Claims
- 1. A thin film magnetic head characterized in that the electrical insulation which surrounds the conductive coil comprises a photosensitive resin which has been crosslinked by a thermally activated crosslinking agent or promotor.
- 2. A thin film magnetic head as claimed in claim 1 in which the photosensitive resin is a novolac resin.
- 3. A thin film magnetic head as claimed in claim 2 in which the thermally activated crosslinking agent or promotor comprises from about 10 to about 50% by weight of the novolac resin.
- 4. A thin film magnetic head as claimed in claim 1 in which the crosslinking agent is a melamine.
- 5. A thin film magnetic head as claimed in claim 1 in which the crosslinking agent is an epoxy cresol novolac resin containing a latent catalyst.
- 6. A thin film magnetic head as claimed in claim 1 in which the crosslinking promotor is of the bisazide type.
Parent Case Info
The present application is a continuation-in-part of copending application Ser. No. 141,738 now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
4219854 |
Church et al. |
Aug 1980 |
|
4516180 |
Narishige et al. |
May 1985 |
|
4596739 |
Piltingsrud et al. |
Jun 1986 |
|
4652954 |
Church |
Mar 1987 |
|
Non-Patent Literature Citations (2)
Entry |
Cortellino et al., "Photoresist for Use in Silicon Nitride Etching Baths", IBM Technical Disclosure Bulletin, vol. 14, No. 8, Jan. 1972. |
W. E. Feely, "Microplastic Structures", SPIE, vol. 631, Advances in Resist Technology and Processing III, (1986). |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
141738 |
Jan 1988 |
|