield (%) by GCcP (bars)% Conv. ofMonoAdductDiAdductRunaInit.dR0bC0bT (° C.)tr (hrs)maxminTaxogenTelogen(n = 1)(n = 2)1Therm0.5016020221779.227.651.920.52Therm0.2516020393436.852.826.2213Therm0.5018022301173.42.465.931.24Perk0.500.0362207579.223.835.440.85AIBN0.500.03821810779.217.438.8426TRIG0.500.031346160.689.63.71963.87DTBP0.500.031406170.297.93.71963.88DTBP0.500.031434190.894.39.62166.69DTBP1.40.031504131.195.222.554.415.710DTBP0.750.031454203.093.86.834.149.011DTBP1.20.031504205.090.014.946.333.412DTBP1.40.031504213.595.012.654.128.613DTBP1.50.031504195.095.024.643.928.3
aTelogen can be C6F13I in Runs Nos 1-9 and (CF3)2CFI in Runs No 10-13

bR0 = [T]0/[Tx]0; C0 = [In]0/[Tx]

cHeavy TFP telomers (n > 2) can make up remainder of product

dInitiators can be Perk. 16s(t-butyl cyclohexyl dicarbonate); AIBN; Trig. 101 (2,5-bis-(t-butyl peroxy)-2,5-dimethylhexane); and DTBP.

Claims
  • 1-17. (canceled)
  • 18: A telomerization process comprising exposing at least one CF3-comprising taxogen to a fluorine-comprising telogen to produce a telomer, wherein the fluorine-comprising telogen comprises at least four fluorine atoms.
  • 19: The process of claim 18 wherein the CF3-comprising taxogen is trifluoropropene.
  • 20: The process of claim 18 wherein the fluorine-comprising telogen is (CF3)2CFI.
  • 21: The process of claim 18 wherein the exposing the CF3-comprising taxogen to the fluorine-comprising telogen is in the presence of an initiator.
  • 22: The process of claim 21 wherein the initiator comprises a peroxide.
  • 23: The process of claim 22 wherein the peroxide comprises di-tert-butyl peroxide.
  • 24: The process of claim 22 wherein the exposing occurs within a reactor and the initiator and telogen are provided to the reactor, a mole ratio of the initiator to the telogen being between about 0.001 and about 0.05.
  • 25: The process of claim 24 wherein the mole ratio of the initiator to the telogen is between about 0.01 and about 0.03.
  • 26: The process of claim 19 wherein the exposing occurs within a reactor, a temperature within the reactor during the exposing being from about 130° C. to about 150° C.
  • 27: The process of claim 18 wherein: the CF3-comprising taxogen is trifluoropropene; and the telomer comprises wherein: the RF group comprises at least four fluorine atoms; n is at least 1; and the Q group comprises one or more atoms of the periodic table of elements.
  • 28: The process of claim 0 wherein: the CF3-comprising taxogen is trifluoropropene; the fluorine-comprising telogen is (CF3)2CFI; and a mole ratio of the taxogen to the telogen is from about 2:1 to about 4:1.
CLAIM FOR PRIORITY

This application claims priority to U.S. Provisional Patent Application Ser. No. 60/540,612, entitled Fluorine Functional Groups, Fluorine Compositions, Processes for Manufacturing Fluorine Compositions, and Material Treatments, filed Jan. 30, 2004, the entirety of which is incorporated by reference herein.

Provisional Applications (1)
Number Date Country
60540612 Jan 2004 US
Divisions (1)
Number Date Country
Parent 10587344 Jul 2007 US
Child 11986222 Nov 2007 US