Claims
- 1. A method for the manufacture of an electrode for an energy storage and conversion device, comprising
thermally spraying a feedstock mixture comprising an effective quantity of a source of a thermally protective salt and an active material or active material precursor onto a substrate to produce a film of the active material and salt wherein the film has a thickness of about 1 to about 1000 microns.
- 2. The method of claim 1, wherein the source of the thermally protective salt is a LiCl—KCl eutectic, LiBr—KBr—LiF, LiCl—LiBr—LiF, a carbonate-based system with a melting point below about 500° C., or a sulfate-based system with a melting point below about 500° C.
- 3. The method of claim 2, wherein the source of the thermally protective salt is LiCl—KCl eutectic.
- 4. The method of claim 1, wherein the active material film comprises a metal chalcenogide.
- 5. The method of claim 4, wherein the active material film comprises a metal sulfide.
- 6. The method of claim 4, wherein the active material film comprises FeS2.
- 7. The method of claim 4, wherein the active material film comprises FeS2, CoS2, WS2, Ni(OH)2, or MnO2.
- 8. The method of claim 1, wherein thermal spraying is by DC arc plasma spray.
- 9. The method of claim 1, wherein the film thickness is about 1 to about 200 microns.
- 10. The method of claim 1, wherein the film thickness is about 5 to about 114 microns.
- 11. The method of claim 1, wherein the active material film is nanostructured.
- 12. The method of claim 1 further comprising removing the thermally protective salt from the film by leaching with a solvent.
- 13. The method of claim 1 wherein the feedstock mixture further comprises Li2O.
- 14. The method of claim 1 further comprising adding Li2O to the film of active material after thermally spraying the feedstock mixture.
- 15. A method for the manufacture of an electrode for an energy storage and conversion device, comprising
ball-milling an active material comprising a metal chalcenogide or metal chalcenogide precursor with about 10% to about 30% by weight based on the total weight of the composition of a source of a thermally protective salt, to provide a feedstock for thermal spray; and thermally spraying the feedstock for thermal spray onto a substrate, to produce an active material film.
- 16. The method of claim 15, wherein the source of the thermally protective salt is a LiCl—KCl eutectic, LiBr—KBr—LiF, LiCl—LiBr—LiF, a carbonate-based system with a melting point below about 500° C., or a sulfate-based system with a melting point below about 500° C.
- 17. The method of claim 16, wherein the source of the thermally protective salt is LiCl—KCl eutectic.
- 18. The method of claim 15, wherein the thermally protective salt coats particles of the active material prior to thermal spray.
- 19. The method of claim 18, wherein the active material film comprises a metal sulfide.
- 20. The method of claim 18, wherein the active material film comprises FeS2.
- 21. The method of claim 18, wherein the active material film comprises FeS2, CoS2, WS2, Ni(OH)2, or MnO2.
- 22. The method of claim 15, wherein thermal spraying is by DC arc plasma spray.
- 23. The method of claim 15, wherein the film has a thickness of about 1 to about 200 microns.
- 24. The method of claim 15, wherein the film has a thickness of about 5 to about 114 microns.
- 25. The method of claim 15, wherein the active material film is nanostructured.
- 26. The method of claim 15 further comprising removing the thermally protective salt from the film by leaching with a solvent.
- 27. The method of claim 15 wherein the feedstock -further comprises Li2O.
- 28. A electrode for an energy storage and conversion device, comprising
a substrate; and a layer of active material comprising a thermally protective salt deposited on the substrate, the layer having a thickness of about 1 to about 200 microns wherein the active material is unsuitable without the thermally protective salt for use in an electrode at thermal spray temperatures.
- 29. The electrode of claim 28, wherein the layer of active material has a thickness of about 5 to about 114 microns.
- 30. The electrode of claim 28, wherein the layer of active material comprises a metal sulfide.
- 31. The electrode of claim 28, wherein the layer of active material comprises FeS2, CoS2, WS2, Ni(OH)2, or MnO2.
- 32. The electrode of claim 31, wherein the layer of active material comprises FeS2.
- 33. The electrode of claim 28, wherein the thermally protective salt is a LiCl—KCl eutectic, LiBr—KBr—LiF, LiCl—LiBr—LiF, a carbonate-based system with a melting point below 500° C., or a sulfate-based system with a melting point below 500° C.
- 34. A method for the manufacture of an electrode, comprising
providing a feedstock comprising pyrite and an effective quantity of a thermally protective salt; and thermally spraying the feedstock onto a substrate, to produce a film of salt coated pyrite active material having a thickness of about 1 to about 1000 microns.
- 35. The method of claim 34, wherein thermal spraying is by DC arc plasma spray.
- 36. The method of claim 34, wherein the film has a thickness of about 1 to about 200 microns.
- 37. The method of claim 34, wherein the film has a thickness of about 5 to about 114 microns.
- 38. A method for the manufacture of a cathode, comprising ball-milling pyrite with about 10% to about 30% by weight based on the total weight of the composition of a salt coating material, to provide a feedstock comprising a thermally protective salt coating and pyrite; and
thermally spraying the feedstock solution onto a substrate to produce a film of salt coated pyrite active material having a thickness of about 1 to about 200 microns.
- 39. The method of claim 38, wherein thermal spraying is by DC arc plasma spray.
- 40. The method of claim 38, wherein the films have a thickness of about 5 to about 114 microns.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims priority to the provisional application No. 60/185,263 titled Thermal Barrier Coatings for Thermal Spraying of Electrode Materials filed Feb. 28, 2000 which is incorporated herein by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60185263 |
Feb 2000 |
US |