The present invention relates to thin film inductors (see definition of “thin film inductor,” below) and more particularly to thin film inductors having ferromagnetic yokes (sometimes herein referred to as “yoke portions” or “pole portions”).
The integration of inductive power converters onto silicon, by using fabrication techniques developed for integrated circuits, has reduced the cost, weight, and size of electronics devices. For example, one challenge to developing a fully integrated “on silicon” power converter is the development of high quality thin film inductors. To be viable, the inductors should have a high Q, a large inductance per unit volume and per unit of footprint area, have low energy losses (also called high energy efficiency) and a large energy storage per unit area.
Thin film magnetic inductors typically include: (i) a ferromagnetic bottom yoke portion formed as a thin film layer laid on top of a base portion (for example, a silicon substrate layer); (ii) a ferromagnetic top yoke portion formed as a thin film layer; (iii) magnetic via zones, which are paths of low magnetic reluctance between the bottom pole portion and top pole portion (see definition of “magnetic via zone,” below for a more precise definition); and (iv) a current carrier portion (for example, a portion of a spiral winding or a stripline conductor) that passes between the top and bottom yoke portions with respect to the vertical direction and between the via zones with respect to the horizontal direction. The low reluctance paths of the via zones may be formed by: (i) shaping the top and bottom pole pieces so they come into contact (or at least close proximity) in the via zones; or (ii) providing dedicated via portions, made of magnetically permeable material) that serve as a bridge for magnetic flux between the top and bottom yoke portions.
According to an aspect of the present invention, there is a thin film inductor where a stacking direction of the layers of the thin film structure defines a vertical direction. The inductor includes: (i) a rectangular bottom yoke portion; (ii) a rectangular top yoke portion; (iii) a magnetic via zone set including at least a first magnetic via zone and a second magnetic via zone (with each magnetic via zone of the magnetic via zone set being structured, sized, shaped, connected and/or located to form a low magnetic reluctance path between the top yoke portion and the bottom yoke portion); and (iv) a first current carrier portion. The first magnetic via zone and the second magnetic via zone are elongated in an axial direction. The first magnetic via zone and the second magnetic via zone are spaced apart in a transverse direction by a distance W. At least a portion of the first current carrier portion is located to pass between: (a) the top yoke portion and the bottom yoke portion, and (b) the first via zone and the second via zone. The first and second yoke portions, the first current carrier portion and the first set of via zones are located, sized, shaped and/or connected to act as an inductor when current passes through the first current carrier portion. Each of the top and bottom yoke portions have: (a) a first axial end terminating in a first transverse edge, and (b) a second axial end terminating in a second transverse edge. At least one of the first transverse edge of the top yoke, the second transverse edge of the top yoke, the first transverse edge of the bottom yoke, the second transverse edge of the bottom yoke is spaced apart from the first and second via zones in the axial direction by at least 0.5 times W.
According to a further aspect of the present invention, there is a thin film inductor where a stacking direction of the layers of the thin film structure defines a vertical direction. The inductor includes: (i) a rectangular bottom yoke portion; (ii) a rectangular top yoke portion; (iii) a magnetic via zone set (including at least a first magnetic via zone and a second magnetic via zone, and with each magnetic via zone of the magnetic via zone set being structured, sized, shaped, connected and/or located to form a low magnetic reluctance path between the top yoke portion and the bottom yoke portion); and (iv) a first current carrier portion. The via zones of the magnetic via zone set are elongated in an axial direction and at least substantially aligned with each other in the axial direction. The via zones of the magnetic via zone set are spaced apart from each other in a transverse direction by a distance W. The via zones of the magnetic via zone set each have a transverse direction width L. The first and second yoke portions, the first current carrier portion and the first set of via zones are located, sized, shaped and/or connected to act as an inductor when current passes through the first current carrier portion. Each of the top and bottom yoke portions have: (i) a first transverse end terminating in a first axial edge, and (ii) a second transverse end terminating in a second axial edge. At least one of the first axial edge of the top yoke, the second axial edge of the top yoke, the first axial edge of the bottom yoke, the second axial edge of the bottom yoke is spaced apart from a closest via zone of the via zone of the magnetic via zone set in the transverse direction by at least L.
According to a further aspect of the present invention, there is a thin film inductor where a stacking direction of the layers of the thin film defines a vertical direction. The inductor includes: (i) a rectangular bottom yoke portion; (ii) a rectangular top yoke portion. (iii) a magnetic via zone set (including a plurality of magnetic via zones, with each magnetic via zone of the magnetic via zone set being structured, sized, shaped, connected and/or located to form a low magnetic reluctance path between the top yoke portion and the bottom yoke portion); (iv) a first current carrier portion; and (v) a first electrical via. The via zones of the magnetic via zone set are elongated in an axial direction and at least substantially aligned with each other in the axial direction. The via zones of the magnetic via zone set are spaced apart from each other in a transverse direction. The first and second yoke portions, the first current carrier portion and the first set of via zones are located, sized, shaped and/or connected to act as an inductor when current passes through the first current carrier portion. The top yoke portion includes a first axial end terminating in a first transverse edge. The bottom yoke portion includes a first axial end terminating in a first transverse edge. The first transverse edges of the top and bottom yoke portions are offset from each other to define a gap footprint. The first electrical via extends in the vertical direction. The first electrical via is electrically connected to the first current carrying portion. A footprint of the first electrical via is located at least substantially within the gap footprint.
Some embodiments of the present invention recognize the following facts, potential problems and/or potential areas for improvement with respect to the current state of the art: (i) longer thin film inductors have better performance in terms of magnetic losses, quality factor, and saturation behavior; (ii) this improved behavior is believed to be due to a proportionately greater portion of edge area on smaller inductor devices; (iii) due to the shape of the magnetic poles, “closure domains” (that is, small ferromagnetic magnetic flux domains whose position and orientation ensure that the flux lines between larger magnetic flux domains in the vicinity close on themselves) may form at the edges of the top and bottom yoke portions; (iv) these closure domains exhibit behavior that differs from that of the material in the center of the device and may degrade performance; and (v) physical properties, such as edge roughness and defects, may also degrade magnetic performance at the yoke portion edge areas of a thin film inductor device.
Some embodiments of the present invention may include one, or more, of the following features, characteristics and/or advantages: (i) a thin film inductor where the top and/or bottom yoke portion extends out beyond the via zones in an “axial direction” (that is, the direction of the current flow in the current carrier portion); (ii) a thin film inductor where the top and/or bottom yoke portions extend out beyond the via zones in the “transverse direction” (that is, normal to the axial direction); (iii) a thin film inductor that places the edges of yoke portions containing the closure domains and other magnetic defects away from the areas with high field concentrations; and/or (iv) a thin film inductor with reduced loss and better saturation characteristics.
As shown in
Many variations on this geometry are possible, such as: (i) more or fewer turns of the spiral current carrier portion; (ii) a flat top yoke portion, with the bottom yoke portion being contoured upward to make the meetings in the via zones; (iii) contours in both the top and bottom yoke portions so that the via zones occur at a height of the center plane of the winding member; (iv) via zones created using intermediate discrete fabricated portions that are not part of the top yoke portion of the bottom yoke portion; and/or (v) other current carrier geometries (such as a stripline current carrier portion).
As shown in
As shown in
As those of skill in the art will appreciate, electrical current paths will generally be provided from the ends 120a, 120b of winding member 120 so that current can flow through the inductor and be subject to electrical induction. In typical inductor configurations, these ends connect to the electrical circuitry that is located either above or below the plane of the inductor. The connection is made by using an electrical via, or bond pad. However, as can be seen from
In any of these embodiments, the top pole is shaped and contoured by being formed on a hard baked photoresist 103 which encapsulates the enclosed portions of the winding member. More specifically, this photoresist has a top portion that includes sloping portions. In inductor 100, when the top yoke is deposited, it is located directly on top of: (i) the bottom yoke portion (for the via zones 104, 106, 108); and (ii) the baked photoresist (for all portions outside of the via zones). Other methods of encapsulating the windings may also be used, as would be known to someone skilled in the art.
In inductor 100, the top and bottom yoke portions 102, 122 are formed as deposited conformal magnetic films. Typical inductors use plated materials such as permalloy or other compositions of nickel and iron, however other ferromagnetic materials and deposition techniques may be employed as would be known to someone skilled in the art. In alternate embodiment a laminated stack of alternating magnetic layers and electrically insulative layers may be used for each of the poles. These laminated stacks have the advantage of reducing eddy current losses.
As shown in
As shown in
Inductor 300 is an example of a thin film inductor that: (i) includes multiple current carriers; (ii) includes multiple sets of magnetic vias, with each set of magnetic vias being respectively associated with a current carrier; (iii) defines a single carrier via zone footprint for each set of vias; and (iv) includes top and bottom yokes that extend over a space that is between single carrier via footprints (specifically, intermediate region 307).
In this embodiment and as shown in
As shown in
A method of making one embodiment of thin film inductor according to the invention will now be discussed.
Step (i): provide a “base portion.” This may be a simple monolithic substrate, or it may include multiple layers and electronic components. This step is similar to the provision of a base portion for fabricating a conventional thin film inductor.
Step (ii): deposit and/or pattern a resist mask on the top surface of the base portion. The resist mask extends around and defines a rectangular area where the bottom yoke portion will later be located. This step is similar to the provision of a resist mask for use in defining the size and shape of a bottom yoke portion of a conventional thin film inductor, except that the rectangular unmasked space will extend further in the axial and/or transverse directions than it would for a comparable conventional thin film conductor.
Step (iii): the bottom yoke is electroplated inside the unmasked area defined by the resist mask. This step is similar to the way a bottom yoke portion is provided in a conventional thin film inductor.
Step (iv): the resist mask is removed. This step is similar to the fabrication process for a conventional thin film inductor.
Step (v): a thin insulation layer (in this example, a silicon oxide layer) is deposited on the top surface of the bottom yoke portion. This step is similar to the fabrication process for a conventional thin film inductor.
Step (vi): a current carrier portion (in this example, a spiral coil shaped current carrier) is electroplated onto the top surface of the insulation layer. This step is similar to the fabrication process for a conventional thin film inductor.
Step (vii): via regions are formed by coating an organic insulation layer (in this example, a photoresist layer) over the entire structure. This step is similar to the fabrication process for a conventional thin film inductor.
Step (viii): the photoresist layer is partially removed by photo-exposure. More specifically, in the via zones, where the top and bottom yokes are going to come into contact to make a magnetic via, the photoresist layer is removed. This step is similar to the fabrication process for a conventional thin film inductor, except that the via zones will be offset from the edges of the bottom yoke in at least one of the following two directions: (i) the axial direction; and/or (ii) the transverse direction. To put it a slightly different way, there will be some photoresist that remains: (a) between the short edges of the via zones and the corresponding edge of the bottom yoke; and/or (b) between the outer elongated edges of the via zone and the corresponding edges of the bottom yoke.
Step (ix): the remaining photoresist layer is developed and then baked at a high temperature to harden the remaining portion of the photoresist layer. The photo-exposure process makes permanent the location of what will become the via regions after the top yoke portion is put into place. As mentioned above, the outer vias are positioned so that they lie inside the extent of the bottom yoke portion.
Step (x): etching is used to remove the thin insulation in the via regions. More specifically, the thin insulation layer will largely be covered by the photoresist layer, but, in the via regions, the top surface of the thin insulation layer will be exposed by the previous partial removal of the photoresist layer at step (viii). In this example, step (x) is a reactive ion etch process. This step is similar to the fabrication process for a conventional thin film inductor, except for the placement of the via regions relative to the footprint of the bottom yoke.
Step (xi): deposit and/or pattern a second resist mask on the top surfaces of the photoresist layer. The second resist mask extends around and defines a rectangular area where the top yoke portion will later be located. This step is similar to the provision of a second resist mask for use in defining the size and shape of a top yoke portion of a conventional thin film inductor, except that the rectangular unmasked space will extend further in the axial and/or transverse directions than it would for a comparable conventional thin film conductor.
Step (xii): the top yoke is electroplated inside the unmasked area defined by the second resist mask. This unmasked area will include: (a) via regions where the top yoke portion is plated directly on top of the bottom yoke portion; and (b) non-via regions (including “extended yoke portions”) where the top yoke is electroplated over the top surface of the hardened photoresist layer. This step is similar to the way a top yoke portion is provided in a conventional thin film inductor.
Step (xiii): the second resist mask is removed. This step is similar to the fabrication process for a conventional thin film inductor.
Step (xiv): other conventional post-processing, such as providing an overcoat layer on the top surface of the top yoke portion.
A further aspect of some embodiments of the present invention will now be discussed in detail. This aspect relates to the distance that the yoke extends outside the footprint, and how a designer can ensure that an extended yoke is extended sufficiently far enough to substantially improve inductor performance.
First, the amount of extension will be discussed with reference to embodiments having an axial direction extension, like inductor 100 of
The size of the closure domains depends on material properties. For example, there might be many small “triangles” instead of four big ones at each transverse edge of the yoke, as shown in
Because the magnetic domain lines at least roughly align with the inward-facing, axial direction edges of magnetic vias, the transverse direction width W (see
The greater the axial extension (that is, the greater L2 is), the lower the flux density at the transverse edge (for example, transverse edge 122a) of the yoke member. The lower the flux density at the transverse edge, the better the performance of the inductor. However, the marginal drop in flux density with increased extension length is believed to diminish, especially as the axial extension L2 becomes greater than 0.5 times the transverse width W.
The interplay between axial extensions and electric vias (that is, vertical current carrying members that carry current into and/or out of the current carrying member of the thin film inductor) will now be briefly revisited. Some embodiments of the present invention: (i) have some yokes extended in the axial direction; but (ii) leave at least one yoke unextended in the axial direction so that an electrical via can extend in the vertical direction up (or down) to an end of the current carrying member without the need for the current carrier to pass through a yoke layer. It was mentioned above that, in some embodiments of the present invention, an electrical via does pass through a yoke. However, the electric via must be electrically isolated from the yoke through which it vertically extends, which may prove difficult to fabricate reliably and/or reduce the magnetic performance of the yoke in some thin film inductor applications. In the embodiments which are the focus of these paragraphs: (i) there is an upper and lower yoke; (ii) one of the yokes is substantially axially extended (that is, extended more than 0.5 times the width a magnetic via pair) at at least one of its transverse ends; (iii) while the other yoke is not substantially axially extended at its corresponding transverse end which defines a gap footprint between the transverse ends of the two yokes; and (iv) a first electric via extends vertically from outside of the thin film inductor to a current carrying member of the thin film inductor within the gap footprint and without passing through either yoke.
As shown in
Moving now from axial direction yoke extensions to transverse direction yoke extensions, according to some embodiments of the present invention, the transverse extension (see
The following paragraphs set forth some definitions.
Present invention: should not be taken as an absolute indication that the subject matter described by the term “present invention” is covered by either the claims as they are filed, or by the claims that may eventually issue after patent prosecution; while the term “present invention” is used to help the reader to get a general feel for which disclosures herein that are believed as maybe being new, this understanding, as indicated by use of the term “present invention,” is tentative and provisional and subject to change over the course of patent prosecution as relevant information is developed and as the claims are potentially amended.
Embodiment: see definition of “present invention” above—similar cautions apply to the term “embodiment.”
and/or: inclusive or; for example, A, B “and/or” C means that at least one of A or B or C is true and applicable.
Electrically Connected: means either directly electrically connected, or indirectly electrically connected, such that intervening elements are present; in an indirect electrical connection, the intervening elements may include inductors and/or transformers.
Mechanically connected: Includes both direct mechanical connections, and indirect mechanical connections made through intermediate components; includes rigid mechanical connections as well as mechanical connection that allows for relative motion between the mechanically connected components; includes, but is not limited, to welded connections, solder connections, connections by fasteners (for example, nails, bolts, screws, nuts, hook-and-loop fasteners, knots, rivets, quick-release connections, latches and/or magnetic connections), force fit connections, friction fit connections, connections secured by engagement caused by gravitational forces, pivoting or rotatable connections, and/or slidable mechanical connections.
Vertical/horizontal: for purposes of convenient reference, vertical and horizontal references (or “up” and “down” or “top” and “bottom”) are used herein based on a convention that the substrate underlies the yokes and current carrier, which effectively defines the “vertical” and “horizontal;” while this convenient convention is used in this document, it will be understood by those of skill in the art that the thin film inductors of the present invention, like conventional thin film inductors, may be susceptible to fabrication and/or use such that the “vertical” direction is not aligned with the direction of Earth's gravitational field.
Inductor: as used herein, a single “inductor” may include more than one electrically independent current carrier, so long as there is a common top yoke and/or a common bottom yoke.
Thin film inductor: any inductor made with integrated circuit fabrication techniques; integrated circuit fabrication techniques include, but are not limited to, various types of deposition (for example, sputter deposition), various types of material removal (for example, planarization, etch processes), various types of patterning (for example, photolithography), etc.
Magnetic via zone: is a low reluctance path between a top and bottom yoke portion that is in proximity to at least one current carrier portion; a magnetic via zone may take the form of a part separate from the top and bottom yokes, or it may simply be a zone where the bottom surface of the top yoke and the top surface of the bottom yoke come into contact (or at least close proximity); for example, a single magnetic via zone may serve two independent current carriers if the via is in proximity to both current carriers; as a further example, the top and bottom yokes may come into direct physical contact, without creating a “magnetic via zone” because the zone over which the two top and bottom yokes come into contact is not in proximity to a current carrier and, consequently, electromagnetic interaction with the current carrier would not cause significant magnetic flux density through the contact zone.
Magnetic via zone set: all of the magnetic via zones associated with a single independent current carrier; a single magnetic via zone may belong to more than one magnetic via zone set.
Number | Name | Date | Kind |
---|---|---|---|
5097243 | Zieren | Mar 1992 | A |
5757522 | Kulick | May 1998 | A |
5886959 | Bischoff | Mar 1999 | A |
6445271 | Johnson | Sep 2002 | B1 |
7205876 | Lee | Apr 2007 | B2 |
8089155 | Lin | Jan 2012 | B2 |
8102236 | Fontana, Jr. et al. | Jan 2012 | B1 |
20050068144 | Miettinen | Mar 2005 | A1 |
20080123222 | Daughton et al. | May 2008 | A1 |
20080238602 | Schrom et al. | Oct 2008 | A1 |
20100302662 | Toba et al. | Dec 2010 | A1 |
20120105187 | Lin | May 2012 | A1 |
Number | Date | Country |
---|---|---|
3414581 | Oct 1985 | DE |
3926571 | Apr 1990 | DE |
Entry |
---|
“Developments in Integrated On-Chip Inductors with Magnetic Yokes”, Abstract #3407, Honolulu PRiME 2012, Copyright 2012 The Electrochemical Society. |
Number | Date | Country | |
---|---|---|---|
20150279546 A1 | Oct 2015 | US |