Claims
        
                - 1. A process for applying a coating of a normally solid material to a target substrate, comprising:
- (a) within a zone at essentially atmospheric pressure generating an inductively coupled toroidal plasma from an inert gas, said generated plasma being in the form of an annulus with a plasma-free central portion;
- (b) passing a carrier stream of said gas through the central portion of said plasma annulus;
- (c) introducing a finely-divided particulate solid coating material into said carrier gas upstream of said plasma annulus;
- (d) vaporizing the particles of said coating material by inductively coupled plasma heating as said stream passes through said plasma annulus;
- (e) downstream of said annulus directing said stream containing said vaporized coating material through a first orifice which separates said atmospheric pressure zone from a first-vacuum zone, said first zone having a vacuum maintained therein below 50 Torr, the size of said first orifice and the vacuum in said first zone being related so that said stream accelerates on passing through said first orifice to a velocity greater than Mach 1 within said first zone generating a shock wave along a front downstream of said first orifice, said shock wave providing a Mach disk at a predetermined distance from said first orifice and the vacuum being applied to said first-vacuum zone on the downstream side of said Mach disk;
- (f) providing a second orifice of larger size than said first orifice in stream flow alignment therewith, said second orifice being provided in the tip of conical skimmer extending downstream from said first orifice and separating said first vacuum zone from a second vacuum zone within said skimmer which second zone is maintained at a higher vacuum than said first zone, said second orifice being located in relation to said first orifice so that said Mach disk is intercepted by said skimmer means adjacent its orifice-providing tip;
- (g) passing at least a portion of the coating material containing stream through said second orifice; and
- (h) supporting a target substrate within said second zone in alignment with said second orifice so that said stream portion impinges thereon, the coating material in the carrier stream being cooled below its melting temperature as it passes through said first and second vacuum zones and being deposited in solid form on the target substrate.
- 2. The process of claim 1 in which said plasma and carrier stream gas is argon.
- 3. The process of claim 1 in which said first vacuum zone is maintained at a pressure below 20 Torr and said second vacuum zone is maintained at pressure below 10.sup.-2 Torr.
- 4. The process of claim 1 in which said first orifice has a diameter of from 0.125 to 2.5 millimeters and said second orifice has a diameter of from 0.25 to 10 millimeters, said second orifice having a diameter greater than the diameter of said first orifice.
- 5. The process of claim 1 in which the particulate coating material as introduced into the carrier gas has an average particle diameter of less than 50 microns.
- 6. The process of claim 1 in which said monatomic gas is argon and said particulate coating material as introduced in the argon carrier stream has an average particle diameter of from 1 to 25 microns.
- 7. The process for applying a coating of a normally solid material to a target substrate, comprising:
- (a) within a zone at essentially atmospheric pressure generating an inductively coupled toroidal plasma from a monatomic gas, said generated plasma being in the form of an annulus with a plasma-free central portion;
- (b) passing a carrier stream of said monatomic gas through the central portion of said plasma annulus;
- (c) introducing a finely-divided, particulate solid coating material into said carrier gas upstream of said plasma annulus, the particles of said material having an average size of less than 50 microns;
- (d) vaporizing the particles of said coating material by inductively coupled plasma heating as said stream passes through said plasma annulus;
- (e) downstream of said annulus directing said stream containing said vaporized coating material through a first orifice which separates said atmospheric pressure zone from a first-vacuum zone, said orifice being of circular shape and having a diameter of from 0.125 to 2.5 millimeters, said first vacuum zone having a pressure maintained therein below 20 Torr, the diameter of said first orifice and the vacuum in said first zone being related so that said stream accelerates on passing through said first orifice to a velocity greater than Mach 1 within said first zone generating a shock wave along a front downstream of said first orifice, said shock wave providing a Mach disk at a predetermined distance from said first orifice and the vacuum being applied to said first-vacuum zone on the downstream side of said Mach disk;
- (f) providing a second circular orifice having a diameter greater than the diameter of said first orifice in stream flow alignment therewith, said second orifice being provided in the tip of conical skimmer means extending downstream from said first orifice and separating said first vacuum zone from a second vacuum zone within said skimmer means which is maintained at a pressure below 10.sup.-4 Torr, said second orifice being located in relation to said first orifice so that said Mach disk is pierced by said skimmer means adjacent its orifice-providing tip;
- (g) passing at least a portion of the coating material-containing stream through said second orifice; and
- (h) supporting a target substrate within said second zone in alignment with said second orifice so that said stream portion impinges thereon, the coating material in the carrier stream being cooled below its melting temperature as it passes through said first and second vacuum zones and depositing in solid form on the target substrate.
- 8. The process of claim 7 in which said monatomic gas is argon.
- 9. The process of claim 7 in which the particulate coating material introduced into the carrier gas has an average particle diameter of from 1 to 25 microns,.
- 10. The process of applying a coating of a vaporized normally solid material to a target substrate, comprising:
- (a) within a zone at essentially atmospheric pressure generating an inductively coupled toroidal plasma from argon gas, said generated plasma being in the form of an annulus with a plasma-free central portion;
- (b) passing a carrier stream of said argon gas through the central portion of said plasma annulus;
- (c) introducing a particulate coating material into said carrier gas upstream of said plasma annulus, said particulate coating material having an average particle diameter of from 1 to 25 microns;
- (d) vaporizing the particles of said coating material by inductively coupled plasma heating as said stream passes through said plasma annulus;
- (e) downstream of said annulus directing said stream containing said vaporized coating material through a first orifice which separates said plasma atmospheric pressure zone from a first-vacuum zone, said orifice being of circular shape and having a diameter of from 1.1 to 1.3 millimeters, said first vacuum zone having a pressure maintained therein below 20 Torr, the diameter of said first orifice and the vacuum in said first zone being related so that said stream accelerates on passing through said first orifice to a velocity greater than Mach 1 within said first zone generating a shock wave along a front downstream of said first orifice, said shock wave providing a Mach disk at a predetermined distance from said first orifice and the vacuum being applied to said first-vacuum zone on the downstream side of said Mach disk;
- (f) providing a second orifice of larger diameter than said first orifice in stream flow alignment therewith, said second orifice having a diameter in the range of 1.4 to 2.7 millimeters, said second orifice being provided in the tip of conical skimmer means extending downstream from said first orifice and separating said first vacuum zone from the second vacuum zone within said skimmer means which is maintained at a pressure of below 10.sup.-4 Torr, said second orifice being located so that said Mach disk is pierced by said skimmer means adjacent its orifice-providing tip;
- (g) passing at least a portion of the coating material-containing stream through said second orifice; and
- (h) supporting a target substrate within said second zone in alignment with said second orifice so that said stream portion impinges thereon, the coating material in the carrier stream being cooled below its melting temperature as it passes through said first and second vacuum zones and depositing in solid form on the target substrate.
RELATED APPLICATION
        This application is a continuation-in-part of copending application Ser. No. 904,680, filed Sept. 8, 1986 now abandoned.
                        ACKNOWLEDGMENT
        Research leading to the present invention was carried out in the Ames Laboratory, U.S.D.O.E., at Iowa State University, Ames, Iowa. The Government has rights therein.
                
                
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                        Continuation in Parts (1)
        
            
                
                    |  | Number | Date | Country | 
            
            
    
        | Parent | 904680 | Sep 1986 |  |