Claims
- 1. A thin film magnetic disk comprising:
a ruthenium-aluminum (RuAl) seed layer with a B2 crystallographic structure; and a nickel-aluminum (NiAl) layer with a B2 crystallographic structure deposited onto the RuAl seed layer.
- 2. The thin film magnetic disk of claim 1 further comprising a nonmagnetic underlayer deposited subsequent to the NiAl layer, the nonmagnetic underlayer having a [100] crystallographic structure.
- 3. The thin film magnetic disk of claim 2 further comprising an onset layer deposited onto the underlayer prior to a magnetic layer.
- 4. The disk of claim 2 wherein the underlayer is an alloy of chromium.
- 5. The disk of claim 2 wherein the underlayer contains greater than 5 at. % of vanadium or titanium.
- 6. The disk of claim 2 wherein the underlayer contains approximately 20 at. % of vanadium.
- 7. The disk of claim 2 wherein the underlayer contains approximately 10 at. % of titanium.
- 8. The disk of claim 3 wherein the onset layer comprises a magnetic alloy of cobalt.
- 9. The disk of claim 3 wherein the onset layer comprises a nonmagnetic alloy of CoCr.
- 10. The disk of claim 1 wherein the RuAl seed layer is between 2 and 50 nm in thickness.
- 11. The disk of claim 1 further comprising a magnetic layer of CoPtCrTa, CoPtCrB or CoPtCr.
- 12. The disk of claim 1 wherein the magnetic layer has a [11{overscore (2)}0] preferred orientation.
- 13. The disk of claim 1 further comprising a circumferentially polished substrate.
- 14. A disk drive comprising:
a motor for rotating a spindle; a thin film magnetic disk mounted on the spindle comprising a ruthenium-aluminum (RuAl) seed layer with a B2 crystallographic structure followed by a nickel-aluminum (NiAl) layer, a nonmagnetic underlayer deposited subsequent to the NiAl layer with a [100] preferred orientation and a magnetic layer; and an actuator assembly including a head for writing magnetic information on the disk as it rotates.
- 15. The disk drive of claim 14 wherein the magnetic layer has a [11{overscore (2)}0] preferred orientation.
- 16. The disk drive of claim 15 wherein the thin film magnetic disk further comprises a circumferentially polished substrate.
- 17. The disk drive of claim 15 wherein the RuAl seed layer is from 2 nm to 50 nm thick.
- 18. The disk drive of claim 15 wherein the underlayer is a chromium alloy with greater than 5 at. % vanadium or titanium.
- 19. A method of manufacturing a thin film disk comprising the steps of:
depositing a ruthenium-aluminum (RuAl) layer with a B2 crystallographic structure; depositing a nickel-aluminum (NiAl) layer with a B2 crystallographic structure onto the RuAl; depositing a underlayer with a [100] preferred orientation subsequent to the NiAl layer; and depositing a magnetic layer with a a [11{overscore (2)}0] preferred orientation subsequent to the underlayer.
- 20. The method of claim 19 wherein a substrate on which the RuAl layer is deposited is circumferentially polished.
RELATED APPLICATION
[0001] This application is a continuation of application Ser. No. 09/547,439 Apr. 12, 2000 which is a continuation-in-part of application Ser. No. 09/295,267 filed on Apr. 20, 1999.
Continuations (1)
|
Number |
Date |
Country |
Parent |
09547439 |
Apr 2000 |
US |
Child |
10850735 |
May 2004 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09295267 |
Apr 1999 |
US |
Child |
09547439 |
Apr 2000 |
US |