Claims
- 1. A method of forming a nanostructured coating comprising
(a) delivering a solution of a liquid precursor to a thermal spray device; (b) forming nanaostructured particles from the liquid precursor solution within the thermal spray device; and (c) delivering the formed nanostructured particles from the thermal spray device to a substrate, thereby forming a nanostructured coating on the substrate.
- 2. The method of claim 2, wherein the solution of liquid precursor is a metalorganic feedstock solution.
- 3. The method of claim 2, wherein the metalorganic feedstock is hexamethyldisilazane.
- 4. The method of claim 2, wherein the coating is SiCxNy.
- 5. A method of forming a nanostructured coating comprising
(a) atomizing a precurosr solution; (b) delivering the atomized solution to a plasma flame of a thermal spray device, thereby forming nanostructured particles; and (c) delivering the formed nanostructured particles from the thermal spray device to a substrate, thereby forming a nanostructured coating on the substrate.
- 6. The method of claim 5, wherein the solution of liquid precursor is a metalorganic feedstock solution.
- 7. The method of claim 6, wherein the metalorganic feedstock is hexamethyldisilazane.
- 8. The method of claim 6, wherein the coating is SiCxNy.
- 9. A method of forming a nanostructured coating comprising
(a) atomizing a solution of a liquid precursor; (b) delivering the atomized solution to a plasma flame in a thermal spray device; (c) forming nanostructured particles from the liquid precursor solution within the plasma flame; and (d) delivering the formed nanostructured particles from the thermal spray device to a substrate, thereby forming a nanostructured coating on the substrate.
- 10. The method of claim 9, wherein the solution of liquid precursor is a metalorganic feedstock solution.
- 11. The method of claim 10, wherein the metalorganic feedstock is hexamethyldisilazane.
- 12. The method of claim 9, wherein the formed coating is SiCxNy.
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional of U.S. application Ser. No. 09/019,061, filed Feb. 5, 1998, which is a continuation of U.S. application Ser. No. 08/558,133, filed Nov. 13, 1995, now abandoned, all of which are incorporated herein by reference.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09019061 |
Feb 1998 |
US |
Child |
09325822 |
Jun 1999 |
US |
Continuations (1)
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Number |
Date |
Country |
Parent |
08558133 |
Nov 1995 |
US |
Child |
09019061 |
Feb 1998 |
US |