Claims
- 1. A wavelength division multiplexer/demultiplexer (WDM), comprising:
a support structure coupled to at least one optical component; a diffraction grating optically coupled to said at least one optical component coupled to said support structure; a frame, said diffraction grating being supported by said frame; and a plurality of pins connecting said support structure and said frame, said plurality of pins substantially thermally isolating said frame from said support structure.
- 2. The WDM according to claim 1, wherein said pins are substantially geometrically equally spaced about said frame.
- 3. The WDM according to claim 1, wherein said pins are permanently coupled to said frame.
- 4. The WDM according to claim 3, wherein said permanent coupling includes at least one of the following: press-fit, epoxy bonded, soldered, and welded.
- 5. The WDM according to claim 1, wherein said pins are permanently coupled to said support structure.
- 6. The WDM according to claim 5, wherein said permanent coupling includes at least one of the following: press-fit, epoxy bonded, soldered, and welded.
- 7. The WDM according to claim 1, wherein said pins have approximately the same exposed length extending from said support structure.
- 8. The WDM according to claim 1, wherein said pins and said support structure have approximately the same coefficient of thermal expansion.
- 9. The WDM according to claim 1, wherein said diffraction grating includes a substrate.
- 10. The WDM according to claim 9, wherein said frame has approximately the same coefficient of thermal expansion as the coefficient of thermal expansion of the substrate.
- 11. The WDM according to claim 9, wherein the coefficient of thermal expansion of said substrate is below about 1.0 PPM/C.
- 12. The WDM according to claim 9, wherein the substrate comprises at least one of the following materials: fused silica, glass, metal, silicon carbide, and ceramic.
- 13. The WDM according to claim 9, wherein the substrate is coupled to said frame.
- 14. The WDM according to claim 13, wherein the coupling of the substrate and said frame includes at least one of the following: epoxied, soldered, welded, and metalized and soldered.
- 15. The WDM according to claim 1, wherein said pins have approximately the same coefficient of thermal expansion as the coefficient of thermal expansion of said frame.
- 16. The WDM according to claim 1, wherein said frame is substantially thermally isolated from the support structure over a temperature range between about −40 Celsius and about +85 Celsius.
- 17. The WDM according to claim 1, wherein said frame comprises at least one of the following materials: invar, metal, glass, and ceramic.
- 18. The WDM according to claim 1, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPM/C.
- 19. The WDM according to claim 1, wherein the support structure includes at least one of the following materials: 416, 410, and 412 stainless steel.
- 20. The WDM according to claim 1, wherein said support structure is a lens barrel.
- 21. The WDM according to claim 1, wherein said support structure includes a base plate.
- 22. The WDM according to claim 1, wherein a gap is included between said support structure and said frame.
- 23. An apparatus for stabilizing a position of a diffraction grating in relation to at least one optical component, the apparatus comprising:
a support structure coupled to the at least one optical component; a frame coupled to said diffraction grating; and a plurality of pins coupling said frame to said support structure, said plurality of pins substantially thermally isolating said frame from said support structure over temperature variations.
- 24. The apparatus according to claim 23, wherein said frame is substantially thermally dynamically matched to said substrate.
- 25. The apparatus according to claim 23, wherein said pins are substantially dynamically thermally matched to said support structure.
- 26. The apparatus according to claim 23, wherein said pins are substantially dynamically thermally matched to said frame.
- 27. The apparatus according to claim 23, wherein said pins have substantially the same exposed length extending from said support structure.
- 28. The apparatus according to claim 23, wherein the temperature variations range from about −40 Celsius to about +85 Celsius.
- 29. The apparatus according to claim 23, wherein said support structure has a coefficient of thermal expansion of between about 9.5 and about 10.5 PPN/C.
- 30. The apparatus according to claim 23, wherein said pins are substantially equally spaced about said support structure.
- 31. The apparatus according to claim 23, wherein said pins are extended axially from said support structure.
- 32. The apparatus according to claim 23, wherein the coefficient of thermal expansion of said substrate is below about 1.0 PPM/C.
- 33. The apparatus according to claim 23, wherein said support structure is a lens barrel.
- 34. A wavelength division multiplexer/demultiplexer (WDM), comprising:
means for supporting at least one optical component; means for diffracting an optical signal, said means for diffracting being oriented at a set position relative to at least one optical component; and means for coupling said means for diffracting to said means for supporting at least one optical component, said means for coupling providing substantially the same relative position between said means for diffracting and the at least one optical component over a temperature range.
- 35. The WDM according to claim 34, wherein the position is an angle.
- 36. The WDM according to claim 34, wherein the temperature range comprises at least approximately 120 degrees Celsius.
- 37. The WDM according to claim 34, wherein said means for coupling is substantially dynamically thermally matched to said means for supporting at least one optical component.
- 38. The WDM according to claim 34, further comprising means for supporting said means for diffracting.
- 39. The WDM according to claim 38, wherein said means for supporting said means for diffracting is substantially dynamically thermally matched to at least one component forming said means for diffracting.
- 40. The WDM according to claim 34, wherein said means for coupling creates a gap between said means for diffracting and said means for supporting.
- 41. A wavelength division multiplexer/demultiplexer (WDM) comprising:
a support structure for supporting at least one optical component, the diffraction grating optically coupled to the at least one optical component; and at least one coupling element coupling the diffraction grating to said support structure, the at least one coupling element substantially thermally isolating the diffraction grating from said support structure.
- 42. The WDM according to claim 41, wherein said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said support structure.
- 43. The WDM according to claim 41, further comprising a frame coupled to the diffraction grating, said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said frame.
- 44. The WDM according to claim 41, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPM/C.
- 45. The WDM according to claim 41, wherein the diffraction grating includes a substrate, said substrate has a coefficient of thermal expansion below about 1.0 PPM/C.
- 46. The WDM according to claim 41, wherein said at least one coupling element is cylindrically shaped.
- 47. The WDM according to claim 41, wherein said coupling elements are coupled to said support structure in substantially equal spacings.
- 48. The WDM according to claim 41, wherein said support structure is a lens barrel.
- 49. The WDM according to claim 41, wherein said at least one coupling element includes at least one of the following: a pin, a bracket, and a strap.
- 50. The WDM according to claim 41, wherein said at least one coupling element forms a gap between said support structure and the diffraction grating.
- 51. A system comprising:
optical components; a support structure for supporting at least one optical component; a diffraction grating optically coupled to the at least one optical component; and at least one coupling element connecting said support structure to said diffraction grating so that an orientation of said diffraction grating relative to said optical components is substantially maintained over a temperature range.
- 52. The system according to claim 51, wherein the system multiplexes and demultiplexes monochromatic optical signals.
- 53. The system according to claim 51, wherein said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said support structure.
- 54. The system according to claim 51, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPM/C.
- 55. The system according to claim 51, wherein said diffraction grating includes a substrate, said substrate has a coefficient of thermal expansion below about 1.0 PPM/C.
- 56. The system according to claim 51, wherein the system is includes at least one of the following: a spectrometer, optical performance monitor, and a wavelength division multiplexer.
- 57. A method for manufacturing a wavelength division multiplexer/demultiplexer (WDM), comprising:
coupling at least one optical component to a first support structure; and connecting the support structure to a diffraction grating so as to optically couple the diffraction grating to the at least one optical component, the diffraction grating being substantially thermally isolated from the first support structure.
- 58. The method according to claim 57, wherein the diffraction grating is connected to a second support structure.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This patent application is related to and claims priority from U.S. Provisional Patent Application No. 60/212,099 (Attorney Docket No. 34013-00036USPL, Client Reference No. D-00006), filed Jun. 15, 2000, which is hereby incorporated by reference herein in its entirety.
Provisional Applications (1)
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Number |
Date |
Country |
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60212099 |
Jun 2000 |
US |