Temperature sensing return electrode pad

Abstract
An electrosurgical return electrode is disclosed. The return electrode includes a conductive pad having one or more temperature monitoring zones and a patient-contacting surface configured to conduct electrosurgical energy and a temperature sensing circuit coupled to the conductive pad. The temperature sensing circuit includes at least one diode disposed within the at least one temperature monitoring zone, the at least one diode having a predetermined forward voltage drop that is indicative of temperature of at least one temperature monitoring zone.
Description
BACKGROUND

1. Technical Field


The present disclosure relates to electrosurgical apparatuses, systems and methods. More particularly, the present disclosure is directed to monopolar electrosurgical systems utilizing one or more return electrode pads configured to sense temperature.


2. Background of Related Art


Energy-based tissue treatment is well known in the art. Various types of energy (e.g., electrical, ultrasonic, microwave, cryo, heat, laser, etc.) may be applied to tissue to achieve a desired surgical result. Electrosurgery typically involves application of high radio frequency electrical current to a surgical site to cut, ablate, coagulate or seal tissue. In monopolar electrosurgery, a source or active electrode delivers radio frequency energy from the electrosurgical generator to the tissue and a return electrode carries the current back to the generator. In monopolar electrosurgery, the source electrode is typically part of the surgical instrument held by the user and applied to the tissue to be treated. The patient return electrodes are typically in the form of pads adhesively adhered to the patient and are placed remotely from the active electrode to carry the current back to the generator.


The return electrodes usually have a large patient contact surface area to minimize heating at that site since the smaller the surface area, the greater the current density and the greater the intensity of the heat. That is, the area of the return electrode that is adhered to the patient is important because it is the current density of the electrical signal that heats the tissue. A larger surface contact area is desirable to reduce localized heat intensity. Return electrodes are typically sized based on assumptions of the maximum current utilized during a particular surgical procedure and the duty cycle (i.e., the percentage of time the generator is on).


The first types of return electrodes were in the form of large metal plates covered with conductive jelly. Later, adhesive electrodes were developed with a single metal foil covered with conductive jelly or conductive adhesive. However, one problem with these adhesive electrodes was that if a portion peeled from the patient, the contact area of the electrode with the patient decreased, thereby increasing the current density at the adhered portion and, in turn, increasing the heat applied to the tissue. This risked burning the patient in the area under the adhered portion of the return electrode if the tissue was heated beyond the point where circulation of blood could cool the skin.


To address this problem various return electrodes and hardware circuits, generically called Return Electrode Contact Quality Monitors (RECQMs), were developed. Such systems relied on measuring impedance at the return electrode to calculate a variety of tissue and/or electrode properties (e.g., degree of electrode adhesiveness, temperature). These systems were only configured to measure temperature as a function of the changes in impedance of the return electrode pads.


SUMMARY

The present disclosure relates to an electrosurgical return electrode that includes a conductive pad having a patient-contacting surface. The conductive pad includes a temperature circuit coupled to a power source and electrically insulated from the patient-contacting surface. The temperature circuit includes one or more diodes coupled in series with one or more resistors. The diodes are located within predetermined temperature measuring zone and provide for temperature measurement within corresponding temperature monitoring zones. In particular, the forward bias voltage across the diodes varies with the temperature. Thus, by monitoring the voltage, temperature can be monitored as a function thereof.


According to one aspect of the present disclosure, an electrosurgical return electrode is provided. The return electrode includes a conductive pad having one or more temperature monitoring zones and a patient-contacting surface configured to conduct electrosurgical energy and a temperature sensing circuit operatively associated with the conductive pad. The temperature sensing circuit includes at least one diode disposed within the at least one temperature monitoring zone, the at least one diode having a predetermined forward voltage drop which is indicative of temperature of at least one temperature monitoring zone.


A method for performing electrosurgery is also contemplated by the present disclosure. The method includes the steps of providing an electrosurgical return electrode including a conductive pad having one or more temperature monitoring zones and a patient-contacting surface configured to conduct electrosurgical energy and a temperature sensing circuit operatively associated with the conductive pad. The temperature sensing circuit includes at least one diode disposed within the at least one temperature monitoring zone, the at least one diode having a predetermined forward voltage drop which is indicative of temperature of at least one temperature monitoring zone. The method also includes the steps of placing the electrosurgical return electrode in contact with a patient, generating electrosurgical energy via an electrosurgical generator, supplying the electrosurgical energy to the patient via an active electrode, and monitoring the predetermined forward voltage drop to measure the temperature of the at least one temperature monitoring zone.


According to another aspect of the present disclosure an electrosurgical system for performing electrosurgery is disclosed. The electrosurgical system includes an electrosurgical generator configured to provide electrosurgical energy and an electrosurgical return electrode. The return electrode includes a conductive pad having one or more temperature monitoring zones and a patient-contacting surface configured to conduct electrosurgical energy and a temperature sensing circuit operatively associated with the conductive pad. The temperature sensing circuit includes at least one diode disposed within the at least one temperature monitoring zone, the at least one diode having a predetermined forward voltage drop which is indicative of temperature of at least one temperature monitoring zone. The system also includes an active electrode to supply electrosurgical energy to a patient.





BRIEF DESCRIPTION OF THE DRAWINGS

Various embodiments of the present disclosure are described herein with reference to the drawings wherein:



FIG. 1 is a schematic block diagram of an electrosurgical system according to the present disclosure;



FIG. 2 is a schematic block diagram of a generator according to one embodiment of the present disclosure;



FIG. 3 is a top view of the electrosurgical return electrode of the monopolar electrosurgical system of FIG. 1;



FIG. 4 is a cross-sectional side view of an electrosurgical return electrode having a positive temperature coefficient (PTC) material and adhesive material layers;



FIGS. 5A-B illustrate one embodiment of an electro surgical return electrode having temperature sensing circuit according to the present disclosure; and



FIG. 6 is a cross-sectional plan view of another embodiment of an electrosurgical return electrode having temperature sensing circuit according to the present disclosure.





DETAILED DESCRIPTION

Particular embodiments of the present disclosure are described hereinbelow with reference to the accompanying drawings. In the following description, well-known functions or constructions are not described in detail to avoid obscuring the present disclosure in unnecessary detail.



FIG. 1 is a schematic illustration of an electrosurgical system according to one embodiment of the present disclosure. The system includes an electrosurgical instrument 2 having one or more electrodes for treating tissue of a patient P. The instrument 2 is a monopolar instrument including one or more active electrodes (e.g., electrosurgical cutting probe, ablation electrode(s), etc.). Electrosurgical RF energy is supplied to the instrument 2 by a generator 20 via an electrosurgical cable 4, which is connected to an active output terminal, allowing the instrument 2 to coagulate, seal, ablate and/or otherwise treat tissue. The energy is returned to the generator 20 through a return electrode 6 via a return cable 8. The system may include a plurality of return electrodes 6 that are arranged to minimize the chances of tissue damage by maximizing the overall contact area with the patient P. In addition, the generator 20 and the return electrode 6 may be configured for monitoring so-called “tissue-to-patient” contact to insure that sufficient contact exists therebetween to further minimize chances of tissue damage.


The generator 20 includes input controls (e.g., buttons, activators, switches, touch screen, etc.) for controlling the generator 20. In addition, the generator 20 may include one or more display screens for providing the user with variety of output information (e.g., intensity settings, treatment complete indicators, etc.). The controls allow the user to adjust power of the RF energy, waveform, and other parameters to achieve the desired waveform suitable for a particular task (e.g., coagulating, tissue sealing, intensity setting, etc.). The instrument 2 may also include a plurality of input controls that may be redundant with certain input controls of the generator 20. Placing the input controls at the instrument 2 allows for easier and faster modification of RF energy parameters during the surgical procedure without requiring interaction with the generator 20.



FIG. 2 shows a schematic block diagram of the generator 20 having a controller 24, a high voltage DC power supply 27 (“HVPS”) and an RF output stage 28. The HVPS 27 provides high voltage DC power to an RF output stage 28, which then converts high voltage DC power into RF energy and delivers the RF energy to the active electrode. In particular, the RF output stage 28 generates sinusoidal waveforms of high RF energy. The RF output stage 28 is configured to generate a plurality of waveforms having various duty cycles, peak voltages, crest factors, and other suitable parameters. Certain types of waveforms are suitable for specific electrosurgical modes. For instance, the RF output stage 28 generates a 100% duty cycle sinusoidal waveform in cut mode, which is best suited for ablating, fusing and dissecting tissue, and a 1-25% duty cycle waveform in coagulation mode, which is best used for cauterizing tissue to stop bleeding.


The controller 24 includes a microprocessor 25 operably connected to a memory 26, which may be volatile type memory (e.g., RAM) and/or non-volatile type memory (e.g., flash media, disk media, etc.). The microprocessor 25 includes an output port that is operably connected to the HVPS 27 and/or RF output stage 28 allowing the microprocessor 25 to control the output of the generator 20 according to either open and/or closed control loop schemes. Those skilled in the art will appreciate that the microprocessor 25 may be substituted by any logic processor (e.g., control circuit) adapted to perform the calculations discussed herein.


A closed loop control scheme is a feedback control loop wherein sensor circuit 22, which may include a plurality of sensors measuring a variety of tissue and energy properties (e.g., tissue impedance, tissue temperature, output current and/or voltage, etc.), provides feedback to the controller 24. Such sensors are within the purview of those skilled in the art. The controller 24 then signals the HVPS 27 and/or RF output stage 28, which then adjust DC and/or RF power supply, respectively. The controller 24 also receives input signals from the input controls of the generator 20 or the instrument 2. The controller 24 utilizes the input signals to adjust power outputted by the generator 20 and/or performs other control functions thereon.



FIGS. 3 and 4 illustrate various embodiments of the return electrode 6 for use in monopolar electrosurgery. The return electrode 6 includes a conductive pad 30 having a top surface and a patient-contacting surface 32 configured to receive current during monopolar electrosurgery. The patient-contacting surface 32 is made from a suitable conductive material such as metallic foil. While FIG. 3 depicts the return electrode 6 in a general rectangular shape, it is within the scope of the disclosure for the return electrode 6 to have any suitable regular or irregular shape.


Referring to FIG. 4, another embodiment of the return electrode 6 is shown, wherein the conductive pad 30 includes a positive temperature coefficient (PTC) material layer 38 deposited thereon. The PTC material 38 can be made of, inter alia, a polymer/carbon-based material, a cermet-based material, a polymer material, a ceramic material, a dielectric material, or any combinations thereof. The PTC material layer 38 acts to distribute the temperature created by the current over the surface of the electrosurgical return electrode 6, which minimizes the risk of a patient burn. The return electrode 6 further includes an adhesive material layer 39 on the patient-contacting surface 32. The adhesive material can be, but is not limited to, a polyhesive adhesive, a Z-axis adhesive, a water-insoluble, hydrophilic, pressure-sensitive adhesive, or any combinations thereof, such as POLYHESIVE™ adhesive manufactured by Valleylab of Boulder, Colo. The adhesive material layer 39 ensures an optimal surface contact area between the electrosurgical return electrode 6 and the patient “P,” which limits the possibility of a patient burn. In an embodiment where PTC material layer 38 is not utilized, the adhesive material layer 39 may be deposited directly onto the patient-contacting surface 32.



FIGS. 5A and 5B shows the return electrode 6 including a temperature sensing circuit 40 disposed therein. The temperature sensing circuit 40 includes one or more temperature sensor arrays 41 and 43 having at least one temperature sensor. Contemplated temperature sensors include thermocouples, thermistors, semiconductor (e.g., silicon) diodes, ferrite materials and Hall effect devices. The temperature sensing circuit 40 is disposed on a flex circuit (e.g., a flexible holding substrate 48) manufactured from suitable substrate, such as a polyimide film. Examples are films sold under the trademarks MYLAR™ and KAPTON™ and the like.


The diodes 42 are connected in series with one or more current limiting resistors 44 and are utilized as temperature sensors. The resistor 44 is coupled in series with the diode 42, having a resistance selected to set and limit the current flowing through the diode 42 at a predetermined level. The current flow to the diodes 42 is provided by a power source 50, such as a low voltage DC power source (e.g., battery, AC/DC transformer, etc.) connected in series with the diodes 42 and resistors 44 via interconnection wires 46. The power source 50 may be integrated into the generator 20 and draw power from the same source as the HVPS 27 (e.g., AC outlet). In one embodiment, interconnection of the diodes 42 and the resistors 44 is achieved by deposition of metal traces on the holding substrate 48 and soldering of the diodes 42 and the resistors 44 directly into the holding substrate 48. The holding substrate 48 may also electrically insulate the temperature sensing circuit 40 from the patient-contacting surface 32 to prevent RF energy being returned to the generator 20 from interfering with the circuit components.


The diodes 42 are forward biased such that current flows initially through the resistor 44 and from the diode's anode to the diode's cathode. In a forward biased diode 42, forward voltage drop (Vf) is produced that is in the range of about 0.5V to about 5V depending on the type of diode (e.g., light emitting diode). The forward voltage is directly dependent on the temperature. In particular, as the temperature increases, the semiconductor material within the diode 42 undergoes changes in their valence and conduction bands and consequently Vf decreases. Thus, by keeping the current flowing through the diode 42 constant via the resistor 44 and measuring the forward bias voltage allows for determination of the temperature of the diode 42.


The Vf signal is transmitted through the interconnection wires 46 to the generator 20, wherein the sensor circuit 22 analyzes the Vf to determine a corresponding temperature value. As those skilled in the art will appreciate, each of the interconnection wires 46 may include a corresponding isolation circuit (e.g., optical couplers) to translate electric signals (e.g., Vf) across isolation barriers, thereby isolating the temperature sensing circuit 40 from the RF supply.


The analysis process may include passing the Vf signals through an analog-to-digital converter and then multiplying the digitized Vf signal by a predetermined factor to arrive at a corresponding temperature value. The factor is derived empirically taking into consideration electrical properties of the diode 42, resistor 44 as well as electrical properties of the current being passed therethrough. The temperature signal is then transmitted to the controller 24 where it is further analyzed to determine appropriate action. For instance, comparing temperature measurements with a predetermined temperature threshold and adjusting or terminating the RF energy supply if the temperature measurement is larger than the predetermined threshold.


Temperature across the patient-contacting surface 32 may vary due to a number of factors (e.g., moisture content, adherence, etc.) affecting current density. Therefore, it may be desirable to measure temperatures at various points in the conductive pad 30. Measuring temperature at various points allows for pinpointing the location of so-called “hot spots,” segments of the patient-contacting surface 32 where current density exceeds that of the surrounding area and results in pad burn. Since measurement of Vf for each diode 42 provides for determination of corresponding temperature at the location of the diode 42, placing the diodes 42 strategically within the conductive pad 30 allows for monitoring of temperature at those locations.


With reference to FIG. 5A, each resistor 44 and diode 42 pair is disposed within the conducting pad 30 such that the diode 42 provides temperature readings for a corresponding temperature monitoring zone 45. The size of the monitoring zone 45 depends on the distance between the diodes 42. The conductive pad 30 may include any number of monitoring zones 45 of varying sizes. Each diode 42 is identified by the sensor circuit 22 as being associated with a particular monitoring zone 45 such that, when Vf signals are transmitted and subsequently converted into temperature readings, the generator 20 provides temperature monitoring for each of the monitoring zones 45. This data is utilized to instruct the user which specific portion of the conductive pad 30 includes a hot spot so that preventative action may be taken, if necessary. This may include automatic RF supply termination and/or adjustment or manual termination of RF supply to ensure that the conductive pad 30 adheres properly to the patient at the identified hot spot.


As shown in FIG. 6, the temperature sensor arrays 41 and 43 include a single resistor 44 connected in series with a plurality of diodes 42 disposed within a respective temperature monitoring zone 45. Since the diodes 42 are connected in series to one resistor 44, the current supplied to the diodes 42 is the same. Consequently, measuring the Vf across the diodes 42 provides the temperature for the entire respective temperature monitoring zone 45. This circuit arrangement provides an average temperature measurement over larger segments of the conductive pad 30 (e.g., entire area). Those skilled in the art will appreciate that various configurations of the resistor 44 and diode 42 are contemplated to ensure that temperature of various segments of the conductive pads 30 are monitored.


While several embodiments of the disclosure have been shown in the drawings and/or discussed herein, it is not intended that the disclosure be limited thereto, as it is intended that the disclosure be as broad in scope as the art will allow and that the specification be read likewise. Therefore, the above description should not be construed as limiting, but merely as exemplifications of particular embodiments. Those skilled in the art will envision other modifications within the scope and spirit of the claims appended hereto.

Claims
  • 1. An electrosurgical return pad, comprising: a conductive electrode including a plurality of temperature monitoring zones contiguously arranged therein and a patient-contacting surface configured to conduct electrosurgical energy;a temperature sensing circuit thermally associated with each temperature monitoring zone configured to sense an average temperature of the temperature monitoring zone associated therewith; andan interconnection wire coupling each temperature sensing circuit to an optical isolation circuit adapted to isolate the temperature sensing circuit from electrosurgical energy.
  • 2. An electrosurgical return pad according to claim 1, wherein the temperature sensing circuit includes one or more temperature sensing elements selected from the group consisting of a thermocouple, a thermistor, and a semiconductor diode.
  • 3. An electrosurgical return pad according to claim 1, further comprising a holding substrate for housing the temperature sensing circuit, the holding substrate configured to electrically insulate the temperature sensing circuit from the patient-contacting surface.
  • 4. An electrosurgical return pad according to claim 1, wherein the temperature sensing circuit is configured to operably couple to an electrosurgical generator.
  • 5. The electrosurgical return pad according to claim 1, wherein the return pad includes an adhesive material disposed on the patient-contacting surface.
  • 6. The electrosurgical return pad according to claim 1, wherein the return pad is at least partially coated with a positive temperature coefficient material.
  • 7. A method for performing electrosurgery, comprising: providing an electrosurgical return pad having a conductive electrode that includes a plurality of temperature monitoring zones contiguously arranged therein and a patient-contacting surface configured to conduct electrosurgical energy, a temperature sensing circuit thermally associated with each temperature monitoring zone and configured to sense an average temperature of the temperature monitoring zone associated therewith, and an interconnection wire coupling each temperature sensing circuit to an optical isolation circuit adapted to isolate the temperature sensing circuit from electrosurgical energy;placing the electrosurgical return pad in contact with a patient;generating electrosurgical energy from an electrical energy source;supplying the electrosurgical energy to the patient via an active electrode; andmeasuring the average temperature of the plurality of temperature monitoring zones.
  • 8. A method according to claim 7, wherein the temperature sensing circuit includes one or more temperature sensing elements selected from the group consisting of a thermocouple, a thermistor, and a semiconductor diode.
  • 9. A method according to claim 7, further comprising a holding substrate for housing the temperature circuit, the holding substrate configured to electrically insulate the temperature sensing circuit from the patient-contacting surface.
  • 10. A method according to claim 7, wherein the return pad includes an adhesive material disposed on the patient-contacting surface.
  • 11. A method according to claim 7, wherein the return pad is at least partially coated with a positive temperature coefficient material.
  • 12. A method according to claim 7, further comprising: identifying a segment of the patient-contacting surface corresponding to a temperature monitoring zone wherein current density exceeds that of the surrounding area; andinstructing a user to take action with respect to the identified segment.
  • 13. An electrosurgical system for performing electrosurgery, the electrosurgical system comprising: an electrosurgical generator configured to provide electrosurgical energy;an electrosurgical return pad including a conductive electrode including a plurality of temperature monitoring zones contiguously arranged therein and a patient-contacting surface configured to conduct electrosurgical energy, and a temperature sensing circuit thermally associated with each temperature monitoring zone configured to sense an average temperature of the at least one temperature monitoring zone associated therewith, and an interconnection wire coupling each temperature sensing circuit to an optical isolation circuit adapted to isolate the temperature sensing circuit from electrosurgical energy; andan active electrode configured to supply electrosurgical energy to a patient.
  • 14. An electrosurgical system according to claim 13, wherein the temperature sensing circuit includes one or more temperature sensing elements selected from the group consisting of a thermocouple, a thermistor, and a semiconductor diode.
  • 15. An electrosurgical system according to claim 13, further comprising a holding substrate for housing the temperature sensing circuit, the holding substrate configured to electrically insulate the temperature sensing circuit from the patient-contacting surface.
  • 16. An electrosurgical system according to claim 13, wherein the return pad includes an adhesive material disposed on the patient-contacting surface.
  • 17. An electrosurgical system according to claim 13, wherein the return pad is at least partially coated with a positive temperature coefficient material.
  • 18. An electrosurgical system according to claim 13, further comprising: an analog-to-digital converter unit configured to receive an analog temperature signal from a temperature sensing circuit of a temperature monitoring zone, and to output a corresponding digital temperature signal.
  • 19. An electrosurgical system according to claim 18, further comprising: a multiplication unit configured to multiply the digital temperature signal by a predetermined factor to arrive at a corresponding temperature value.
  • 20. An electrosurgical system according to claim 19, wherein the electrosurgical generator terminates a supply of electrosurgical energy if the temperature value is larger than a predetermined threshold.
CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. application Ser. No. 11/529,007, filed Sep. 28, 2006, now U.S. Pat. No. 7,927,329, the entirety of which is hereby incorporated by reference herein for all purposes.

US Referenced Citations (289)
Number Name Date Kind
2536271 Fransen et al. Jan 1951 A
3380445 Frasier Apr 1968 A
3534306 Watrous et al. Oct 1970 A
3543760 Bolduc Dec 1970 A
3642008 Bolduc Feb 1972 A
3683923 Anderson Aug 1972 A
3812861 Peters May 1974 A
3913583 Bross Oct 1975 A
3923063 Andrews et al. Dec 1975 A
3933157 Bjurwill et al. Jan 1976 A
3987796 Gonser Oct 1976 A
4067342 Burton Jan 1978 A
4092985 Kaufman Jun 1978 A
4094320 Newton et al. Jun 1978 A
4102341 Ikuno et al. Jul 1978 A
4114622 Gonser Sep 1978 A
4117846 Williams Oct 1978 A
4121590 Gonser Oct 1978 A
4126137 Archibald Nov 1978 A
4166465 Esty et al. Sep 1979 A
4188927 Harris Feb 1980 A
4200104 Harris Apr 1980 A
4200105 Gonser Apr 1980 A
4213463 Osenkarski Jul 1980 A
4231372 Newton Nov 1980 A
4237887 Gonser Dec 1980 A
4253721 Kaufman Mar 1981 A
4303073 Archibald Dec 1981 A
4304235 Kaufman Dec 1981 A
4331149 Gonser May 1982 A
4343308 Gross Aug 1982 A
4381789 Naser et al. May 1983 A
4384582 Watt May 1983 A
4387714 Geddes et al. Jun 1983 A
4393584 Bare et al. Jul 1983 A
4416276 Newton et al. Nov 1983 A
4416277 Newton et al. Nov 1983 A
4437464 Crow Mar 1984 A
4494541 Archibald Jan 1985 A
4494552 Heath Jan 1985 A
4643193 DeMarzo Feb 1987 A
4657015 Irnich Apr 1987 A
4658819 Harris et al. Apr 1987 A
4662369 Ensslin May 1987 A
4669468 Cartmell et al. Jun 1987 A
4699146 Sieverding Oct 1987 A
4722761 Cartmell et al. Feb 1988 A
4725713 Lehrke Feb 1988 A
4741334 Irnich May 1988 A
4745918 Feucht May 1988 A
4748983 Shigeta et al. Jun 1988 A
4750482 Sieverding Jun 1988 A
4754757 Feucht Jul 1988 A
4768514 DeMarzo Sep 1988 A
4770173 Feucht et al. Sep 1988 A
4788977 Farin et al. Dec 1988 A
4799480 Abraham et al. Jan 1989 A
4807621 Hagen et al. Feb 1989 A
4844063 Clark Jul 1989 A
4848335 Manes Jul 1989 A
4852571 Gadsby et al. Aug 1989 A
4862889 Feucht Sep 1989 A
4873974 Hagen et al. Oct 1989 A
4878493 Pasternak et al. Nov 1989 A
4887047 Somerville Dec 1989 A
4895169 Heath Jan 1990 A
4933535 Zabinski Jun 1990 A
4942313 Kinzel Jul 1990 A
4947846 Kitagawa et al. Aug 1990 A
4955381 Way et al. Sep 1990 A
4961047 Carder Oct 1990 A
4969885 Farin Nov 1990 A
5000753 Hagen et al. Mar 1991 A
5004425 Hee Apr 1991 A
5010896 Westbrook Apr 1991 A
5038796 Axelgaard et al. Aug 1991 A
5042981 Gross Aug 1991 A
5061914 Busch et al. Oct 1991 A
5087257 Farin et al. Feb 1992 A
5114424 Hagen et al. May 1992 A
5152762 McElhenney Oct 1992 A
5160334 Billings et al. Nov 1992 A
5196008 Kuenecke et al. Mar 1993 A
5246439 Hebborn et al. Sep 1993 A
5271417 Swanson et al. Dec 1993 A
5276079 Duan et al. Jan 1994 A
5286255 Weber Feb 1994 A
5312401 Newton et al. May 1994 A
5336255 Kanare et al. Aug 1994 A
5352315 Carrier et al. Oct 1994 A
5362420 Itoh et al. Nov 1994 A
5370645 Klicek et al. Dec 1994 A
5372596 Klicek et al. Dec 1994 A
5385679 Uy et al. Jan 1995 A
5388490 Buck Feb 1995 A
5389376 Duan et al. Feb 1995 A
5390382 Hannant et al. Feb 1995 A
5409966 Duan et al. Apr 1995 A
5447513 Davison et al. Sep 1995 A
5449365 Green et al. Sep 1995 A
5452725 Martenson Sep 1995 A
5480399 Hebborn Jan 1996 A
5496312 Klicek Mar 1996 A
5496363 Burgio et al. Mar 1996 A
5520180 Uy et al. May 1996 A
5536446 Uy et al. Jul 1996 A
5540684 Hassler, Jr. Jul 1996 A
5585756 Wang Dec 1996 A
5599347 Hart et al. Feb 1997 A
5601618 James Feb 1997 A
5611709 McAnulty Mar 1997 A
5632280 Leyde et al. May 1997 A
5633578 Eggers et al. May 1997 A
5643319 Green et al. Jul 1997 A
5660892 Robbins et al. Aug 1997 A
5670557 Dietz et al. Sep 1997 A
5674561 Dietz et al. Oct 1997 A
5678545 Stratbucker Oct 1997 A
5688269 Newton et al. Nov 1997 A
5695494 Becker Dec 1997 A
5707369 Vaitekunas et al. Jan 1998 A
5718719 Clare et al. Feb 1998 A
5720744 Eggleston et al. Feb 1998 A
5766165 Gentelia et al. Jun 1998 A
5779632 Dietz et al. Jul 1998 A
5797902 Netherly Aug 1998 A
5800426 Taki et al. Sep 1998 A
5817091 Nardella et al. Oct 1998 A
5830212 Cartmell et al. Nov 1998 A
5836942 Netherly et al. Nov 1998 A
5846558 Nielsen et al. Dec 1998 A
5853750 Dietz et al. Dec 1998 A
5868742 Manes et al. Feb 1999 A
5924983 Takaki et al. Jul 1999 A
5947961 Netherly Sep 1999 A
5952398 Dietz et al. Sep 1999 A
5971981 Hill et al. Oct 1999 A
5976128 Schilling et al. Nov 1999 A
5983141 Sluijter et al. Nov 1999 A
5985990 Kantner et al. Nov 1999 A
5999061 Pope et al. Dec 1999 A
6007532 Netherly Dec 1999 A
6010054 Johnson et al. Jan 2000 A
6026323 Skladnev et al. Feb 2000 A
6030381 Jones et al. Feb 2000 A
6032063 Hoar et al. Feb 2000 A
6039732 Ichikawa et al. Mar 2000 A
6053910 Fleenor Apr 2000 A
RE36720 Green et al. May 2000 E
6059778 Sherman May 2000 A
6063075 Mihori May 2000 A
6083221 Fleenor et al. Jul 2000 A
6086249 Urich Jul 2000 A
6121508 Bischof et al. Sep 2000 A
6135953 Carim Oct 2000 A
6171304 Netherly et al. Jan 2001 B1
6200314 Sherman Mar 2001 B1
6203541 Keppel Mar 2001 B1
6214000 Fleenor et al. Apr 2001 B1
6232366 Wang et al. May 2001 B1
6240323 Calenzo, Sr. et al. May 2001 B1
6246912 Sluijter et al. Jun 2001 B1
6258085 Eggleston Jul 2001 B1
6258087 Edwards et al. Jul 2001 B1
6275786 Daners Aug 2001 B1
6283987 Laird et al. Sep 2001 B1
6301500 Van Herk et al. Oct 2001 B1
6310611 Caldwell Oct 2001 B1
6347246 Perrault et al. Feb 2002 B1
6350264 Hooven Feb 2002 B1
6350276 Knowlton Feb 2002 B1
6355031 Edwards et al. Mar 2002 B1
6356779 Katzenmaier et al. Mar 2002 B1
6357089 Koguchi et al. Mar 2002 B1
6358245 Edwards et al. Mar 2002 B1
6379161 Ma Apr 2002 B1
6409722 Hoey et al. Jun 2002 B1
6413255 Stern Jul 2002 B1
6415170 Loutis et al. Jul 2002 B1
6454764 Fleenor et al. Sep 2002 B1
6488678 Sherman Dec 2002 B2
6511478 Burnside et al. Jan 2003 B1
6537272 Christopherson et al. Mar 2003 B2
6544258 Fleenor et al. Apr 2003 B2
6546270 Goldin et al. Apr 2003 B1
6565559 Eggleston May 2003 B2
6569160 Goldin et al. May 2003 B1
6582424 Fleenor et al. Jun 2003 B2
6666859 Fleenor et al. Dec 2003 B1
6669073 Milliman et al. Dec 2003 B2
6736810 Hoey et al. May 2004 B2
6796828 Ehr et al. Sep 2004 B2
6799063 Carson Sep 2004 B2
6830569 Thompson et al. Dec 2004 B2
6849073 Hoey et al. Feb 2005 B2
6860881 Sturm et al. Mar 2005 B2
6875210 Refior et al. Apr 2005 B2
6892086 Russell May 2005 B2
6905497 Truckai et al. Jun 2005 B2
6939344 Kreindel Sep 2005 B2
6948503 Refior et al. Sep 2005 B2
6953139 Milliman et al. Oct 2005 B2
6958463 Kochman et al. Oct 2005 B1
6959852 Shelton, IV et al. Nov 2005 B2
6997735 Ehr et al. Feb 2006 B2
7025765 Balbierz et al. Apr 2006 B2
7112201 Truckai et al. Sep 2006 B2
7128253 Mastri et al. Oct 2006 B2
7137980 Buysse et al. Nov 2006 B2
7143926 Shelton, IV et al. Dec 2006 B2
7160293 Sturm et al. Jan 2007 B2
7166102 Fleenor et al. Jan 2007 B2
7169144 Hoey et al. Jan 2007 B2
7169145 Isaacson et al. Jan 2007 B2
7182604 Ehr et al. Feb 2007 B2
7220260 Fleming et al. May 2007 B2
7229307 Ehr et al. Jun 2007 B2
7258262 Mastri et al. Aug 2007 B2
7267675 Stern et al. Sep 2007 B2
7278562 Mastri et al. Oct 2007 B2
7303107 Milliman et al. Dec 2007 B2
7308998 Mastri et al. Dec 2007 B2
7311560 Ehr et al. Dec 2007 B2
7357287 Shelton, IV et al. Apr 2008 B2
7380695 Doll et al. Jun 2008 B2
7422589 Newton et al. Sep 2008 B2
7452358 Stern et al. Nov 2008 B2
7465302 Odell et al. Dec 2008 B2
7473145 Ehr et al. Jan 2009 B2
7483738 Tamarkin et al. Jan 2009 B2
7520877 Lee et al. Apr 2009 B2
7566332 Jarrard et al. Jul 2009 B2
7588567 Boveja et al. Sep 2009 B2
7637907 Blaha Dec 2009 B2
7722412 Ehr et al. May 2010 B2
7722603 McPherson May 2010 B2
7736357 Lee, Jr. et al. Jun 2010 B2
7736359 McPherson Jun 2010 B2
7771419 Carmel et al. Aug 2010 B2
7771422 Auge, II et al. Aug 2010 B2
7837680 Isaacson et al. Nov 2010 B2
7909819 Falkenstein et al. Mar 2011 B2
7927329 McPherson Apr 2011 B2
7938825 Sturm et al. May 2011 B2
8021360 Dunning et al. Sep 2011 B2
8062291 McPherson Nov 2011 B2
8080007 Dunning et al. Dec 2011 B2
8100898 Gregg Jan 2012 B2
20030020072 Higgins Jan 2003 A1
20030120271 Burnside et al. Jun 2003 A1
20030139741 Goble et al. Jul 2003 A1
20040150504 Nicholson Aug 2004 A1
20040199154 Nahon et al. Oct 2004 A1
20040206365 Knowlton Oct 2004 A1
20050113817 Isaacson et al. May 2005 A1
20060041252 Odell et al. Feb 2006 A1
20060074411 Carmel et al. Apr 2006 A1
20060079872 Eggleston Apr 2006 A1
20060173250 Nessler Aug 2006 A1
20060217742 Messerly et al. Sep 2006 A1
20060224150 Arts et al. Oct 2006 A1
20070049914 Eggleston Mar 2007 A1
20070049919 Lee et al. Mar 2007 A1
20070074719 Danek et al. Apr 2007 A1
20070161979 McPherson Jul 2007 A1
20070167942 Rick Jul 2007 A1
20070203481 Gregg et al. Aug 2007 A1
20070244478 Bahney Oct 2007 A1
20080009846 Ward Jan 2008 A1
20080082097 McPherson Apr 2008 A1
20080083806 Scirica Apr 2008 A1
20080083813 Zemlok et al. Apr 2008 A1
20080097558 Eggers et al. Apr 2008 A1
20080249524 Dunning Oct 2008 A1
20080281310 Dunning et al. Nov 2008 A1
20080281311 Dunning et al. Nov 2008 A1
20090036884 Gregg et al. Feb 2009 A1
20090138006 Bales et al. May 2009 A1
20090198229 Dunning Aug 2009 A1
20090198230 Behnke et al. Aug 2009 A1
20090209953 Schoenman Aug 2009 A1
20090223041 Garrison et al. Sep 2009 A1
20090234352 Behnke et al. Sep 2009 A1
20090234353 McPherson Sep 2009 A1
20100241023 Gilbert Sep 2010 A1
20110077641 Dunning Mar 2011 A1
20110112525 Dunning et al. May 2011 A1
20110112530 Keller May 2011 A1
20110190761 McPherson Aug 2011 A1
Foreign Referenced Citations (56)
Number Date Country
1219642 Mar 1987 CA
3239640 May 1983 DE
3206947 Sep 1983 DE
3544443 Jun 1987 DE
4238263 May 1993 DE
4231236 Mar 1994 DE
19717411 Nov 1998 DE
19751108 May 1999 DE
19801173 Jul 1999 DE
10328514 Jun 2003 DE
102004010940 Sep 2005 DE
0262888 Apr 1988 EP
390937 Oct 1990 EP
836868 Apr 1998 EP
1051949 Nov 2000 EP
1076350 Feb 2001 EP
0930048 Apr 2003 EP
1645236 Apr 2006 EP
1707151 Oct 2006 EP
1808144 Jul 2007 EP
1468653 Nov 2007 EP
1902684 Mar 2008 EP
1990020 Nov 2008 EP
1994905 Nov 2008 EP
2033588 Mar 2009 EP
2276027 Jun 1974 FR
2516782 May 1983 FR
2054382 Feb 1981 GB
2374532 Oct 2002 GB
WO9300862 Jan 1993 WO
WO 9619152 Jun 1996 WO
WO 9737719 Oct 1997 WO
WO 9818395 May 1998 WO
WO 9853751 Dec 1998 WO
WO 9909899 Mar 1999 WO
WO 9911187 Mar 1999 WO
WO 0006246 Feb 2000 WO
WO 0032122 Jun 2000 WO
WO 0053113 Sep 2000 WO
WO 0065993 Nov 2000 WO
WO 0187175 Nov 2001 WO
WO 0224092 Mar 2002 WO
WO 02058579 Aug 2002 WO
WO 02060526 Aug 2002 WO
WO 02099442 Dec 2002 WO
WO 03094766 Nov 2003 WO
WO 2004028385 Apr 2004 WO
WO 2004074854 Sep 2004 WO
WO 2005048809 Jun 2005 WO
WO 2005087124 Sep 2005 WO
WO 2005099606 Oct 2005 WO
WO 2005110263 Nov 2005 WO
WO 2005115262 Dec 2005 WO
WO 2008009385 Jan 2008 WO
WO 2009031995 Mar 2009 WO
WO 2009099960 Aug 2009 WO
Related Publications (1)
Number Date Country
20110190761 A1 Aug 2011 US
Continuations (1)
Number Date Country
Parent 11529007 Sep 2006 US
Child 13085973 US