This invention relates generally to bias voltage generators.
As is known in the art, many electronic devices require a bias voltage source to enable such device to operate in a desired operating region. For example, a transistor used to linearly amplify an input signal generally requires a bias voltage to enable the transistor to operate in its linear operating region.
More particularly, in one example, Depletion mode (D-Mode) MESFETS and HEMTS in some applications are required to operate with drain voltages set to a positive potential, sources set to ground and a negative bias (lower potential than Ground) applied to the gate. When D-mode FETS are used discretely or in integrated circuits any negative DC bias typically comes from an external negative power supply in addition to the positive DC supplies and ground connection.
There are two common approaches for supplying a negative DC bias to Depletion Mode FETS. The most common approach is an “off-chip” external DC power supply. A second more compact and integrated approach may use a DC-DC converter circuit requiring transistors, resistors, large capacitors, an oscillating signal and positive DC supply.
As is also known in the art, one source of electric potential is thermoelectric. One thermoelectric effect is the Seebeck effect. More particularly, a linear certain material combinations, called thermojunctions. A thermocouple is a device for measuring temperature that is made up of one or more thermoelectric junctions. Thermojunctions respond to this thermal gradient with a detectable voltage. It is based on the Seebeck effect (measured in volts per degree C.) in which a voltage appears between two dissimilar materials if a temperature gradient exists between two junctions along them. Sometimes many pairs of junctions or thermocouples are connected in series, where the net thermoelectric voltage produced by one thermocouple adds to that to the next, and so on. This multiple series connection yields a larger thermoelectric output. Such a series of thermocouple connections is called a thermopile. Thermopiles are place in close proximity to a heat source, usually a thin film resistor. The thermoelectric sensitivity would be equal to the voltage detected divided by power dissipated in heat source in V/W. Parameters employed to maximize thermopile thermoelectric output are: the number of thermopiles, thermopile length, thermopile width, thermopile pitch, and proximity to heat source.
As shown in the equations below, the sum of the temperature differentials (Ti, To) between the hot and cold junctions for a series of thermocouples is multiplied by the Seebeck coefficient (αk) to yield a detected voltage (Vout) for the thermopile. The sensitivity (S) is equal to the detected voltage divided over the power dissipated.
As is known in the art, such thermopiles have been suggested for use as thermal sensors, reference being made to the following articles: “Broadband thermoelectric microwave power sensors using GaAs foundry process” by Dehe, A.; Fricke-Neuderth, K.; Krozer, V.; Microwave Symposium Digest, 2002 IEEE “MTT-S International, Volume: 3, 2002 Page(s): 1829-1832; “Free-standing Al0.30Ga0.70As thermopile infrared sensor”, by Dehe, A.; Hartnagel, H. L.; Device Research Conference, 1995. Digest. 1995 53rd Annual, 19-21 Jun. 1995 Page(s): 120-12; and “High-sensitivity microwave power sensor for GaAs-MMIC implementation” by Dehe, A.; Krozer, V.; Chen, B.; Hartnagel, H. L.; Electronics Letters, Volume: 32 Issue: 23, 7 Nov. 1996 Page(s): 2149-215, and an article by A. Dehe et al., entitled “GaAs Monolithic Integrated Microwave Power Sensor in Coplanar Waveguide Technology” published in the IEEE 1996 Microwave and Milli-meter Wave Monolithic Circuits Symposium, pages 179-181.
I have now recognized that it would be desirable to produce this negative bias without the need for an external negative DC voltage supply. I have demonstrated that by using thermopiles, a negative potential can be produced from a positive DC voltage supply. This negative potential is suitable for use as a bias voltage to bias depletion-mode FETS in situations where minimal bias current is required. In this new approach a thermopile is used with its positive terminal ground referenced. When DC power is applied to the thermopile the thermoelectric potential generated at the negative junction can be less than ground and could be used to bias a D-mode FET. The thermopiles also can be built “on chip” next to transistors or networks requiring negative bias, providing a much more compact and integrated biasing technique when compared to using external negative DC bias or complicated DC-DC converters.
By using the thermoelectric properties of semiconductors and conductors, thermopiles can be fabricated monolithically with depletion mode FETS. The thermoelectric negative potential of the thermopile could be used for DC biasing of depletion mode FETS or networks requiring negative potential. This eliminates the need for external off chip/transistor power supplies or more complicated/area consuming DC converter type monolithic circuits.
Thus, in accordance with the invention, a thermoelectric bias voltage generator is provided having a substrate, an active device formed in a semiconductor region of the substrate, and a thermoelectric junction disposed on the substrate and connected to the active device to provide the bias voltage for the active device.
In one embodiment, the active device is a transistor. In one embodiment, the transistor has a control electrode for controlling carriers between a first electrode and a second electrode and wherein the input is the control electrode and wherein the thermoelectric junction provides a voltage potential to the control electrode.
In one embodiment, the voltage potential produced at the control electrode is negative relative to a voltage potential provided at the second electrodes of the transistor and wherein the first electrodes provides the output.
In one embodiment, the transistor is depletion mode field effect transistor and wherein the control electrode is the gate of such transistor.
The details of one or more embodiments of the invention are set forth in the accompanying drawings and the description below. Other features, objects, and advantages of the invention will be apparent from the description and drawings, and from the claims.
Like reference symbols in the various drawings indicate like elements.
Referring now to
Completing the circuit 10 is an inductor L coupled between the DC bias voltage VB produced by the thermopile 10 and the gate electrode G. The input signal is here an RF signal, RF INPUT that is fed to the gate G through an AC coupling capacitor, C. The capacitor blocks any DC out of the RF INPUT and the inductor L blocks any RF from the RF INPUT from passing to the thermopile 10.
Here, the thermopile 10 is similar to that described in copending patent application Ser. No. 10/871,995 filed Jun. 18, 2004, entitled “Microwave Power Sensor”, inventors, Katherine J. Herrick, John P. Bettencourt, and Alan J. Bielunis, assigned to the same assignee as the present invention, the entire subject matter thereof being incorporate herein by reference.
Thus, referring now to
Each one of the thermopile sections 20, 22 include a plurality, here six, electrically insulated of S-shaped electrical conductors 28, each one having a first end 30 electrically connected to a distal end 32 of a corresponding one of the thermocouples 24 and a second end 36 electrically connected to the proximal end portion 25 of one of the plurality of thermocouples 24 disposed adjacent to such corresponding one of the thermocouples 24, as shown more clearly in
Thus, as shown in
It is noted that the polarity of the voltage V is the same at the distal ends 32 of the thermopiles 28 is opposite (here labeled +) to the polarity (here labeled −) of the voltage V at the proximal ends 25 of the thermopiles 28, as shown in
Here, the substrate 14 (
The thermopile 10 is here formed by the following method. The semi-insulating single crystal substrate 10 is provided. A plurality of GaAs mesas is formed on a surface of the substrate to provide the thermocouples 24. The strip resistive element 16 is disposed on the surface of the structure and is then patterned with edge portions 27 thereof disposed on proximate end portions 25 of the thermocouples 24. As noted above, the thermocouples 24 extend outwardly from (here perpendicular to) the strip resistive element 16. The insulating layer 42 is disposed and patterned to be disposed over the surface on the strip resistive element 16. It is noted that the patterning exposes edge portions of the thermocouples 24 (i.e., the portions of the thermocouples 24 adjacent to the proximal ends 25 and distal ends 32 thereof, as shown in
The plurality of electrical conductors 28 is formed, each one having the first end 28 disposed on, and electrically connected, the distal end 32 of a corresponding one of the thermocouples 24 and a second end 36 disposed on, and electrically connected to, the proximate end 25 of one of the plurality of thermocouples 24 disposed adjacent to such corresponding one of the thermocouples 24 as described above in connection with
For this application heat from the resistive material of strip resistive element 16, i.e., to form the resistor 16, with positive potential +V applied is used to induce a temperature gradient across the thermopile. If the positive end of the thermopile 10 is “ground” referenced the induced voltage at the negative end will be lower than ground.
During the manufacture of GaAs transistors and integrated circuits there are semiconductor layers and metals available for formation of thermocouples and thermopiles. Here, the thermopile is fabricated using a PHEMT integrated circuit process. In this case available doped AlGaAs semiconductor layers and gold form a thermoelectric junction.
Heat for developing a temperature gradient comes from the strip resistive element 16. This strip resistive element 16 is electrically isolated from thermocouple by the insulating layer 42, here silicon nitride. Positive potential is applied across the heating resistor, causing a temperature gradient from the strip resistive element 16 outward. This gradient causes the Seebeck effect resulting in a voltage across the thermopile. The higher potential (+) thermopile junction is set to ground, the negative junction is at a potential less than ground.
The TABLE below presents measurements of the thermopile output voltage. Input power was supplied from a DC power supply with its potential set above ground. All output voltages in the last column were less than the ground reference . . . Negative!
It is noted that the measurements of negative voltage generated for dissipated DC power. Note “negative voltage out”.
A number of embodiments of the invention have been described. For example, the DC source being used to heat the strip resistive element 16 may be an ac or microwave source. Nevertheless, it will be understood that various modifications may be made without departing from the spirit and scope of the invention. Accordingly, other embodiments are within the scope of the following claims.
Number | Name | Date | Kind |
---|---|---|---|
4787686 | Tajima et al. | Nov 1988 | A |
4855246 | Codella et al. | Aug 1989 | A |
5724004 | Reif et al. | Mar 1998 | A |
5793194 | Lewis | Aug 1998 | A |
6600301 | DeFalco | Jul 2003 | B1 |
20030053516 | Atherton | Mar 2003 | A1 |
20050279398 | Herrick et al. | Dec 2005 | A1 |
Number | Date | Country |
---|---|---|
2001-24445 | Jan 2001 | JP |
Entry |
---|
Dehé et al.: “GaAs Monolithic Integrated Microwave Power Sensor in Coplanar Waveguide Technology;” IEEE 1996 Microwave and Millimeter Wave Monolithic Circuits Symposium; XP 000683222; 0-7803-3360; Aug. 1996; pp. 179-182. |
Strasser et al.: “Micromachined CMOS Thermoelectric Generators as On-Chip Power Supply;” The 12th Int'l Conf. on Solid State Sensors, Actuators and Microsystems; Boston, MA; Jun. 1002; pp. 45-48. |
PCT Search Report and Written Opinion of the ISA dated Apr. 19, 2007. |
Alfons Dehe, Klaus Fricke-Neuderth, Viktor Krozer, Broadband Thermoelectric Microwave Power Sensors Using GaAs Foundry Process, 2002, pp. 1829-1832, Germany. |
Office Action from the Patent Office of the People Republic of China issued on Aug. 28, 2009. |
Strasser et al., “Micromachined CMOS thermoelectric generators as on-chip power supply”, Infineon Technologies AG, Memory Products, 81541 Munich Germany, Munich University of Technology, Institute for Physics of Electrotechnology, 80290 Munich, Germany, 2004, 9 pages. |
Number | Date | Country | |
---|---|---|---|
20070125414 A1 | Jun 2007 | US |