Patent Application
20240064983
The present disclosure relates generally to the field of semiconductor devices, and particularly to a three-dimensional memory device containing laterally-undulating lateral isolation trenches and methods of forming the same.
A three-dimensional memory device including three-dimensional vertical NAND strings having one bit per cell are disclosed in an article by T. Endoh et al., titled “Novel Ultra High Density Memory With A Stacked-Surrounding Gate Transistor (S-SGT) Structured Cell”, IEDM Proc. (2001) 33-36.
According to an aspect of the present disclosure, a three-dimensional memory device is provided, which comprises: alternating stacks of insulating layers and electrically conductive layers that alternate along a vertical direction, laterally extending along a first horizontal direction, and laterally spaced apart along a second horizontal direction that is perpendicular to the first horizontal direction by lateral isolation trenches; memory stack structures vertically extending through a respective one of the alternating stacks and comprising a respective vertical semiconductor channel and a respective vertical stack of memory elements at levels of the electrically conductive layers; and isolation trench fill structures located in the lateral isolation trenches. At least one of the isolation trench fill structures comprises a first lengthwise sidewall and a second lengthwise sidewall that generally extend along the first horizontal direction and that are laterally spaced apart from each other along the second horizontal direction. The first lengthwise sidewall has a first periodic lateral undulation with a uniform pitch along the first horizontal direction. The second lengthwise sidewall has a second periodic lateral undulation with the uniform pitch along the first horizontal direction.
According to another aspect of the present disclosure, a method of forming a semiconductor structure comprises: forming a vertically alternating sequence of continuous insulating layers and continuous sacrificial material layers over a substrate; forming memory openings and isolation openings through the vertically alternating sequence, wherein the isolation openings are formed as clusters of isolation openings, each cluster of isolation openings comprises at least a pair of rows of isolation openings that are arranged along a first horizontal direction with a uniform pitch; forming memory opening fill structures in the memory openings, wherein each of the memory opening fill structures comprises a respective vertical semiconductor channel and a respective vertical stack of memory elements; forming lateral isolation trenches by laterally recessing proximal portions of the continuous insulating layers and the continuous sacrificial material layers around each of the isolation openings, wherein each cluster of isolation openings merge to form a respective lateral isolation trench of the lateral isolation trenches; and replacing remaining portions of the continuous sacrificial material layers with electrically conductive layers to form an alternating stacks of insulating layers and the electrically conductive layers that are laterally spaced from each other by the lateral isolation trenches.
According to an aspect of the present disclosure, a three-dimensional memory device includes a first alternating stack of first word lines and first insulating layers, first memory stack structures vertically extending through the first alternating stack, a second alternating stack of second word lines and second insulating layers, second memory stack structures vertically extending through the second alternating stack, plural isolation trench fill structures located between the first alternating stack and the second alternating stack, and a bridge region located between the plural isolation trench fill structures and between the between the first alternating stack and the second alternating stack. At least one insulating layer extends continuously through the first alternating stack, the second alternating stack, and the bridge region.
According to another aspect of the present disclosure, a method of forming a semiconductor structure comprises forming a first vertically alternating sequence of first continuous insulating layers and first continuous sacrificial material layers over a semiconductor substrate; forming at least one inter-tier material layer comprising an inter-tier dielectric layer over the first vertically alternating sequence; forming tubular etch stop liners through the at least one inter-tier material layer; forming a second vertically alternating sequence of second continuous insulating layers and second continuous sacrificial material layers over the at least one inter-tier material layer; forming openings vertically extending through the second vertically alternating sequence, the at least one inter-tier material layer, and the first vertically alternating sequence, wherein the openings comprise discrete isolation openings that are arranged in rows extending along a first horizontal direction and memory openings located between rows of the discrete isolation openings, and wherein the tubular etch stop liners are exposed to a first subset of the discrete isolation openings and are not exposed to a second subset of the discrete isolation openings; forming memory opening fill structures in the memory openings; and forming lateral isolation trenches by performing a first isotropic etch process to laterally expand and merge each row of the discrete isolation openings at levels of the first continuous insulating layers, the second continuous insulating layers, and the inter-tier dielectric layer, wherein the tubular etch stop liners cover and prevent etching of portions of the inter-tier dielectric layer from around the first subset of the discrete isolation openings during the first isotropic etch process to leave unetched portions of the inter-tier dielectric layer that laterally extend through a respective one of the lateral isolation trenches and comprise dielectric bridge portions.
According to an aspect of the present disclosure, a three-dimensional memory device includes a first word-line region including a first alternating stack of first word lines and continuous insulating layers, first memory stack structures vertically extending through the first alternating stack, a second word-line region comprising a second alternating stack of second word lines and the continuous insulating layers, second memory stack structures vertically extending through the second alternating stack, plural dielectric separator structures located between the first word-line region and the second word-line region, and at least one bridge region located between the plural dielectric separator structures and between the between the first word-line region and the second word-line region. The continuous insulating layers extend through the at least one bridge region between the first alternating stack in the first word-line region and the second alternating stack in the second word-line region.
According to another aspect of the present disclosure, a dielectric pillar structure may extend through the at least one bridge region.
According to another aspect of the present disclosure, a method of forming a memory device comprises forming a vertically alternating sequence of unit layer stacks over a substrate, wherein each of the unit layer stacks comprises a continuous insulating layer and a continuous sacrificial material layer, forming openings through the vertically alternating sequence, wherein the openings comprise discrete isolation openings that are arranged in rows extending along a first horizontal direction and memory openings located between rows of the discrete isolation openings, forming memory opening fill structures in the memory openings, laterally expanding and merging the discrete isolation openings at least a at levels of the continuous insulating layers to form a plurality of lateral isolation trenches that are laterally spaced apart along the first horizontal direction by at least one bridge region, forming backside recesses by introducing into the lateral isolation trenches an etchant that etches the continuous sacrificial material layers selective to the continuous insulating layers, and depositing at least one electrically conductive material in the backside recesses to form electrically conductive layers in the backside recesses.
According to another aspect of the present disclosure, a method of forming a memory device comprises forming a vertically alternating sequence of unit layer stacks over a substrate, wherein each of the unit layer stacks comprises a continuous insulating layer and a continuous sacrificial material layer, forming openings through the vertically alternating sequence, wherein the openings comprise laterally alternating sequences of lateral isolation trenches and isolation openings extending through bridge regions that are arranged in rows extending along a first horizontal direction, and the openings further comprise memory openings located between a respective neighboring pair of the laterally alternating sequences, forming dielectric pillar structures in the isolation openings, forming memory opening fill structures in the memory openings, forming backside recesses by introducing into the lateral isolation trenches an etchant that etches the continuous sacrificial material layers selective to the continuous insulating layers, depositing at least one electrically conductive material in the backside recesses, and laterally recessing the at least one electrically conductive material around the lateral isolation trenches by performing a lateral recess etch process, wherein remaining portions of the at least one electrically conductive material comprise electrically conductive layers.
As discussed above, the embodiments of the present disclosure are directed to a three-dimensional memory device containing laterally-undulating lateral isolation trenches and methods of forming the same, the various aspects of which are now described in detail.
The drawings are not drawn to scale. Multiple instances of an element may be duplicated where a single instance of the element is illustrated, unless absence of duplication of elements is expressly described or clearly indicated otherwise. Ordinals such as “first,” “second,” and “third” are employed merely to identify similar elements, and different ordinals may be employed across the specification and the claims of the instant disclosure. The term “at least one” element refers to all possibilities including the possibility of a single element and the possibility of multiple elements.
The same reference numerals refer to the same element or similar element. Unless otherwise indicated, elements having the same reference numerals are presumed to have the same composition and the same function. Unless otherwise indicated, a “contact” between elements refers to a direct contact between elements that provides an edge or a surface shared by the elements. If two or more elements are not in direct contact with each other or from each other, the two elements are “disjoined from” each other or “disjoined among” one another. As used herein, a first element located “on” a second element can be located on the exterior side of a surface of the second element or on the interior side of the second element. As used herein, a first element is located “directly on” a second element if there exist a physical contact between a surface of the first element and a surface of the second element. As used herein, a first element is “electrically connected to” a second element if there exists a conductive path consisting of at least one conductive material between the first element and the second element. As used herein, a “prototype” structure or an “in-process” structure refers to a transient structure that is subsequently modified in the shape or composition of at least one component therein.
As used herein, a “layer” refers to a material portion including a region having a thickness. A layer may extend over the entirety of an underlying or overlying structure, or may have an extent less than the extent of an underlying or overlying structure. Further, a layer may be a region of a homogeneous or inhomogeneous continuous structure that has a thickness less than the thickness of the first continuous structure. For example, a layer may be located between any pair of horizontal planes between, or at, a top surface and a bottom surface of the first continuous structure. A layer may extend horizontally, vertically, and/or along a tapered surface. A substrate may be a layer, may include one or more layers therein, or may have one or more layer thereupon, thereabove, and/or therebelow.
As used herein, a first surface and a second surface are “vertically coincident” with each other if the second surface overlies or underlies the first surface and there exists a vertical plane or a substantially vertical plane that includes the first surface and the second surface. A substantially vertical plane is a plane that extends straight along a direction that deviates from a vertical direction by an angle less than 5 degrees. A vertical plane or a substantially vertical plane is straight along a vertical direction or a substantially vertical direction, and may, or may not, include a curvature along a direction that is perpendicular to the vertical direction or the substantially vertical direction.
As used herein, a “memory level” or a “memory array level” refers to the level corresponding to a general region between a first horizontal plane (i.e., a plane parallel to the top surface of the substrate) including topmost surfaces of an array of memory elements and a second horizontal plane including bottommost surfaces of the array of memory elements. As used herein, a “through-stack” element refers to an element that vertically extends through a memory level.
As used herein, a “semiconducting material” refers to a material having electrical conductivity in the range from 1.0×10−5 S/m to 1.0×105 S/m. As used herein, a “semiconductor material” refers to a material having electrical conductivity in the range from 1.0×10−5 S/m to 1.0 S/m in the absence of electrical dopants therein, and is capable of producing a doped material having electrical conductivity in a range from 1.0 S/m to 1.0×107 S/m upon suitable doping with an electrical dopant. As used herein, an “electrical dopant” refers to a p-type dopant that adds a hole to a valence band within a band structure, or an n-type dopant that adds an electron to a conduction band within a band structure. As used herein, a “conductive material” refers to a material having electrical conductivity greater than 1.0×105 S/m. As used herein, an “insulator material” or a “dielectric material” refers to a material having electrical conductivity less than 1.0×10−5 S/m. As used herein, a “heavily doped semiconductor material” refers to a semiconductor material that is doped with electrical dopant at a sufficiently high atomic concentration to become a conductive material either as formed as a crystalline material or if converted into a crystalline material through an anneal process (for example, from an initial amorphous state), i.e., to provide electrical conductivity greater than 1.0×105 S/m. A “doped semiconductor material” may be a heavily doped semiconductor material, or may be a semiconductor material that includes electrical dopants (i.e., p-type dopants and/or n-type dopants) at a concentration that provides electrical conductivity in the range from 1.0×10−5 S/m to 1.0×107 S/m. An “intrinsic semiconductor material” refers to a semiconductor material that is not doped with electrical dopants. Thus, a semiconductor material may be semiconducting or conductive, and may be an intrinsic semiconductor material or a doped semiconductor material. A doped semiconductor material may be semiconducting or conductive depending on the atomic concentration of electrical dopants therein. As used herein, a “metallic material” refers to a conductive material including at least one metallic element therein. All measurements for electrical conductivities are made at the standard condition.
A monolithic three-dimensional memory array is one in which multiple memory levels are formed above a single substrate, such as a semiconductor wafer, with no intervening substrates. The term “monolithic” means that layers of each level of the array are directly deposited on the layers of each underlying level of the array. In contrast, two dimensional arrays may be formed separately and then packaged together to form a non-monolithic memory device. For example, non-monolithic stacked memories have been constructed by forming memory levels on separate substrates and vertically stacking the memory levels, as described in U.S. Pat. No. 5,915,167 titled “Three-dimensional Structure Memory.” The substrates may be thinned or removed from the memory levels before bonding, but as the memory levels are initially formed over separate substrates, such memories are not true monolithic three-dimensional memory arrays. The substrate may include integrated circuits fabricated thereon, such as driver circuits for a memory device.
The various three-dimensional memory devices of the present disclosure include a monolithic three-dimensional NAND string memory device, and may be fabricated using the various embodiments described herein. The monolithic three-dimensional NAND string is located in a monolithic, three-dimensional array of NAND strings located over the substrate. At least one memory cell in the first device level of the three-dimensional array of NAND strings is located over another memory cell in the second device level of the three-dimensional array of NAND strings.
Generally, a semiconductor package (or a “package”) refers to a unit semiconductor device that may be attached to a circuit board through a set of pins or solder balls. A semiconductor package may include a semiconductor chip (or a “chip”) or a plurality of semiconductor chips that are bonded throughout, for example, by flip-chip bonding or another chip-to-chip bonding. A package or a chip may include a single semiconductor die (or a “die”) or a plurality of semiconductor dies. A die is the smallest unit that may independently execute external commands or report status. Typically, a package or a chip with multiple dies is capable of simultaneously executing as many number of external commands as the total number of dies therein. Each die includes one or more planes. Identical concurrent operations may be executed in each plane within a same die, although there may be some restrictions. In case a die is a memory die, i.e., a die including memory elements, concurrent read operations, concurrent write operations, or concurrent erase operations may be performed in each plane within a same memory die. In a memory die, each plane contains a number of memory blocks (or “blocks”), which are the smallest unit that may be erased by in a single erase operation. Each memory block contains a number of pages, which are the smallest units that may be selected for programming. A page is also the smallest unit that may be selected to a read operation.
Referring to
Referring to
The substrate semiconductor layer 9 may comprise a top portion (e.g., a doped well) of a substrate 8, such as silicon wafer, or a semiconductor layer located over a substrate, such as a silicon on insulator substrate or a semiconductor substrate. The semiconductor devices 720 may include field effect transistors that are formed over a top surface of the substrate 8. The lower-level dielectric layers 760 may be interconnect-level dielectric material layers that embed the lower-level metal interconnect structures 780.
As used herein, a vertically alternating sequence refers to a sequence of multiple instances of a first element and multiple instances of a second element that is arranged such that an instance of a second element is located between each vertically neighboring pair of instances of the first element, and an instance of a first element is located between each vertically neighboring pair of instances of the second element.
The first continuous insulating layers 132L can be composed of the first material, and the first continuous sacrificial material layers 142L can be composed of the second material, which is different from the first material. Each of the first continuous insulating layers 132L is an insulating layer that continuously extends over the entire area of the substrate 8, and may have a uniform thickness throughout. Each of the first sacrificial material layers 142L includes is a sacrificial material layer that includes a dielectric material and continuously extends over the entire area of the substrate 8, and may have a uniform thickness throughout. Insulating materials that may be used for the first continuous insulating layers 132L include, but are not limited to silicon oxide (including doped or undoped silicate glass), silicon nitride, silicon oxynitride, organosilicate glass (OSG), spin-on dielectric materials, dielectric metal oxides that are commonly known as high dielectric constant (high-k) dielectric oxides (e.g., aluminum oxide, hafnium oxide, etc.) and silicates thereof, dielectric metal oxynitrides and silicates thereof, and organic insulating materials. In one embodiment, the first material of the first continuous insulating layers 132L may be silicon oxide.
The second material of the first continuous sacrificial material layers 142L is a dielectric material, which is a sacrificial material that may be removed selective to the first material of the first continuous insulating layers 132L. As used herein, a removal of a first material is “selective to” a second material if the removal process removes the first material at a rate that is at least twice the rate of removal of the second material. The ratio of the rate of removal of the first material to the rate of removal of the second material is herein referred to as a “selectivity” of the removal process for the first material with respect to the second material.
The second material of the first continuous sacrificial material layers 142L may be subsequently replaced with electrically conductive electrodes which may function, for example, as control gate electrodes of a vertical NAND device. In one embodiment, the first continuous sacrificial material layers 142L may be material layers that comprise silicon nitride.
Referring to
A trimmable mask layer (not shown) can be applied over the first vertically alternating sequence. The trimmable mask layer can include a trimmable photoresist layer that can be controllably trimmed by a timed ashing process. The trimmable mask layer can be patterned with an initial pattern such that a segment of each rectangular opening in the hard mask layer that is most proximal to the memory array regions 100 is not masked by the trimmable mask layer, while the rest of each rectangular opening is covered by the trimmable mask layer. For example, the trimmable mask layer can have a rectangular shape having straight edges that are parallel to the second horizontal direction hd2, such that the straight edges are located over a vertical step S of respective first stepped surfaces that is most proximal to one of the memory array regions 100.
The first stepped surfaces can be formed within the rectangular openings in the hard mask layer by iteratively performing a set of layer patterning processing steps as many times as the total number of first continuous sacrificial material layers 142L within the first vertically alternating sequence less 1. The set of layer patterning processing steps comprises an anisotropic etch process that etches unmasked portions of a pair of a first continuous insulating layer 132L and a first continuous sacrificial material layer 142L, and a mask trimming process in which the trimmable mask layer is isotropically trimmed to provide shifted sidewalls that are shifted away from the most proximal memory array region 100. A final anisotropic etch process can be performed after the last mask trimming process, and the trimmable mask layer can be removed, for example, by ashing. The hard mask layer can be removed selective to the materials of the first vertically alternating sequence (132L, 142L), for example, by an isotropic etch process (such as a wet etch process).
A first stepped cavity 163 can be formed within each area of the rectangular opening in the hard mask layer. Each first stepped cavity 163 can include a cliff region in which a tapered sidewall of the first vertically alternating sequence vertically extends from the bottommost layer of the first vertically alternating sequence (132L, 142L) to the topmost layer of the first vertically alternating sequence (132L, 142L). Each first stepped cavity 163 has respective first stepped surfaces as stepped bottom surfaces. Each first stepped cavity 163 has a pair of stepped sidewalls that laterally extend along the first horizontal direction hd1. Each stepped sidewall of the first stepped cavity adjoins the first stepped surfaces at the bottom edge, and extends to the top surface of the topmost layer of the first vertically alternating sequence (132L, 142L).
The array of first staircase regions can be arranged along the second horizontal direction hd2 with an alternating lateral offsets along the first horizontal direction hd1 to provide a staggered configuration for the first staircase regions. In other words, upon sequentially numerically labeling the first staircase regions with positive integers starting with 1 along the second horizontal direction hd2, every odd-numbered first staircase region may be closer to the first memory array region 100A than to the second memory array region 100B, and every even-numbered first staircase region may be closer to the second memory array region 100B than to the first memory array region 100A.
Referring to
Referring to
The various first-tier openings may include first-tier memory openings 41 formed in the memory array regions 100, first-tier support openings 21 formed in the inter-array region 200 as clusters, first-tier isolation openings 171 that are formed in rows that are arranged along the first horizontal direction (e.g., word line direction) hd1, first-tier moat-region openings 271, and first-tier connection openings 471. Each cluster of first-tier memory openings 41 may be formed as a two-dimensional array of first-tier memory openings 41. The first-tier support openings 21 are openings that are formed in the inter-array region 200, and are subsequently employed to form support pillar structures. A subset of the first-tier support openings 21 may be formed through a respective horizontal surface of the first stepped surfaces. First-tier isolation openings 171 within each row of first-tier isolation openings 171 can be arranged along the first horizontal direction hd1 between neighboring clusters of first-tier memory openings 41. In one embodiment, each row of first-tier isolation openings 171 can laterally extend from a distal end of a first memory array region 100A, through an inter-array region 200, and to a distal end of a second memory array region 100B. The first-tier moat-region openings 271 can be formed in the inter-array region 200 in a manner that at least partially surrounds a respective area. The first-tier moat-region openings 271 may, or may not, vertically extend through a retro-stepped dielectric material portion 165. The first-tier connection openings 471 are formed within a respective area that is at least partially laterally surrounded by a respective set of first-tier moat-region openings 271. In one embodiment, the first-tier connection openings 471 can be formed within a respective area of openings through the semiconductor material layer 110, and can vertically extend down to a top surface of a respective one of landing-pad-level metal interconnect structures 788, which are a subset of the lower-level metal interconnect structures 780 embedded within the lower-level dielectric material layers 760. Optionally, an etch stop layer (not shown) may be located above the semiconductor material layer 110 to prevent over etching the first-tier isolation openings 171 too far into the semiconductor material layer 110.
In one embodiment, the first-tier memory openings 41, the first-tier support openings 21, the first-tier isolation openings 171, the first-tier moat-region openings 271, and the first-tier connection openings 471 can have a respective circular or elliptical horizontal cross-sectional shape. Alternatively, the first-tier isolation openings 171 can have a respective rectangular or rounded rectangular horizontal cross-sectional shape. The maximum lateral dimension (such as a diameter or a major axis) of each of the first-tier memory openings 41, the first-tier support openings 21, the first-tier isolation openings 171, the first-tier moat-region openings 271, and the first-tier connection openings 471 may be in a range from 30 nm to 300 nm, such as from 60 nm to 150 nm, although lesser and greater dimensions may also be employed. The nearest-neighbor distance within a row of first-tier isolation openings 171 can be in a range from 10% to 200%, such as from 20% to 100% of the maximum lateral dimension (such as a diameter) of each first-tier isolation opening 171. Optionally, the first-tier isolation opening 171 may have a larger maximum lateral dimension than the first-tier memory openings 41 and the first-tier support openings 21.
Generally, the first-tier isolation openings 171 can be arranged in rows extending along the first horizontal direction hd1, and the first-tier memory openings 41 are located between rows of the discrete first-tier isolation openings 171. The first-tier memory openings 41, the first-tier support openings 21, and the discrete first-tier isolation openings 171, the first-tier moat-region openings 271, and the first-tier connection openings 471 may be formed simultaneously by anisotropically etching unmasked portions of the first vertically alternating sequence (132L, 142L).
Referring to
In another embodiment, the sacrificial first-tier fill material may include a silicon oxide material having a higher etch rate than the materials of the first continuous insulating layers 132L. For example, the sacrificial first-tier fill material may include borosilicate glass or porous or non-porous organosilicate glass having an etch rate that is at least 100 times higher than the etch rate of densified TEOS oxide (i.e., a silicon oxide material formed by decomposition of tetraethylorthosilicate glass in a chemical vapor deposition process and subsequently densified in an anneal process) in a 100:1 dilute hydrofluoric acid. In this case, a thin etch stop liner (such as a silicon nitride layer having a thickness in a range from 1 nm to 3 nm) may be used prior to depositing the sacrificial first-tier fill material. The sacrificial first-tier fill material may be deposited by a non-conformal deposition or a conformal deposition method.
In yet another embodiment, the sacrificial first-tier fill material may include carbon-containing material (such as amorphous carbon or diamond-like carbon) that may be subsequently removed by ashing, or a silicon-based polymer that may be subsequently removed selective to the materials of the first vertically alternating sequence (132L, 142L).
Portions of the deposited sacrificial first-tier fill material may be removed from above the topmost layer of the first vertically alternating sequence (132L, 142L), such as from above the topmost first continuous insulating layer 132L. For example, the sacrificial first-tier fill material may be recessed to a top surface of the topmost first continuous insulating layer 132L using a planarization process. The planarization process may include a recess etch process, chemical mechanical planarization (CMP), or a combination thereof. The top surface of the topmost first continuous insulating layer 132L may be used as an etch stop layer or a planarization stop layer.
Portions of the sacrificial first-tier fill material that remain in the first-tier memory openings 41 comprise sacrificial first-tier memory opening fill structures 42. Portions of the sacrificial first-tier fill material that remain in the first-tier support openings 21 comprise sacrificial first-tier support opening fill structures 22. Portions of the sacrificial first-tier fill material that remain in the discrete first-tier isolation openings 171 comprise sacrificial first-tier isolation opening fill structures 172. Portions of the sacrificial first-tier fill material that remain in the first-tier moat-region openings 271 comprise sacrificial first-tier moat opening fill structures 272. Portions of the sacrificial first-tier fill material that remain in the first-tier connection openings 471 comprise sacrificial first-tier connection opening fill structures 472.
Referring to
Generally, at least one vertically alternating sequence of continuous insulating layers (132L, 232L) and continuous sacrificial material layers (142L, 242L) can be formed over a substrate 8. In some embodiments, at least one additional vertically alternating sequence of additional continuous insulating layers and additional continuous sacrificial material layers can be optionally formed over the first vertically alternating sequence (132L, 142L) and the first-tier retro-stepped dielectric material portions 165.
Second stepped surfaces can be formed within the inter-array region 200 simultaneously. The areas of the second stepped surfaces are laterally offset from respective proximal first stepped surfaces along the first horizontal direction hd1 so that a set of first stepped surfaces and a set of second stepped surfaces that are laterally spaced along the first horizontal direction hd1 and are not offset along the second horizontal direction hd2 can provide a continuously ascending staircase or a continuously descending staircase. For example, a hard mask layer (not shown) such as a metallic or dielectric mask material layer can be formed over the second vertically alternating sequence, and can be patterned to form multiple rectangular openings that are laterally offset from a respective first-tier retro-stepped dielectric material portion 165 along the first horizontal direction hd1 and are aligned to (i.e., not laterally offset from) the respective first-tier retro-stepped dielectric material portion 165 along the second horizontal direction hd2. The areas of openings within the hard mask layer correspond to areas in which second stepped surfaces are to be subsequently formed. Each opening through the hard mask layer may be rectangular, and may have a pair of sides that are parallel to the first horizontal direction hd1 and a pair of sides that are parallel to the second horizontal direction hd2. The rectangular openings through the hard mask layer may be arranged along the second horizontal direction hd1, and may be alternately staggered along the second horizontal direction hd2. Thus, upon sequentially numbering the rectangular openings along the second horizontal direction hd2, every odd-numbered rectangular opening through the hard mask layer can be formed as a first one-dimensional array arranged along the second horizontal direction hd2 and aligned along the first horizontal direction hd1 (i.e., having a same lateral extent along the first horizontal direction), and every even-numbered rectangular openings through the hard mask layer can be formed as a second one-dimensional array arranged along the second horizontal direction hd2 aligned along the first horizontal direction hd1.
A trimmable mask layer (not shown) can be applied over the second vertically alternating sequence. The trimmable mask layer can include a trimmable photoresist layer that can be controllably trimmed by a timed ashing process. The trimmable mask layer can be patterned with an initial pattern such that a segment of each rectangular opening in the hard mask layer that is most distal from the memory array regions 100 is not masked by the trimmable mask layer, while the rest of each rectangular opening is covered by the trimmable mask layer. For example, the trimmable mask layer can have a rectangular shape having straight edges that are parallel to the second horizontal direction hd2, such that the straight edges are located over a vertical step S of respective second stepped surfaces that is most distal from one of the memory array regions 100.
The second stepped surfaces can be formed within the rectangular openings in the hard mask layer by iteratively performing a set of layer patterning processing steps as many times as the total number of second continuous sacrificial material layers 242L within the second vertically alternating sequence less 1. The set of layer patterning processing steps comprises an anisotropic etch process that etches unmasked portions of a pair of a second continuous insulating layer 232L and a second continuous sacrificial material layer 242L, and a mask trimming process in which the trimmable mask layer is isotropically trimmed to provide shifted sidewalls that are shifted away from the most proximal memory array region 100. A final anisotropic etch process can be performed after the last mask trimming process, and the trimmable mask layer can be removed, for example, by ashing. The hard mask layer can be removed selective to the materials of the second vertically alternating sequence (232L, 242L), for example, by an isotropic etch process (such as a wet etch process).
A second stepped cavity can be formed within each area of the rectangular opening in the hard mask layer. Each second stepped cavity can include a cliff region in which a tapered sidewall of the second vertically alternating sequence vertically extends from the bottommost layer of the second vertically alternating sequence (232L, 242L) to the topmost layer of the second vertically alternating sequence (232L, 242L). Each second stepped cavity has respective second stepped surfaces as stepped bottom surfaces. Each second stepped cavity has a pair of stepped sidewalls that laterally extend along the first horizontal direction hd1. Each stepped sidewall of the second stepped cavity adjoins the second stepped surfaces at the bottom edge, and extends to the top surface of the topmost layer of the second vertically alternating sequence (232L, 242L). Each second stepped cavity defines the lateral extent of respective second stepped surfaces.
The array of second staircase regions can be arranged along the second horizontal direction hd2 with an alternating lateral offsets along the first horizontal direction hd1 to provide a staggered configuration for the second staircase regions. In other words, upon sequentially numerically labeling the second staircase regions with positive integers starting with 1 along the second horizontal direction hd2, every even-numbered second staircase region may be closer to the first memory array region 100A than to the second memory array region 100B, and every odd-numbered second staircase region may be closer to the second memory array region 100B than to the first memory array region 100A. The second stepped cavities can extend through each layer within the second vertically alternating sequence (232L, 242L).
A second dielectric fill material (such as undoped silicate glass or a doped silicate glass) can be deposited in each second stepped cavity and in each well. The second dielectric fill material can be planarized to remove excess portions of the second dielectric fill material from above the horizontal plane including the topmost surface of the second vertically alternating sequence (232L, 242L). Each remaining portion of the second dielectric fill material that fills a respective second stepped cavity constitutes a second-tier retro-stepped dielectric material portion 265. Thus, the second-tier retro-stepped dielectric material portions 265 are formed through the second vertically alternating sequence (232L, 242L).
Referring to
The various second-tier openings (43, 23, 173, 273, 473) may include second-tier memory openings 43 formed in the memory array regions 100 on a respective one of the sacrificial first-tier memory opening fill structures 42, second-tier support openings 23 formed in the inter-array region 200 on a respective one of the sacrificial second-tier support opening fill structures 22, second-tier isolation openings 173 that are formed on a respective one of the first-tier isolation opening fill structures 172, second-tier moat-region openings 273 that are formed on a respective one of the first-tier moat opening fill structures 272, and second-tier connection openings 473 that are formed on a respective one of the sacrificial first-tier connection opening fill structures 472. Each cluster of second-tier memory openings 43 may be formed as a two-dimensional array of second-tier memory openings 43. The second-tier support openings 23 are openings that are formed in the inter-array region 200, and are subsequently employed to form support pillar structures. A subset of the second-tier support openings 23 may be formed through a respective horizontal surface of the second stepped surfaces. Second-tier isolation openings 173 within each row of second-tier isolation openings 173 can be arranged along the first horizontal direction hd1 between neighboring clusters of second-tier memory openings 43. In one embodiment, each row of second-tier isolation openings 173 can laterally extend from a distal end of a first memory array region 100A, through an inter-array region 200, and to a distal end of a second memory array region 100B. The second-tier moat-region openings 273 can be formed in the inter-array region 200 in a manner that surrounds a respective area. The second-tier moat-region openings 273 may, or may not, vertically extend through a second retro-stepped dielectric material portion 265. The second-tier connection openings 473 are formed within a respective area that is laterally surrounded by a respective set of second-tier moat-region openings 273.
Referring to
Portions of the sacrificial second-tier fill material that remain in the second-tier memory openings 43 comprise sacrificial second-tier memory opening fill structures 44. Portions of the sacrificial second-tier fill material that remain in the second-tier support openings 23 comprise sacrificial second-tier support opening fill structures 24. Portions of the sacrificial second-tier fill material that remain in the discrete second-tier isolation openings 173 comprise sacrificial second-tier isolation opening fill structures 174. Portions of the sacrificial second-tier fill material that remain in the second-tier moat-region openings 273 comprise sacrificial second-tier moat opening fill structures 274. Portions of the sacrificial second-tier fill material that remain in the second-tier connection openings 473 comprise sacrificial second-tier connection opening fill structures 474.
Referring to
Referring to
Portions of the deposited dielectric fill material may be removed from above the topmost layer of the second vertically alternating sequence (232L, 242L), such as from above the topmost second continuous insulating layer 232L. For example, the dielectric fill material may be recessed to a top surface of the topmost second continuous insulating layer 232L using a planarization process. The planarization process may include a recess etch process, chemical mechanical planarization (CMP), or a combination thereof. The top surface of the topmost second continuous insulating layer 232L may be used as an etch stop layer or a planarization stop layer. Each remaining portion of the dielectric fill material in the support openings 29 constitutes a support pillar structure 20.
A photoresist layer 152 can be applied over the first exemplary structure, and can be lithographically patterned to cover areas of the support pillar structures 20, the sacrificial second-tier isolation opening fill structures 174, the sacrificial second-tier moat opening fill structures 274, and the sacrificial second-tier connection opening fill structures 474 without covering the areas of the sacrificial second-tier memory opening fill structures 44. An etch process can be performed that selectively etches the sacrificial second-tier fill material relative to the materials of the second vertically alternating sequence (232L, 242L) and relative to the materials of the first vertically alternating sequence (132L, 142L). The sacrificial second-tier fill material can be removed from inside the second-tier memory openings 43 and from inside the first-tier memory openings 41. Voids are formed in the volumes of the second-tier memory openings 43 and the first-tier memory openings 41. Each contiguous combination of a second-tier memory opening 43 and a first-tier memory opening 41 constitutes an inter-tier memory opening, which is also referred to as a memory opening 49. The photoresist layer 152 can be subsequently removed, for example, by ashing.
Referring to
Referring to
Subsequently, the charge storage layer 54 may be formed. In one embodiment, the charge storage layer 54 may be a continuous layer or patterned discrete portions of a charge trapping material including a dielectric charge trapping material, which may be, for example, silicon nitride. Alternatively, the charge storage layer 54 may include a continuous layer or patterned discrete portions of a conductive material such as doped polysilicon or a metallic material that is patterned into multiple electrically isolated portions (e.g., floating gates), for example, by being formed within lateral recesses into continuous sacrificial material layers (142L, 242L). In one embodiment, the charge storage layer 54 includes a silicon nitride layer. In one embodiment, the continuous sacrificial material layers (142L, 242L) and the continuous insulating layers (132L, 232L) may have vertically coincident sidewalls, and the charge storage layer 54 may be formed as a single continuous layer. Alternatively, the continuous sacrificial material layers (142L, 242L) may be laterally recessed with respect to the sidewalls of the continuous insulating layers (132L, 232L), and a combination of a deposition process and an anisotropic etch process may be used to form the charge storage layer 54 as a plurality of memory material portions that are vertically spaced apart. The thickness of the charge storage layer 54 may be in a range from 2 nm to 20 nm, although lesser and greater thicknesses may also be used.
The tunneling dielectric layer 56 includes a dielectric material through which charge tunneling may be performed under suitable electrical bias conditions. The charge tunneling may be performed through hot-carrier injection or by Fowler-Nordheim tunneling induced charge transfer depending on the mode of operation of the monolithic three-dimensional NAND string memory device to be formed. The tunneling dielectric layer 56 may include silicon oxide, silicon nitride, silicon oxynitride, dielectric metal oxides (such as aluminum oxide and hafnium oxide), dielectric metal oxynitride, dielectric metal silicates, alloys thereof, and/or combinations thereof. In one embodiment, the tunneling dielectric layer 56 may include a stack of a first silicon oxide layer, a silicon oxynitride layer, and a second silicon oxide layer, which is commonly known as an ONO stack. In one embodiment, the tunneling dielectric layer 56 may include a silicon oxide layer that is substantially free of carbon or a silicon oxynitride layer that is substantially free of carbon. The thickness of the tunneling dielectric layer 56 may be in a range from 2 nm to 20 nm, although lesser and greater thicknesses may also be used. The stack of the blocking dielectric layer 52, the charge storage layer 54, and the tunneling dielectric layer 56 constitutes a memory film 50 that stores memory bits.
An anisotropic etch process can be performed to remove horizontal portions of the tunneling dielectric layer 56, the charge storage layer 54, and the blocking dielectric layer 52. A surface of the semiconductor material layer 110 can be physically exposed at the bottom of each cavity 49′ within each memory opening 49.
A semiconductor channel material layer 60L can be subsequently deposited. The semiconductor channel material layer 60L includes a p-doped semiconductor material such as at least one elemental semiconductor material, at least one III-V compound semiconductor material, at least one II-VI compound semiconductor material, at least one organic semiconductor material, or other semiconductor materials known in the art. In one embodiment, the semiconductor channel material layer 60L may have a uniform doping. In one embodiment, the semiconductor channel material layer 60L has a p-type doping in which p-type dopants (such as boron atoms) are present at an atomic concentration in a range from 1.0×1012/cm3 to 1.0×1018/cm3, such as from 1.0×1014/cm3 to 1.0×1017/cm3. In one embodiment, the semiconductor channel material layer 60L includes, and/or consists essentially of, boron-doped amorphous silicon or boron-doped polysilicon. In another embodiment, the semiconductor channel material layer 60L has an n-type doping in which n-type dopants (such as phosphor atoms or arsenic atoms) are present at an atomic concentration in a range from 1.0×1012/cm3 to 1.0×1018/cm3, such as from 1.0×1014/cm3 to 1.0×1017/cm3. The semiconductor channel material layer 60L may be formed by a conformal deposition method such as low pressure chemical vapor deposition (LPCVD). The thickness of the semiconductor channel material layer 60L may be in a range from 2 nm to 10 nm, although lesser and greater thicknesses may also be used. A cavity 49′ is formed in the volume of each inter-tier memory opening 49 that is not filled with the deposited material layers (52, 54, 56, 60L).
Referring to
Referring to
Each remaining portion of the doped semiconductor material of the second conductivity type constitutes a drain region 63. The dopant concentration in the drain regions 63 may be in a range from 5.0×1018/cm3 to 2.0×1021/cm3, although lesser and greater dopant concentrations may also be used. The doped semiconductor material may be, for example, doped polysilicon.
Each remaining portion of the semiconductor channel material layer 60L constitutes a vertical semiconductor channel 60 through which electrical current may flow when a vertical NAND device including the vertical semiconductor channel 60 is turned on. A tunneling dielectric layer 56 is surrounded by a charge storage layer 54, and laterally surrounds a vertical semiconductor channel 60. Each adjoining set of a blocking dielectric layer 52, a charge storage layer 54, and a tunneling dielectric layer 56 collectively constitute a memory film 50, which may store electrical charges with a macroscopic retention time. In some embodiments, a blocking dielectric layer 52 may not be present in the memory film 50 at this step, and a blocking dielectric layer may be subsequently formed after formation of backside recesses. As used herein, a macroscopic retention time refers to a retention time suitable for operation of a memory device as a permanent memory device such as a retention time in excess of 24 hours.
Each combination of a memory film 50 and a vertical semiconductor channel 60 within an inter-tier memory opening 49 constitutes a memory stack structure 55. The memory stack structure 55 is a combination of a vertical semiconductor channel 60, a tunneling dielectric layer 56, a plurality of memory elements comprising portions of the charge storage layer 54, and an optional blocking dielectric layer 52. The memory stack structures 55 can be formed through memory array regions 100 of the first and second vertically alternating sequences in which all layers of the first and second vertically alternating sequences are present. Each combination of a memory stack structure 55, a dielectric core 62, and a drain region 63 within an inter-tier memory opening 49 constitutes a memory opening fill structure 58. Generally, memory opening fill structures 58 are formed within the memory openings 49. Each of the memory opening fill structures 58 comprises a respective memory film 50 and a respective vertical semiconductor channel 60.
Generally, memory stack structures 55 can be formed through the at least one vertically alternating sequence {(132L, 142L), (232L, 242L)}. Each of the memory stack structures 55 comprises a respective vertical semiconductor channel 60 and a respective vertical stack of memory elements (which may comprise portions of the charge storage layer 54 located at levels of the continuous sacrificial material layers (142L, 242L).
Referring to
Referring to
The widening of the openings (177, 277) may be performed by recessing of surfaces of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) exposed in each of the openings (177, 277) by performing an etch process. The etch process has an etch chemistry that etches the materials of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L). For example, the etch process may be wet isotropic etch process, such as a buffered hydrofluoric acid wet etch. The etching is terminated before the clusters of openings are merged with each other.
Surfaces of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) are laterally recessed around the isolation openings 177 by greater than one half of the nearest neighbor distance, but less than one half of the inter-cluster distance, i.e., the first inter-opening distance. The discrete isolation openings 177 are laterally expanded and are merged with each other at levels of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) to form a respective lateral isolation trench 179. A plurality of lateral isolation trenches 179 that are laterally spaced apart by backside bridge regions 178 along the first horizontal direction hd1 are formed from each row of discrete isolation openings 177. The moat-region openings 277 are laterally expanded and are merged with each other at levels of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) to form a respective moat trench 279. A plurality of moat trenches 279 that are laterally spaced apart by moat-region bridge regions 278 are formed from each row of moat-region openings 277.
The unetched regions of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) located between the clusters of the isolation openings 177 comprise the backside bridge regions 178. The unetched regions of the continuous insulating layers (132L, 232L) and the sacrificial material layers (142L, 242L) located between the clusters of the moat-region openings 277 comprise the moat-region bridge regions 278.
Referring to
Referring to
Backside recesses (143, 243) are formed in volumes from which the continuous sacrificial material layers (142L, 242L) are removed. The backside recesses (143, 243) include first backside recesses 143 that are formed in volumes from which the first continuous sacrificial material layers 142L are removed and second backside recesses 243 that are formed in volumes from which the second continuous sacrificial material layers 242L are removed. Each of the backside recesses (143, 243) may be a laterally extending cavity having a lateral dimension that is greater than the vertical extent of the cavity. In other words, the lateral dimension of each of the backside recesses (143, 243) may be greater than the height of the respective backside recess. A plurality of backside recesses (143, 243) may be formed in the volumes from which the material of the continuous sacrificial material layers (142L, 242L) is removed. Each of the backside recesses (143, 243) may extend substantially parallel to the top surface of the semiconductor material layer 10. A backside recess (143, 243) may be vertically bounded by a top surface of an underlying continuous insulating layer (132L, 232L) and a bottom surface of an overlying continuous insulating layer (132L, 232L). In one embodiment, each of the backside recesses (143, 243) may have a uniform height throughout.
Generally, the backside recesses (143, 243) can be formed by removing the patterned portions of the first continuous sacrificial material layers 142L and the second continuous sacrificial material layers 242L selective to the first continuous insulating layers 132L and the second continuous insulating layers 232L after formation of the lateral isolation trenches 179, the moat trenches 279, and the dielectric etch mask liner 160. The backside recesses (143, 243) can be formed by performing an isotropic etch process that supplies an isotropic etchant that etches the first continuous sacrificial material layers 142L and the second continuous sacrificial material layers 242L selective to the first continuous insulating layers 132L and the second continuous insulating layers 232L and selective to the support pillar structures 20. The support pillar structures 20 are physically exposed to the backside recesses (143, 243) after the isotropic etch process. The support pillar structures 20 vertically support the vertically spaced apart continuous insulating layers (132L, 232L). The bridge regions (178, 278) laterally support the remaining alternating stacks and prevent them from toppling or leaning into the respective trenches (197, 279).
Portions of the first continuous sacrificial material layers 142L that are laterally surrounded by the dielectric etch mask liner 160 are not etched by the isotropic etch process, and are herein referred to as first dielectric material plates 142′. Portions of the second continuous sacrificial material layers 242L that are laterally surrounded by the dielectric etch mask liner 160 are not etched by the isotropic etch process, and are herein referred to as second dielectric material plates 242′. A set of moat trenches 279 that laterally surround vertical stacks of a sacrificial second-tier connection opening fill structure 474 and a sacrificial first-tier connection opening fill structure 274 can be interconnected at the levels of the backside recesses (143, 243) to provide one contiguous moat trench 279 or plural moat trenches 279 that at least partially laterally surround a vertical stack of dielectric material plates (142′, 242′).
Referring to
At least one conductive material may be deposited in the plurality of backside recesses (143, 243), at peripheral regions of the lateral isolation trenches 179 and the moat trenches 279. The at least one conductive material may be deposited by a conformal deposition method, which may be, for example, chemical vapor deposition (CVD), atomic layer deposition (ALD), electroless plating, electroplating, or a combination thereof. The at least one conductive material may include an elemental metal, an intermetallic alloy of at least two elemental metals, a conductive nitride of at least one elemental metal, a conductive metal oxide, a conductive doped semiconductor material, a conductive metal-semiconductor alloy such as a metal silicide, alloys thereof, and combinations or stacks thereof.
In one embodiment, the at least one conductive material may include at least one metallic material, i.e., an electrically conductive material that includes at least one metallic element. Non-limiting exemplary metallic materials that may be deposited in the backside recesses (143, 243) include tungsten, tungsten nitride, titanium, titanium nitride, tantalum, tantalum nitride, cobalt, and ruthenium. For example, the at least one conductive material may include a conductive metallic nitride liner that includes a conductive metallic nitride material such as TiN, TaN, WN, or a combination thereof, and a conductive fill material such as W, Co, Ru, Mo, Cu, or combinations thereof. In one embodiment, the at least one conductive material for filling the backside recesses (143, 243) may be a combination of titanium nitride layer and a tungsten fill material.
Electrically conductive layers (146, 246) may be formed in the backside recesses (143, 243) by deposition of the at least one conductive material. A plurality of first electrically conductive layers 146 may be formed in the plurality of first backside recesses 143, a plurality of second electrically conductive layers 246 may be formed in the plurality of second backside recesses 243, and a continuous metallic material layer (not shown) may be formed on the sidewalls of each lateral isolation trench 179. Each of the first electrically conductive layers 146 and the second electrically conductive layers 246 may include a respective conductive metallic nitride liner and a respective conductive fill material. Thus, the first and second continuous sacrificial material layers (142L, 242L) may be replaced with the first and second electrically conductive layers (146, 246), respectively. Specifically, each first continuous sacrificial material layer 142L may be replaced with an optional portion of the backside blocking dielectric layer and a first electrically conductive layer 146, and each second continuous sacrificial material layer 242L may be replaced with an optional portion of the backside blocking dielectric layer and a second electrically conductive layer 246. A backside cavity is present in the portion of each lateral isolation trench 179 that is not filled with the continuous metallic material layer.
Residual conductive material may be removed from inside the lateral isolation trenches 179 and from inside the moat trenches 279, and from above the topmost second continuous insulating layer 232L by an anisotropic process and/or an isotropic etch process. Each remaining portion of the deposited metallic material in the first backside recesses constitutes a first electrically conductive layer 146. Each remaining portion of the deposited metallic material in the second backside recesses constitutes a second electrically conductive layer 246.
According to an aspect of the present disclosure, sidewalls of the first electrically conductive layers 146 and the second electrically conductive layers 246 can be isotropically recessed from around the lateral isolation trenches 179 selective to the materials of the first continuous insulating layers 132L and the second continuous insulating layers 232L. The lateral recess distance of the isotropic recess process that laterally recesses the sidewalls of the first electrically conductive layers 146 and the second electrically conductive layers 246 can be selected such that the first electrically conductive layers 146 and the second electrically conductive layers 256 are laterally disjoined from each other along the second horizontal direction hd2 at each row of lateral isolation trenches 179 that are arranged along the first horizontal direction hd1. In other words, the lateral recess distance of the isotropic etch process is at least one half of the nearest neighbor distance among the lateral isolation trenches 179 that are arranged in a row along the first horizontal direction hd1. Thus, the lateral extent of each of the first electrically conductive layers 146 and the second electrically conductive layers 246 along the second horizontal direction hd2 is not greater than the pitch of the rows of the lateral isolation trenches 179 along the second horizontal direction hd2.
Therefore, the electrically conductive layers (146, 246) are removed from the bridge regions 178 and the recesses (143, 243) are reformed between the insulating material layers (132L, 232L) in the bridge regions 178, as shown in
A subset of the electrically conductive layers (146, 246) may comprise word lines for the memory elements. One or more topmost and bottommost electrically conductive layers may comprise select gate electrodes. The semiconductor devices in the underlying semiconductor devices 720 may comprise word line switch devices configured to control a bias voltage to respective word lines, and/or bit line driver devices, such as sense amplifiers.
Generally, at least one electrically conductive material can be deposited in the backside recesses (143, 243) to form electrically conductive layers (146, 246) in the backside recesses (143, 243). The at least one electrically conductive material of the electrically conductive layers (146, 246) can be laterally recessed from around the lateral isolation trenches 179 by a lateral recess distance employing an isotropic etch back process. The electrically conductive layers (146, 246) comprise remaining portions of the at least one electrically conductive material after the isotropic etch back process, and each subset of electrically conductive layers (146, 246) located at a same vertical distance from the substrate 8 comprise a respective plurality of electrically conductive layers (146, 246) that are disjoined (i.e., not in direct contact with) among one another and laterally spaced apart along a second horizontal direction hd2 that is perpendicular to the first horizontal direction hd1. In one embodiment, each of the electrically conductive layers (146, 246) comprises a respective set of vertically straight and laterally concave sidewall segments that are adjoined to each other at vertical edges.
Each region in which electrically conductive layers (146, 246) are present in a top-down view (i.e., a plan view of
Each of the continuous insulating layers (132L, 232L) comprises connection portions located in the backside bridge regions 178 between a respective neighboring pair of lateral isolation trenches 179 that are laterally spaced apart along the first horizontal direction hd1. The connection portions function as bridges between neighboring pairs of lateral isolation trenches 179 and provide structural support during replacement of the continuous sacrificial material layers (142L, 242L) with electrically conductive layers (146, 246). Generally, the lateral recess distance of the isotropic recess etch process that laterally recesses the sidewalls of the electrically conductive layers (146, 246) is greater than one half of a minimum width of the connections portions along the first horizontal direction hd1, which ensures that the electrically conductive layers (146, 246) are physically disconnected between each neighboring pair of word-line regions WLR.
Referring to
In one embodiment, each of the continuous dielectric wall structures 176 comprises dielectric fin portions 176F at each level of the electrically conductive layers (146, 246) that laterally protrude outward relative to a respective overlying continuous insulating layer (132L or 232L) and relative to a respective underlying continuous insulating layer (132L or 232L), as shown in
Referring to
In one embodiment shown in
Referring to
In the second embodiment, the first and second tier moat-region openings (271, 273) may be formed in clusters as in the first embodiment, such that these openings in each cluster have the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, and the clusters are spaced apart in the first horizontal direction hd1 by the larger inter-cluster distance, as in the first exemplary structure. Alternatively, the first and second tier moat-region openings (271, 273) may be formed with the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, rather than in clusters which are spaced apart by the larger inter-cluster distance along the first horizontal direction. Furthermore, in one aspect of the second embodiment, the through-memory-level connection via structures 486 may be formed earlier in the process or at the step of
Referring to
In the second embodiment, the isolation openings 177 are formed with the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, rather than in clusters which are spaced apart by the larger inter-cluster distance along the first horizontal direction (in contrast to the first exemplary structure).
In the second embodiment, the moat-region openings 277 may be formed in clusters as in the first embodiment, such that these openings in each cluster have the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, and the clusters are spaced apart in the first horizontal direction hd1 by the larger inter-cluster distance, as in the first exemplary structure. Alternatively, the moat-region openings 277 may be formed with the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, rather than in clusters which are spaced apart by the larger inter-cluster distance along the first horizontal direction.
In the second embodiment, the pattern of an etch mask layer (such as the third photoresist layer 153) can be modified such that the third photoresist layer 153 does not cover a first subset of the isolation openings 177 which is located in the inter-array region 200 between two staircase regions (e.g., between the steps and the retro-stepped dielectric regions (165, 265)) along the second horizontal direction (e.g., bit line direction) hd2. However, the third photoresist layer 153 does not cover the rest of the isolation openings 177 and the moat-region openings 277. Thus, all isolation openings 177 located in the memory array regions 100 (including those openings 177 located in the same row along the first horizontal direction hd1 as the covered isolation openings 177) are not covered by the third photoresist layer 153. Likewise, the remaining isolation openings 177 located in the inter-array region 200 that are not located between two staircase regions along the second horizontal direction hd2 (e.g., located adjacent to the moat-region openings 277) are not covered by the third photoresist layer 153. The third photoresist layer 153 also covers the support pillar structures 20, memory opening fill structures 58, and the through-memory-level connection via structures 486.
Referring to
Referring to
The backside bridge regions 178 are located between the dielectric pillar structures 220 separated in the first horizontal direction hd1 in the inter-array region 200 between two staircase regions along the second horizontal direction hd2. The backside bridge regions 178 may be omitted in the memory array regions 100 and in the inter-array region 200 where the continuous dielectric wall structures 176 are not located between two staircase regions along the second horizontal direction hd2. The moat-region bridge regions 278 may either be present between the moat trenches 279 as in the first embodiment or may be omitted.
Referring to
In the third embodiment, the first and second tier moat-region openings (271, 273) may be formed in clusters as in the first embodiment, such that these openings in each cluster have the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, and the clusters are spaced apart in the first horizontal direction hd1 by the larger inter-cluster distance, as in the first exemplary structure. Alternatively, the first and second tier moat-region openings (271, 273) may be formed with the same second nearest neighbor distance from each other along the first horizontal direction (e.g., word line direction) hd1 as the isolation openings (171, 173) in region 200, rather than in clusters which are spaced apart by the larger inter-cluster distance along the first horizontal direction. Furthermore, in one aspect of the second embodiment, the through-memory-level connection via structures 486 may be formed earlier in the process or at the step of
Referring to
In the third embodiment, the isolation openings 177 are formed with the first nearest neighbor distance (i.e., same first pitch) from each other along the first horizontal direction (e.g., word line direction) hd1 in the memory array regions 100, and with the second nearest neighbor distance (i.e., same second pitch) from each other along the first horizontal direction (e.g., word line direction) hd1 in the inter-array region 200. The second nearest neighbor distance is greater than the first nearest neighbor distance.
In the third embodiment, the moat-region openings 277 may be formed in clusters as in the first embodiment, such that these openings in each cluster have the same nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, and the clusters are spaced apart in the first horizontal direction hd1 by the larger inter-cluster distance, as in the first exemplary structure. Alternatively, the moat-region openings 277 may be formed with the same second nearest neighbor distance (i.e., same pitch) from each other along the first horizontal direction (e.g., word line direction) hd1, rather than in clusters which are spaced apart by the larger inter-cluster distance along the first horizontal direction.
Referring to
Referring to
Thus, in the third embodiment, only the continuous insulating layers (132L, 232L) are laterally recessed selectively to the sacrificial material layers (142L, 242L) followed by removal of the sacrificial material layers to expand the isolation openings 177. This method of expanding the isolation openings and forming the lateral isolation trenches 179 may also be used in the alternative configurations of the first and second embodiments.
Referring to
The backside bridge regions 178 are located between the dielectric pillar structures 220 separated in the first horizontal direction hd1 in the inter-array region 200. The backside bridge regions 178 may be omitted in the memory array regions 100. The moat-region bridge regions 278 may either be present between the moat trenches 279 as in the first embodiment or may be omitted.
Referring to
Optionally, moat-region openings may be replaced with moat trenches 579 having straight inner sidewalls. Alternatively, the moat trenches 279 of the first embodiment may be formed instead.
In the fourth embodiment, the support pillar structures 20 are formed in the memory openings 49 and the dielectric pillar structures 220 of the second embodiment are formed in the discrete openings at the step of
Referring to
Referring to
Referring to
Referring to
In one alternative configuration of the fourth embodiment shown in
In another alternative configuration of the fourth embodiment shown in
Referring to various drawings of the present disclosure and according to various embodiments of the present disclosure, a three-dimensional memory device includes a first word-line region WLR including a first alternating stack of first word lines (146, 246) and continuous insulating layers (132L, 232L), first memory stack structures 55 vertically extending through the first alternating stack, a second word-line region WLR comprising a second alternating stack of second word lines (146, 246) and the continuous insulating layers (132L, 232L), second memory stack structures 55 vertically extending through the second alternating stack, plural dielectric separator structures (176, 220, 776) located between the first word-line region and the second word-line region, and at least one bridge region 178 located between the plural dielectric separator structures and between the between the first word-line region and the second word-line region. The continuous insulating layers (132L, 232L) extend through the at least one bridge region 178 between the first alternating stack in the first word-line region and the second alternating stack in the second word-line region.
In some embodiments, the first word lines in the first alternating stack do not electrically contact the second word lines in the second alternating stack. In some embodiments, the device also includes dielectric fin portions 176F of the plural dielectric separator structures (176, 776), wherein the dielectric fin portions are located at levels of the first and second word lines (146, 246) between the continuous insulating layers in the at least one bridge region 178. In some embodiments, the at least one bridge region 178 comprises a third alternating stack of the continuous insulating layers (132L, 232L) and the dielectric fin portions 176F, and no word lines (146, 246) are located between the continuous insulating layers in the at least one bridge region.
In the fourth embodiment, a dielectric pillar structure 220 extends through the at least one bridge region 178. The dielectric fin portions 176F contact the dielectric pillar structure 220.
In some embodiments, the first word-line region WLR comprises a first memory block and the second word-line region WLR comprises a second memory block different from the first memory block.
In some embodiments, the first alternating stack extends along a word line direction hd1, the second alternating stack extends along the word line direction hd1, the first alternating stack is spaced apart from the second alternating stack along a bit line direction hd2 which is perpendicular to the word line direction, the plural dielectric separator structures are located in a row extending in the word line direction between the first and the second alternating stacks, and the at least one bridge region 178 is located between the plural dielectric separator structures in the row which extends in the word line direction and between the first and the second alternating stacks in the bit line direction.
In some embodiments, the plural dielectric separator structures comprise plural continuous dielectric wall structures (176, 776) which extend in the word line direction hd1.
In the first through third embodiments, each of the plural continuous dielectric wall structures 176 comprises a pair of laterally undulating sidewalls that generally extend along the word line direction hd1 and having a lateral undulation along the bit line direction hd2, and comprising multiple vertically straight and laterally convex sidewall segments that are adjoined to each other and that extend from a first horizontal plane including top surfaces of the first and the second alternating stack to a second horizontal plane including a bottom surfaces of the first and the second alternating stack.
In the first through third embodiments, each of the first word lines (146, 246) is located between a respective pair of the continuous dielectric wall structures 176 of the plurality continuous dielectric wall structures that are spaced apart along the bit line direction hd2, and contacts each of the respective pair of continuous dielectric wall structures at the plurality of vertically straight and laterally convex sidewall segments.
In the second and third embodiments, the at least one bridge region 178 comprises a plurality of bridge regions 178 which are spaced apart along the word line direction hd1, and the plural dielectric separator structures comprise plural dielectric pillar structures 220 spaced apart by the plurality of bridge regions along the word line direction.
In the second and third embodiments, the plural dielectric separator structures comprise the plural dielectric pillar structures 220 and plural continuous dielectric wall structures 176 spaced apart by the plurality of bridge regions 178 along the word line direction.
In some embodiments, the device includes first and second memory array regions 100 separated by a first inter-array region 200 in the first word-line region WLR, wherein the first memory stack structures 55 are located in the first and the second memory array regions, third and fourth memory array regions 100 separated by a second inter-array region 200 in the second word-line region WLR, wherein the second memory stack structures 55 are located in the third and the fourth memory array regions, a first staircase region of the first alternating stack located in the first inter-array region 200, first word line contact via structures 86 contacting the first word lines (146, 246) in the first staircase region, a second staircase region of the second alternating stack located in the second inter-array region 200, and second word line contact via structures 86 contacting the second word lines (146, 246) in the second staircase region.
In the second and third embodiments, the plurality of continuous dielectric wall structures 176 are located between the first memory array region and the third memory array region in the bit line direction hd2, and between the second memory array region and the fourth memory array region in the bit line direction, and the plurality of dielectric pillar structures 220 and the plurality of bridge regions 178 are located between the first staircase region and the second staircase region.
In the second and third embodiments, no bridge regions 178 are located between the memory array regions 100 of adjacent word-line regions WLR.
In one embodiment, the device also includes a first alternating dielectric material plate stack (132L, 142′, 232L, 242′) laterally surrounded by a first dielectric moat trench fill structure (276, 576), and first conductive via structures 486 extending through the first alternating dielectric material plate stack to peripheral circuitry 720 located below the first alternating dielectric material plate stack, and a second alternating dielectric material plate stack (132L, 142′, 232L, 242′) laterally surrounded by a second dielectric moat trench fill structure (276, 576), and second conductive via structures 486 extending through the second alternating dielectric material plate stack to the peripheral circuitry 720 located below the second alternating dielectric material plate stack.
Referring to
In one embodiment, each of the at least one inter-tier dielectric layer 182 comprises a dielectric material that may be isotropically etched concurrently with etching of the first continuous insulating layers 132L selective to the first continuous sacrificial material layers 142L. In one embodiment, each of the at least one inter-tier dielectric layer 182 may comprise a same material as the first continuous insulating layers 132L. In one embodiment, the at least one inter-tier dielectric layer 182 and the first continuous insulating layers 132L may comprise, and/or may consist essentially of, undoped silicate glass (i.e., silicon oxide) or a doped silicate glass. The thickness of each of the at least one inter-tier dielectric layer 182 may be in a range from 5 nm to 100 nm, such as from 10 nm to 50 nm, although lesser and greater thicknesses may also be employed.
In embodiments in which the at least one inter-tier etch stop liner layer 184 are employed, the at least one inter-tier etch stop liner layer 184 comprises a material that may be employed as an etch stop material during a subsequent isotropic etch process that etches the materials of the at least one inter-tier dielectric layer 182 and the first continuous insulating layers 132L. In one embodiment, the at least one inter-tier etch stop liner layer 184 comprises, and/or consists of, a same material as the first continuous sacrificial material layers 142L. For example, the at least one inter-tier etch stop liner layer 184 and the first continuous sacrificial material layers 142L comprise, and/or consists essentially of, silicon nitride. In another embodiment, the at least one inter-tier etch stop liner layer 184 comprises, and/or consists of, a different material than the first continuous sacrificial material layers 142L. For example, the at least one inter-tier etch stop liner layer 184 may comprise, and/or may consist essentially of, a dielectric metal oxide such as aluminum oxide or silicon carbide nitride. The thickness of each inter-tier etch stop liner layer 184 may be in a range from 3 nm to 30 nm, such as from 6 nm to 15 nm, although lesser and greater thicknesses may also be employed.
Generally, a first vertically alternating sequence (i.e., a first tier) of first continuous insulating layers 132L and first continuous sacrificial material layers 142L is formed over a semiconductor substrate, at least one inter-tier dielectric layer 182 can be formed thereabove. In one embodiment, a layer stack comprising a first etch stop liner layer 184, an inter-tier dielectric layer 182, and a second etch stop liner layer 184 may be formed over the first vertically alternating sequence (132L, 142L). A first-tier retro-stepped dielectric material portion 165 can be formed by patterning stepped surfaces on the at least one inter-tier material layer 180 and the first vertically alternating sequence (132L, 142L), and by filling a stepped cavity with a dielectric fill material.
Referring to
Referring to
Remaining portions of the first sacrificial fill material filling the first-tier memory openings 41 comprise first-tier sacrificial memory opening fill material portions 742. Remaining portions of the first sacrificial fill material filling the first-tier support openings 21 comprise first-tier sacrificial support opening fill material portions (not shown). Remaining portions of the first sacrificial fill material filling the first-tier isolation openings 171 comprise first-tier sacrificial isolation opening fill material portions 772. Remaining portions of the first sacrificial fill material filling the first-tier moat-region openings 271 comprise first-tier sacrificial moat-opening fill material portions (not shown). Remaining portions of the first sacrificial fill material filling the first-tier connection openings 471 comprise first-tier sacrificial connection opening fill material portions (not shown). The various remaining portions of the first sacrificial fill material are collectively referred to as first-tier sacrificial fill material portions. If the material of the first-tier sacrificial memory opening fill material portions 742 and the first-tier sacrificial isolation opening fill material portions 772 is similar or the same as the material of the semiconductor material layer 110 (e.g., polysilicon or amorphous silicon), then a cover material, such as silicon oxide, is formed over the semiconductor material layer 110 prior to forming the first-tier sacrificial memory opening fill material portions 742 and the first-tier sacrificial isolation opening fill material portions 772. If the material of the first-tier sacrificial memory opening fill material portions 742 and the first-tier sacrificial isolation opening fill material portions 772 comprises a different material (e.g., carbon, etc.) with high etch or removal selectively to the material of the semiconductor material layer 110, then the cover material may be omitted.
Referring to
The cover liner layer 188L comprises a material that can be removed selective to the material of the etch stop material layer 186L. The cover liner layer 188L may comprise a same material as, or may comprise a material that is different from, the material of the first continuous sacrificial material layers 142L. In one embodiment, the cover liner layer 188L comprises, and/or consists essentially of, silicon oxide. The cover liner layer 188L may be formed by a conformal deposition process such as a low pressure chemical vapor deposition process. In one embodiment, the cover liner layer 188L may have a thickness in a range from 3 nm to 30 nm, such as from 6 nm to 15 nm, although lesser and greater thicknesses may also be employed.
Referring to
The patterned photoresist layer 189 comprises multiple rows of discrete photoresist material portions that are arranged along the first horizontal direction hd1 and laterally spaced apart along the second horizontal direction hd2. In other words, each row of discrete photoresist material portions may be arranged along the first horizontal direction hd1, and the multiple rows of discrete photoresist material portions may be laterally spaced among one another along the second horizontal direction hd2. While
Referring to
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Referring to
Referring to
Remaining portions of the inter-tier-level sacrificial fill material filling upper portions of the first memory openings 41 comprise inter-tier-level sacrificial memory opening fill material portions 842. Remaining portions of the inter-tier-level sacrificial fill material filling upper portions of the first support openings 21 comprise inter-tier-level sacrificial support opening fill material portions (not shown). Remaining portions of the inter-tier-level sacrificial fill material filling upper portions of the first isolation openings 171 comprise inter-tier-level sacrificial isolation opening fill material portions 872. Remaining portions of the inter-tier-level sacrificial fill material filling upper portions of the first moat-region openings 271 comprise inter-tier-level sacrificial moat-opening fill material portions (not shown). Remaining portions of the inter-tier-level sacrificial fill material filling upper portions of the first connection openings 471 comprise inter-tier-level sacrificial connection opening fill material portions (not shown). The various remaining portions of the inter-tier-level sacrificial fill material are collectively referred to as inter-tier-level sacrificial fill material portions.
Referring to
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Generally, openings vertically extending through the second vertically alternating sequence (232L, 242L), the at least one inter-tier material layer (182, 184), and the first vertically alternating sequence (132L, 142L). The openings comprise discrete isolation openings 177 that are arranged in rows extending along a first horizontal direction hd1 and memory openings 49 located between rows of the discrete isolation openings 177. The tubular etch stop liners 186 are exposed to a first subset of the discrete isolation openings 177 and are not exposed to a second subset of the discrete isolation openings 177.
Referring to
Various sacrificial opening fill structures are formed, which can include sacrificial memory opening fill structures 45 that are formed in the memory openings 49, sacrificial support opening fill structures that are formed in the support openings, sacrificial isolation opening fill structures 175 that are formed in the isolation openings 177, sacrificial moat-region opening fill structures that are formed in the moat-region openings, and sacrificial connection opening fill structures that are formed in the connection openings.
In an alternative embodiment, the processing steps of
Referring to
Referring to
A selective etch process can be performed, which etches the sacrificial fill material(s) of the sacrificial memory opening fill structures 45 and the sacrificial support opening fill structures. Voids are formed in the volumes of the sacrificial memory opening fill structures 45 and the sacrificial support opening fill structures. Specifically, memory openings 49 and support openings are exposed in volumes from which the sacrificial fill material(s) of the sacrificial memory opening fill structures 45 and the sacrificial support opening fill structures are removed. The patterned photoresist layer 673 can be removed, for example, by ashing.
Referring to
Referring to
A photoresist layer 287 can be applied over the contact-level dielectric layer 280, and can be lithographically patterned for form openings therein. The openings in the photoresist layer 287 may comprise line-shaped openings laterally extending along the first horizontal direction hd1 that overlie areas of the rows of sacrificial isolation opening fill structures 175. Further, the openings in the photoresist layer 287 may comprise moat-shaped openings that overlie areas of a respective set of sacrificial moat-region opening fill structures. An anisotropic etch process can be performed to transfer the pattern of the openings in the photoresist layer 287 through the contact-level dielectric layer 280. Each of the sacrificial isolation opening fill structures 175 and the sacrificial moat-region opening fill structures can be physically exposed underneath a respective opening through the contact-level dielectric layer 280. The photoresist layer 287 can be subsequently removed, for example, by ashing.
Referring to
Referring to
The first isotropic etch process widens the portions of each isolation opening 177 at levels of the first continuous insulating layers 132L, the second continuous insulating layers 232L, and the contact-level dielectric layer 280, without widening the portions of the isolation openings 177 at levels of the first continuous sacrificial material layers 142L and the second continuous sacrificial material layers 242L. The duration of the first isotropic etch process can be selected such that the isolation openings 177 in each row are merged (i.e., connected to each other) at the levels of the first continuous insulating layers 132L and the second continuous insulating layers 232L, and the moat-region openings in each cluster are merged (i.e., connected to each other) at the levels of the first continuous insulating layers 132L and the second continuous insulating layers 232L.
Each row of the discrete isolation openings 177 can be laterally expanded and merged at levels of the first continuous insulating layers 132L, the second continuous insulating layers 232L, and the contact-level dielectric layer 280 by performing a first isotropic etch process. The tubular etch stop liners 186 cover and prevent etching of portions of the inter-tier dielectric layers 182 from around the first subset of the discrete isolation openings 179 during the first isotropic etch process, whereas no tubular etch stop liners 186 are present within the second subset of the discrete isolation openings 179. Lateral isolation trenches 179 laterally extending along the first horizontal direction hd1 can be formed in contiguous combinations of volumes of the discrete isolation openings 177 and volumes of material portions that are removed by the first isotopic etch process.
The first isotropic etch process divides each of the first continuous insulating layers 132L into a respective set of first insulating layers 132 that are laterally spaced apart from each other by the lateral isolation trenches 179. Further, the first isotropic etch process divides each of the second continuous insulating layers 232L into a respective set of second insulating layers 232 that are laterally spaced apart from each other by the lateral isolation trenches 179. Thus, each of the first continuous insulating layers 132L is divided into multiple first insulating layers 132, and each of the second continuous insulating layers 232L is divided into multiple second insulating layers 232.
Surfaces of the continuous insulating layers (132L, 232L) are laterally recessed around the isolation openings 177 by greater than one half of the nearest neighbor distance within each row of the isolation openings 177. The discrete isolation openings 177 within each row of isolation openings 177 are laterally expanded and are merged among one another at levels of the continuous insulating layers (132L, 232L) to form a respective lateral isolation trench 179. Multiple lateral isolation trenches 179 can be formed within the merged volumes of the expanded isolation openings 179. The moat-region openings are laterally expanded and are merged among one another at levels of the continuous insulating layers (132L, 232L) to form a respective moat trench.
According to an aspect of the present disclosure shown in
The dielectric bridge portions 182B reduce or prevent the alternating stacks (e.g., “fingers”) of insulating layers (132L, 232) and sacrificial material layers (142L, 242L) from tilting, buckling or collapsing into the lateral isolation trenches 179. Furthermore, the dielectric bridge portions 182B of the fifth embodiment are located vertically at the level of the at least one inter-tier material layer 180 between the first (i.e., lower) and second (i.e., upper) tiers. Thus, the dielectric bridge portions 182B of the fifth embodiment reduce or prevent the buckling of the middle portions of the alternating stacks located between the top and bottom of the alternating stacks, unlike bridge portions which are located only at the top of the lateral isolation trenches. Thus, the dielectric bridge portions 182B increase the structural strength of the memory device. Furthermore, the dielectric bridge portions 182B do not increase the chance of subsequently formed word lines shorting across the lateral isolation trenches 179.
In one embodiment, at least one of the dielectric bridge portions 182B may comprise a vertically-extending opening 979 (such as a cylindrical opening) therethrough. In one embodiment, the vertically-extending opening 979 vertically extends from a top surface of each inter-tier dielectric layer 182 to a bottom surface of each inter-tier dielectric layer 182. A tubular etch stop liner 186 may be located on a cylindrical sidewall of the vertically-extending opening 979 after the first isotropic etch process. The vertically-extending opening 979 comprises a portion of the respective isolation opening 177 that extends through the inter-tier dielectric layer(s) 182. In one embodiment shown in
Referring to
In one embodiment shown in
Referring to
A second isotropic etch process can be employed to remove the continuous sacrificial material layers (142L, 242L) selective to the first insulating layers 132, the second insulating layers 232, the inter-tier dielectric layers 182, the support pillar structures 20, the outermost layer of each memory opening fill structure 58, the semiconductor material layer 110, and the dielectric liner. In one embodiment, an etchant that selectively etches the materials of the continuous sacrificial material layers (142L, 242L) with respect to the materials of the first insulating layers 132, the second insulating layers 232, the inter-tier dielectric layers 182, the support pillar structures 20, the outermost layer of each memory stack structure 58, and the semiconductor material layer 110 may be introduced into the lateral isolation trenches 179 during the second isotropic etch process. For example, the continuous sacrificial material layers (142L, 242L) may include silicon nitride, the first and second insulating layers (132, 232) may comprise silicon oxide materials, and the isotropic etch process may employ hot phosphoric acid.
Backside recesses (143, 243) are formed in volumes from which the continuous sacrificial material layers (142L, 242L) are removed. The backside recesses (143, 243) include first backside recesses 143 that are formed in volumes from which the first continuous sacrificial material layers 142L are removed and second backside recesses 243 that are formed in volumes from which the second continuous sacrificial material layers 242L are removed. Each of the backside recesses (143, 243) may be a laterally extending cavity having a lateral dimension that is greater than the vertical extent of the cavity. In other words, the lateral dimension of each of the backside recesses (143, 243) may be greater than the height of the respective backside recess. A plurality of backside recesses (143, 243) may be formed in the volumes from which the material of the continuous sacrificial material layers (142L, 242L) is removed. Each of the backside recesses (143, 243) may extend substantially parallel to the top surface of the semiconductor material layer 10. A backside recess (143, 243) may be vertically bounded by a top surface of an underlying insulating layer (132 or 232) and a bottom surface of an overlying insulating layer (132 or 232). In one embodiment, each of the backside recesses (143, 243) may have a uniform height throughout.
In one embodiment, the at least one inter-tier etch stop liner layer 184 may be collaterally removed during the second isotropic etch process, and inter-tier backside recesses 183 may be formed in volumes from which the at least one inter-tier etch stop liner layer 184 is removed.
Referring to
At least one conductive material may be deposited in the plurality of backside recesses (143, 243), at peripheral regions of the lateral isolation trenches 179. The at least one conductive material may be deposited by a conformal deposition method, which may be, for example, chemical vapor deposition (CVD), atomic layer deposition (ALD), electroless plating, electroplating, or a combination thereof. The at least one conductive material may include an elemental metal, an intermetallic alloy of at least two elemental metals, a conductive nitride of at least one elemental metal, a conductive metal oxide, a conductive doped semiconductor material, a conductive metal-semiconductor alloy such as a metal silicide, alloys thereof, and combinations or stacks thereof.
In one embodiment, the at least one conductive material may include at least one metallic material, i.e., an electrically conductive material that includes at least one metallic element. Non-limiting exemplary metallic materials that may be deposited in the backside recesses (143, 243) include tungsten, tungsten nitride, titanium, titanium nitride, tantalum, tantalum nitride, cobalt, and ruthenium. For example, the at least one conductive material may include a conductive metallic nitride liner that includes a conductive metallic nitride material such as TiN, TaN, WN, or a combination thereof, and a conductive fill material such as W, Co, Ru, Mo, Cu, or combinations thereof. In one embodiment, the at least one conductive material for filling the backside recesses (143, 243) may be a combination of titanium nitride layer and a tungsten fill material.
Electrically conductive layers (146, 246) may be formed in the backside recesses (143, 243) by deposition of the at least one conductive material. A plurality of first electrically conductive layers 146 may be formed in the plurality of first backside recesses 143, a plurality of second electrically conductive layers 246 may be formed in the plurality of second backside recesses 243, and a continuous metallic material layer (not shown) may be formed on the sidewalls of each lateral isolation trench 179. Each of the first electrically conductive layers 146 and the second electrically conductive layers 246 may include a respective conductive metallic nitride liner and a respective conductive fill material. Thus, the first and second continuous sacrificial material layers (142L, 242L) are replaced with the first and second electrically conductive layers (146, 246), respectively. Specifically, each first continuous sacrificial material layer 142L may be replaced with an optional portion of the backside blocking dielectric layer and a first electrically conductive layer 146, and each second continuous sacrificial material layer 242L may be replaced with an optional portion of the backside blocking dielectric layer and a second electrically conductive layer 246. A backside cavity is present in the portion of each lateral isolation trench 179 that is not filled with the continuous metallic material layer.
Residual conductive material may be removed from inside the lateral isolation trenches 179 and from inside the moat trenches, and from above the topmost second continuous insulating layer 232L by an anisotropic process and/or an isotropic etch process. Each remaining portion of the deposited metallic material in the first backside recesses constitutes a first electrically conductive layer 146. Each remaining portion of the deposited metallic material in the second backside recesses constitutes a second electrically conductive layer 246.
In one embodiment, each of the second electrically conductive layers 246 comprises a respective set of vertically-straight and laterally-concave sidewall segments that are adjoined among one another at vertically-extending edges and physically exposed to a respective lateral isolation trench 179. In one embodiment, a plurality of first electrically conductive layers 146 (which may exclude a topmost first electrically conductive layer 146) comprises a respective set of vertically-straight and laterally-concave sidewall segments that are adjoined among one another at vertically-extending edges and physically exposed to a respective lateral isolation trench 179.
In one embodiment, the inter-tier backside recesses 183 may be filled with the at least one electrically conductive material to form inter-tier electrically conductive layers 196 having a same material composition as the first and second electrically conductive layers (146, 246). The inter-tier electrically conductive layers 196 may comprise dummy electrically conductive layers which are electrically inactive and are not connected to a voltage or current source.
Referring to
Referring to
A second alternative embodiment of the fifth exemplary structure can be derived from the fifth exemplary structure by employing a material that has a high resistance to the second isotropic etch process for the at least one inter-tier etch stop liner layer 184. For example, the at least one inter-tier etch stop liner layer 184 may comprise a dielectric metal oxide or silicon carbide nitride, while the sacrificial material layers (142L, 242L) comprise a different material, such as silicon nitride. In this case, the at least one dielectric inter-tier etch stop liner layer 184 may not be recessed at the step shown in
According to various embodiments of the present disclosure, a three-dimensional memory device includes a first alternating stack of first word lines (146, 246) and first insulating layers (132, 232) first memory stack structures 55 vertically extending through the first alternating stack, a second alternating stack of second word lines (146, 246) and second insulating layers (132, 232), second memory stack structures 55 vertically extending through the second alternating stack, plural isolation trench fill structures 176 located between the first alternating stack and the second alternating stack, and a bridge region 179 located between the plural isolation trench fill structures 176 and between the between the first alternating stack and the second alternating stack, wherein at least one insulating layer 182 extends continuously through the first alternating stack, the second alternating stack, and the bridge region 178.
In the fifth embodiment, the first alternating stack comprises a lower first tier (132, 146), an upper first tier (232, 246) located above the lower first tier, and a first inter-tier region {182, (184, 196)} located between the lower and the upper first tiers. The second alternating stack comprises a lower second tier (132, 146), an upper second tier (232, 246) located above the lower first tier, and a second inter-tier region {182, (184, 196)} located between the lower and the upper second tiers. A lateral isolation trench 179 is filled with the plural isolation trench fill structures 176 and the bridge region 178 is located between the first and the second alternating stacks. The lower first tier is laterally spaced apart along a second horizontal direction hd2 from the lower second tier by a lower portion of the lateral isolation trench 179 which extends along a first horizontal direction hd1. The upper first tier is laterally spaced apart along the second horizontal direction hd2 from the upper second tier by an upper portion of the lateral isolation trench 179 which extends along the first horizontal direction hd1. The isolation trench fill structures 176 comprise a respective dielectric trench fill material portion, and the at least one insulating layer which extends continuously through the first alternating stack, the second alternating stack, and the bridge region 178 comprises an inter-tier dielectric layer 182 continuously extending through the first inter-tier region {182, (184, 196), the second inter-tier region {182, (184, 196)} and the bridge region 178.
In one aspect of the fifth embodiment, a portion of the inter-tier dielectric layer 182 located in the bridge region 178 comprises a dielectric bridge portion 182b which extends through an opening between adjacent dielectric trench fill material portions, and the dielectric bridge portion 182 comprises at least one concave sidewall (182C, 182S) that contacts a convex sidewall segment of an adjacent one of the dielectric trench fill material portions.
In one aspect, the dielectric bridge portion 182B comprises a vertically-extending opening 979 that vertically extends from a top surface of the inter-tier dielectric layer 182 to a bottom surface of the inter-tier dielectric layer 182. One of the dielectric trench fill material portions vertically extends through the vertically-extending opening 979 in the dielectric bridge portion 182B.
In one aspect, each of the first and the second word lines (146, 246) comprises a respective set of vertically-straight and laterally-concave sidewall segments that are adjoined to each other at vertically-extending edges. The respective set of vertically-straight and laterally-concave sidewall segments contacts a set of vertically-straight and laterally-convex sidewall segments of one of the dielectric trench fill material portions.
In one aspect, each of the dielectric trench fill material portions vertically extends from a horizontal plane including bottommost surfaces of the lower first tier (132, 146) and the lower second tier (132, 146) to a horizontal plane including topmost surfaces of the upper first tier (232, 246) and the upper second tier (232, 246).
In one aspect, the dielectric bridge portion 182B has a same thickness the inter-tier dielectric layer 182. In one aspect, each of the dielectric trench fill material portions is in contact with sidewalls of the first and the second alternating stacks.
In one aspect, an additional inter-tier dielectric layer 182 continuously extending through the first and the second inter-tier regions and comprising an additional dielectric bridge portion 182B that laterally extends through the bridge region 178 through an opening between adjacent dielectric trench fill material portions.
In one embodiment shown in
In another embodiment shown in
In one aspect, the dielectric bridge portion 182B comprises a first vertically-straight and laterally-concave sidewall segment 182C having a first radius of curvature r1 in a plan view, and a pair of second vertically-straight and laterally-concave sidewall segments 182S having a second radius r2 of curvature that is greater than the first radius of curvature r1 in the plan view and adjoined to vertically-extending edges of the first vertically-straight and laterally-concave sidewall segment 182C.
In some embodiment, wherein each of the memory stack structures 55 comprises a vertical stack of memory elements 54 located at levels of the first and the second word lines (146, 246), and a vertical semiconductor channel 60.
Referring to
The first-tier memory openings 41 are formed in the memory array regions 100. The first-tier support openings 21 are formed in the inter-array region 200 as clusters. The first-tier isolation openings 171 are formed in neighboring pairs of rows that are arranged along the first horizontal direction hd1, which is the word line direction. Each cluster of first-tier memory openings 41 may be formed as a two-dimensional array of first-tier memory openings 41. The first-tier support openings 21 are openings that are formed in the inter-array region 200, and are subsequently employed to form support pillar structures. A subset of the first-tier support openings 21 may be formed through a respective horizontal surface of the first stepped surfaces. First-tier isolation openings 171 within each row of first-tier isolation openings 171 can be arranged along the first horizontal direction hd1 between neighboring clusters of first-tier memory openings 41. In one embodiment, each row of first-tier isolation openings 171 can laterally extend from a distal end of a first memory array region 100A, through an inter-array region 200, and to a distal end of a second memory array region 100B.
In one embodiment, the first-tier memory openings 41, the first-tier support openings 21, and the first-tier isolation openings 171 can have a respective circular or elliptical horizontal cross-sectional shape. The maximum lateral dimension (such as a diameter or a major axis) of each of the first-tier memory openings 41, the first-tier support openings 21, and the first-tier isolation openings 171 may be in a range from 30 nm to 300 nm, such as from 60 nm to 150 nm, although lesser and greater dimensions may also be employed. The nearest-neighbor distance within a row of first-tier isolation openings 171 can be in a range from 10% to 200%, such as from 20% to 100% of the maximum lateral dimension (such as a diameter) of each first-tier isolation opening 171. Optionally, the first-tier isolation opening 171 may have a larger maximum lateral dimension than the first-tier memory openings 41 and the first-tier support openings 21.
In one embodiment, first-tier isolation openings 171 within each row of first-tier isolation openings 171 may be periodically arranged along the first horizontal direction hd1 with a uniform periodicity, which is herein referred to as a uniform pitch p. The nearest-neighbor distance within a row of first-tier isolation openings 171 may be the same as the difference between the uniform pitch p and the maximum lateral dimension of each first-tier isolation opening 171 along the first horizontal direction hd1. The uniform pitch p may be in a range from 50 nm to 800 nm, such as from 100 nm to 400 nm, although lesser and greater dimensions may also be employed for the uniform pitch p.
In each neighboring pair of rows of first-tier isolation openings 171, the rows of first-tier isolation openings 171 may be laterally spaced from each other along a second horizontal direction (e.g., bit line direction) hd2 by a lateral spacing that is not greater than twice the uniform pitch p, and preferably not greater than the uniform pitch p, and even more preferably not greater than the uniform pitch p minus the maximum diameter of each first-tier isolation opening 171 along the first horizontal direction hd1. In one embodiment, each first-tier isolation opening 171 may have a respective circular horizontal cross-sectional shape. In one embodiment, the center-to-center distance between neighboring pairs of first-tier isolation openings 171 within a row of first-tier isolation openings 171 may be the same as center-to-center distances between the first-tier isolation opening 171 and each of two neighboring first-tier isolation openings 171 within a neighboring row of first-tier isolation openings 171. In other words, the center-to-center distance between three nearest neighbor first-tier isolation openings 171 forms an equilateral triangle.
In one embodiment, each cluster of first-tier isolation openings 171 may consist of at least two rows of first-tier isolation openings 171. While two rows of first-tier isolation openings 171 are shown in
According to an aspect of the present disclosure, each pair of rows of first-tier isolation openings 171 comprises a first row of first-tier isolation openings 171 and a second row of first-tier isolation openings 171. In one embodiment, each first-tier isolation opening 171 within the second row of first-tier isolation openings 171 is laterally offset along the first horizontal direction hd1 from a respective most proximal one of the first-tier isolation openings 171 within the first row of first-tier isolation openings 171 by one half of the uniform pitch p.
Referring to
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Portions of the deposited dielectric fill material may be removed from above the topmost layer of the second vertically alternating sequence (232L, 242L), such as from above the topmost second continuous insulating layer 232L. For example, the dielectric fill material may be recessed to a top surface of the topmost second continuous insulating layer 232L using a planarization process. The planarization process may include a recess etch process, chemical mechanical planarization (CMP), or a combination thereof. The top surface of the topmost second continuous insulating layer 232L may be used as an etch stop layer or a planarization stop layer. Each remaining portion of the dielectric fill material in the support openings 29 constitutes a support pillar structure 20.
A photoresist layer 152 can be applied over the second exemplary structure, and can be lithographically patterned to cover areas of the support pillar structures 20 and the sacrificial second-tier isolation opening fill structures 174 without covering the areas of the sacrificial second-tier memory opening fill structures 44. An etch process can be performed that selectively etches the sacrificial second-tier fill material relative to the materials of the second vertically alternating sequence (232L, 242L) and relative to the materials of the first vertically alternating sequence (132L, 142L). The sacrificial second-tier fill material can be removed from inside the second-tier memory openings 43 and from inside the first-tier memory openings 41. Voids are formed in the volumes of the second-tier memory openings 43 and the first-tier memory openings 41. Each contiguous combination of a second-tier memory opening 43 and a first-tier memory opening 41 constitutes an inter-tier memory opening 49, which is also referred to as a memory opening 49. The photoresist layer 152 can be subsequently removed, for example, by ashing.
Referring to
Referring to
A photoresist layer 153 can be applied over the second exemplary structure, and can be lithographically patterned to cover areas of the support pillar structures 20 and the memory opening fill structures 58 without covering the areas of the sacrificial second-tier isolation opening fill structures 174. Slit-shaped openings in the photoresist layer 153 overlie clusters of sacrificial second-tier isolation opening fill structures 174 in the second-tier isolation openings 173, and clusters of sacrificial first-tier isolation opening fill structures 172 in the first-tier isolation openings 171. The pattern in the photoresist layer 153 can be transferred through the dielectric etch mask liner 160 by performing an etch process, which may comprise an isotropic etch process or an anisotropic etch process.
An etch process can be performed that selectively etches the sacrificial fill materials of the sacrificial isolation opening fill structures (174, 172) relative to the materials of the second vertically alternating sequence (232L, 242L), the first vertically alternating sequence (132L, 142L), and the dielectric etch mask liner 160. The sacrificial fill materials can be removed from inside the second-tier isolation openings 173 and the first-tier isolation openings 171. Voids are formed in the volumes of the second-tier isolation openings 173 and the first-tier isolation openings 171. Each contiguous combination of a second-tier isolation opening 173 and a first-tier isolation opening 171 constitutes an inter-tier isolation opening, which is also referred to as a isolation opening 177. In summary, sacrificial isolation opening fill structures (174, 172) are removed from the discrete isolation openings (171, 173) after formation of the memory opening fill structures 58 to form the isolation openings 177. The isolation openings 177 are formed as clusters of isolation openings 177 and each cluster of isolation openings 177 comprises at least a pair of rows of isolation openings 177 that are arranged along a first horizontal direction hd1 with a uniform pitch p.
While an embodiment is described in which two vertical alternating sequences of continuous insulating layers (132L, 232L) and continuous sacrificial material layers (142L, 242L) are formed over a substrate 8, alternative embodiments include a single vertically alternating sequence of continuous insulating layers and continuous sacrificial material layers, or three or more vertically alternating sequences of respective continuous dielectric material layers and continuous sacrificial material layers. Further, two or more vertically alternating sequences of respective continuous dielectric material layers and continuous sacrificial material layers can constitute a combined vertically alternating sequence including all of the continuous dielectric material layers and continuous sacrificial material layers.
In one embodiment, isolation openings 177 within each row of isolation openings 177 may be periodically arranged along the first horizontal direction hd1 with the uniform pitch p. The nearest-neighbor distance within a row of isolation openings 177 may be the same as the difference between the uniform pitch p and the maximum lateral dimension of each isolation opening 177 along the first horizontal direction hd1. The uniform pitch p may be in a range from 50 nm to 800 nm, such as from 100 nm to 400 nm, although lesser and greater dimensions may also be employed for the uniform pitch p.
In each neighboring pair of rows of isolation openings 177, the rows of isolation openings 177 may be laterally spaced from each other along a second horizontal direction hd2 by a lateral spacing that is not greater than twice the uniform pitch p, and preferably not greater than the uniform pitch p, and even more preferably not greater than the uniform pitch p1 minus the maximum diameter of each isolation opening 177 along the first horizontal direction hd1. In one embodiment, each isolation opening 177 may have a respective circular horizontal cross-sectional shape. In one embodiment, the center-to-center distance between neighboring pairs of isolation openings 177 within a row of isolation openings 177 may be the same as center-to-center distances between the isolation opening 177 and each of two neighboring isolation openings 177 within a neighboring row of isolation openings 177.
In one embodiment, each cluster of isolation openings 177 may consist of two rows of isolation openings 177. In one embodiment, the clusters of isolation openings 177 are laterally spaced from each other along the second horizontal direction hd2 at least by a lateral spacing LS that is greater than four times the uniform pitch p. The lateral spacing LS may be greater than six times, including eight times, the uniform pitch p.
According to an aspect of the present disclosure, each pair of rows of isolation openings 177 comprises a first row of isolation openings 177 and a second row of isolation openings 177. In one embodiment, each isolation opening 177 within the second row of isolation openings 177 is laterally offset along the first horizontal direction hd1 from a respective isolation opening 177 within the first row of isolation openings 177 by one half of the uniform pitch p.
Referring to
The first isotropic etch process isotropically recesses the material of the continuous insulating layers (132L, 232L) around the isolation openings 177. Thus, the first isotropic etch process laterally expands the isolation openings 177 at each level of the continuous insulating layers (132L, 232L). The duration of the first isotropic etch process can be selected such that neighboring portions of the isolation openings 177 merge with each other at the levels of the continuous insulating layers (132L, 232L). Two rows of isolation openings 177 within each cluster of isolation openings 177 can merge with each other to form interconnected isolation openings 179′.
The lateral recess distance of the first isotropic etch process is greater than one half of the greater of the lateral spacings between neighboring pairs of isolation openings 177 within a same row of isolation openings 177, and the lateral spacing between neighboring pairs of isolation openings 177 across neighboring rows of isolation openings 177. In one embodiment, the lateral spacings between neighboring pairs of isolation openings 177 within a same row of isolation openings 177 may be the same as the lateral spacing between neighboring pairs of isolation openings 177 across neighboring rows of isolation openings 177. In one embodiment, lateral recess distance of the first isotropic etch process may be in a range from 55% to 120%, such as from 60% to 100%, and/or from 70% to 85%, of the lateral spacings between neighboring pairs of isolation openings 177 within a same row of isolation openings 177, and the lateral spacing between neighboring pairs of isolation openings 177 across neighboring rows of isolation openings 177.
The first isotropic etch process divides each of the continuous insulating layers (132L, 232L) into a respective set of insulating layers (132, 232) that are laterally spaced apart from each other. Each first continuous insulating layer 132L is divided into a plurality of first insulating layers 132 that are laterally spaced apart from each other by the interconnected isolation openings 179′. Each second continuous insulating layer 232L is divided into a plurality of second insulating layers 132 that are laterally spaced apart among one another by the interconnected isolation openings 179′.
Referring to
The second isotropic etch process isotropically recesses the material of the continuous sacrificial material layers (142L, 242L) around the interconnected isolation openings 179′. The second isotropic etch process laterally expands the interconnected isolation openings 179′ at each level of the continuous sacrificial material layers (142L, 242L). The duration of the second isotropic etch process can be selected such that neighboring portions of the isolation openings 177 (i.e., the volumes of the voids of the isolation openings 177 as formed at the processing steps of
The lateral recess distance of the second isotropic etch process is greater than one half of the greater of the lateral spacings between neighboring pairs of isolation openings 177 (as formed at the processing steps of
The second isotropic etch process divides each of the continuous sacrificial material layers (142L, 242L) into a respective set of sacrificial material layers (142, 242) that are laterally spaced apart among one another. Each first continuous sacrificial material layer 142L is divided into a plurality of first sacrificial material layers 142 that are laterally spaced apart from each other by the lateral isolation trenches 179. Each second continuous sacrificial material layer 242L is divided into a plurality of second sacrificial material layers 142 that are laterally spaced apart from each other by the lateral isolation trenches 179.
In summary, the lateral isolation trenches 179 can be formed by laterally recessing proximal portions of the continuous insulating layers (132L, 232L) and the continuous sacrificial material layers (142L, 242L) around each of the isolation openings 177. Each cluster of isolation openings 177 merge to form a respective lateral isolation trench 179. Specifically, two rows of isolation openings 177 merge to form a single lateral isolation trench 179. The volumes of the lateral isolation trenches 179 comprises volumes of the isolation openings 177 and volumes of voids formed by the first isotropic etch process and the second isotropic etch process.
Each lateral isolation trench 179 comprises a pair of laterally-undulating lengthwise sidewalls that laterally extend along the first horizontal direction hd1 having a periodic lateral undulation along the second horizontal direction hd2. The periodic lateral undulation may have a periodicity of the uniform pitch p along the first horizontal direction hd1. Each laterally-undulating lengthwise sidewall of an lateral isolation trench 179 may comprise a respective set of horizontally-concave and vertically-straight surface segments. As used herein, a “horizontally-concave” surface segment refers to a surface segment having a concave horizontal cross-sectional profile. As used herein, a “horizontally-convex” surface segment refers to a surface segment having a convex horizontal cross-sectional profile. As used herein, a “vertically-straight” surface segment refers to a surface segment having a straight vertical cross-sectional profile.
As shown in
In one embodiment shown in
Referring to
Backside recesses (143, 243) are formed in volumes from which the sacrificial material layers (142, 242) are removed. The backside recesses (143, 243) include first backside recesses 143 that are formed in volumes from which the first sacrificial material layers 142 are removed and second backside recesses 243 that are formed in volumes from which the second sacrificial material layers 242 are removed. Each of the backside recesses (143, 243) may be a laterally extending cavity having a lateral dimension that is greater than the vertical extent of the cavity. In other words, the lateral dimension of each of the backside recesses (143, 243) may be greater than the height of the respective backside recess. A plurality of backside recesses (143, 243) may be formed in the volumes from which the material of the sacrificial material layers (142, 242) is removed. Each of the backside recesses (143, 243) may extend substantially parallel to the top surface of the semiconductor material layer 10. A backside recess (143, 243) may be vertically bounded by a top surface of an underlying insulating layer (132, 232) and a bottom surface of an overlying insulating layer (132, 232). In one embodiment, each of the backside recesses (143, 243) may have a uniform height throughout.
Referring to
At least one conductive material may be deposited in the plurality of backside recesses (143, 243) and in peripheral regions of the lateral isolation trenches 179. The at least one conductive material may be deposited by a conformal deposition method, which may be, for example, chemical vapor deposition (CVD), atomic layer deposition (ALD), electroless plating, electroplating, or a combination thereof. The at least one conductive material may include an elemental metal, an intermetallic alloy of at least two elemental metals, a conductive nitride of at least one elemental metal, a conductive metal oxide, a conductive doped semiconductor material, a conductive metal-semiconductor alloy such as a metal silicide, alloys thereof, and combinations or stacks thereof.
In one embodiment, the at least one conductive material may include at least one metallic material, i.e., an electrically conductive material that includes at least one metallic element. Non-limiting exemplary metallic materials that may be deposited in the backside recesses (143, 243) include tungsten, tungsten nitride, titanium, titanium nitride, tantalum, tantalum nitride, cobalt, and ruthenium. For example, the at least one conductive material may include a conductive metallic nitride liner that includes a conductive metallic nitride material such as TiN, TaN, WN, MoN or a combination thereof, and a conductive fill material such as W, Co, Ru, Mo, Cu, or combinations thereof. In one embodiment, the at least one conductive material for filling the backside recesses (143, 243) may be a combination of titanium nitride layer and a tungsten fill material.
Electrically conductive layers (146, 246) may be formed in the backside recesses (143, 243) by deposition of the at least one conductive material. A plurality of first electrically conductive layers 146 may be formed in the plurality of first backside recesses 143, a plurality of second electrically conductive layers 246 may be formed in the plurality of second backside recesses 243, and a continuous metallic material layer (not shown) may be formed on the sidewalls of each lateral isolation trench 179. Each of the first electrically conductive layers 146 and the second electrically conductive layers 246 may include a respective conductive metallic nitride liner and a respective conductive fill material. Thus, the first and second sacrificial material layers (142, 242) may be replaced with the first and second electrically conductive layers (146, 246), respectively. Specifically, each first sacrificial material layer 142 may be replaced with an optional portion of the backside blocking dielectric layer and a first electrically conductive layer 146, and each second sacrificial material layer 242 may be replaced with an optional portion of the backside blocking dielectric layer and a second electrically conductive layer 246. A backside cavity is present in the portion of each lateral isolation trench 179 that is not filled with the continuous metallic material layer.
Residual conductive material may be removed from inside the lateral isolation trenches 179 and from above the topmost second continuous insulating layer 232L by an anisotropic process and/or an isotropic etch process. Each remaining portion of the deposited metallic material in the first backside recesses constitutes a first electrically conductive layer 146. Each remaining portion of the deposited metallic material in the second backside recesses constitutes a second electrically conductive layer 246.
Generally, remaining portions of the continuous sacrificial material layers (142L, 242L) can be replaced with portions of an electrically conductive material. Alternating stacks (132, 146, 232, 246) of insulating layers (132, 232) and electrically conductive layers (146, 246) can be formed, which are laterally spaced from each other by the lateral isolation trenches 179. Each alternating stack (132, 146, 232, 246) includes insulating layers (132, 232) and electrically conductive layers (146, 246) that alternate along a vertical direction, is located over a substrate 8, and laterally extends along a first horizontal direction hd1. The alternating stacks (132, 146, 232, 246) are laterally spaced apart along a second horizontal direction hd2 that is perpendicular to the first horizontal direction hd1 by the lateral isolation trenches 179. The area of each alternating stack may correspond to an area of a memory block. Thus, the lateral isolation trenches 179 laterally separate adjacent memory blocks from each other along the second horizontal direction (e.g., bit line direction) hd2. Memory stack structures 55 (which are located in memory opening fill structures 58) vertically extend through a respective one of the alternating stacks (132, 146, 232, 246), and comprise a respective vertical stack of memory elements (e.g., memory cells located in the memory films 50) at levels of the electrically conductive layers (146, 246).
Referring to
At least one conducive material can be optionally deposited in remaining unfilled volumes of the lateral isolation trenches 79 to form source contact via structures 76, which can be conductive wall structures laterally extending along the first horizontal direction hd1. Each contiguous combination of an insulating spacer 74 and a source contact via structure 76 constitutes an isolation trench fill structure (74, 76) that fills a respective lateral isolation trench 179. Alternatively, the source contact via structure 76 may be omitted and the isolation trench fill structure consists essentially of the insulating material.
In one embodiment shown in
Referring to
At least one conductive material can be deposited in the drain contact via cavities and in the layer contact via cavities. Excess portions of the at least one conductive material can be removed from above the horizontal plane including the top surface of the contact-level dielectric layer 280 by a planarization process such as a chemical mechanical planarization (CMP) process or a recess etch process. Each remaining portion of the at least one conductive material filling a respective drain contact via cavity and contacting a top surface of a respective drain region 63 constitutes a drain contact via structure 88. Each remaining portion of the at least one conductive material filling a respective layer contact via cavity and contacting a top surface of a respective electrically conductive strip 84 constitutes a layer contact via structure 86.
Additional metal interconnect structures including bit lines (not shown) and additional dielectric material layers can be subsequently formed to provide a memory die. Optionally, the memory die including the sixth exemplary structure may be bonded to a logic die, which may comprise a peripheral circuit configured to operate the three-dimensional memory device in the memory die.
Referring collectively to
In one embodiment, the second periodic lateral undulation is laterally offset along the first horizontal direction hd1 relative to the first periodic lateral undulation by one half of the uniform pitch p.
In one embodiment, the first lengthwise sidewall LS1 comprises first horizontally-convex and vertically-straight surface segments that are arranged along the first horizontal direction hd1 with the uniform pitch p; and the second lengthwise sidewall LS2 comprises second horizontally-convex and vertically-straight surface segments that are arranged along the first horizontal direction hd1 with the uniform pitch p. In one embodiment, the first horizontally-convex and vertically-straight surface segments and the second horizontally-convex and vertically-straight surface segments have a same radius of curvature Rc. In one embodiment, a minimum spacing along the second horizontal direction hd2 between the first lengthwise sidewall LS1 and the second lengthwise sidewall LS2 is greater than twice the same radius of curvature Rc.
In one embodiment, the first horizontally-convex and vertically-straight surface segments are adjoined to each other at first vertically-extending edges that are laterally spaced apart along the first horizontal direction hd1 by the uniform pitch p; and the second horizontally-convex and vertically-straight surface segments are adjoined to each other at second vertically-extending edges that are laterally spaced apart along the first horizontal direction hd1 by the uniform pitch p. In one embodiment, the second vertically-extending edges are laterally offset along the first horizontal direction hd1 from a respective one of the first vertically-extending edges by one half of the uniform pitch p.
In one embodiment, the isolation trench fill structures (74, 76) vertically extend from a first horizontal plane including a bottommost surface of the alternating stacks (132, 146, 232, 246) to a second horizontal plane including a topmost surface of the alternating stacks (132, 146, 232, 246). In one embodiment, the first lengthwise sidewall LS1 has the first periodic lateral undulation along the second horizontal direction hd2 at each level of the electrically conductive layers (146, 246). In one embodiment, the first lengthwise sidewall LS1 has the first periodic lateral undulation along the second horizontal direction hd2 at each level of the insulating layers (132, 232) except a level of topmost insulating layers (132, 232) within the alternating stacks (132, 146, 232, 246).
In one embodiment, the first lengthwise sidewall LS1 comprises a straight sidewall segment that is parallel to the first horizontal direction hd1 at the level of the topmost insulating layers (132, 232) within the alternating stacks (132, 146, 232, 246). In one embodiment, the first lengthwise sidewall LS1 consists of first surface segments of an insulating material portion; and the second lengthwise sidewall LS2 consist of second surface segments of the insulating material portion. In one embodiment, the insulating material portion comprises an insulating spacer 74 that laterally surrounds a backside contact via structure 76 that contacts a top surface of a semiconductor material layer that underlies the alternating stacks (132, 146, 232, 246).
In one embodiment, the backside contact via structure 76 comprises: a pair of laterally-undulating lengthwise sidewalls that vertically extend at least from a horizontal plane including bottom surfaces of topmost insulating layers (132, 232) of the alternating stacks (132, 146, 232, 246) to a horizontal plane including bottom surfaces of bottommost insulating layers (132, 232) of the alternating stacks (132, 146, 232, 246); and a pair of straight lengthwise sidewalls located entirely above the horizontal plane including the bottom surfaces of the topmost insulating layers (132, 232) of the alternating stacks (132, 146, 232, 246).
In one embodiment, the three-dimensional memory device comprises layer contact via structures 86 vertically extending through a respective subset of layers within a respective alternating stack (132, 146, 232, 246) of the alternating stacks (132, 146, 232, 246) and contacting a top surface of a respective electrically conductive layer (146, 246) within the respective alternating stack (132, 146, 232, 246).
The various embodiments of the present disclosure may be employed to provide process-friendly and structurally robust lateral isolation trenches 179 formed by merging of two rows of isolation openings 177. The lateral isolation trenches 179 formed by lateral expansion of pairs of rows of isolation openings 177 are resistant to malformation of a single isolation opening 177 within any row of isolation openings 177 because neighboring isolation openings 177 around any malformed isolation opening 177 can merge to provide a continuous lateral isolation trench 179 between adjacent memory blocks and thus prevent short circuits between word lines of adjacent memory blocks even if one of the isolation openings 177 is not formed due to a lithography or etching error. Thus, the process yield of the three-dimensional memory array can be increases through use of lateral isolation trenches 179 formed by merging pairs of rows of isolation openings 177.
Although the foregoing refers to particular embodiments, it will be understood that the disclosure is not so limited. It will occur to those of ordinary skill in the art that various modifications may be made to the disclosed embodiments and that such modifications are intended to be within the scope of the disclosure. Compatibility is presumed among all embodiments that are not alternatives of one another. The word “comprise” or “include” contemplates all embodiments in which the word “consist essentially of” or the word “consists of” replaces the word “comprise” or “include,” unless explicitly stated otherwise. Where an embodiment using a particular structure and/or configuration is illustrated in the present disclosure, it is understood that the present disclosure may be practiced with any other compatible structures and/or configurations that are functionally equivalent provided that such substitutions are not explicitly forbidden or otherwise known to be impossible to one of ordinary skill in the art. All of the publications, patent applications and patents cited herein are incorporated herein by reference in their entirety.
This application is a continuation-in-part (CIP) application of U.S. application Ser. No. 17/510,807 filed on Oct. 26, 2021, which is a CIP application of U.S. application Ser. No. 17/174,064 that was filed on Feb. 11, 2021, the entire contents of which are incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | 17510807 | Oct 2021 | US |
| Child | 18495491 | US | |
| Parent | 17174064 | Feb 2021 | US |
| Child | 17510807 | US |
