Tetrahydrocarbazoles, a process for the preparation of those compounds, and the use thereof

Information

  • Patent Grant
  • 6967215
  • Patent Number
    6,967,215
  • Date Filed
    Tuesday, September 11, 2001
    23 years ago
  • Date Issued
    Tuesday, November 22, 2005
    18 years ago
Abstract
Tetrahydrocarbazoles of formula where Q is —SO2—; —O—; or —(CO)—; X is —(CH)—; or —N—; m is from 1 to 3; t is 0 or 1 and the remaining substituents are as defined herein, are useful as antimicrobial active ingredients.
Description

The present invention relates to novel tetrahydrocarbazoles, to a process for the preparation of those compounds and to the use thereof as antimicrobial active ingredients.


The tetrahydrocarbazoles according to the invention correspond to formula
embedded image

wherein

  • R1 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkylcarbonyl, C1-C7alkoxycarbonyl, C3-C12cycloalkylcarbonyl, C3-C12-cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro,
  • R2 is hydrogen; hydroxy; C1-C20alkyl; C3-C12cycloalkyl; C1-C20hydroxyalkyl; C1-C20-hydroxyalkoxy; C1-C20aminoalkyl; N—C1-C20monoalkylamino-C1-C20alkyl; N—C1-C20-monoalkylaminohydroxy-C1-C20alkoxy; N,N—C1-C20dialkylamino-C1-C20alkyl; N,N—C1-C20dialkylaminohydroxy-C1-C20alkoxy; carboxy; carboxy-C1-C20alkyl ester; C1-C20-haloalkyl; C1-C20haloalkoxy; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12-cycloalkynyl; C1-C20alkoxy; C2-C20alkenyloxy; C2-C20alkynyloxy; halogen; cyano; C1-C7alkylcarbonyl; nitro; trifluoromethyl; or pentafluoroethyl;
  • R3 and R4 are each independently of the other hydrogen; or C1-C20alkyl; or R3 and R4 together denote a C2-C20alkylene radical; a C2-C20alkenylene radical; a C4-C20-alkynylene radical; or a C3-C20alkylene radical interrupted by —N(R6)—, it being possible for such bivalent radicals to be further substituted by one or more C1-C20alkyl, C3-C12-cycloalkyl, C2-C20alkenyl, C4-C12cycloalkenyl, C3-C20alkynyl, C4-C12cycloalkynyl, C1-C7-alkoxycarbonyl, or phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro; or R3 and R4 together denote a bicyclo[x.y.z.]C4-C20alkylene; or bicyclo[x.y.z.]C4-C20alkylene interrupted by —N(R6)—, wherein x, y and z are each independently of the others from 0 to 10;
  • R5 is hydrogen; hydroxy; C1-C20alkyl; C1-C20alkoxy; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cyclolkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, triluoroethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • R6 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; C1-C7alkoxycarbonyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cyclolkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • Q is —SO2—; —O—; or —(CO)—;
  • X is —CH—; or —N—;
  • m is from 1 to 3; and
  • t is 0 or 1.


C1-C20Alkyl denotes straight-chain or branched alkyl radicals, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, isoamyl or tert-amyl, heptyl, octyl, isooctyl, nonyl, decyl, undecyl, dodecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl or eicosyl.


C3-C12Cycloalkyl is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, cycloundecyl, cyclodocecyl and especially cyclohexyl.


Within the scope of the meanings given, alkenyl includes inter alia allyl, isopropenyl, 2-butenyl, 3-butenyl, isobutenyl, n-penta-2,4-dienyl, 3-methylbut-2-enyl, n-oct-2-enyl, n-dodec-2-enyl, isododecenyl, n-dodec-2-enyl or n-octadec-4-enyl.


C1-C20Alkoxy denotes straight-chain or branched radicals, such as methoxy, ethoxy, propoxy, butoxy or pentyloxy, hexyloxy, heptyloxy, octyloxy, isooctyloxy, nonyloxy, decyloxy, undecyloxy, dodecyloxy, tetradecyloxy, pentadecyloxy, hexadecyloxy, heptadecyloxy, octadecyloxy or eicosyloxy.


Halogen is fluorine, chlorine, bromine or iodine.


Preference is given to the use of compounds of formula (1) or (2) wherein

  • R1 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkylcarbonyl, C1-C7alkoxycarbonyl, C3-C12cycloalkylcarbonyl, C3-C12-cycloalkoxyarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylmino or by nitro,
  • R2 is hydrogen; hydroxy; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; C1-C20alkoxy; C2-C20alkenyloxy; C2-C20alkynyloxy; halogen cyano; C1-C7alkylcarbonyl; nitro; trifluoromethyl; or pentafluoroethyl;
  • R3 and R4 are each independently of the other hydrogen; or C1-C20alkyl; or R3 and R4 denote a C2-C20alkylene radical; a C2-C20alkenylene radical; a C4-C20alkynylene radical; or a C3-C20alkylene radical interrupted by —N(R6)—, it being possible for such bivalent radicals to be further substituted by one or more C1-C20alkyl, C3-C12cycloalkyl, C2-C20-alkenyl, C4-C12cycloalkenyl, C3-C20alkynyl, C4-C12cycloalkynyl, C1-C7alkoxycarbonyl, or phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12-cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • R5 is hydrogen; hydroxy; C1-C20alkyl; C1-C20alkoxy; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • R6 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; C1-C7alkoxycarbonyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluorom thyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • Q is —SO2—; —O—; or —(CO)—;
  • X is —CH—; or —N—;
  • m is from 1 to 3; and
  • t is 0 or 1.


In formula (1)

  • R1 is preferably hydrogen; C1-C20alkyl; phenyl or phenyl-C1-C5alkyl, and is especially hydrogen; or C1-C5alkyl.


Preference is given also to compounds of formula (1) wherein

  • R2 is hydrogen; C1-C20alkyl; C1-C20alkoxy; or halogen and is especially hydrogen; C1-C5alkyl; C1-C5alkoxy; or halogen.


Very special preference is given to compounds of formula
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wherein

  • R1 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkylcarbonyl, C1-C7alkoxycarbonyl, C3-C12cycloalkylcarbonyl, C3-C12-cycloalkoxyarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylmino or by nitro,
  • R2 is hydrogen; hydroxy; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; C1-C20alkoxy; C2-C20alkenyloxy; C2-C20alkynyloxy; halogen; cyano; C1-C7alkylcarbonyl; nitro; trifluoromethyl; or pentafluoroethyl;
  • R5 is hydrogen; hydroxy; C1-C20alkyl; C1-C20alkoxy; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • R6 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkeny; C3-C20-alkynyl; C4-C12cycloalkynyl; C1-C7alkoxycarbonyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C7alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12-cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • Q is —SO2—; —O—; or —(CO)—;
  • T1 is C2-C20calkylene; C2-C20alkenylene; C4-C20alkynylene; or C3-C20alkylene interrupted by
    embedded image
  • X is —CH—; or —N—;
  • s is from 1 to 4; and
  • t is 0 or 1.


Preference is given to compounds of formula (3) or (4) wherein

  • T1 is a —(CH2)2-12— radical and
  • R6 is hydrogen; or C1-C5alkyl,
  • and especially to compounds of formula (3) or (4) wherein
  • T1 is a —(CH2)3—, —(CH2)4—, —(CH2)5—, or —(CH2)10— radical; and
  • R6 is hydrogen; or C1-C5alkyl.
  • R5 in formula (1) is preferably hydrogen; C1-C20alkyl; phenyl or phenyl-C1-C5alkyl; and more especially hydrogen; C1-C5alkyl; or phenyl.


More especially preferred compounds according to the invention correspond to formula
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wherein

  • R6′ and R6″ are each independently of the other hydrogen; C1-C20alkyl; C1-C7alkoxy-carbonyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C1-C7alkoxycarbonyl, N,N-mono- or di-C1-C20alkylamino or by nitro;
  • T1 is
    embedded image

    and
  • R1, R2, R5, R6 and X are as defined for formula (3).


In formulae (5) and (6) preferably

  • R6′, R6″ and R6 are each independently of the others hydrogen; C1-C20alkyl; C1-C7-alkoxycarbonyl; phenyl; or phenyl-C1-C5alkyl.


Special preference is given to compounds of formula (5) and (6) wherein R6′ and R6″ and R6 are each independently of the others hydrogen; C1-C5alkyl; C1-C7-alkoxycarbonyl; phenyl or benzyl.


Further preferred compounds according to the invention correspond to formula
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wherein

  • R1 is hydrogen; or C1-C5alkyl;
  • R2 is hydrogen; C1-C4alkyl; Cl or Br;
  • R5 is hydrogen; C1-C5alkyl; or phenyl
  • R6′ and R6″ are each independently of the other hydrogen, C1-C5alkyl; or C1-C7alkoxy-carbonyl;
  • R6 is hydrogen; C1-C5alkyl; C1-C7alkylcarbonyl; or phenyl-C1-C5alkyl;
  • T1 is
    embedded image

    and
  • X is —CH—.


Compounds according to the invention are listed in Tables 1 a and b below by way of example:









TABLE 1a







General structural formula












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Compound of formula
R1
R2


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R5
Yield [surfaces %]















9
H
H
—(CH2)4
Ph
92


10
H
7-Br
—(CH2)4
Ph
75


11
Me
H
—(CH2)4
Ph
68


12
H
H
—(CH2)3
Ph
93


13
H
H


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Ph
67


14
H
H
—(CH2)5
Ph
92


15
H
H


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Ph
79


16
H
H
—(CH2)4
H
48


17
H
H
—(CH2)4
Et
55


18
H
7-Br
—(CH2)3
Ph
96


19
H
7-Br


embedded image


Ph
83


20
H
7-Br
—(CH2)5
Ph
68


21
Me
H
—(CH2)3
Ph
95


22
Me
H


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Ph
64


23
Me
H
—(CH2)5
Ph
75


24
Me
H


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Ph
38


25
H
H
—(CH2)3
H
86


26
H
H


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H
95


27
H
H
—(CH2)5
H
68


28
H
H


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H
88


29
H
7-Br
—(CH2)4
H
92


30
H
7-Br
—(CH2)3
H
90


31
H
7-Br


embedded image


H
41


32
H
7-Br
—(CH2)5
H
79


33
H
7-Br


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H
44


34
Me
H
—(CH2)4
H
77


35
Me
H
—(CH2)3
H
95


36
Me
H


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H
84


37
Me
H
—(CH2)5
H
87


38
H
H
—(CH2)3
Et
91


39
H
H


embedded image


Et
66


40
H
H
—(CH2)5
Et
89


41
H
H


embedded image


Et
57


42
H
7-Br
—(CH2)4
Et
85


43
H
7-Br
—(CH2)3
Et
90


44
H
7-Br


embedded image


Et
47


45
H
7-Br
—(CH2)5
Et
51


46
H
7-Br


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Et
91


47
Me
H
—(CH2)4
Et
94


48
Me
H
—(CH2)3
Et
95


49
Me
H


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Et
80


50
Me
H
—(CH2)5
Et
90


51
H
9-Et
—(CH2)4
Ph
95


52
H
H


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Ph
96


53
H
H
isopropyl
Ph
59


54
H
H


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H
19


55
H
H


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H
85


56
H
H


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H
44


57
H
H


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H
65


58
H
H


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H
62


59
H
H


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H
49


60
H
H


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H
37


61
H
H
—(CH2)10
H
90


62
H
H
—(CH2)6
H
63


63
H
H


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H
81


64
H
H
isopropyl
H
28


65
H
H
Me
H
62


66
H
H
Et
H
58


67
H
H


embedded image


H
58


68
H
7-Br


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H
93


69
H
7-Br


embedded image


H
93


70
H
7-Br


embedded image


H
90


71
H
7-Br


embedded image


H
93


72
H
7-Br


embedded image


H
94


73
H
7-Br
—(CH2)6
H
33


74
H
9-Et
—(CH2)4
H
68


75
H
9-Et
—(CH2)3
H
91


76
H
9-Et


embedded image


H
99


77
H
9-Et
—(CH2)5
H
93


78
H
9-Et


embedded image


H
82


79
H
9-Et


embedded image


H
56


80
H
9-Et


embedded image


H
78


81
H
9-Et


embedded image


H
36


82
H
9-Et


embedded image


H
63


83
H
9-Et


embedded image


H
74


84
H
9-Et


embedded image


H
91


85
H
9-Et


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H
64


86
H
9-Et


embedded image


H
39


87
H
9-Et


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H
26


88
H
9-Et
—(CH2)10
H
64


89
H
9-Et
—(CH2)6
H
86


90
H
9-Et


embedded image


H
63


91
H
7-MeO
—(CH2)4
H
93


92
H
7-MeO
—(CH2)3
H
93


93
H
7-MeO


embedded image


H
56


94
H
7-MeO
—(CH2)5
H
71


95
H
7-MeO


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H
10


96
H
7-MeO


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H
88


97
H
7-MeO


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H
22


98
H
7-MeO


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H
76


99
H
7-MeO


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H
60


100
H
7-MeO


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H
83


101
H
7-MeO


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H
94


102
H
7-MeO


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H
79


103
H
7-MeO


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H
74


104
H
7-MeO


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H
84


105
H
7-MeO


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H
80


106
H
7-MeO
—(CH2)10
H
93


107
H
7-MeO
—(CH2)6
H
34


108
H
7-MeO


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H
27


109
H
H
—(CH2)4
Me
54


110
H
H
—(CH2)3
Me
81


111
H
H


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Me
98


112
H
H
—(CH2)5
Me
93


113
H
H


embedded image


Me
47


114
H
H


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Me
86


115
H
H


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Me
16


116
H
H


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Me
64


117
H
H


embedded image


Me
98


118
H
H


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Me
87


119
H
H


embedded image


Me
98


120
H
H


embedded image


Me
98


121
H
H


embedded image


Me
83


122
H
H


embedded image


Me
93


123
H
H


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Me
89


124
H
H
—(CH2)10
Me
95


125
H
H
—(CH2)6
Me
43


126
H
H


embedded image


Me
98


127
H
7-Br
—(CH2)4
Me
92


128
H
7-Br
—(CH2)3
Me
94


129
H
7-Br


embedded image


Me
99


130
H
7-Br
—(CH2)5
Me
76


131
H
7-Br


embedded image


Me
69


132
H
7-Br


embedded image


Me
97


133
H
7-Br


embedded image


Me
22


134
H
7-Br


embedded image


Me
92


135
H
7-Br


embedded image


Me
95


136
H
7-Br


embedded image


Me
69


137
H
7-Br


embedded image


Me
84


138
H
7-Br


embedded image


Me
75


139
H
7-Br


embedded image


Me
87


140
H
7-Br


embedded image


Me
16


141
H
7-Br


embedded image


Me
73


142
H
7-Br
—(CH2)10
Me
81


143
H
7-Br
—(CH2)6
Me
97


144
H
7-Br


embedded image


Me
92


145
H
9-Et
—(CH2)4
Me
97


146
H
9-Et
—(CH2)3
Me
97


147
H
9-Et


embedded image


Me
46


148
H
9-Et
—(CH2)5
Me
88


149
H
9-Et


embedded image


Me
5


150
H
9-Et


embedded image


Me
32


151
H
9-Et


embedded image


Me
31


152
H
9-Et


embedded image


Me
85


153
H
9-Et


embedded image


Me
87


154
H
9-Et


embedded image


Me
92


155
H
9-Et


embedded image


Me
93


156
H
9-Et

Me
27


157
H
9-Et


embedded image


Me
73


158
H
9-Et


embedded image


Me
79


159
H
9-Et


embedded image


Me
13


160
H
9-Et


embedded image


Me
81


161
H
9-Et
—(CH2)10
Me
98


162
H
9-Et
—(CH2)6
Me
97


163
H
9-Et


embedded image


Me
55


164
H
7-MeO
—(CH2)4
Me
58


165
H
7-MeO
—(CH2)3
Me
54


166
H
7-MeO


embedded image


Me
93


167
H
7-MeO
—(CH2)5
Me
96


168
H
7-MeO


embedded image


Me
7


169
H
7-MeO


embedded image


Me
82


170
H
7-MeO


embedded image


Me
36


171
H
7-MeO


embedded image


Me
71


172
H
7-MeO


embedded image


Me
29


173
H
7-MeO


embedded image


Me
80


174
H
7-MeO


embedded image


Me
68


175
H
7-MeO


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Me
95


176
H
7-MeO


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Me
79


177
H
7-MeO


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Me
89


178
H
7-MeO


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Me
72


179
H
7-MeO
—(CH2)10
Me
73


180
H
7-MeO
—(CH2)6
Me
27


181
H
7-MeO


embedded image


Me
95
















TABLE 1b







General structural formula












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Compound of formula
R1
R2
R2


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R4
Yield [surfaces %]
















182
—H
—H
—H


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—H
89


183
—H
—H
—H


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—H
56


184
—H
—H
—H


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—H
95


185
—H
—H
—H
—(CH2)13
—H
82


186
—H
6-Me
—H


embedded image


—H
93


187
—H
6-OMe
—H
—(CH2)5
—H
90


188
—H
6-OMe
—H
—(CH2)10
—H
50


189
—H
6-
embedded image

—H
—(CH2)5
—H
85


190
—H
6-
embedded image

—H


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—H
40


191
—H
7-F
—H
—(CH2)5
—H
88


192
—H
7-F
—H
—(CH2)10
—H
93


193
—H
7-F
—H


embedded image


—H
94


194
—H
7-Me
—H
—(CH2)5
—H
81


195
—H
7-Me
—H
—(CH2)10
—H
96


196
—H
8-Cl
—H
—(CH2)6
—H
87


197
—H
8-Cl
—H
—(CH2)10
—H
44


198
—H
8-Cl
—H
—(CH2)2
—H
97


199
—H
8-Cl
—H


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—H
99


200
—H
6-COOMe
—H
—(CH2)2
—H
66


201
—H
6-COOMe
—H


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—H
82


202
—H
8-Me
—H
—(CH2)5
—H
76


203
—H
8-Me
—H


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—H
82


204
—H
8-F
—H
—(CH2)5
—H
76


205
—H
8-F
—H
—(CH2)10
—H
56


206
—H
8-F
—H
—(CH2)2
—H
75


207
—H
8-F
—H


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—H
90


208
—H
9-F
—H
—(CH2)5
—H
93


209
—H
9-F
—H
—(CH2)10
—H
30


210
—H
9-F
—H
—(CH2)2
—H
89


211
—H
9-F
—H


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—H
99


212
—H
8-CF3
—H
—(CH2)5
—H
42


213
—H
8-CF3
—H
—(CH2)10
—H
40


214
—H
8-CF3
—H
—(CH2)2
—H
61


215
—H
8-CF3
—H


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—H
71


216
—H
7-F
8-F
—(CH2)5
—H
68


217
—H
7-F
8-F
—(CH2)10
—H
90


218
—H
7-F
8-F
—(CH2)2
—H
87


219
—H
7-F
8-F


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—H
98


220
—H
9-Me
—H
—(CH2)5
—H
95


221
—H
9-Me
—H
—(CH2)10
—H
97


222
—H
9-Me
—H


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—H
75


223
—H
6-Cl
—H
—(CH2)2
—H
95


224
—H
6-Cl
—H


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—H
91


225
—H
6-F
—H
—(CH2)2
—H
94


226
—H
6-F
—H


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—H
97


227
—H
9-OMe
—H
—(CH2)5
—H
93


228
—H
9-OMe
—H
—(CH2)10
—H
90


229
—H
9-OMe
—H


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—H
98


230
—H
8-OMe
—H
—(CH2)5
—H
84


231
—H
8-OMe
—H


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—H
96


232
—H
7-COOMe
—H
—(CH2)5
—H
87


233
—H
7-COOMe
—H
—(CH2)10
—H
83


234
—H
7-COOMe
—H
—(CH2)2
—H
54


235
—H
7-COOMe
—H


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—H
57


236
—H
7-OMe
8-OMe
—(CH2)5
—H
99


237
—H
7-OMe
8-OMe
—(CH2)10
—H
69


238
—H
7-OMe
8-OMe


embedded image


—H
58









The preparation of the tetrahydrocarbazoles according to the invention is carried out according to widely known methods in a 3-component reaction, as described in the publication by W. Noland et al., J. Heterocycl. Chem., 1993, 30, 81-91.


For that purpose, mixtures of a (substituted) indole, ketone or aldehyde and a dienophile are reacted in a suitable solvent, e.g. 1-butanol, toluene, DMF, DMSO or Tetralin, using acid catalysts, e.g. hydrochloric acid, trifluoroacetic acid, toluenesulfonic acid, etc. The ketone or aldehyde component can also serve as solvent. The mixture is heated for several hours at a temperature of from 50° C. to 140° C. The resulting tetrahydrocarbazoles are filtered off and washed, or precipitated from the solvent with cold n-hexane and filtered off. Some of the substances are also obtained by concentrating the reaction mixture by evaporation.


The course of the reaction can be represented schematically as follows:
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The tetrahydrocarbazoles obtained in that manner are generally obtained in the form of racemates and are mainly in the cis stereochemical form. Some compounds also form trans stereochemical isomers.


The invention relates also to the process for the preparation of those compounds.


The tetrahydrocarbazoles according to the invention exhibit pronounced antimicrobial activity, especially against pathogenic gram-positive and gram-negative bacteria and against bacteria of the skin flora, and also against yeasts and moulds. They are accordingly especially suitable for disinfection, deodorisation, and for the general and antimicrobial treatment of the skin and mucosa, and integumentary appendages (hair), especially for the disinfection of hands and wounds.


The compounds are accordingly suitable as antimicrobial active ingredients and as preservatives in personal care preparations, such as shampoos, bath additives, hair care products, liquid and solid soaps (based on synthetic surfactants and salts of saturated and/or unsaturated fatty acids), lotions and creams, deodorants, other aqueous or alcoholic solutions, e.g. cleansing solutions for the skin, moist wipes, oils or powders.


The invention accordingly relates also to a personal care preparation comprising at least one compound of formula (1) or (2) and cosmetically tolerable carriers or adjuvants.


The personal care preparation according to the invention contains from 0.01 to 15% by weight, preferably from 0.1 to 10% by weight, based on the total weight of the composition, of a compound of formula (1) or (2) and cosmetically tolerable adjuvants.


Depending upon the form of the personal care preparation, it comprises, in addition to the compound of formula (1) or (2), further constituents, such as sequestering agents, colourings, perfume oils, thickening or solidifying agents (consistency regulators), emollients, UV-absorbers, skin protective agents, antioxidants, additives that improve the mechanical properties, such as dicarboxylic acids and/or aluminium, zinc, calcium or magnesium salts of C14-C22 fatty acids and, optionally, preservatives.


The personal care preparation according to the invention may be in the form of a water-in-oil or oil-in-water emulsion, an alcoholic or alcohol-containing formulation, a vesicular dispersion of an ionic or non-ionic amphiphilic lipid, a gel, a solid stick or an aerosol formulation.


As a water-in-oil or oil-in-water emulsion the cosmetically tolerable adjuvant contains preferably from 5 to 50% of an oil phase, from 5 to 20% of an emulsifier and from 30 to 90% water. The oil phase may comprise any oil suitable for cosmetic formulations, for example one or more hydrocarbon oils, a wax, a natural oil, a silicone oil, a fatty acid ester or a fatty alcohol.


Preferred mono- or poly-ols are ethanol, isopropanol, propylene glycol, hexylene glycol, glycerol and sorbitol.


Cosmetic formulations according to the invention are used in various fields. There come into consideration, for example, especially the following preparations:

    • skin-care preparations, e.g. skin-washing and cleansing preparations in the form of tablet-form or liquid soaps, synthetic detergents or washing pastes,
    • bath preparations, e.g. liquid (foam baths, milks, shower preparations) or solid bath preparations, e.g. bath cubes and bath salts;
    • skin-care preparations, e.g. skin emulsions, multi-emulsions or skin oils;
    • cosmetic personal care preparations, e.g. facial make-up in the form of day creams or powder creams, face powder (loose or compressed), rouge or cream make-up, eyecare preparations, e.g. eyeshadow preparations, mascara, eyeliner, eyecreams or eye-fix creams; lip-care preparations, e.g. lipsticks, lip gloss, lip contour pencils, nail-care preparations, such as nail varnish, nail varnish removers, nail hardeners or cuticle removers;
    • intimate hygiene preparations, e.g. intimate washing lotions or intimate sprays;
    • foot-care preparations, e.g. foot baths, foot powders, foot creams or foot balsams, special deodorants and antiperspirants or callus-removing preparations;
    • light-protective preparations, such as sun milks, lotions, creams, oils, sun-blocks or tropicals, pre-tanning preparations or after-sun preparations;
    • skin-tanning preparations, e.g. self-tanning creams;
    • depigmenting preparations, e.g. preparations for bleaching the skin or skin-lightening preparations;
    • insect repellents, e.g. insect-repellent oils, lotions, sprays or sticks;
    • deodorants, such as deodorant sprays, pump-action sprays, deodorant gels, sticks or roll-ons;
    • antiperspirants, e.g. antiperspirant sticks, creams or roll-ons;
    • preparations for cleansing and caring for blemished skin, e.g. synthetic detergents (solid or liquid), peeling or scrub preparations or peeling masks;
    • hair-removal preparations in chemical form (depilation), e.g. hair-removing powders, liquid hair-removing preparations, cream- or paste-form hair-removing preparations, hair-removing preparations in gel form or aerosol foams;
    • shaving preparations, e.g. shaving soap, foaming shaving creams, non-foaming shaving creams, foams and gels, preshave preparations for dry shaving, aftershaves or aftershave lotions;
    • fragrance preparations, e.g. fragrances (eau de Cologne, eau de toilette, eau de perfume, perfume de toilette, perfume), perfume oils or perfume creams;
    • dental care, denture-care and mouth-care preparations, e.g. toothpastes, gel toothpastes, tooth powders, mouthwash concentrates, anti-plaque mouthwashes, denture cleaners or denture fixatives;
    • cosmetic hair-treatment preparations, e.g. hair-washing preparations in the form of shampoos and conditioners, hair-care preparations, e.g. pre-treatment preparations, hair tonics, styling creams, styling gels, pomades, hair rinses, treatment packs, intensive hair treatments, hair-structuring preparations, e.g. hair-waving preparations for permanent waves (hot wave, mild wave, cold wave), hair-straightening preparations, liquid hairsetting preparations, hair foams, hairsprays, bleaching preparations, e.g. hydrogen peroxide solutions, lightening shampoos, bleaching creams, bleaching powders, bleaching pastes or oils, temporary, semi-permanent or permanent hair colourants, preparations containing self-oxidising dyes, or natural hair colourants, such as henna or camomile.


An antimicrobial soap has, for example, the following composition:

  • 0.01 to 5% by weight of a compound of formula (1) or (2),
  • 0.3 to 1% by weight titanium dioxide,
  • 1 to 10% by weight stearic acid,
  • ad 100% soap base, e.g. a sodium salt of tallow fatty acid or coconut fatty acid, or glycerol.


A shampoo has, for example, the following composition:

  • 0.01 to 5% by weight of a compound of formula (1) or (2),
  • 12.0% by weight sodium laureth-2-sulfate,
  • 4.0% by weight cocamidopropylbetaine,
  • 3.0% by weight NaCl and
  • water ad 100%.


A deodorant has, for example, the following composition:

  • 0.01 to 5% by weight of a compound of formula (1) or (2),
  • 60% by weight ethanol,
  • 0.3% by weight perfume oil, and
  • water ad 100%.


The invention relates also to an oral composition comprising

  • 0.01 to 15% by weight, based on the total weight of the composition, of a compound of formula (1) or (2), and orally tolerable adjuvants.


Example of an oral composition:

  • 10% by weight sorbitol,
  • 10% by weight glycerol,
  • 15% by weight ethanol,
  • 15% by weight propylene glycol,
  • 0.5% by weight sodium lauryl sulfate,
  • 0.25% by weight sodium methylcocyl taurate,
  • 0.25% by weight polyoxypropylene/polyoxyethylene block copolymer,
  • 0.10% by weight peppermint flavouring,
  • 0.1 to 0.5% by weight of a compound of formula (1) or (2) and
  • 48.6% by weight water.


The oral composition according to the invention may be, for example, in the form of a gel, a paste, a cream or an aqueous preparation (mouthwash).


The oral composition according to the invention may also comprise compounds that release fluoride ions which are effective against the formation of caries, for example inorganic fluoride salts, e.g. sodium, potassium, ammonium or calcium fluoride or organic fluoride salts, e.g. amine fluorides, which are known under the trade name Olafluor.


The tetrahydrocarbazoles of formula (1) or (2) used according to the invention are also suitable for treating, especially preserving, textile fibre materials. Such materials are undyed and dyed or printed fibre materials, e.g. of silk, wool, polyamide or polyurethanes, and especially cellulosic fibre materials of all kinds. Such fibre materials are, for example, natural cellulose fibres, such as cotton, linen, jute and hemp, as well as cellulose and regenerated cellulose. Preferred suitable textile fibre materials are made of cotton.


The tetrahydrocarbazoles according to the invention are suitable also for treating, especially imparting antimicrobial properties to or preserving, plastics, e.g. polyethylene, polypropylene, polyurethane, polyester, polyamide, polycarbonate, latex, etc. Fields of use therefore are, for example, floor coverings, plastics coatings, plastics container and packaging materials; kitchen and bathroom utensils (e.g. brushes, shower curtains, sponges, bathmats), latex, filter materials (air and water filters), plastics articles used in the field of medicine, e.g. dressing materials, syringes, catheters, etc., so-called “medical devices”, gloves and mattresses.


Paper, for example papers used for hygiene purposes, may also be provided with antimicrobial properties using the tetrahydrocarbazoles according to the invention.


It is also possible for nonwovens, e.g. nappies/diapers, sanitary towels, panty liners, and cloths for hygiene and household uses, to be provided with antimicrobial properties in accordance with the invention.


The tetrahydrocarbazoles of formula (1) or (2) are also used in washing and cleaning formulations, e.g. in liquid or powder washing agents or softeners.


The tetrahydrocarbazoles of formula (1) or (2) can be used especially in household and general-purpose cleaners for cleaning and disinfecting hard surfaces.


A cleaning preparation has, for example, the following composition:


















0.01 to 5%
of a compound of formula (1) or (2),



3.0%
octyl alcohol 4EO,



1.3%
fatty alcohol C8-C10 polyglucoside,



3.0%
isopropanol,



ad 100%
water.










In addition to preserving cosmetic and household products, the preservation of technical products, the provision of technical products with antimicrobial properties and use as a biocide in technical processes are also possible, for example in paper treatment, especially in paper treatment liquors, print thickeners of starch or of cellulose derivatives, surface coatings and paints.


The tetrahydrocarbazoles of formula (1) or (2) according to the invention are suitable also for the antimicrobial treatment of wood and for the antimicrobial treatment of leather, the preservation of leather and the provision of leather with antimicrobial properties.


The compounds according to the invention are also suitable for the protection of cosmetic products and household products from microbial damage.


The tetrahydrocarbazoles according to the invention are suitable also as medicaments for the treatment of bacterial infections for oral, intravenous, subcutaneous or parenteral administration of the active ingredient.


The invention accordingly relates also to a medicament comprising a compound of formula (1) or (2) and therapeutically tolerable adjuvants, for the treatment of bacterial infections.


The following Examples illustrate the invention.


General Procedure for the Preparation of the Tetrahydrocarbazoles According to the Invention:


The appropriate (substituted) indole (compound (I)) (1 mmol) is dissolved with (substituted) maleimide (compound (IV) (1.2 mmol) and an aldehyde/ketone (compound (II) (2 mmol) in 1-butanol (1 ml).


There is then added to the mixture aqueous hydrochloric acid (2N; 50 μl; 0.1 mmol) or, in the case of piperidones, concentrated hydrochloric acid (32%; 220 μl; 1.1 mmol). The mixture is then heated at 95° C. for 3 hours.


After cooling to 25° C., the resulting tetrahydrocarbazole (compound (1)) is precipitated with n-hexane (3 ml).


After filtration, the filtrate is cooled to 5° C. in order to obtain further crystals. The combined crystals are washed with n-hexane/ethyl acetate and dried in vacuo.


All the compounds, that is to say the compounds of formulae (9) to (181), are characterised by LC-MS (for yields, see Table 1). Some of the compounds are analysed by NMR spectroscopy. The compounds are obtained in the form of mixtures of isomers (racemates or exo/endo isomers).







PREPARATION EXAMPLES
Example 1
10-Bromo-3a,3b,4,5,6,7,8,8a,13,13b-decahydro-1H-cyclohepta[c]pyrrolo[3,4-a]carbazole-1,3(2H)-dione (compound of formula (32))



embedded image


Yield: 72%


LC-MS: [M+H]+=386 (79Br)


NMR Data:


For reasons of clarity, the numbering used is not in accordance with IUPAC.
embedded image

















Assignment
d1H [ppm]
d13C [ppm]




















OC-1

176.5



HN-1
approx. 11




OC-3

180.4



HC-4
3.40
44.1



HC-5
2.32
37.6



H2C-6
1.82
28.1




1.58



H2C-7
1.88
30.4




1.28



H2C-8
1.74
24.2




1.41



H2C-9
2.39
27.3




1.81



H2C-10
1.73
30.4



HC-11
3.12
35.5



C-12

114.1



C-13

127.6



HC-14
7.48
120.3



C-15

111.0



HC-16
7.16
123.6



HC-17
7.31
113.5



C18

135.7



HN-19
11.11 




C-20

128.8



HC-21
4.09
41.6








3JH-21,H-4 = 7.9 Hz;





3JH-4,H-5 = 5.1 Hz







Example 2
2,6-Dimethyl-3b,4,5,6,7,7a,12,12b-octahydrobenzo[c]pyrrolo[3,4 a]carbazole-1,3(2H,3aH)-dione (compound of formula (117))



embedded image


Yield: 79%


LC-MS: [M+H]+=322


NMR Data:


For reasons of clarity, the numbering used is not in accordance with IUPAC.
embedded image
















Isomer A
Isomer B











Assignment
δ1H [ppm]
δ13C [ppm]
δ1H [ppm]
δ13C [ppm]














OC-1

175.6a

175.9b


CH3—N-2
2.81
24.4
2.72
24.2


OC-3

178.6a

177.7b


HC-4
3.44
43.9
3.45
44.3


HC-5
2.35
33.8
1.58
40.8


H2C-6
1.99
26.1
2.33
29.2



1.73

1.83


H2C-7
1.85
30.2
1.80
35.1



1.51

0.96


H2C-8
1.67
30.8
1.58
31.7


H3C-9
0.79
21.8
0.96
22.5


H2C-10
1.86
37.7
2.84
40.0



0.96

0.91


HC-11
3.02
33.6
2.56
34.9


C-12

113.9

113.4


C-13

125.8

125.5


HC-14
7.46
118.2c
7.61
119.9c


HC-15
6.93
118.3
6.89
118.3


HC-16
7.02d
120.9
7.00d
120.7


HC-17
7.34
111.4
7.32
111.4


C18

136.9

136.9


HN-19
10.94

11.06



C-20

126.6

127.6


HC-21
4.21
43.8
4.23
42.3









Example 3
9-Bromo-6-methyl-3b,4,5,6,7,7a,12,12b-octahydrobenzo[c]pyrrolo[3,4-a]carbazole-1,3(2H,3aH)-dione (compound of formula (70))



embedded image


Yield: 71%


LC-MS: [M+H]+=386 (79Br)
embedded image
















Isomer A
Isomer B











Assignment
δ1H [ppm]
δ13C [ppm]
δ1H [ppm]
δ13C [ppm]














OC-1

175.6a

175.9b


CH3—N-2
2.81
24.4
2.72
24.2


OC-3

178.6a

177.7b


HC-4
3.44
43.9
3.45
44.3


HC-5
2.35
33.8
1.58
40.8


H2C-6
1.99
26.1
2.33
29.2



1.73

1.83


H2C-7
1.85
30.2
1.80
35.1



1.51

0.96


H2C-8
1.67
30.8
1.58
31.7


H3C-9
0.79
21.8
0.96
22.5


H2C-10
1.86
37.7
2.84
40.0



0.96

0.91


HC-11
3.02
33.6
2.56
34.9


C-12

113.9

113.4


C-13

125.8

125.5


HC-14
7.46
118.2c
7.61
119.9c


HC-15
6.93
118.3
6.89
118.3


HC-16

7.02d

120.9

7.00d

120.7


HC-17
7.34
111.4
7.32
111.4


C18

136.9

136.9


HN-19
10.94 

11.06 



C-20

126.6

127.6


HC-21
4.21
43.8
4.23
42.3









Example 3
9-Bromo-6-methyl-3b,4,5,6,7,7a,12,12b-octahydrobenzo[c]pyrrolo[3,4-a]carbazole-1,3(2H,3aH)-dione (compound of formula (70))



embedded image


Yield: 71%


LC-MS: [M+H]+386 (79Br)


NMR Data:


For reasons of clarity, the numbering used is not in accordance with IUPAC.














embedded image













Assignment
δ1H [ppm]
δ13C [ppm]















OC-1

176.8



HN-1
11.06 




OC-3

179.1



HC-4
3.43
?



HC-5
1.50
40.6



H2C-6
2.26
29.1




1.75



H2C-7
1.76
35.1




0.94



H2C-8
1.56
31.7



H3C-9
0.96
22.6



H2C-10
2.75
39.7




0.85



HC-11
2.57
34.7



C-12

113.2



C-13

127.3



HC-14
7.76
121.8



C-15

110.8



HC-16
7.13
123.1



HC-17
7.29
113.3



C18

135.5



HN-19
11.26 




C-20

129.8



HC-21
4.14
42.9








3JH-21,H-4 = 7.9 Hz





3JH-4,H-5 = 4.1 Hz







The remaining compounds listed in Table 1 can be prepared in analogous manner.


4. Microbiological Test Results


Nutrient:


Casein/soybean flour peptone bouillon for the preparation of pre-cultures of the test bacteria and yeast.


Mycological slant agar for the pre-culture of moulds


Examples of Test Organisms:
















Staphylococcus hominis DMS 20328


Staphylococcus epidermidis




Escherichia coli NCTC 8196

ATCC 12228



Corynebacterium xerosis ATCC 373


P. ovale ATCC 14521




Enterococcus hirae ATCC 10541


Actinomyces viscosus DSM 43329




Micrococcus luteus ATCC 9341


Porphyromonas gingivalis DSM 20709




Candida albicans ATCC 10259


Selenomonas artemidis ATCC 43528




Staphylococcus aureus (methicillin-resistant) NCTC


Streptococcus mutans ATCC 25175



11940

Streptococcus sobrinus DSM 20742




Staphylococcus aureus (methicillin-resistant)


Epidermophyton floccosum DSM 10709



NCTC 12493



Staphylococcus aureus (penicillin-resistant)

Tr. mentagrophytes ATCC 9533


NCTC 10443

Trichophyton rubrum DSM 4167




Staphylococcus aureus (rifampicin-resistant)


Trichoderma longibrachiatum



NCTC 10703
DSM 768



Propionibacterium acnes ATCC 25746


Aspergillus niger ATCC 6175











Procedure:


The test substances are predissolved in dimethyl sulfoxide (DMSO) and tested in a dilution series of 1:2.


Bacteria and yeast are cultured overnight in CASO bouillon, the mould is cultured overnight on mycological slant agar, and washed off with 10 ml of 0.85% sodium chloride solution (+0.1% TritonX-100).


All the test organisms are adjusted to an organism count of 1-5×106 CFU/ml using 0.85% sodium chloride solution.


The test substances are pre-pipetted into microtitre plates in an amount of 8 μl per well.


Pre-diluted organism suspensions are diluted 1:100 in CASO bouillon (bacteria and yeast) or Sabouraud 2% glucose bouillon (mould) and are added in an amount of 192 μl per well to the test substances.


The test batches are incubated for 48 hours at 37° C. (bacteria and yeast) or for 5 days at 28° C. (mould).


After incubation, the growth is evaluated by reference to the turbidity of the test batches (optical density) at 620 nm in a microplate reader.


The minimum inhibitory concentration (MIC value) is the concentration of substance at which (compared with the growth of the control) an appreciable inhibition of growth (≦20% growth) of the test organisms is ascertained.


One microtitre plate is used for each test organism and substance concentration. All the substances are tested in duplicate.


The results are compiled in Table 2:









TABLE 2







Minimum inhibitory concentrations (MIC) in ppm of the


compounds synthesised against Staphylococcus hominis


DMS 20328 and Escherichia coli









Compound
MIC [ppm]
MIC [ppm]


of formula

S. hominis


E. coli













9
>36
>36


10
>48
>48


11
>120
>120


12
>120
>120


13
>120
>120


14
>120
>120


15
>120
>120


16
>120
>120


17
>120
>120


18
>120
>120


19
>120
>120


20
>120
>120


21
>120
>120


22
>120
>120


23
>64
>64


24
>120
>120


25
>120
>120


26
15
>120


27
60
>120


28
>120
>120


29
15
>120


30
>120
>120


31
15
>120


32
3.75
>120


33
30
60


34
>120
>120


35
>120
>120


36
>120
>120


37
>120
>120


38
>120
>120


39
>120
>120


40
>120
>120


41
>120
>120


42
>120
>120


43
>120
>120


44
>120
>120


45
>120
>120


46
120
120


47
>120
>120


48
>120
>120


49
>120
>120


50
>120
>120


51
>120
>120


52
>120
>120


53
>120
>120


54
>120
>120


55
>120
>120


56
30
>120


57
>120
>120


58
30
>120


59
>120
>120


60
120
>120


61
3.75
>120


62
15
>120


63
7.5
>120


64
120
>120


65
120
>120


66
>120
>120


67
>120
>120


68
>120
>120


69
120
>120


70
15
>120


71
60
>120


72
120
>120


73
60
>120


74
60
>120


75
30
>120


76
>120
>120


77
15
>120


78
60
>120


79
120
>120


80
120
>120


81
60
120


82
30
>120


83
>120
>120


84
120
>120


85
>120
>120


86
120
>120


87
15
120


88
>120
>120


89
7.5
>120


90
>120
>120


91
>120
>120


92
>120
>120


93
60
>120


94
>120
>120


95
>120
>120


96
>120
>120


97
120
>120


98
>120
>120


99
120
>120


100
120
>120


101
>120
>120


102
60
>120


103
>120
>120


104
>120
>120


105
>120
>120


106
3.75
>120


107
120
>120


108
>120
>120


109
>120
>120


110
120
>120


111
60
>120


112
>120
>120


113
>120
>120


114
>120
>120


115
60
>120


116
120
>120


117
>120
>120


118
>120
>120


119
>120
>120


120
30
>120


121
>120
>120


122
>120
>120


123
>120
120


124
>120
>120


125
>120
>120


126
>120
>120


127
60
>120


128
>120
>120


129
>120
>120


130
15
>120


131
>120
120


132
>120
>120


133
120
>120


134
120
>120


135
>120
>120


136
>120
>120


137
>120
>120


138
>120
>120


139
>120
>120


140
120
>120


141
>120
>120


142
>120
>120


143
>120
>120


144
>120
>120


145
>120
>120


146
>120
>120


147
>120
>120


148
>120
>120


149
120
120


150
>120
>120


151
>120
>120


152
120
>120


153
>120
>120


154
>120
>120


155
>120
>120


156
>120
>120


157
>120
>120


158
>120
>120


159
7.5
120


160
120
120


161
>120
>120


162
120
>120


163
>120
>120


164
>120
>120


165
120
>120


166
>120
>120


167
>120
>120


168
>120
>120


169
>120
>120


170
>120
>120


171
>120
>120


172
>120
>120


173
>120
>120


174
30
>120


175
>120
>120


176
>120
>120


177
120
120


178
>120
>120


179
>120
>120


180
>120
>120


181
>120
>120
















TABLE 3







Further minimum inhibitory concentrations (MIC) in ppm of selected compounds


(MIC values in ppm)









Compound of formula













Microorganism
61
63
70
87
89
106

















Staphylococcus hominis DSM

3.75
7.5
15
15
7.5
3.75


20328



Staphylococcus epidermidis

≦3.75
≦3.75
15
15
≦3.75
≦3.75


ATCC 12228



Corynebacterium xerosis

≦3.75
≦3.75
7.5
7.5
≦3.75
≦3.75


ATCC 373



Enterococcus hirae

7.5
7.5
60
30
>120
>120


ATCC 10541



Micrococcus luteus ATCC 9341

≦3.75
≦3.75
15
15
≦3.75
≦3.75



Candida albicans ATCC 10259

>120
>120
>120
>120
>120
>120
















TABLE 4







Minimum inhibitory concentrations (MIC) in ppm of compound


(32) against methicillin, penicillin-resistant Staphylococci and


other microorganisms


>(MIC values in ppm)


Compound of formula (32)










Microorganism

Microorganism







Staphylococus aureus ATCC 9144

5.0 ppm

P. ovale ATCC 14521

 >10 ppm



Staphylococcus hominis DSM 20328

5.0 ppm

Actinomyces viscosus

6.25 ppm




DSM 43329



Staphylococcus aureus (methicillin-

5.0 ppm

Porphyromonas gingivalis

3.125 ppm 


resistant) NCTC 11940

DSM 20709



Staphylococcus aureus (methicillin-

5.0 ppm

Selenomonas artemidis

50.0 ppm


resistant) NCTC 12493

ATCC 43528



Staphylococcus aureus (penicillin-

5.0 ppm

Streptococcus mutans

 5.0 ppm


resistant) NCTC 10443

ATCC 25175



Staphylococcus aureus (rifampicin-

5.0 ppm

Streptococcus sobrinus

6.25 ppm


resistant) NCTC 10703

DSM 20742



S. epidermidis ATCC 12228

 10 ppm

Candida albicans ATCC

 >10 ppm




10259



Corynebacterium xerosis ATCC 373

5.0 ppm

Epidermophyton floccosum

 5.0 ppm




DSM 10709



Micrococcus luteus ATCC 9341

5.0 ppm
Tr. mentagrophytes ATCC
  10 ppm




9533



Enterococcus hirae ATCC 10541

 >10 ppm 

Trichophyton rubrum DSM

  10 ppm




4167



Propionibacterium acnes ATCC

6.25 ppm 

Trichoderma longibrachiatum

 >10 ppm


25746

DSM 768





Aspergillus niger ATCC

 >10 ppm




6175
















TABLE 5







Minimum inhibitory concentrations (MIC) in ppm of


selected synthesised compounds against


selected test organisms











Compound






of
MIC [ppm]
MIC [ppm]
MIC [ppm]
MIC [ppm]


formula

S. hominis


E. coil


P. aeruginosa


A. niger















182
>120
>120
>120
>120


183
15
>120
>120
>120


184
>120
>120
>120
>120


185
>120
>120
>120
>120


186
>120
>120
120
>120


187
30
>120
60
>120


188
15
>120
>120
>120


189
15
120
>120
>120


190
>120
>120
>120
>120


191
7.5
>120
>120
120


192
7.5
>120
>120
>120


193
>120
60
>120
>120


194
7.5
>120
>120
>120


195
15
>120
>120
>120


196
7.5
>120
>120
>120


197
>120
>120
120
>120


198
>120
>120
>120
>120


199
120
>120
>120
>120


200
>120
>120
120
>120


201
>120
>120
60
>120


202
60
>120
120
>120


203
>120
>120
>120
>120


204
15
120
60
>120


205
7.5
>120
120
>120


206
7.5
>120
60
>120


207
>120
>120
120
>120


208
15
>120
>120
>120


209
30
>120
120
>120


210
120
>120
120
>120


211
>120
120
120
>120


212
120
>120
>120
>120


213
>120
>120
>120
>120


214
15
120
120
120


215
30
60
120
>120


216
15
120
120
120


217
<3.75
>120
>120
>120


218
15
>120
120
>120


219
>120
>120
>120
>120


220
15
>120
>120
>120


221
15
>120
60
>120


222
120
120
>120
>120


223
>120
>120
60
>120


224
>120
>120
120
>120


225
120
>120
120
>120


226
120
120
>120
>120


227
>120
>120
>120
>120


228
15
>120
>120
>120


229
>120
>120
>120
>120


230
120
>120
120
>120


231
120
>120
120
>120


232
>120
>120
>120
>120


233
15
>120
120
>120


234
>120
>120
120
>120


235
120
>120
>120
>120


236
>120
>120
120
>120


237
>120
>120
120
>120


238
>120
>120
>120
>120


239
120
120
120
>120








Claims
  • 1. A compound of formula
  • 2. A compound of formula (1) according to claim 1, wherein R1 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkylcarbonyl, C1-C7alkoxycarbonyl, C3-C12cycloalkylcarbonyl, C3-C12-cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N,N-mono- or di-C1-C20alkylamino or by nitro, R2 is hydrogen; hydroxy; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; C1-C20alkoxy; C2-C20alkenyloxy; C2-C20alkynyloxy; halogen; cyano; C1-C7alkylcarbonyl; nitro; trifluoromethyl; or pentafluoroethyl; R3 and R4 together denote a —(CH2)10— radical; a C2-C20alkenylene radical; a C4-C20alkynylene radical; or a C3-C20alkylene radical interrupted by —N(R6)—, it being possible for such bivalent radicals to be further substituted by one or more C1-C20alkyl, C3-C12cycloalkyl, C2-C20-alkenyl, C4-C12cycloalkenyl, C3-C20alkynyl, C4-C12cycloalkynyl, C1-C7alkoxycarbonyl, or phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12-cycloalkyl, C1-C5alkoxy, C3-C12cycloalkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N-mono- or N,N-di-C1-C20alkylamino or by nitro; R5 is hydrogen; hydroxy; C1-C20alkyl; C1-C20alkoxy; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20alkynyl; C4-C12cycloalkynyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cyclo-alkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N-mono- or N,N-di-C1-C20alkylamino or by nitro; R6 is hydrogen; C1-C20alkyl; C3-C12cycloalkyl; C2-C20alkenyl; C4-C12cycloalkenyl; C3-C20-alkynyl; C4-C12cycloalkynyl; C1-C7alkoxycarbonyl; phenyl or phenyl-C1-C5alkyl each unsubstituted or substituted by C1-C5alkyl, C3-C12cycloalkyl, C1-C5alkoxy, C3-C12cyclo-alkoxy, halogen, carboxy, C1-C7alkoxycarbonyl, C3-C12cycloalkoxycarbonyl, cyano, trifluoromethyl, pentafluoroethyl, amino, N-mono- or N,N-di-C1-C20alkylamino or by nitro; Q is —SO2—; —O—; or —(CO)—; X is —CH—; or —N—; m is from 1 to 3; and t is 0 or 1, or
  • 3. A compound according to claim 1, wherein R1 is hydrogen; C1-C20alkyl; phenyl or phenyl-C1-C5alkyl.
  • 4. A compound according to claim 1, wherein R1 is hydrogen; or C1-C5alkyl.
  • 5. A compound according to claim 1, wherein R2 is hydrogen; C1-C20alkyl; C1-C20alkoxy; or halogen.
  • 6. A compound according claim 1, wherein R2 is hydrogen; C1-C5alkyl; C1-C5alkoxy; or halogen.
  • 7. A compound according to claim 1 that corresponds to formula
  • 8. A compound of formula (4) according to claim 7, wherein T1 is a —(CH2)10— radical; and R6 is hydrogen; or C1-C5alkyl.
  • 9. A compound according to claim 1, wherein R5 is hydrogen; C1-C20alkyl; phenyl or phenyl-C1-C5alkyl.
  • 10. A compound according to claim 1, wherein R5 is hydrogen; C1-C5alkyl; or phenyl.
  • 11. A compound of formula
  • 12. A compound according to claim 11, wherein R6′, R6″ and R6 are each independently of the others hydrogen; C1-C20alkyl; C1-C7-alkoxycarbonyl; phenyl; or phenyl-C1-C5alkyl.
  • 13. A compound according to claim 12, wherein R6′, R6″ and R6 are each independently of the others hydrogen; C1-C5alkyl; C1-C7alkoxycarbonyl; phenyl or benzyl.
  • 14. A compound according to claim 11 that corresponds to formula
  • 15. A personal care method for antimicrobial treatment, deodorisation and disinfection of skin, mucosa or hair, which comprises contacting the skin, mucosa or hair with an effective amount of a compound of formula (1) or (2)
  • 16. A method according to claim 15, wherein the compound of formula (1) or (2) is used for disinfection and deodorisation.
  • 17. A method for preserving textile fibre materials, which comprises contacting the textile fibre materials with an effective amount of a compound of formula (1) or (2) according to claim 15.
  • 18. A method of preparing and preserving washing and cleaning formulations, which comprises incorporating therein an effective amount of a compound of formula (1) or (2) according to claim 15.
  • 19. A method of imparting antimicrobial properties to and preserving plastics, paper, nonwovens, wood or leather, which comprises contacting the plastics, paper, nonwovens, wood or leather with an effective amount of a compound of formula (1) or (2) according to claim 15.
  • 20. A method of imparting antimicrobial properties to and preserving technical products selected from the group consisting of print thickeners of starch or of cellulose derivatives, surface coatings and paints, which comprises contacting said technical products with an effective amount of a compound of formula (1) or (2) according to claim 15.
  • 21. A method for biocidal treatment of paper, which comprises contacting said paper with a biocidally effective amount of a compound of formula (1) or (2) according to claim 15.
  • 22. An anitimicrobial personal care preparation comprising from 0.01 to 15% by weight, based on the total weight of the composition, of a compound of formula (1) or (2)
  • 23. An antimicrobial oral composition comprising from 0.01 to 15% by weight, based on the total weight of the composition, of a compound of formula (1) or (2) according to claim 22 and an orally tolerable adjuvant.
  • 24. A pharmaceutical composition for the treatment of bacterial infections, comprising an antibacterially effective amount of a compound of formula (1) or (2) according to claim 22 and a therapeutically tolerable adjuvant.
  • 25. A process for the preparation of a compound of formula (1) or (2) according to claim 1, wherein an indole compound (I), a keto or aldehyde compound of formula (II) and a dienophile of formula (IV) or (V), respectively, are reacted in a suitable solvent using an acid catalyst at a temperature of from 50° C. to 140° C. to form a compound of formula (1) or (2), respectively, in accordance with the following scheme: wherein R1, R2, R5, R6, m, Q, t and X are as defined in claim 1.
Priority Claims (2)
Number Date Country Kind
008108441 Sep 2000 EP regional
84301 May 2001 CH national
PCT Information
Filing Document Filing Date Country Kind 371c Date
PCT/EP01/10479 9/11/2001 WO 00 3/13/2003
Publishing Document Publishing Date Country Kind
WO02/24699 3/28/2002 WO A
US Referenced Citations (1)
Number Name Date Kind
5645988 Vande Woude et al. Jul 1997 A
Foreign Referenced Citations (1)
Number Date Country
653675 Jan 1986 CH
Related Publications (1)
Number Date Country
20040097535 A1 May 2004 US