The subject matter disclosed herein relates to a tile leveling device for leveling tiles.
Ceramic tiles must be laid in a level position.
A tile leveling device is disclosed. The tile leveling device includes a tower, a base, and two leveling ridges. The tower includes a cross piece and two struts that extend in a distal direction along a first axis from the cross piece. The base is connected to the two struts at a base intersection and extending along a traverse axis from the two struts, the base comprising two side edges, two front edges, and four diagonal cutouts, wherein the two side edges are each perpendicular to both the two front edges, a diagonal cutout is between each side edge and front edge pair at a diagonal angle and each strut comprises a notch along a break line at an outer intersection. The two leveling ridges are disposed on a proximal surface of the base, each leveling ridge comprising a platform perpendicular to the first axis, and the two platforms form a tension gap and each platform extends unbroken through the tension gap, a platform height from the proximal surface along the first axis is at least one quarter a platform width along a cross axis and a platform gap between the two platforms is greater than twice the platform width, each leveling ridge further comprising leveling ramps that slope from the platform along a traverse axis to the proximal surface, wherein an intersection of each leveling ramp and the proximal surface is separated from a nearest front edge by a proximal surface gap.
A more particular description of the embodiments briefly described above will be rendered by reference to specific embodiments that are illustrated in the appended drawings. Understanding that these drawings depict only some embodiments and are not therefore to be considered to be limiting of scope, the embodiments will be described and explained with additional specificity and detail through the use of the accompanying drawings, in which:
Reference throughout this specification to “one embodiment,” “an embodiment,” or similar language means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment. Thus, appearances of the phrases “in one embodiment,” “in an embodiment,” and similar language throughout this specification may, but do not necessarily, all refer to the same embodiment, but mean “one or more but not all embodiments” unless expressly specified otherwise. The terms “including,” “comprising,” “having,” and variations thereof mean “including but not limited to” unless expressly specified otherwise. An enumerated listing of items does not imply that any or all of the items are mutually exclusive and/or mutually inclusive, unless expressly specified otherwise. The terms “a,” “an,” and “the” also refer to “one or more” unless expressly specified otherwise.
Furthermore, the described features, advantages, and characteristics of the embodiments may be combined in any suitable manner. One skilled in the relevant art will recognize that the embodiments may be practiced without one or more of the specific features or advantages of a particular embodiment. In other instances, additional features and advantages may be recognized in certain embodiments that may not be present in all embodiments.
The description of elements in each figure may refer to elements of proceeding figures. Like numbers refer to like elements in all figures, including alternate embodiments of like elements.
The tower 105 includes a cross piece 110 and at least one strut 115. In the depicted embodiment, the tower 105 includes two struts 115. The at least one strut 115 extends in a distal direction 150 along a first axis 145 from the cross piece 110.
The base 120 may be connected to the at least one strut 115 at base intersections 140 and may extend traversely in one or more of a first traverse direction 155 and a second traverse direction 160 from the at least one strut 115. In one embodiment, the base 120 extends in the first traverse direction 155 traverse to the tower 105. In addition, the base 120 may extend in the second traverse direction 160 opposite the first traverse direction 155 from the tower 105. The first traverse direction 155 and the second traverse direction 160 may be orthogonal to the first axis 145.
The cross piece 110, the at least one strut 115, and the base 120 may form a tension gap 125. In the depicted embodiment, the tension gap 125 is bounded by the two struts 115, the cross piece 110, and the base 120.
The base 120 includes one or more leveling ridges 130. The leveling ridges 130 may be disposed on a proximal surface 121 of the base 120. Each leveling ridge 130 may comprise a distal ridge side 131 connected to the base 120 and a proximal ridge surface 132 in a proximal direction 151 along the first axis 145 from the base 120.
In the depicted embodiment, the base 120 includes a mortar passage 135. The mortar passage 135 may be disposed between the leveling ridges 130. The mortar passage 135 may allow mortar to pass between the leveling ridges 130 and/or the base 120.
In one embodiment, each strut 115 includes one or more spacing bars 175. The spacing bars 175 may maintain a specified spacing between tiles.
The total of a width of one or more spacing bars 175 and the first traverse width 170 is a second traverse width 180. In one embodiment, the second traverse width 180 is in the range of 1.5-5 mm. Each spacing bar 175 may have a width of 1 mm. The second traverse width may be 1 mm for no spacing bars 175, 2 mm for one spacing bar 175, and 3 mm for two spacing bars 17 as shown.
Mortar passages 135 are shown disposed between the leveling ridges 130. In the depicted embodiment, the mortar passages 135 are bounded by the base 120.
The tension gap 125 may be formed between the cross piece 110 and the base 120 on both sides of the strut 115 along the longitudinal axis 146. In the depicted embodiment, the tile leveling device 100 does not include a mortar passage 135. Alternate embodiments may include a mortar passage 135.
The tapered surface 201 may be inclined at a taper angle in the range of 15 to 35% relative to the leveling surface 203. In one embodiment, the taper angle is relative to a virtual plane containing a front edge 209 and a rear edge 211 of the leveling surface 203 of the tensioner 200.
The tile leveling device 100 may be positioned with the tensioner 200 in the tension gap 125. In the depicted embodiment, a single strut 115 is disposed within a tensioner trough 207.
In the depicted embodiment, the tile leveling device 100 comprises the single strut 115 that is substantially centered along the longitudinal axis 146 of the base 120. The tension gap 125 is formed between the cross piece 110 and the base 120 on both sides of the strut 115 along the longitudinal axis 146. The tensioner 200 is forced through the tension gap 125 on both sides of the strut 115.
The tensioner 200 may be forced through the tension gap 125 until the tapered surface 201 contacts the cross piece 110, applying a leveling force to the first tile 300a and the second tile 300b from the leveling surface 130 of the tensioner 200 and the leveling ridges 130.
The embodiments level tile 300 with leveling ridges 130 that are set above the base 120. As a result, mortar may freely flow between the base 120 and the tile 300. In addition, the break line 141 for the struts 115 are disposed the offset distance 147 from the proximal ridge surface 132 of the leveling ridges 130. As a result, the setting of the mortar relative to the base 120 is improved.
The device base 171 is connected to the two struts 115 at a base intersection 173. The device base 171 extends along a traverse axis 160 from the two struts 115. The device base 171 may include two base triangles 177. Each base triangle 117 may include an outer triangle vertices 183. Each strut 115 comprises a notch 143 along a break line 141 at an outer intersection of the strut 115 and the device base 171.
The tile leveling device 100 further includes a leveling stage 113. The leveling stage 113 is disposed on a proximal surface of the device base 171. The leveling stage 113 may receive a tile. The cross piece 110, the two struts 115, and the leveling stage 113 form the tension gap 125.
The tile leveling device 100 may include a break ridge 193 that extends in the proximal direction 151 from the device base 171 and/or base triangle 117 base triangle 117. The break line 141 may be along a proximal side 194 of the break ridge 193.
The leveling surface 203 is disposed on proximal surfaces 301 of first and/or second tiles 300. The tapered surface 201 may taper from a front edge 209 disposed opposite the leveling surface to the level platform 221.
The bubble level 223 may be embedded in the leveling platform 221. The bubble level 223 indicates whether the leveling platform 223 and/or the leveling surface 203 is level.
The base 120 is connected to the two struts 115 at a base intersection 173. The base 120 extends along the first traverse direction 155 and the second traverse axis 160 from the two struts 115. Each strut 115 comprises a notch 143 along a break line 141 at an outer intersection of the strut 115 and the device base 171.
The base 120 includes side edges 186 and front edges 187. In one embodiment, the base 120 includes a diagonal cutout 188. The base 120 may include leveling ridges 130 disposed on the base 120. The leveling ridges 130 may receive one or more tiles 300. The cross piece 110, the two struts 115, the base 120, and/or the leveling ridges 130 form the tension gap 125.
In one embodiment, the base 120 is connected to the two struts 115 at a base intersection 173. The device base 171 includes two side edges 186, two front edges 187, and four diagonal cutouts 188. The two side edges 186 are each perpendicular to both the two front edges 187. A diagonal cutout 188 is between each side edge 186 and front edge pair 187 at a diagonal angle and each strut 115 comprises a notch 143 along a break line 141 at an outer intersection 173.
Two leveling ridges 130 may be disposed on a proximal surface 121 of the base 120. Each leveling ridge 130 includes a platform 196 perpendicular to the first axis 145 and/or the two struts 115. The two platforms 196 may form the tension gap 125. Each platform 196 extends unbroken through the tension gap 125. Each leveling ridge 130 may include leveling ramps 195 that slope from the platform 196 along the traverse axis 160 to the proximal surface 121.
The device base 171 is connected to the two struts 115 at a base intersection 173. The device base 171 extends along the traverse axis 160 from the two struts 115. Each strut 115 comprises a notch 143 along a break line 141 at an outer intersection of the strut 115 and the device base 171.
The device base 171 includes side edges 186 and front edges 187. In one embodiment, the device base 171 includes a diagonal cutout 188.
The tile leveling device 100 includes the leveling stage 113 disposed on the device base 171. The leveling stage 113 may receive one or more tiles 300. The cross piece 110, the two struts 115, and the leveling stage 113 form the tension gap 125.
In one embodiment, the leveling stage 113 includes two recesses 191 extending in the first traverse direction 155 and the second traverse direction 160 respectively. The recesses 191 may receive mortar while leveling the one or more tiles 300.
The diagonal angle 192 is shown. The diagonal angle 192 may be in the range of 40 to 50 degrees. In one embodiment, the diagonal angle 192 is in the range of 25 to 65 degrees. A platform width 178 is shown. A diagonal cutout length 198 may be greater than a side edge length 199. The diagonal cutout length 198 may be greater than half side edge length 199. In one embodiment, the diagonal cutout length 198 is less than the side edge length 199. The diagonal cutout length 198 may be less than half side edge length 199.
The diagonal cutout length 198 may be greater than a front edge length 176. The diagonal cutout length 198 may greater than a half the front edge length 176. The diagonal cutout length 198 may less than a front edge length 176. The diagonal cutout length 198 may less than a half the front edge length 176.
A platform gap 152 between the two platforms 130 may greater than twice the platform width 178. In addition, the platform gap 152 between the two platforms 130 may greater than the platform width 178.
In one embodiment, each base 101 includes base rails 168. Each base rail 168 may have a rail height that is equal to a base height.
Each base 101 may have leveling ramps 195 that slope down along the traverse axis 160.
Each base 101 has a base length 166. The base length 166 may be greater than the base gap 165. The base length 166 may be in the range of 1.8 to 4 times the base gap 165. The base length 166 may be 2.1 times the base gap 165.
Embodiments may be practiced in other specific forms. The described embodiments are to be considered in all respects only as illustrative and not restrictive. The scope of the invention is, therefore, indicated by the appended claims rather than by the foregoing description. All changes which come within the meaning and range of equivalency of the claims are to be embraced within their scope.
This application is a continuation-in-part of and claims priority to U.S. patent application Ser. No. 17/121,656 entitled “TILE LEVELING TENSIONER” filed Dec. 14, 2020 for Raunier Mendiluza, which is incorporated herein by reference and which is a continuation-in-part of and claims priority to U.S. patent application Ser. No. 16/627,686 entitled “TILE LEVELING DEVICE” filed on Dec. 23, 2019 for Raunier Mendiluza, which is incorporated herein by reference, and which is a US nationalization of and claims priority to PCT Application PCT/US18/26225 entitled “TILE LEVELING DEVICE” filed on Apr. 5, 2018 for Eventile, Inc., which is incorporated herein by reference.
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Number | Date | Country | |
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Parent | 17121656 | Dec 2020 | US |
Child | 17820038 | US | |
Parent | 16627686 | US | |
Child | 17121656 | US |