Tissue treatment method

Abstract

A method for skin treatment comprises the steps of delivering at least one pulse of radio frequency power to at least one electrode in order to create an electric field; passing gas through the electric field in order to form plasma from the gas; and applying the plasma to the surface of skin. The amount of radio frequency power may be relatively low such that the application of plasma causes denaturation of collagen within the collagen-containing tissue beneath the skin surface, which may promote the generation of new collagen within the collagen-containing tissue.

Description

BACKGROUND OF THE INVENTION

1. Field of Invention

This invention relates to tissue resurfacing, for example, skin resurfacing, or the resurfacing or removal of tissue located within, e.g., the alimentary canal, respiratory tracts, blood vessels, uterus or urethra. The invention is also directed to skin treatments that cause the denaturation of collagen under the surface of skin.

2. Description of Related Art

Human skin has two principal layers: the epidermis, which is the outer layer and typically has a thickness of around 120μ in the region of the face, and the dermis, which is typically 20-30 times thicker than the epidermis, and contains hair follicles, sebaceous glands, nerve endings and fine blood capillaries. By volume the dermis is made up predominantly of the protein collagen.

A common aim of many cosmetic surgical procedures is to improve the appearance of a patient's skin. For example, a desirable clinical effect in the field of cosmetic surgery is to provide an improvement in the texture of ageing skin and to give it a more youthful appearance. These effects can be achieved by the removal of a part or all of the epidermis, and on occasions part of the dermis, causing the growth of a new epidermis having the desired properties. Additionally skin frequently contains scar tissue, the appearance of which is considered by some people to be detrimental to their attractiveness. The skin structure that gives rise to scar tissue is typically formed in the dermis. By removing the epidermis in a selected region and resculpting the scar tissue in the dermis it is possible to improve the appearance of certain types of scars, such as for example scars left by acne. The process of removing epidermal and possibly dermal tissue is known as skin resurfacing or dermabrasion.

One known technique for achieving skin resurfacing includes the mechanical removal of tissue by means of an abrasive wheel, for example. Another technique is known as a chemical peel, and involves the application of a corrosive chemical to the surface of the epidermis, to remove epidermal, and possibly dermal skin cells. Yet a further technique is laser resurfacing of the skin. Lasers are used to deliver a controlled amount of energy to the epidermis. This energy is absorbed by the epidermis causing necrosis of epidermal cells. Necrosis can occur either as a result of the energy absorption causing the temperature of the water in the cells to increase to a level at which the cells die, or alternatively, depending upon the frequency of the laser light employed, the energy may be absorbed by molecules within the cells of the epidermis in a manner that results in their dissociation. This molecular dissociation kills the cells, and as a side effect also gives rise to an increase in temperature of the skin.

Typically during laser resurfacing a laser beam is directed at a given treatment area of skin for a short period of time (typically less than one millisecond). This can be achieved either by pulsing the laser or by moving the laser continuously and sufficiently quickly that the beam is only incident upon a given area of skin for a predetermined period of time. A number of passes be may made over the skin surface, and dead skin debris is usually wiped from the skin between passes. Lasers currently employed for dermabrasion include a CO 2 laser, and an Erbium-YAG laser. The mechanisms by which energy is absorbed by the tissue causing it to die, and the resultant clinical effects obtained, such as the depth of tissue necrosis and the magnitude of the thermal margin (i.e., the region surrounding the treated area that undergoes tissue modification as a result of absorbing heat) vary from one laser type to another. Essentially, however, the varying treatments provided by these lasers may be considered as a single type of treatment method in which a laser is used to impart energy to kill some or part of the epidermis (and depending upon the objective of the treatment, possibly part of the dermis), with the objective of creating growth of a new epidermis having an improved appearance, and also possibly the stimulation of new collagen growth in the dermis.

Another known way to provide an improvement in the appearance skin is to achieve skin tightening through the partial denaturation of collagen in the dermis under the surface of skin. U.S. Pat. Nos. 5,755,753 and 5,948,011 to Knowlton describe a method for achieving skin tightening by applying radiant energy through the skin to underlying collagen tissue without substantially modifying melanocytes and other epithelial cell in the epidermis. In these patents, this effect is achieved by applying the radiant energy through an electrolytic solution while simultaneously using a cooling fluid to cool the surface, thus creating a reverse thermal gradient, which cools the surface while heating the underlying collagen-containing layer.

Other prior art references of background interest to the present invention include U.S. Pat. No. 3,699,967 (Anderson), U.S. Pat. No. 3,903,891 (Brayshaw), U.S. Pat. No. 4,040,426 (Morrison), U.S. Pat. No. 5,669,904, WO95/0759, WO95/26686 and WO98/35618.

SUMMARY OF THE INVENTION

The present invention provides an alternative to known tissue treatment techniques, apparatus and methods of operating such apparatus.

According to a first aspect of the present invention, a tissue resurfacing system comprises: a surgical instrument having a gas conduit terminating in a plasma exit nozzle, and an electrode associated with the conduit, and a radio frequency power generator coupled to the instrument electrode and arranged to deliver radio frequency power to the electrode in single or series of treatment pulses for creating a plasma from gas fed through the conduit, the pulses having durations in the range of from 2 ms to 100 ms.

The application of an electric field to the gas in order to create the plasma may take place at any suitable frequency, including the application of standard electrosurgical frequencies in the region of 500 kHz or the use of microwave frequencies in the region of 2450 MHz, the latter having the advantage that voltages suitable for obtaining the plasma are more easily obtained in a complete structure. The plasma may be initiated or “struck” at one frequency, whereupon optimum power transfer into the plasma may then take place at a different frequency.

In one embodiment a radio frequency oscillating voltage is applied to the electrode in order to create a correspondingly oscillating electric field, and the power transferred to the plasma is controlled by monitoring the power reflected from the electrode (this providing an indication of the fraction of the power output from the power output device that has been transferred into the plasma), and adjusting the frequency of the oscillating voltage from the generator accordingly. As the frequency of the oscillating output from the generator approaches the resonant frequency of the electrode (which is affected by the presence of the plasma), the power transferred to the plasma increases, and vice versa.

Preferably, in this embodiment, a dipole electric field is applied to the gas between a pair of electrodes on the instrument, which are connected to opposing output terminals of the power output device.

In an alternative aspect of the invention a DC electric field is applied, and power is delivered into the plasma from the DC field.

The gas employed is preferably non-toxic, and more preferably readily biocompatible to enable its natural secretion or expulsion from the body of the patient. Carbon dioxide is one preferred gas, since the human body automatically removes carbon dioxide from the bloodstream during respiration. Additionally, a plasma created from carbon dioxide is hotter (albeit more difficult to create) than a plasma from, for example, argon, and carbon dioxide is readily available in most operating theatres. Nitrogen or even air may also be used.

According to another aspect of the invention, a gas plasma tissue resurfacing instrument comprises: an elongate gas conduit extending from a gas inlet to an outlet nozzle and having a heat resistant dielectric wall; a first electrode located inside the conduit; a second electrode located on or adjacent an outer surface of the dielectric wall in registry with the first electrode; and an electrically conductive electric field focussing element located inside the conduit and between the first and second electrodes.

The system described hereinafter has the benefit of being able to produce rapid treatment at the tissue surface while minimising unwanted effects, e.g., thermal effects, at a greater than required depth.

A further aspect of the present invention provides a skin treatment method comprising generating at least one pulse of a hot gas and applying the at least one pulse of hot gas to the surface of skin. In embodiments, the hot gas is at a temperature between 800 and 1200° C. In embodiments, the hot gas is a plasma. In a particular embodiment, the method comprises delivering at least one pulse of power, which may be radio frequency power, to at least one electrode in order to create an electric field; passing gas through the electric field in order to form hot gas, particularly plasma, from the gas; and applying the hot gas, particularly plasma, to the surface of skin. In an embodiment thereof, the method is a method of skin resurfacing at least the epidermis of a patient using a surgical system comprising an instrument having an electrode connected to a power output device, the method comprising the steps of: operating the power output device to create an electric field in the region of the electrode; directing a flow of gas through the electric field, and generating, by virtue of the interaction of the electric field with the gas, a plasma; controlling power transferred into the plasma from the electric field; directing the plasma onto the tissue for a predetermined period of time, and vaporising at least a part of the epidermis as a result of the heat delivered to the epidermis from the plasma.

Different amounts of energy can be delivered to the surface of the skin, either by varying the energy delivered by the power output device, or by varying the length of time for which the energy is delivered. Whichever method is used to vary the delivered energy, the device can be used at “energy settings” up to about 10 Joules. However, it was found that at lower energy settings, such as settings between 1 and 3.5 Joules, although some surface ablation may still occur, the more significant effect is that collagen under the epidermis is denatured. In particular, in embodiments, the entire epidermis at the site of application is not removed by the hot gas or plasma. The immediate effect of this is that the collagen is rendered non-viable, although it retains its structural integrity. The dead collagen is then replaced over a period of several days, weeks, or even months with new collagen growth, resulting in an improvement to the appearance of skin. Thus, in embodiments of the invention, the method of skin treatment comprises delivering at least one pulse of radio frequency power at a relatively low energy setting to at least one electrode in order to create an electric field; passing gas through the electric field in order to form plasma from the gas; and applying the plasma to the surface of skin. In this embodiment, the energy setting may be from 1 to 3.5 Joules, preferably from 2.0 to 3.0 Joules. Alternatively, the amount of energy may be measured based on the energy density delivered to the skin by the plasma. When the amount of energy is measured in this way, in embodiments the power setting results in plasma that applies a pulse of energy of between 0.5 and 3.5 Joules per square centimeter of skin, preferably between 1.5 and 3.0 Joules per square centimeter of skin.

In embodiments of the invention, the electric field is created in a gas conduit. In this embodiment, gas is passed through the gas conduit towards an exit nozzle. The electric field in the gas conduit forms a pulse of hot gas, particularly a plasma, from the gas, which exits the exit nozzle towards the surface of the skin.

In embodiments of the invention, a series of pulses of hot gas, particularly a series of pulses of plasma, are applied to a series of regions of the skin surface. These regions of the skin surface may overlap. In particular embodiments, one of the series of pulses of hot gas, particularly of plasma, is applied to each of the regions of the skin surface. In alternative embodiments, at least two pulses of hot gas, particularly of plasma, are applied to each of the regions. The at least two pulses may be applied consecutively to each region. Alternatively, a single pulse may be applied to each region and then an additional pulse may be applied to each region.

The invention also provides, according to a further aspect, a tissue resurfacing system comprising: a plasma treatment instrument having a gas conduit terminating in a plasma exit nozzle, and an electrode associated with the conduit, and a radio frequency power generator coupled to the instrument electrode and arranged to deliver radio frequency power to the electrode in a single or series of treatment pulses each comprising a burst of radio frequency oscillations, the generator including a controller that operates to control the width of the treatment pulses to a predetermined width. The controller is preferably arranged to adjust the treatment pulse width by generating corresponding control pulses that are fed to a radio frequency power stage of the generator to alter the level of the power stage output from a substantially quiescent level to a predetermined, preferably constant, output power level for time periods each equal to a demanded pulse width, whereby a gas plasma is produced for such time periods. The time periods and/or the power level may be adjusted by the controller to yield metered treatment pulses for the instrument each having a predetermined total energy content.

It is possible, within the scope of the invention, for the radio frequency power output to be modulated (100% modulation or less) within each treatment pulse.

Treatment pulse widths of from 2 ms to 100 ms are contemplated, and are preferably within the range of from 3 ms to 50 ms or, more preferably, from 4 ms to 30 ms. In the case where they are delivered in series, the treatment pulses may have a repetition rate of 0.5 Hz to 10 Hz or 15 Hz, preferably 1 Hz to 6 Hz.

From an instrument aspect, the invention also provides a gas plasma tissue resurfacing instrument comprising an elongate gas conduit extending from a gas inlet to a plasma exit nozzle, at least a pair of mutually adjacent electrodes for striking a plasma from gas within the conduit, and, between the electrodes, a solid dielectric wall formed from a material having a relative dielectric constant greater than unity (preferably of the order of 5 or higher). Advantageously the conduit is formed at least in part as a dielectric tube of such material, the electrode comprising an inner electrode inside the tube and a coaxial outer electrode surrounding the tube.

Other aspects of the invention include the following.

A method of operating a surgical system is provided comprising a power output device that generates an output signal at an output terminal, a controller capable of receiving input signals from a user and controlling the power output device accordingly, an instrument having at least one electrode connected to the generator output terminal via a feed structure, a supply of gas and a further feed structure for conveying the gas from the supply to the instrument, the method comprising the steps of: receiving input signals from a user, and operating the controller to determine from the user input signals a manner in which the power output device is to be controlled; operating the power output device to supply a voltage to the at least one electrode, thereby to create an electric field in the region of the electrode; passing gas through the electric field, and creating by virtue of the intensity of the electric field a plasma from the gas; and controlling, in accordance with the user input signals to the controller, the power output device to control the power delivered into the plasma. The controller may operate to control the power output device to deliver a predetermined level of energy into the plasma, and the controller may further control the rate of flow of gas through the electric field.

The gas preferably comprises molecules having at least two atoms.

There is also provided a surgical system for use in tissue resurfacing comprising: a user interface that receives input signals from a user relating to desired performance of the system; a power output device that generates a voltage output signal at an output terminal; a gas supply; an instrument having an electrode connected to the output terminal of the power output device thereby to enable the generation of an electric field in the region of the electrode when the power output device is operated to produce an output voltage at the output terminal, the instrument additionally being connected to the gas supply and further comprising a conduit for passing gas from the supply through the electric field in the region of the electrode to create a plasma; and a controller that is connected to the user interface and the power output device, the controller being adapted to receive and process signals from the user interface and to control, on the basis of the user interface signals, the delivery of power from the power output device into the plasma. The controller may be additionally adapted to control the time period over which power is delivered into the plasma.

User interface signals from the user interface to the controller may relate to a total amount of energy to be delivered into the plasma. The system may further comprise a gas flow regulator connected to the controller, the controller being additionally adapted to control to a rate of flow of gas from the supply. The controller may receive feedback signals indicative of power delivered to the plasma.

The power output device may include a tunable oscillator, and the controller being connected to the oscillator to tune the oscillator on the basis of feedback signals indicative of power attenuated within the instrument. Typically, the output frequency of the oscillator lies within the band of 2400-2500 MHz.

A method is provided for operating a surgical system comprising a power output device that produces an oscillating electrical output signal across a pair of output terminals, an instrument having a pair of electrodes each of which is connected to one of the output terminals of the power output device, a controller that receives input signals from a user interface and controls the power output device accordingly, and a supply of gas connected to the instrument, wherein the method comprises the steps of: operating the power output device to apply an oscillating voltage across the electrodes of the instrument, thereby to create an electric field in the region of the electrodes; passing gas through the electric field and striking a plasma between the electrodes of the instrument; and operating the controller to control the power delivered into the plasma from the power output device.

A surgical system is provided comprising: a power output device that generates a radio frequency oscillating output signal across a pair of output terminals; an instrument having a first pair of electrodes connected to respective output terminals of the power output device and that are part of a first resonant assembly that is resonant at a predetermined frequency, and a second pair of electrodes connected to respective output terminals of the power output device and that are part of a second resonant assembly that is also resonant at the predetermined frequency; a gas supply that supplies gas to the oscillating electric field between the first pair of electrodes and to the oscillating electric field between the second pair of electrodes; wherein the first resonant assembly is resonant at the predetermined frequency prior to formation of a plasma from the gas, and the second resonant assembly is resonant at the predetermined frequency subsequent to the generation of a plasma. In such a system the first pair of electrodes may comprise an inner electrode and an outer electrode extending substantially coaxially with, and around the inner electrode, and the second pair of electrodes may comprise a further inner electrode and said outer electrode. The system may operate such that, during resonance of the first resonant structure, a potential difference is created between the inner electrode and the further inner electrode, and a plasma is initially struck between the inner electrode and the further inner electrode as a result of the potential difference.

A further aspect of the invention includes a surgical system comprising: a power output device that generates a radio frequency oscillating output signal across a pair of output terminals; an instrument having a pair of electrodes connected to respective output terminals of the power output device via a feed structure, to create an oscillating electric field between the electrodes; a gas supply and a conduit from the gas supply to the electric field, to enable gas passing through the electric field to be converted into a plasma and to pass out of an aperture in the instrument; wherein the instrument comprises a voltage transformation assembly providing step up of the voltage output from the power output device, and supplying the stepped-up voltage across the electrodes thereby to intensify the electric field between the electrodes. In such a system the voltage transformation assembly may comprise a structure within the instrument having a resonant frequency within the radio frequency oscillating output bandwidth. The resonant structure may comprise at least one length of transmission line having an electrical length equal to one quarter of a wavelength of the oscillating output signal of the power output device.

Another aspect of the invention provides a surgical instrument comprising: a pair of electrodes; a connector connectible to a feed structure, thereby to enable a signal from a generator to be conveyed to the electrodes; at least a first section of transmission line electrically connected to the electrodes and to the feed structure, the section of transmission line having an electrical length substantially equal to one quarter of a wavelength of an electromagnetic wave having a frequency in the range 2400 MHz to 2500 MHz. This instrument may further comprise a second section of transmission line electrically connected to the connector and to the first section of transmission line, the further section of transmission line having an electrical length substantially equal to the length of the first section of transmission line, wherein the characteristic impedances of the first and second sections of transmission line are different, the first and second sections of transmission line forming an impedance matching assembly between a relatively low characteristic impedance of a feed structure which is connectable to the instrument via the connector and a relatively high impedance electrical load provided by a plasma formed between the electrodes.

There is also provided a surgical instrument comprising: a pair of electrodes separated from each other; a connector for connecting an electrical signal from a feed structure to the electrodes thereby to enable the creation of an electric field between the electrodes; a gas inlet port; a gas conduit for conveying gas from the inlet port to the electrodes thereby to allow gas to pass between the electrodes to enable the creation of a plasma between the electrodes when an electric field is applied between them; and an aperture in the instrument through which plasma may be expelled under pressure of gas passing along the gas conduit. In such an instrument, gas pressure within the conduit may force plasma out of the aperture in a first direction, and the electrodes may be spaced apart at least in the first direction.

Yet a further aspect includes a surgical instrument comprising: a connector having a pair of electrical terminals; a first pair of electrodes provided by an inner electrode and an outer electrode extending coaxially around the inner electrode; a second pair of electrodes provided by a further inner electrode and said outer electrode, the first and second pairs of electrodes being electrically connectable via the connector to a generator to enable creation of an electric field between the inner and outer electrodes and the further inner and outer electrodes respectively; a gas inlet port, and a conduit for conveying gas from the inlet port through the electric field thereby to enable the formation of a plasma from the gas; the first pair of electrodes forming at least a part of a first resonant assembly, and the second pair of electrodes forming at least a part of a second resonant assembly, the first and second resonant assemblies being resonant at different frequencies prior to the formation of a plasma, thereby to enable, prior to the formation of a plasma, the creation of an electric field between the inner and further inner electrodes which may be used to strike a plasma.

There is also provided a method of operating a surgical instrument having first and second pairs of electrodes, the electrodes of each pair being connected to different output terminals of a power output device which generates an oscillating electrical output signal, the method comprising the steps of: operating the power output device to apply an oscillating electrical signal to the first and second pairs of electrodes; causing resonance of a resonant assembly of which the first pair of electrodes form at least a part; creating, by virtue of the resonance, a potential difference and thus an electric field between an electrode of the first pair of electrodes and an electrode of the second pair of electrodes; passing a gas through the electric field and, by virtue of interaction between the electric field and the gas, forming a plasma. The electrodes between which the electric field is created may both be connected to the same output terminal of the power output device. Generally, the formation of a plasma results in a change of electrical characteristics of the second pair of electrodes such that they are at least a part of a further resonant assembly which is resonant at the frequency of the oscillating electrical output signal, the method then further comprising the step, subsequent to the formation of a plasma, of causing resonance of the further resonant assembly to create an electric field of sufficient intensity between the second pair of electrodes to maintain the plasma, and delivering power into the plasma from the oscillating output signal.

Yet another aspect of the invention is a method of operating a surgical instrument having first and second pairs of electrodes, the electrodes of each pair being connected to different output terminals of a power output device which generates an oscillating electrical output signal, the method comprising the steps of: operating the power output device to apply an oscillating electrical signal to the first pair of electrodes; applying the oscillating electrical output signal to the first pair of electrodes; causing resonance of a first resonant assembly of which the first pair of electrodes forms a part, and creating an electric field during resonance of the first resonant assembly; passing gas through the electric field, and forming, by virtue of interaction between the electric field and the gas, a plasma; subsequent to the formation of a plasma, applying the oscillating electrical output signal to the second pair of electrodes and causing resonance of a second resonant assembly of which the second pair of electrodes form a part, and maintaining the plasma by delivering into the plasma via the second pair of electrodes, power from the oscillating output signal. The oscillating output signal may remain substantially constant. The first and second pairs of electrodes may be distinct, or they may have an electrode common to both. The electric field is preferably formed between the first pair of electrodes, but may be formed between an electrode of the first pair of electrodes and an electrode of the second pair of electrodes, in which case the electric field may be formed between two electrodes, both of which are connected to the same output terminal of the power output device.

As a result, in the preferred method, the plasma causes necrosis of living epidermal cells and vaporisation of dead epidermal cells, and where required, produces effects in the dermis.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of example and with reference to the accompanying drawings, in which:

FIG. 1 is a schematic drawing illustrating the principle underlying a surgical system for skin resurfacing according to the present invention;

FIG. 2 is a longitudinal cross-section of a surgical instrument for use in a system in accordance with the present invention;

FIG. 3 is a detail of FIG. 2 ;

FIG. 4 is a schematic illustration of a generator used in conjunction with the instrument of FIGS. 2 and 3 ;

FIG. 5 is a graph showing reflected power as a function of operating frequency;

FIG. 6 is a cross-section showing a modification of part of the instrument shown in FIG. 3 ;

FIG. 7 is a schematic drawing of an alternative generator including a magnetron;

FIG. 8 is a more detailed block diagram of a generator including a magnetron;

FIG. 9 is a circuit diagram of an inverter unit of the generator of FIG. 8 ;

FIG. 10 is a graph illustrating the switch-on characteristics of the magnetron in the generator of FIG. 8 ;

FIG. 11 is a block diagram of an outer power control loop of the generator of FIG. 8 ;

FIG. 12 is a block diagram of intermediate and inner power control loops of the generator of FIG. 8 ;

FIG. 13 is a cross section of a UHF isolator forming part of the generator of FIG. 8 ;

FIG. 14 is a section through an embodiment of instrument suitable for use with the generator of FIG. 7 ;

FIG. 15 is a graph of reflected power versus frequency for the instrument of FIG. 14 when employed with the generator of FIG. 7 ;

FIG. 16 is a section through a further embodiment of instrument;

FIG. 17 is a graph of reflected power versus frequency in the instrument of FIG. 16 ;

FIG. 18 is a schematic illustration of a further embodiment of instrument.

FIG. 19 is a cut-away perspective view of another alternative instrument;

FIG. 20 is a longitudinal cross-section of part of the instrument of FIG. 19 ;

FIG. 21 is a photograph of PSR treatment at 2.0 Joules at day 0 (original magnification ×100), with the white arrows showing raised features of thermally denatured collagen and the black arrow showing lower epidermal cellular cytoplasmic vacuolation;

FIG. 22 is a photograph of PSR treatment at 2.0 Joules at day 7 (original magnification ×100), with the black arrows showing flattening of thermally denatured collagen and the white arrows showing the remaining raised denatured collagen;

FIG. 23 is a photograph of PSR treatment at 2.0 Joules at day 14 (original magnification ×100), showing a normal dermis under a fully regenerated epidermis;

FIG. 24 is a photograph of PSR treatment at 3.0 Joules at day 0 (original magnification ×100), with the black arrows showing a continuous undulating band of thermally denatured collagen and the white arrow showing sub-epidermal clefting prior to epidermal loss;

FIG. 25 is a photograph of PSR treatment at 2.5 Joules at day 2 (original magnification ×100), with the black arrows showing flattening of previously raised, thermally denatured collagen and the white arrow showing the removal of the epidermis;

FIG. 26 is a photograph of PSR treatment at 2.5 Joules at day 7 (original magnification ×100), showing a normal dermis under a fully regenerated epidermis;

FIG. 27 is a photograph of PSR treatment at 3.0 Joules at day 7 (original magnification ×200), with the white arrows showing very small single fiber, neocollagenesis in a previously totally denatured band, which is under a regenerating epidermis;

FIG. 28 is a photograph of PSR treatment at 3.5 Joules at day 2 (original magnification ×100), with the black arrow showing a band of thermally denatured dermal collagen and the white arrow showing an ablated epidermis;

FIG. 29 is a photograph of PSR treatment at 3.5 Joules at day 7 (original magnification ×100), with the black arrow showing a band of thermally denatured collagen and the white arrow showing an ablated and removed epidermal layer;

FIG. 30 is a photograph of PSR treatment at 3.5 Joules at day 14 (original magnification ×100), with the white arrows showing areas of neocollagenesis under a fully regenerated epidermis;

FIG. 31 is a photograph of laser treatment at high fluence at day 14, showing considerable thermal denaturation of collagen to almost total dermal thickness under a highly regenerative but very disrupted epidermis;

FIG. 32 is a photograph of PSR treatment at 4.0 Joules at day 2 (original magnification ×100), with the white arrow showing a band of thermally denatured collagen under a totally ablated and removed epidermis;

FIG. 33 is a photograph of PSR treatment at 4.0 Joules at day 7 (original magnification ×100), with the white arrow showing a band of thermally denatured collagen with some granulation tissue present at an upper aspect;

FIG. 34 is a photograph of PSR treatment at 4.0 Joules at day 14 (original magnification ×100), with the white arrows showing areas of neocollagenesis under a highly regenerative but disrupted epidermis;

FIG. 35 is a top view (not to scale) of concentric copper discs used in the “copper disc test”;

FIG. 36 is a side view (not to scale) of the device in FIG. 35 ;

FIG. 37 is an enlarged view (not to scale) of a portion of the device in FIG. 36 ;

FIG. 38 depicts the system (not to scale) used for the “copper disc test”;

FIG. 39 shows the depth of visible denatured collagen over time using the present invention; and

FIG. 40 shows the depth of visible denatured collagen over time using a laser.

DEFINITION

The amount of energy applied to the surface of skin by the pulse or pulses of hot gas, particularly plasma, may be measured by the “copper disc test.” As used herein, the “copper disc test” refers to the following test, which determines the energy density applied to the surface of skin by a plasma (or hot gas) instrument and is not dependent on the particular design or application to tissue. This definition refers to a plasma instrument and the plasma generated thereby. However, the definition also applies to systems that generate hot gas. The “copper disc test” sets forth the way in which the device used in the Examples below was calibrated so that it can be compared to other devices. The energy density of a particular device can, of course, be measured in other ways. However, this test provides a reproducible way of determining whether a system will function according to the present invention.

According to the “copper disc test,” the plasma produced by the instrument is used to heat a small copper disc positioned within a larger copper disc but insulated from it. The maximum temperature rise on the disc is recorded for each setting of the plasma generating system with the instrument positioned over the disc in the same way as the instrument would be positioned over tissue to achieve the desired clinical effect. The temperature rise, for all other factors being equal, will depend on the energy density transfer to the small disc and the time over which the transfer occurred. The temperature rise to its maximum occurs within 40 ms of the application of the plasma to the disc.

The system used for “copper disc test” is depicted in FIGS. 35 to 38 , which are further described in the following Tables:

TABLE IA
Figure	Part		Supplier	Dimensions
Reference	Description	Material	Specification	mm	Notes
1	Plastic Base	Black Acetal	BASF Ultraform	75 × 75 square
			Copolymer Acetal	25 thick,
			Black Plate	tolerance +/−0.2.
				Central hole 2.0
				+/−0.1 diameter
2	Small copper	Copper	HDHC	3.0 diameter,
	disc		BS2874/C101	0.64 thick
			grade bar	tolerance +/−, 0.1
3	Large copper	Copper	Alloy 110 Sheet,	50.0 diameter,
	disc		99.9% minimum	0.64 thick
			copper	tolerance +/−, 0.1
				Central hole 3.4
				+/−0.05 diameter
8	T-type	Copper/	Labfacility	Length,
	Thermocouple	Copper-	Temperature	nominally
		Nickel with	Technology-	1 meter
		PTFE	1/0.2 mm
		insulation	diameter, Class 1
			tolerance XF-244
			Type T.
			Farnell Part No.
			335-8173

TABLE IB
Figure	Part		Supplier	Dimensions
Reference	Description	Material	Specification	mm	Notes
9	Solder &	Tin/Lead	Multicore	Weight of	Weight of
	soldering		ERSIN 362,	small copper	parts
	operation		Order code 419	disc only =	measured
			333. 60/40	0.038 g	using
			Tin/Lead,	Weight with	electronic
			0.9 mm	solder applied	scales
			diameter	prior to	GML 673
				fixing =	Net weight
				0.67 g	of disc and
				Weight of	solder =
				thermocouple	0.055 g
				lead before
				soldering =
				1.407 g
				Weight of
				finished
				assembly after
				removal of
				excess solder
				to allow
				proper
				assembly into
				the plastic
				base = 1.462 g
4, 5	Upper surfaces	3M			3M 7447
	of small and	Scotch-			Hand-pad
	large copper	bright			Maroon
	discs rubbed	Hand-pad
	with abrasive
	to give a
	uniform finish.

The diameter of the disc is specified and its weight after assembly is known (0.055 g, comprising 0.038 g copper and the remainder comprising solder) and so the thermal characteristics are determined and repeatable.

Referring to FIGS. 35-37 , the plastic base ( 1 ) supports the small copper disc ( 2 ). Surrounding the small disc ( 2 ) is a larger disc ( 3 ) which is placed concentrically about the small disc ( 2 ) and whose upper surface ( 4 ) is flush with the upper surface ( 5 ) of the small disc ( 2 ). The plastic base ( 1 ) is recessed so that both upper surfaces of the two discs ( 2 ) and ( 3 ) are flush with the upper surface of the plastic base ( 1 ). The gap ( 6 ) between the outer edge of the small disc ( 2 ) and inner edge of the larger disc ( 3 ) is about 0.2 mm and is sufficient to ensure thermal isolation between the two discs ( 2 ) and ( 3 ). Both upper surfaces ( 4 ) and ( 5 ) are flush with the upper surface ( 7 ) of the plastic base ( 1 ).

The junction of a T-type thermocouple ( 8 ) is soldered ( 9 ) to the lower surface ( 10 ) of the small disc ( 2 ). The mass of the disc and solder is known through weighing parts before and after assembly of the thermocouple to the small disc ( 2 ). The thermocouple ( 8 ) is positioned during soldering so that the tip of the thermocouple is in contact with the underside of the small disc ( 2 ) at the center of the disc ( 2 ) and positioned normally to the disc as indicated in the FIGS. 36 and 37 . Flux residue is removed after assembly using a suitable solvent.

The larger disc ( 3 ) and small disc ( 2 ) are held in position by a small amount of adhesive between their lower surfaces and the upper surface of the base. The wires of the thermocouple ( 8 ) pass through the plastic base ( 1 ) via a conduit ( 11 ) and, as depicted in FIG. 38 , are connected to suitable temperature indication equipment ( 12 ) suitable for operation with a T-type thermocouple.

Since the temperature rise immediately following activation of the instrument and plasma generation will vary with time, the measuring equipment must be able to indicate the temperature at the thermocouple tip essentially ‘instantaneously’ so that the maximum can be determined. The temperature indication equipment used comprised a conditioning circuit based on an Analog Device “AD595AQ Monolithic Thermocouple Amplifier with Cold Junction Compensation” (One Technology Way, Northwood, Mass. 02062-9106 USA) (see Datasheet of the same name, Rev C 1999), together with an oscilloscope. The conditioning circuit was assembled onto a piece of plain copper pcb type material approximately 80 mm square with the copper forming the OV and ‘Common’ ground plane connection for the circuit. The T-type thermocouple wire is connected directly to pins 1 and 14 of the AD595. A PP3 type 9 V battery was used to power the device and the voltage was checked during operation to ensure that the supply voltage was within the range specified by the manufacturer. A 100 nF ceramic plate capacitor was connected between pin 1 of the AD595 and the copper ground plane and between the supply positive input to pin 11 and the copper ground plane.

Calibration error of the AD595 device is quoted as +/−3° C. However, since measurements were taken that determined the temperature rise over ambient (the ambient was subtracted from the maximum), the stability vs. temperature and gain error only are pertinent. These are specified as +/−0.05° C./° C. and +/−1.5% respectively. Since the maximum temperature rise indicated by the thermocouple was circa 25° C. with an ambient of about 24° C., and the AD595 circuitry was kept at ambient, the errors in the temperature rise due to the AD595 are due to gain errors only and calculated to be +/−0.38° C. In addition, the datasheet for the AD595 quotes a maximum 0.2° C. error for the AD595 when a T-type thermocouple is used in place of a K-type for measurement of temperatures between 0 and 50° C. The maximum error is therefore +/−0.58° C. The T-type thermocouple used is quoted as having an accuracy of +/−0.5° C. across the temperature range used.

The output from the AD595 was taken from pins 8 and 9 (connected together as specified in the datasheet) with the copper ground plane taken as the 0 V reference and connected, via a 1:1 probe to a calibrated digital oscilloscope type Yokogawa DL1540 (Gyrus reference GML1578) which enables measurement cursors to be set and a print out of the display to be made. Output of the AD595 is 10 mV/° C., therefore the temperature is derived by dividing the indicated voltage by 10 mV (e.g., 243 mV corresponds to 24.3° C.). The signal average (judged by eye) was taken, the peak to peak noise being typically 12 mV (or 1.2° C.).

Referring to FIG. 38 , the jig ( 14 ) was positioned on a level horizontal surface away from draughts in an indoor environment with an ambient temperature of between +20 and +25° C. There were no radiating heat sources or other sources of interference that might have affected the accuracy of the measurements made with the jig.

The instrument ( 13 ) belonging to the system to be characterized was positioned and held steady over the jig ( 14 ) as if the upper surface of the jig were the tissue to be treated. The temperature of the disc ( 2 ) as indicated by the meter ( 12 ) was allowed to steady at the local ambient temperature. With the system ( 15 ) set to the required energy output, the system was activated to produce a single pulse (or series of pulses if this was the intended method of tissue treatment for each area of tissue) of plasma directed at the small disc ( 2 ). The maximum temperature rise was then recorded. The instrument ( 13 ) is re-positioned if necessary to produce a maximum whilst maintaining the intended separation and orientation with respect to the upper surface of the jig.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Referring to FIG. 1 , the principle of operation of embodiments of the invention will now be described. A surgical system comprises a generator 4 which includes a power output 6 , typically in the form of an oscillator and an amplifier, or a thermionic power device, and a user interface 8 and a controller 10 . The generator produces an output which is coupled via a feed structure including a cable 12 to an electrode 14 of an instrument 16 . The system further includes a supply 18 of gas, which is supplied to the instrument by means of a pipe 20 . The gas is preferably a gas that enables relatively high energy to be delivered to the tissue per unit energy delivered into the gas at the instrument. Preferably the gas should include a diatomic gas (or gas having more than two atoms), for example, nitrogen, carbon dioxide or air. In use, the generator operates to establish an electric field in the region of the tip 22 of the electrode. Gas from the supply 18 is passed through the electric field. If the field is sufficiently strong, it will have the effect of accelerating free electrons sufficiently to cause collisions with the gas molecules, the result of which is either the dissociation of one or more electrons from the gas molecules to create gaseous ions, or the excitation of electrons in the gas molecules to higher energy states, or dissociation of molecules into constituent atoms, or the excitation of vibrational states in the gaseous molecules. The result in macroscopic terms is the creation of a plasma 24 which is hot. Energy is released from the plasma by way of recombination of electrons and ions to form neutrally charged atoms or molecules and the relaxation to lower energy states from higher energy states. Such energy release includes the emission of electromagnetic radiation, for example, as light, with a spectrum that is characteristic of the gas used. The temperature of the plasma depends upon the nature of the gas and the amount of power delivered to the gas from the electric field (i.e., the amount of energy transferred to a given quantity of gas).

In the preferred embodiment, a low-temperature plasma is formed in nitrogen. This is also known in the art as a Lewis-Rayleigh Afterglow and energy storage by the plasma is dominated by vibrational states of the gaseous molecule and elevated states of electrons still bound to molecules (known as “metastable states” because of their relatively long lifetime before decay to a lower energy states occurs).

In this condition the plasma will readily react, that is, give energy up due to collision, with other molecules. The plasma emits a characteristic yellow/orange light with a principle wavelength of about 580 nm.

The relatively long-lived states of the plasma is an advantage in that the plasma still contains useful amounts of energy by the time it reaches the tissue to be treated.

The resulting plasma is directed out of an open end of the instrument and towards the tissue of a patient, to cause modification or partial or total removal thereof.

Upon impact, the nitrogen plasma penetrates a short distance into the tissue and rapidly decays into a low energy state to reach equilibrium with its surroundings. Energy is transferred through collisions (thus heating the tissue) and emission of electromagnetic energy with a spectrum typically extending from 250 (yellow light) to 2500 nm (infrared light). The electromagnetic energy is absorbed by the tissue with consequent heating.

Where the system is employed for the purpose of skin resurfacing, there are a variety of skin resurfacing effects which may be achieved by the application of a plasma to the skin, and different effects are achieved by delivering different amounts of energy to the skin for different periods of time. The system operates by generating a plasma in short pulses. The various combinations of these parameters result in different skin resurfacing effects. For example, applying relatively high power in extremely short pulses (i.e., over an extremely short period of time) will result in the virtual instantaneous vaporisation of an uppermost layer of the epidermis (i.e., dissociation into tiny fragments, which in this situation are usually airborne). The high power delivery results in the vaporisation of the tissue, while the short time period over which energy is delivered prevents deeper penetration of thermally induced tissue damage. To deliver high power levels to the tissue, a high temperature plasma is required, and this can be obtained by delivering energy at a high level into a given quantity of gas (i.e., high energy over a short period of time, or high power) from the electric field. It should be noted that the temperature of the plasma decreases with increasing distance from the electrode tip, which means that the stand-off distance of the instrument from the surface of the skin will affect the temperature of the plasma incident upon the skin and, therefore, the energy delivered to the skin over a given time period. This is a relatively superficial skin resurfacing treatment, but has the advantage of extremely short healing times.

A deeper effect, caused by thermal modification and eventual removal of a greater thickness of tissue, may be obtained by delivering lower levels of power to the skin but for longer periods of time. A lower power level and, thus, a lower rate of energy delivery avoids substantially instantaneous vaporisation of tissue, but the longer period over which power is delivered results in a greater net energy delivery to the tissue and deeper thermal effects in the tissue. The resultant blistering of the skin and subsequent tissue necrosis occur over a substantially longer period of time than in the case of a superficial treatment. The most deeply penetrative skin resurfacing, which may involve a stepwise process whereby several “passes” are made over the tissue so that a given area of skin is exposed to the plasma on two or more occasions, can penetrate sufficiently deeply to cause the denaturing of collagen in the dermis. This has applicability in the removal or remodelling of scar tissue (such as that caused by acne, for example), and reduction of wrinkles. Depilation of the skin surface may also be achieved.

The system and methods of the present invention may also be used to debride wounds or ulcers, or in the treatment of a variety of cutaneous or dermatological disorders, including: malignant tumours (whether primarily or secondarily involving the skin); port wine stains; telangiectasia; granulomas; adenomas; haemangioma; pigmented lesions; nevi; hyperplastic, proliferative and inflammatory fibrous papules; rhinophyma; seborrhoeic keratoses; lymphocytoma; angiofibromata; warts; neurofibromas; condylomata; keloid or hypertrophic scar tissue.

The system and methods of the present invention also have applicability to numerous other disorders, and in this regard the ability to vary the depth of tissue effect in a very controlled manner is particularly advantageous. For example, in a superficial mode of treatment, tissue surfaces of the body other than skin may be treated, including the linings of the oropharynx, respiratory and gastrointestinal tracts in which it is desirable to remove surface lesions, such as leudoplakia (a superficial pre-cancerous lesion often found in the oropharynx), while minimising damage to underlying structures. In addition, the peritoneal surface of organs and structures within the abdomen may be a site for abnormal implantation of endometrial tissue derived from the uterus. These are often constituted by superficial plaques which may also be treated using the invention set in a superficial mode of treatment. If such lesions involve deeper layers of tissue then these may be treated my multiple applications using the invention or the depth of tissue effect may be adjusted using the control features included within the invention and which are further described herein.

By employing a system or method in accordance with the invention with a setting designed to achieve a deeper effect, tissue structures deep to the surface layer may be treated or modified. Such modification may include the contraction of collagen containing tissue often found in tissue layers deep to the surface layer. The depth control of the system allows vital structures to be treated without, for instance, causing perforation of the structure. Such structures may include parts of the intestine where it is desirable to reduce their volume, such as in gastroplexy (reducing the volume of the stomach), or in instances where the intestine includes abnormal out-pouchings or diverticular. Such structures may also include blood vessels which have become abnormally distended by an aneurysm or varicosisties, common sites being the aortic artery, the vessels of the brain or in the superficial veins of the leg. Apart from these vital structures, musculo-skeletal structures may also be modified where they have become stretched or lax. A hiatus hernia occurs when a portion of the stomach passes through the crura of the diaphragm which could, for example, be modified using the instrument such that the aperture for the stomach to pass through is narrowed to a point at which this does not occur by contracting the crura. Hernias in other areas of the body may be similarly treated including by modifying collagen-containing structures surrounding the weakness through which the herniation occurs. Such hernias include but are not limited to inguinal and other abdominal hernias.

In addition, a deeper effect that is not necessarily associated with the removal of substantial amounts of the epidermis may be obtained by delivering lower levels of power to the skin. In particular, lower levels of power can cause denaturation of collagen within the collagen-containing tissue beneath the skin surface. This denaturation of collagen may subsequently promote the generation of new collagen within the collagen-containing tissues. In this embodiment, the skin surface is improved by the generation of new collagen beneath the surface, rather than by a substantial amount, if any, skin resurfacing. However, the device for skin resurfacing described herein may be used at lower power settings to achieve this result.

The present invention is particularly directed to pulses of hot gas or plasma that, according to the copper disc test, provide a temperature rise of up to 22.7° C., preferably between 12.8 and 19.4° C. In embodiments where more than one pulse of hot gas or plasma is applied to a region of skin, the combined effect of these pulses, according to the copper disc test, should provide a temperature rise of up to 22.7° C., preferably between 12.8 and 19.4° C. However, in conducting the copper disc test, the application of individual pulses must be spaced apart in time as they will be applied to the surface of skin. Thus, to the extent that the temperature rise caused by a first pulse dissipates before the second pulse is applied, the effect on temperature rise of two pulses would not be additive.

Thermal denaturation of collagen results in the loss of viability of the affected tissue without loss of the structural integrity. This occurs by heat deactivation of the proteins responsible for collagen synthesis and the destruction of cells that reside within the collagen matrix. The non-viable collagen matrix is not immediately resorbed as the heating process acts as a “fixative” by cross-linking the proteins. Some of the non-viable collagen matrix is resorbed slowly over a long period of time as new collagen replaces the matrix as a new, viable tissue structure.

Various embodiments of the system will now be described in further detail. Referring to FIGS. 2 and 3 , a skin resurfacing instrument 16 has an outer shaft 30 with has a connector 26 at its proximal end, by means of which the instrument may be connected to the output terminals of a generator (described in more detail with reference to FIG. 4 ), usually via a flexible cable, as shown in FIG. 1 . The instrument also receives a supply of nitrogen at inlet port 32 , which is fed initially along an annular conduit 34 formed between shaft 30 and a length of coaxial feed cable 40 , and subsequently, via apertures 36 along a further sections of annular conduit 38 A and 38 B. The sections 38 A, 38 B of annular conduit are formed between a conductive sleeve 50 , which is connected to the outer conductor 44 of the coaxial feed cable, and conductive elements 52 and 54 respectively which are connected to the inner conductor 42 of the coaxial feed cable 40 . At the distal end of the annular conduit 38 B the gas is converted into a plasma under the influence of an oscillating high intensity electric field E between an inner needle-like electrode 60 provided by the distal end of the conductive element 54 , and an outer second electrode 70 provided by a part of the sleeve 50 which is adjacent and coextensive with the needle electrode 60 . The resultant plasma 72 passes out of an aperture 80 formed in a ceramic disc 82 in the distal end of the instrument largely under the influence of the pressure from the nitrogen supply; the insulating nature of the disc 82 serving to reduce or avoid preferential arcing between the electrodes 60 and 70 .

The inner electrode 60 is connected to one of the generator output terminals via the conductive elements 52 , 54 and the inner conductor 42 of the coaxial feed structure, and the outer electrode 70 is connected to the other generator output terminal via the conductive sleeve 50 and the outer conductor 44 of the coaxial feed structure 40 . (Waveguides may also be used as the feed structure.) The intensity of the electric field between them therefore, oscillates at the output frequency of the generator, which in this embodiment is in the region of 2450 MHz. In order to generate a plasma from the nitrogen gas, a high intensity electric field is required. In this regard the relatively pointed configuration of the needle electrode 60 assists in the creation of such a field, because charge accumulates in the region of the tip, which has the effect of increasing the field intensity in that region. However, the creation of a high intensity electric field requires a large potential difference between the inner and outer electrodes 60 , 70 and, generally speaking, the magnitude of the potential difference required to create such a field increases with increasing separation of the electrodes. The electric field intensity required to strike a plasma from nitrogen (and thus create a plasma) is in the region of 3 MNewtons per Coulomb of charge, which translated into a uniform potential difference, equates roughly to a potential difference of 3 kV between conductors separated by a distance of 1 mm. In the instrument illustrated in FIG. 2 , the separation between the inner and outer electrodes 60 , 70 is approximately 3 mm, so that were the field uniform the voltage required to achieve the requisite field intensity would be approximately 10 kV. However the geometry of the electrode 60 is such as to concentrate charge in regions of conductor which have a small curvature thereby intensifying the electric field regions adjacent such conductors and reducing the magnitude of potential difference which must be supplied to the electrodes in order to create a field of the required strength. Nonetheless, in practice it is not necessarily desirable to supply a potential difference of sufficient magnitude to the electrodes 60 , 70 directly from the generator, because the insulator of the feed structure used to connect the generator output to the electrodes 60 , 70 may be subject to breakdown.

In the embodiment described above with reference to FIGS. 1 to 3 , the output voltage of the generator is preferably of the order of 100V. In order to obtain a high enough voltage across the electrodes 60 , 70 to strike a plasma, therefore, it is necessary to provide a step-up, or upward transformation of the supply voltage from the generator. One way of achieving this is to create a resonant structure which incorporates the electrodes 60 , 70 . If an output signal from the generator is supplied to the resonant structure (and, therefore, the electrodes) at a frequency which is equal to or similar to its resonant frequency, the resulting resonance provides voltage multiplication of the generator output signal across the electrodes 60 , 70 the magnitude of which is determined by the geometry of the structure, the materials used within the structure (e.g., the dielectric materials), and the impedance of a load. In this instrument, the resonant structure is provided by a combination of two impedance matching structures 92 , 94 the function and operation of which will be described in more detail subsequently.

The use of a resonant structure is one way of providing a sufficiently high voltage across the electrodes 60 , 70 to strike a plasma. For the instrument to be effective, however, it is necessary for the generator to deliver a predetermined and controllable level of power to the plasma, since this affects the extent to which the nitrogen is converted into plasma, which in turn affects the energy which may be delivered to the tissue in the form of heat. In addition it is desirable to have efficient transmission of power from the generator to the load provided by the plasma. As mentioned above, the output frequency of the generator in the present example is in the ultra high frequency (UHF) band of frequencies, and lies in the region of 2450 MHz, this being a frequency whose use is permitted for surgical purposes by ISM legislation. At frequencies of this magnitude is appropriate to consider the transmission of electrical signals in the context of such a surgical system as the transmission of electromagnetic waves, and the feed structures for their efficient propagation of taking the form of coaxial or waveguide transmission lines.

In the instrument of FIG. 2 , the coaxial cable 40 provides the transmission line feed structure from the generator 4 to the instrument 16 . The inner and outer conductors 42 , 44 of the coaxial feed structure 40 are spaced from each other by an annular dielectric 46 . To provide efficient transmission of power from the output of the generator using a transmission line, the internal impedance of the generator is desirably equal to the characteristic impedance of the transmission line. In the present example the internal impedance of the generator is 50 Ω, and the characteristic impedance of the coaxial cable 40 is also 50 Ω. The load provided to the generator prior to striking plasma is of the order of 5 KOΩ. Owing to this large difference in impedance between the generator impedance and feed structure on the one hand, and the load on the other, delivering power to the load directly from the feed structure will result in substantial losses of power (i.e., power output from the generator which is not delivered to the load) due to reflections of the electromagnetic waves at the interface between the feed structure and the load. Thus, it is not preferable simply to connect the inner and outer conductors 42 , 44 of the coaxial cable 40 to the electrodes 60 , 70 because of the resultant losses. To mitigate against such losses it is necessary to match the relatively low characteristic impedance of the cable 40 and the relatively high load impedance, and in the present embodiment this is achieved by connecting the load to the feed structure (whose characteristic impedance is equal to that of the generator impedance) via an impedance transformer provided by two sections 92 , 94 of transmission line having different characteristic impedances to provide a transition between the low characteristic impedance of the coaxial feed structure and the high impedance load. The matching structure 92 has an inner conductor provided by the conductive element 52 , which has a relatively large diameter, and is spaced from an outer conductor provided by the conductive sleeve 50 by means of two dielectric spacers 56 . As can be seen from FIG. 2 , the spacing between the inner and outer conductors 52 , 50 is relatively small, as a result of which the matching structure 92 has a relatively low characteristic impedance (in the region of 8 Ω in this embodiment). The matching structure 94 has an inner conductor provided by the conductive element 54 , and an outer conductor provided by the sleeve 50 . The inner conductor provided by the conductive element 54 has a significantly smaller diameter than conductive element 52 , and the relatively large gap between the inner and outer conductors 50 , 54 results in a relatively high characteristic impedance (80 Ω) of the matching structure 94 .

Electrically, and when operational, the instrument may be thought of as four sections of different impedances connected in series: the impedance Z F of the feed structure provided by the coaxial cable 40 , the impedance of the transition structure provided by the two series connected matching structures 92 , 94 of transmission line, having impedances Z 92 and Z 94 respectively, and the impedance Z L of the load provided by the plasma which forms in the region of the needle electrode 60 . Where each of the sections 92 , 94 of the matching structure has an electrical length equal to one quarter wavelength at 2450 MHz, the following relationship between impedances applies when the impedance of the load and the feed structure are matched:

Z L /Z F =Z 94 2 /Z 92 2

The impedance Z L of the load provided to the generator by the plasma is in the region of 5 kΩ; the characteristic impedance Z F of the coaxial cable 40 is 50 Ω, meaning that the ratio Z 94 2 /Z 92 2 =100 and so Z 94 /Z 92 =10. Practical values have been found to 80 Ω for Z 94 , the impedance of the matching structure section 94 , and 8 Ω for Z 92 , the impedance of matching structure section 92 .

The requirement that each of the matching structures 92 , 94 are one quarter wavelength long is an inherent part of the matching process. Its significance lies in that at each of the interfaces between different characteristic impedances there will be reflections of the electromagnetic waves. By making the sections 92 , 94 one quarter wavelength long, the reflections at e.g., the interface between the coaxial feed structure 40 and the section 92 will be in anti phase with the reflections at the interface between the section 92 and the section 94 , and so will destructively interfere; the same applies to the reflections at the interfaces between the sections 92 and 94 on the one hand and the reflections at the interface between section 94 and the load on the other. The destructive interference has the effect of minimising power losses due to reflected waves at interfaces between differing impedances, provided that the net reflections of the electromagnetic waves having nominal phase angle of 0 radians are of equal intensity to the net reflections having a nominal phase angle of π radians (a condition which is satisfied by selecting appropriate impedance values for the different sections 92 , 94 ).

Referring now to FIG. 4 , an embodiment of generator used in conjunction with the embodiment of instrument described above comprises a power supply unit 100 , which receives an alternating current mains input and produces a constant DC voltage across a pair of output terminals 102 , which are connected to a fixed gain solid state power amplifier 104 . The power amplifier 104 receives an input signal from a tunable oscillator 106 via a variable attenuator 108 . The power amplifier 104 , tunable oscillator 106 , and variable attenuator 108 may be thought of as an AC power output device. Control of the frequency of oscillation of the oscillator, and the attenuator 108 is performed by means of voltage outputs V tune and V gain from a controller 110 (the operation of which will subsequently be described in more detail) in dependence upon feedback signals, and input signals from a user interface 112 . The output of the amplifier 104 passes through a circulator 114 , and then sequentially through output and return directional couplers 116 , 118 which in conjunction with detectors 120 , 122 provide an indication of the power output P out by the generator and the power reflected P ref back into the generator respectively. Power reflected back into the generator passes through the circulator 114 which directs the reflected power into an attenuating resistor 124 , whose impedance is chosen so that it provides a good match with the feed structure 40 (i.e., 50 Ω). The attenuating resistor has the function of dissipating the reflected power, and does this by converting the reflected power into heat.

The controller 110 receives input signals I user , P out , P ref , G flow from the user interface, the output and reflected power detectors 120 , 122 and a gas flow regulator 130 , respectively, the latter controlling the rate of delivery of nitrogen. Each of the input signals passes through an analogue to digital converter 132 and into a microprocessor 134 . The microprocessor 134 operates, via a digital to analogue converter 136 to control the value of three output control parameters: V tune which controls the tuning output frequency of the oscillator 106 ; V gain which controls the extent of attenuation within the variable attenuator 108 and therefore effectively the gain of the amplifier 104 ; and G flow the rate of flow of gas through the instrument, with the aim of optimising the performance of the system. This optimisation includes tuning the output of the oscillator 106 to the most efficient frequency of operation, i.e., the frequency at which most power is transferred into the plasma. The oscillator 106 may generate output signals throughout the ISM bandwidth of 2400-2500 MHz. To achieve optimisation of the operating frequency, upon switch-on of the system, the microprocessor 134 adjusts the V gain output to cause the attenuator to reduce the generator output power to an extremely low level, and sweeps the frequency adjusting voltage output V tune from its lowest to its highest level, causing the oscillator to sweep correspondingly through its 100 MHz output bandwidth. Values of reflected power P ref are recorded by the microprocessor 134 throughout the bandwidth of the oscillator, and FIG. 5 illustrates a typical relationship between output frequency of the generator and reflected power P ref . It can be seen from FIG. 5 that the lowest level of reflected power occurs at a frequency f res , which corresponds to the resonant frequency of the resonant structure within the instrument 16 . Having determined from an initial low power frequency sweep the value of the most efficient frequency at which power may be delivered to the electrode, the microprocessor then tunes the oscillator output frequency to the frequency f res . In a modification, the controller is operable via a demand signal from the user interface (the demand signal being by a user via the user interface) to perform an initial frequency sweep prior to connection of the instrument 16 to the generator. This enables the controller to map the feed structure between the power output device and the instrument to take account of the effect of any mismatches between discrete sections of the feed structure etc., which have an effect upon the attenuation of power at various frequencies. This frequency mapping may then be used by the controller 110 to ensure that it takes account only of variations in the attenuation of power with frequency which are not endemically present as a result of components of the generator and/or feed structure between the generator and the instrument.

The operational power output of the power output device is set in accordance with the input signal I user to the controller 110 from the user interface 112 , and which represents a level of demanded power set in the user interface 112 by an operator. The various possible control modes of the generator depend upon the user interface 112 , and more particularly the options which the user interface is programmed to give to a user. For example, as mentioned above, there are a number of parameters which may be adjusted to achieve different tissue effects, such as power level, gas flow rate, the length of the time period (the treatment pulse width) for which the instrument is operational to generate plasma over a particular region of the skin, and the stand-off distance between the aperture at the distal end of the instrument 16 and the tissue. The user interface 112 offers the user a number of alternative control modes each of which will allow the user to control the system in accordance with differing demand criteria. For example, a preferred mode of operation is one which mimics the operational control of laser resurfacing apparatus, since this has the advantage of being readily understood by those currently practising in the field of skin resurfacing. In the laser resurfacing mode of operation, the user interface invites a user to select a level of energy delivery per surface area (known in the art as “fluence”) per pulse of the instrument. When operating in this mode, the microprocessor sets V gain so that the power output device has a pre-set constant output power, typically in the region of 160W, and the input signal I user from the user is converted into a demanded time period represented by the pulse width, calculated from the required energy per treatment pulse and the constant level of output power. However, the voltage signal V gain is also used to switch the generator output on and off in accordance with input signals I user from the user interface. Thus, for example, when the user presses a button on the handle of the instrument (not shown), a signal sent by the user interface 112 to the microprocessor 134 , which then operates to produce a pulse of predetermined width (e.g., 20 ms) by altering V gain from its quiescent setting, at which the attenuator output 108 is such that there is virtually no signal for the amplifier 104 to amplify, and the generator output is negligible, to a value corresponding to the pre-set constant output power for a period of time equal to the demanded pulse width. This will have the effect of altering the amplifier output from its quiescent level to the pre-set constant output power level for a time period equal to the demanded pulse width, and ultimately of creating a plasma for such a time period. By altering the pulse width according to user input, pulses of selected energies can be delivered, typically, in the range of from 6 ms to 20 ms. These pulses can be delivered on a “one-shot” basis or as a continuous train of pulses at a predetermined pulse frequency.

The surface area over which the energy is delivered will typically be a function of the geometry of the instrument, and this may be entered into the user interface in a number of ways. In one embodiment the user interface stores surface area data for each different geometry of instrument that may be used with the generator, and the instrument in operation is either identified manually by the user in response to a prompt by the user interface 112 , or is identified automatically by virtue of an identification artefact on the instrument which is detectable by the controller (which may require a connection between the controller and the instrument). Additionally the surface area will also be a function of the stand-off distance of the instrument aperture 82 from the tissue, since the greater the stand-off the cooler the plasma will be by the time it reaches the surface, and also, depending on the instrument geometry, the instrument may produce a divergent beam. Instruments may be operated with a fixed stand-off distance, for example by virtue of a spacer connected to the distal end of the instrument, in which case the surface area data held within the user interface will automatically take account of the stand-off distance. Alternatively the instruments may be operated with a variable stand-off distance, in which case the stand-off distance must be measured, and fed back to the controller to enable it to be taken into account in the surface area calculation.

A further parameter which can affect the energy per unit area is the gas flow rate, and in one preferred embodiment the controller preferably contains a look-up table 140 of flow rate G flow against generator output power P out for a variety of constant output power levels, and the flow rate for a given output power level is adjusted accordingly. In a further modification the gas flow rate may be adjusted dynamically to take account of variations in stand-off distance, for example, and is preferably switched off between pulses.

As described above, for optimum ease of use in the resurfacing mode, the power output device will ideally deliver a constant output power over the entire duration of an output, since this facilitates easy control of the total energy output in a given pulse. With a constant power output, the controller is able to control the total energy delivered per pulse simply switching the power output device on (by the means of the signal V gain ) for a predetermined period of time, calculated on the basis of the output power level. It may, however, in practice be the case that the power output varies to a significant extent with regard to the accuracy to within which it is required to determine to the total energy delivered per output pulse. In this case the microprocessor is programmed to monitor the output power by integrating P out (from detector 120 ) with respect to time, and switching the power output device off by altering V gain to return the variable attenuator 108 to its quiescent setting.

A further complication in the control of the operation of the system arises in that the creation of a plasma at aperture 80 amounts in simplistic electrical terms to extending the length of the needle electrode 60 , since the plasma is made up of ionised molecules, and is therefore conductive. This has the effect of lowering the resonant frequency of the resonant structure, so that the optimum generator output at which power may be delivered to the instrument for the purpose of striking a plasma is different to the optimum frequency at which power may be delivered into an existent plasma. To deal with this difficulty, the microprocessor 134 is programmed continuously to tune the oscillator output during operation of the system. In one preferred mode the technique of “dither” is employed, whereby the microprocessor 134 causes the oscillator output momentarily to generate outputs at frequencies 4 MHz below and above the current output frequency, and then samples, via the reflected power detector 122 the attenuation of power at those frequencies. In the event that more power is attenuated at one of those frequencies than at the current frequency of operation, the microprocessor re-tunes the oscillator output to that frequency at which greater power attenuation occurred, and then repeats the process. In a further preferred mode of operation, the microprocessor 134 records the magnitude of the shift in resonant frequency when a plasma is struck, and in subsequent pulses, shifts the frequency of the oscillator 106 correspondingly when the system goes out of tune (i.e., when a plasma is struck), whereupon the technique of dither is then employed. This has the advantage of providing a more rapid re-tuning of the system once a plasma is first struck.

As mentioned above, in the embodiment shown in FIG. 4 , the amplifier 104 is typically set to produce around 160W of output power. However, not all of this is delivered into the plasma. Typically power is also lost through radiation from the end of the instrument in the form of electromagnetic waves, from reflection at connections between cables, and in the form of dielectric and conductive losses (i.e., the attenuation of power within the dielectrics which form part of the transmission line). In the instrument design of FIGS. 2 and 3 it is possible to take advantage of dielectric loss by virtue of feeding the gas through the annular conduits 38 A,B of the sections 92 , 94 of the impedance matching structure; in this way, dielectric power losses into the gas serve to heat up the gas, making it more susceptible to conversion into a plasma.

Referring now to FIG. 6 , in a modification of the instrument 14 shown in FIGS. 2 and 3 , an end cap 84 , made of conducting material, is added to the distal end of the instrument 14 . The end cap is electrically connected to the sleeve 50 and is, therefore, part of the electrode 70 . The provision of the end cap 84 has several beneficial effects. Firstly, since the electric field preferentially extends from conductor to conductor, and the end cap 84 effectively brings the electrode 70 closer to the tip of the needle electrode 60 , it is believed that its geometry serves to increase the intensity of the electric field in the region through which the plasma passes as it is expelled from the instrument, thereby accelerating ions within the plasma. Secondly, the physical effect of the end cap 84 on the plasma is that of directing the plasma in a more controlled manner. Thirdly the outer sheath currents on the instrument (i.e., the current travelling up the outside of the instrument back towards the generator) are reduced significantly with the end cap 84 , since the electrode 60 , even when electrically extended by a plasma, extends to a lesser extent beyond the end of the instrument, and so losses of this nature are reduced.

In an alternative, and simpler embodiment of system operating at an output frequency in the range of 2450 MHz, a power output device capable of delivering significantly more power than a solid state amplifier may be employed. With increased available power from the power output device, the required voltage step-up is lower and so the role played by resonant structures (for example) decreases.

Accordingly, and referring now to FIG. 7 , an alternative generator has a high voltage rectified AC supply 200 connected to a thermionic radio frequency power device, in this case to a magnetron 204 . The magnetron 204 contains a filament heater (not shown) attached to the magnetron cathode 204 C which acts to release electrons from the cathode 204 C, and which is controlled by a filament power supply 206 ; the greater the power supplied to the filament heater, the hotter the cathode 204 C becomes and therefore the greater the number of electrons supplied to the interior of the magnetron. The magnetron may have a permanent magnet to create a magnetic field in the cavity surrounding the cathode, but in this embodiment it has an electromagnet with a number of coils (not shown) which are supplied with current from an electromagnet power supply 208 . The magnetron anode 204 A has a series of resonant chambers 210 arranged in a circular array around the cathode 204 C and its associated annular cavity. Free electrons from the cathode 204 C are accelerated radially toward the anode 204 A under the influence of the electric field created at the cathode 204 C by the high voltage supply 200 . The magnetic field from the electromagnet (not shown) accelerates the electrons in a direction perpendicular to that of the electric field, as a result of which the electrons execute a curved path from the cathode 204 C towards the anode 204 A where they give up their energy to one of the resonant chambers 210 . Power is taken from the resonant chambers 210 by a suitable coupling structure to the output terminal. The operation of magnetron power output devices is well understood per se and will not be described further herein. As with the generator of FIG. 4 , a circulator (not shown in FIG. 7 ) and directional couplers may be provided.

The magnetron-type power output device is capable of generating substantially more power than the solid state power output device of FIG. 4 , but is more difficult to control. In general terms, the output power of the magnetron increases: (a) as the number of electrons passing from the cathode to the anode increases; (b) with increased supply voltage to the cathode (within a relatively narrow voltage band); (c) and with increased magnetic field within the magnetron. The high voltage supply 200 , the filament supply 206 and the electromagnetic supply 208 are, therefore, all controlled from the controller in accordance with input settings from the user interface, as in the case of the solid state amplifier power output device. Since the magnetron is more difficult to control, it is less straightforward to obtain a uniform power output over the entire duration of a treatment pulse (pulse of output power). In one method of control, therefore, the controller operates by integrating the output power with respect to time and turning the high voltage supply 200 off (thus shutting the magnetron off) when the required level of energy has been delivered, as described above. Alternatively, the output of the cathode supply may be monitored and controlled to provide control of output power by controlling the current supplied, the cathode/anode current being proportional to output power.

A further alternative generator for use in a system in accordance with the invention, and employing a magnetron as the power output device, will now be described with reference to FIG. 8 . As in the embodiment of FIG. 7 , power for the magnetron 204 is supplied in two ways, firstly as a high DC voltage 200 P for the cathode and as a filament supply 206 P for the cathode heater. These power inputs are both derived, in this embodiment, from a power supply unit 210 having a mains voltage input 211 . A first output from the unit 210 is an intermediate level DC output 210 P in the region of 200 to 400V DC (specifically 350V DC in this case) which is fed to a DC converter in the form of a inverter unit 200 which multiplies the intermediate voltage to a level in excess of 2 kV DC, in this case in the region of 4 kV.

The filament supply 206 is also powered from the power supply unit 210 . Both the high voltage supply represented by the inverter unit 200 and the filament supply 206 are coupled to a CPU controller 110 for controlling the power output of the magnetron 204 in a manner which will be described hereinafter.

A user interface 112 is coupled to the controller 110 for the purpose of setting the power output mode, amongst other functions.

The magnetron 204 operates in the UHF band, typically at 2.475 GHz, producing an output on output line 204 L which feeds a feed transition stage 213 converting the waveguide magnetron output to a coaxial 50 Ω feeder, low frequency AC isolation also being provided by this stage. Thereafter, circulator 114 provides a constant 50 Ω load impedance for the output of the feed transition stage 213 . Apart from a first port coupled to the transition stage 213 , the circulator 114 has a second port 114 A coupled to a UHF isolation stage 214 and hence to the output terminal 216 of the generator. A third port 114 B of the circulator 114 passes power reflected back from the generator output 216 via port 114 A to a resistive reflected power dump 124 . Forward and reflected power sensing connections 116 and 118 are, in this embodiment, associated with the first and third circulator ports 114 A and 114 B respectively, to provide sensing signals for the controller 110 .

The controller 110 also applies via line 218 a control signal for opening and closing a gas supply valve 220 so that nitrogen gas is supplied from source 130 to a gas supply outlet 222 . A surgical instrument (not shown in FIG. 8 ) connected to the generator has a low-loss coaxial feeder cable for connection to UHF output 216 and a supply pipe for connection to the gas supply outlet 222 .

It is important that the effect produced on tissue is both controllable and consistent, which means that the energy delivered to the skin should be controllable and consistent during treatment. For treatment of skin or other surface tissue it is possible for apparatus in accordance with the invention to allow a controlled amount of energy to be delivered to a small region at a time, typically a circular region with a diameter of about 6 mm. As mentioned above, to avoid unwanted thermal affects to a depth greater than required, it is preferred that relatively high powered plasma delivery is used, but pulsed for rapid treatment to a limited depth. Once a small region is treated, typically with a single burst of radio frequency energy less than 100 ms in duration (a single “treatment pulse”), the user can move the instrument to the next treatment region before applying energy again. Alternatively, plural pulses can be delivered at a predetermined rate. Predictability and consistency of affect can be achieved if the energy delivered to the tissue per pulse is controlled and consistent for a given control setting at the user interface. For this reason, the preferred generator produces a known power output and switches the radio frequency power on and off accurately. Generally, the treatment pulses are much shorter than 100 ms, e.g., less than 30 ms duration, and can be as short as 2 ms. When repeated, the repetition rate is typically in the range of from 0.5 or 1 to 10 or 15 Hz.

The prime application for magnetron devices is for dielectric heating. Power control occurs by averaging over time and, commonly, the device is operated in a discontinuous mode at mains frequency (50 or 60 Hz). A mains drive switching circuit is applied to the primary winding of the step-up transformer, the secondary winding of which is applied to the magnetron anode and cathode terminals. Commonly, in addition, the filament power supply is taken from an auxiliary secondary winding of the step-up transformer. This brings the penalty that the transient responses of the heater and anode-cathode loads are different; the heater may have a warm-up time of ten to thirty seconds whereas the anode-cathode response is less than 10 μs, bringing unpredictable power output levels after a significant break. Due to the discontinuous power feed at mains frequency, the peak power delivery may be three to six times the average power delivery, depending on the current smoothing elements in the power supply. It will be appreciated from the points made above that such operation of a magnetron is inappropriate for tissue resurfacing. The power supply unit of the preferred generator in accordance with the present invention provides a continuous power feed for the radio frequency power device (i.e., the magnetron in this case) which is interrupted only by the applications of the treatment pulses. In practice, the treatment pulses are injected into a power supply stage which has a continuous DC supply of, e.g., at least 200V. The UHF circulator coupled to the magnetron output adds to stability by providing a constant impedance load.

In the generator illustrated in FIG. 8 , the desired controllability and consistency of effect is achieved, firstly, by use of an independent filament supply. The controller 110 is operated to energise the magnetron heater which is then allowed to reach a steady state before actuation of the high voltage supply to the magnetron cathode.

Secondly, the high voltage power supply chain avoids reliance on heavy filtering and forms part of a magnetron current control loop having a much faster response than control circuits using large shunt filter capacitances. In particular, the power supply chain includes, as explained above with reference to FIG. 8 , an inverter unit providing a continuous controllable current source applied at high voltage to the magnetron anode and cathode terminals. For maximum efficiency, the current source is provided by a switched mode power supply operating in a continuous current mode. A series current-smoothing inductance in the inverter supply is fed from a buck regulator device. Referring to FIG. 9 , which is a simplified circuit diagram, the buck regulator comprises a MOSFET 230 , the current-smoothing inductor 232 (here in the region of 500 μH), and a diode 234 . The buck regulator, as shown, is connected between the 350V DC rail of the PSU output 210 P (see FIG. 8 ) and a bridge arrangement of four switching MOSFETs 236 to 239 , forming an inverter stage. These transistors 236 to 239 are connected in an H-bridge and are operated in anti phase with slightly greater than 50% ON times to ensure a continuous supply current to the primary winding 240 P of the step-up transformer 240 . A bridge rectifier 242 coupled across the secondary winding 240 F and a relatively small smoothing capacitor 244 , having a value less than or equal to 220 μS yields the required high voltage supply 200 P for the magnetron.

By pulsing the buck transistor 230 as a switching device at a frequency significantly greater than the repetition frequency of the treatment pulses, which is typically between 1 and 10 Hz or 15 Hz, and owing to the effect of the inductor 232 , continuous current delivery at a power level in excess of 1 kW can be provided for the magnetron within each treatment pulse. The current level is controlled by adjusting the mark-to-space ratio of the drive pulses applied to the gate of the buck transistor 230 . The same gate terminal is used, in this case, in combination with a shut-down of the drive pulses to the inverter stage transistors, to de-activate the magnetron between treatment pulses.

It will be appreciated by the skilled man in the art that single components referred to in this description, e.g., single transistors, inductors and capacitors, may be replaced by multiple such components, according to power handling requirements, and so on. Other equivalent structures can also be used.

The pulse frequency of the buck transistor drive pulses is preferably greater than 16 kHz for inaudability (as well as for control loop response and minimum current ripple) and is preferably between 40 kHz and 150 kHz. Advantageously, the inverter transistors 236 to 239 are pulsed within the same frequency ranges, preferably at half the frequency of the buck transistor consistency between successive half cycles applied to the step-up transformer 240 .

Transformer 240 is preferably ferrite cored, and has a turns ratio of 2:15.

As will be seen from FIG. 10 , which shows the output voltage on output 200 P and the power output of the magnetron at the commencement of a treatment pulse, start-up can be achieved in a relatively short time, typically less than 300 μs, depending on the vale of the capacitor 244 . Switch-off time is generally considerably shorter. This yields the advantage that the treatment pulse length and, as a result, the energy delivered per treatment pulse (typically 2 to 6 Joules) is virtually unaffected by limitations in the power supply for the magnetron. High efficiency (typically 80%) can be achieved for the conversion from a supply voltage of hundreds of volts (on supply rails 228 and 229 ) to the high voltage output 200 P (see FIG. 9 ).

Consistent control of the magnetron power output level, with rapid response to changing load conditions, can now be achieved using feedback control of the mark-to-space ration of the drive pulses to the buck transistor 230 . Since the power output from the magnetron is principally dependent on the anode to cathode current, the power supply control servos are current-based. These include a control loop generating an error voltage from a gain-multiplied difference between measured anode to cathode current and a preset output-power-dependent current demand. The voltage error is compensated for the storage inductor current and the gain multiplied difference determines the mark-to-space ratio of the driving pulses supplied to the buck transistor 230 , as shown in the control loop diagrams of FIGS. 11 and 12 .

A current-based servo action is also preferred to allow compensation for magnetron ageing resulting in increasing anode-to-cathode impedance. Accordingly, the required power delivery levels are maintained up to magnetron failure.

Referring to FIGS. 8 and 11 , variations in magnetron output power with respect to anode/cathode current, e.g., due to magnetron ageing, are compensated in the controller 110 for by comparing a forward power sample 250 (obtained on line 116 in FIG. 8 ) with a power reference signal 252 in comparator 254 . The comparator output is used as a reference signal 256 for setting the magnetron anode current, this reference signal 256 being applied to elements of the controller 110 setting the duty cycle of the drive pulses to the buck transistor 230 (FIG. 9 ), represented generally as the “magnetron principal power supply” block 258 in FIG. 11 .

Referring to FIG. 12 , that principal power supply block 258 has outer and inner control loops 260 and 262 . The anode current reference signal 256 is compared in comparator 264 with an actual measurement 266 of the current delivered to the magnetron anode to produce an error voltage V error . This error voltage is passed through a gain stage 268 in the controller 110 and yields a pulse width modulation (PWM) reference signal at an input 270 to a further comparator 272 , where it is compared with a representation 274 of the actual current in the primary winding of the step-up transformer (see FIG. 9 ). This produces a modified (PWM) control signal on line 276 which is fed to the gate of the buck transistor 230 seen in FIG. 9 , thereby regulating the transformer primary current through operation of the buck stage 278 .

The inner loop 262 has a very rapid response, and controls the transformer primary current within each cycle of the 40 kHz drive pulse waveform fed to the gate terminal 276 of the buck transistor 230 . The outer loop 260 operates with a longer time constant during each treatment pulse to control the level of the magnetron anode/cathode current. It will be seen that the combined effect of the three control loops appearing in FIGS. 11 and 12 is consistent and accurate control of anode current and output power over a full range of time periods, i.e., short term and long term output power regulation is achieved.

The actual power setting applied to the UHF demand input 252 of the outermost control loop, as shown in FIG. 11 , depends on user selection for the required severity of treatment. Depth of effect can be controlled by adjusting the duration of the treatment pulses, 6 to 20 ms being a typical range.

The control connection between the controller 110 and the high voltage power supply appears in FIG. 8 as a control and feedback channel 280 .

It is also possible to control heater of current by a demand/feedback line 282 , e.g., to obtain the preferred steady state heater temperature.

In the case of the magnetron having an electromagnet, variation of the magnetic field strength applied to the magnetron cavity provides another control variable (as shown in FIG. 8 ), e.g., should lower continuous power levels be requires.

Return loss monitored by line 116 in FIG. 8 is a measure of how much energy the load reflects back to the generator. At perfect match of the generator to the load, the return loss is infinite, while an open circuit or short circuit load produces a zero return loss. The controller may therefore employ a return loss sensing output on line 116 as a means of determining load match, and in particular as a means of identifying an instrument or cable fault. Detection of such a fault may be used to shut down the output power device, in the case of the magnetron 204 .

The UHF isolation stage 214 shown in FIG. 8 is illustrated in more detail in FIG. 13 . As a particular aspect of the invention, this isolation stage, which is applicable generally to electrosurgical (i.e., including tissue resurfacing) devices operating at frequencies in the UHF range and upwards, has a waveguide section 286 and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes 288 , 290 for connection to the radio frequency power device (in this case the magnetron) and an output, specifically the output connector 216 shown in FIG. 8 in the present case. In the present example, the waveguide section is cylindrical and has end caps 292 on each end. DC isolation is provided by forming the waveguide section 286 in two interfitting portions 286 A, 286 B, one portion fitting within and being overlapped by the other portion with an insulating dielectric layer 294 between the two portions in the region of the overlap. Suitable connectors, here coaxial connectors 296 are mounted in the wall of the waveguide section for feeding radio frequency energy to and from the probe 288 , 290 .

As an alternative, the waveguide may be rectangular in cross section or may have another regular cross section.

Each probe 288 , 290 is an E-field probe positioned inside the waveguide cavity as an extension of its respective coaxial connector inner conductor, the outer conductor being electrically continuous with the waveguide wall. In the present embodiment, operable in the region of 2.45 GHz, the diameter of the waveguide section is in the region of 70 to 100 mm, specifically 86 mm in the present case. These and other dimensions may be scaled according to the operating frequency.

The length of the interior cavity of the waveguide section between the probe 288 , 290 is preferably a multiple of λ g /2 where λ g is the guide wavelength within the cavity. The distance between each probe and its nearest end cap is in the region of an odd multiple of λ g /4 (in the present case 32 mm), and the axial extent of the overlap between the two waveguide portions 286 A, 286 B should be at least λ g /4. A typical low loss, high voltage breakdown material for the dielectric layer 294 is polyimide tape.

It will be appreciated that the isolation stage provides a degree of b and pass filtering in that the diameter of the waveguide section imposes a lower frequency limit below which standing waves cannot be supported, while high-pass filtering is provided by increasing losses with frequency. Additional bandpass filtering characteristics are provided by the relative spacings of the probe and the end caps. Note that the preferred length of the waveguide section between the end caps 292 is about λ g . Additional filter structures may be introduced into the waveguide section to provide preferential attenuation of unwanted signals.

The isolation stage forms an isolation barrier at DC and at AC frequencies much lower than the operating frequency of the generator and can, typically, withstand a voltage of 5 kV DC applied between the two waveguide portions 286 A, 286 B.

At low frequencies, the isolation stage represents a series capacitor with a value less than 1 μF, preventing thermionic current or single fault currents which may cause unwanted nerve stimulation. Lower values of capacitance can obtained by reducing the degree of overlap between the waveguide section portions 286 A, 286 B, or by increasing the clearance between them where they overlap.

Significant reductions in size of the isolation stage can be achieved by filling the interior cavity with a dielectric material having a relative dielectric constant greater than unity.

As an alternative to the E-field probes 288 , 290 illustrated in FIG. 13 , waves may be launched and collected using H-field elements in the form of loops oriented to excite a magnetic field.

Referring now to FIG. 14 , an instrument for use with a generator having a magnetron power output device comprises, as with the instrument of FIGS. 2 , 3 and 6 , an outer shaft 30 , connector 26 , coaxial feed cable 40 . A transitional impedance matching structure includes a low impedance section 92 and a high impedance section 94 , and provides a match between the power output device of the generator and the load provided by the plasma, which is created in an electric field between a central disc electrode 160 and an outer electrode 70 provided by a section of the conductive sleeve adjacent the disc electrode 160 . Gas passes from the inlet port 32 and along the annular conduits 38 A, B formed between the inner and outer conductors of the sections 92 , 94 of matching structure through the electric field between the electrodes 160 , 70 and is converted into a plasma under the influence of the electric field. A tubular quartz insert 180 is situated against the inside of the sleeve 50 , and therefore between the electrodes 160 , 70 . Quartz is a low loss dielectric material, and the insert has the effect of intensifying the electric field between the electrodes, effectively bringing them closer together, while simultaneously preventing preferential arcing between them, thereby producing a more uniform beam of plasma. In this embodiment, the inner electrode 160 is a disc, and is mounted directly onto the inner conductor 54 of the high impedance matching section, the latter having a length which in electrical terms is one quarter of a wavelength of the generator output. The disc electrode 160 , because of its relatively small length, is, when considered in combination with the electrode 70 effectively a discrete or “lumped” capacitor, which, in conjunction with the inherent distributed inductance of the inner conductor 54 forms a series resonant electrical assembly. The shape of the disc electrode 160 also serves to spread the plasma output beam, thereby increasing the “footprint” of the beam on tissue, this can be desirable in skin resurfacing since it means that a given area of tissue can be treated with fewer “hits” from the instrument. The voltage step-up which occurs in this resonant structure is lower in the instrument of this embodiment than with the instrument of FIGS. 2 , 3 and 6 , and so the step-up of the generator output voltage at the electrodes 160 , 70 as a result of resonance within the resonant assembly is correspondingly lower. One reason for this is that a magnetron power output device produces a significantly higher level of power and at a higher voltage (typically 300 V rms), and therefore it is not necessary to provide such a high step-up transformation, hence the lower Q of the resonant assembly.

Tuning of the output frequency of the magnetron power output device is difficult. Nonetheless, the resonant frequency of the instrument undergoes a shift once a plasma has been struck as a result of a lowering of the load impedance (due to the higher conductivity of plasma than air), so the problem of optimum power delivery for plasma ignition on the one hand and plasma maintenance on the other still applies. Referring to FIG. 15 , the reflected power dissipated within the instrument prior to plasma ignition with varying frequency is illustrated by the line 300 . It can be seen that the resonance within the instrument occurs at a frequency f res , represented graphically by a sharp peak, representative of a relatively high quality factor Q for the voltage multiplication, or upward transformation that occurs within the instrument at resonance. The reflected power versus frequency characteristic curve for the instrument once a plasma has been struck is illustrated by the line 310 , and it can be seen that the resonant frequency of the instrument once a plasma has been created f pls is lower than that prior to ignition, and that the characteristic curve has a much flatter peak, representative of lower quality factor Q. Since the magnetron power output device is relatively powerful, one preferred mode of operation involves selecting a resonant frequency of the instrument such that the output frequency of the magnetron power output device is operable both to benefit from resonance within the instrument to strike a plasma, and also to maintain a plasma.

Referring again to FIG. 15 the magnetron power output device has an output frequency f out which lies between the resonant frequencies f res and f pls . The frequency f out is shifted from the resonant frequency f res as far as possible in the direction of the resonant frequency f pls in an attempt to optimise the delivery of power into the plasma, while still ensuring that sufficient resonance occurs within the instrument at f out to strike a plasma. This compromise in the output frequency of the magnetron power output device is possible as a result of the relatively large power output available, meaning that significantly less resonance is required within the instrument, either in order to strike a plasma or subsequently to maintain a plasma, than would be the case with lower power output devices.

In a further embodiment, the instrument is constructed so that it incorporates two resonant assemblies: one which is resonant prior to the ignition of a plasma and the other which is resonant subsequent to ignition, wherein both of the resonant assemblies have similar or substantially the same resonant frequency. With an instrument of this type it is then possible to optimise power delivery for ignition and maintenance of a plasma at a single frequency. Referring now to FIG. 16 , an instrument 16 has a connector 26 at its distal end, a coaxial feed structure 40 extending from the connector 26 to a bipolar electrode structure comprising a rod-like inner electrode 260 and an outer electrode 70 provided by a section of outer conductive sleeve 50 lying adjacent the rod electrode 260 , a conductive end cap 84 defines an aperture 80 through which plasma passes, and helps to intensify the electric field through which the plasma passes, thereby enhancing the ease of power delivery into the plasma. The characteristic impedance of the section of transmission line formed by the electrode structure 260 , 70 is chosen to provide matching between the power output device and the load provided by the plasma. As will be explained subsequently, it is believed that the plasma load in this embodiment has a lower impedance than in previous embodiments, which therefore makes matching easier. In addition the instrument comprises an auxiliary or strike electrode 260 S. The strike electrode 260 S comprises two elements: a predominantly inductive element, provided in this example by a length of wire 272 connected at its proximal end to the proximal end of rod electrode, and a predominantly capacitive element in series with the inductive element, which is provided in this example by a ring 274 of conductive material connected to the distal end of the wire 272 , and which extends substantially coaxially with the rod electrode 260 , but is spaced therefrom.

Referring now to FIG. 17 , the structure of the strike electrode 260 S is such that the inductance in the form of the wire 272 and the capacitance in the form of the ring 274 forms a resonant assembly which is resonant at the output frequency of the generator f out , and the characteristic variation of reflected power with input frequency for the strike electrode 260 S is illustrated by the line 320 . By contrast, the transmission line formed by the electrode structure 260 , 70 (whose characteristic variation of reflected power with input frequency is illustrated by the line 330 ), has, prior to the ignition of a plasma, a resonant frequency f res that is significantly higher than the generator output frequency to an extent that little or no resonance will occur at that frequency. However, the electrode structure 260 , 70 is configured such that, once a plasma has been formed (which can be thought of as a length of conductor extending from the rod electrode 260 out of the aperture 80 ), it is a resonant structure at the output frequency of the generator, albeit a resonance at a lower Q. Thus, prior to the formation of a plasma, the strike electrode 260 S is a resonant assembly which provides voltage multiplication (also known as step-up transformation) of the generator output signal, whereas subsequent to the formation of a plasma the electrode structure 260 , 70 is a resonant assembly which will provide voltage multiplication. The electrode structure 260 S, 70 may be thought of as having a length, in electrical terms, and once a plasma has been created (and therefore including the extra length of conductor provided by the plasma) which is equal to a quarter wavelength, and so provides a good match of the generator output.

When the generator output signal passes out of the coaxial feed structure 40 the signal initially excites the strike electrode 260 S into resonance since this is resonant at the output frequency of the generator, but does not excite the electrode structure 260 , 70 , since this is not resonant at the output frequency of the generator until a plasma has been created. The effect of a resonance (and therefore voltage multiplication) in the strike electrode 260 S which does not occur in the electrode structure 260 , 70 is that there is a potential difference between the strike electrode 260 S and the rod electrode 260 . If this potential difference is sufficiently large to create an electric field of the required intensity between the strike electrode 260 S and the rod electrode 260 (bearing in mind that, because of the relatively small distance between the electrodes 260 S and 260 , a relatively low potential difference will be required), a plasma is created between the electrodes. Once the plasma has been created, the plasma will affects the electrical characteristics of the electrode structure such that it is resonant at the generator output frequency (or frequencies similar thereto), although this resonance will be not be as pronounced because the Q of the resonant assembly when a plasma has been created is lower than the Q of the strike electrode 260 S.

It is not essential that the strike electrode 260 S and an “ignited” electrode structure 260 , 70 (i.e., the electrode structure 260 , 70 with a created plasma) have identical resonant frequencies in order to benefit from this dual electrode ignition technique, merely that they are each capable of interacting with the generator output to strike and then maintain a plasma without having to retune the generator output. Preferably, however, the resonant frequencies should be the same to within the output frequency bandwidth of the generator. For example, if the generator produced an output of 2450 MHz and at this frequency this output had an inherent bandwidth of 2 MHz, so that, in effect, at this selected frequency the generator output signal is in the frequency range 2449-2451 MHz, the two resonant frequencies should both lie in this range for optimum effect.

Referring now to FIG. 18 , in a further embodiment which provides independent ignition of the plasma, an instrument includes a plasma ignition assembly 470 S and an electrode structure 470 which are separately wired (and mutually isolated) to a circulator 414 within the instrument. Output signals from the generator pass initially into the circulator 414 . The circulator passes the output signals preferentially into the output channel providing the best match to the generator. As with the previous embodiment, prior to ignition of a plasma, the match into the electrode structure 470 is poor, whereas the ignition assembly is configured to provide a good match prior to ignition, and so the generator output is passed by the circulator into the ignition assembly 470 S. Since it is wired independently, the ignition assembly 470 may be provided by any suitable spark or arc generator which is capable of producing a spark or arc with power levels available from the generator. For example, the ignition assembly can include a rectifying circuit and a DC spark generator, a resonant assembly to provide voltage multiplication as in the embodiment of FIG. 16 or any other suitable spark or arc generator. Once ignition of the plasma has occurred, the resultant change in the electrical characteristics of the electrode structure cause matching of the generator output into the electrode structure, and so the circulator then acts to divert the generator output into the electrode structure to enable delivery of power into the plasma.

In the majority of embodiments of the surgical system described above an oscillating electric field is created between two electrodes, both of which are substantially electrically isolated from the patient (inevitably there will be an extremely low level of radiation output from the instrument in the direction of the patient, and possibly some barely detectable stray coupling with the patient), whose presence is irrelevant to the formation of a plasma. A plasma is struck between the electrodes (by the acceleration of free electrons between the electrodes) and the plasma is expelled from an aperture in the instrument, primarily under the influence of the pressure of gas supplied to the instrument. As a result, the presence of a patient's skin has no effect on the formation of a plasma (whereas in the prior art a plasma is struck between an electrode within an instrument and the patient's skin) and the patient does not form a significant conductive pathway for any electrosurgical currents.

In a particularly preferred instrument best suited to operation with a high output power generator such as the above-described generator embodiments having a magnetron as the output power device, a dual matching structure such as those included in the instrument embodiments described above with reference to FIGS. 2 and 14 , is not required. Referring to FIGS. 19 and 20 , this preferred instrument comprises a continuous conductive sleeve 50 having its proximal end portion fixed within and electrically connected to the outer screen of a standard (N-type) coaxial connector, and an inner needle electrode 54 mounted in an extension 42 of the connector inner conductor. Fitted inside the distal end portion 70 of the sleeve outer conductor 50 is a heat resistant dielectric tube 180 made of a low loss dielectric material such as quartz. As shown in FIGS. 19 and 20 , this tube extends beyond the distal end of the sleeve 50 and, in addition, extends by a distance of at least a quarter wavelength (the operating wavelength λ) inside the distal portion 70 . Mounted inside the quartz tube where it is within the distal end portion 70 of the sleeve 50 is a conductive focusing element 480 which may be regarded as a parasitic antenna element for creating electric field concentrations between the needle electrode 54 and the distal end portion 70 of the sleeve 50 .

Adjacent the connector 26 , the sleeve 50 has a gas inlet 32 and provides an annular gas conduit 38 extending around the inner conductor extension 42 , the needle electrode 38 , and distally to the end of the quartz tube 180 , the latter forming the instrument nozzle 180 N. A sealing ring 482 prevents escape of gas from within the conduit 38 into the connector 26 .

When connected to a coaxial feeder from a generator such as that described above with reference to FIG. 8 , the proximal portion of the instrument, comprising the connector 26 and the connector inner conductor extension 42 , constitutes a transmission line having a characteristic impedance which, in this case, is 50 Ω. A PTFE sleeve 26 S within the connector forms part of the 50 Ω structure.

The needle electrode 54 is made of heat resistant conductor such as tungsten and has a diameter such that, in combination with the outer sleeve 50 , it forms a transmission line section of higher characteristic impedance than that of the connector 26 , typically in the region of 90 to 120 Ω. By arranging for the length of the needle electrode, i.e., the distance from the connector inner conductor extension 42 to its tip 54 T (see FIG. 20 ), to be in the region of λ/4, it can be made to act as an impedance transformation element raising the voltage at the tip 54 T to a level significantly higher than that seen on the 50 Ω section (inner conductor extension 42 ). Accordingly, an intense E-field is created between the tip 54 T of the inner electrode needle and the adjacent outer conductor distal end portion 70 . This, in itself, given sufficient input power, can be enough to create a gas plasma extending downstream from the tip 54 T and through the nozzle 180 N. However, more reliable striking of the plasma is achieved due to the presence of the focusing element 480 .

This focussing element 480 is a resonant element dimensioned to have a resonant frequency when in-situ in the quartz tube, in the region of the operating frequency of the instrument and its associated generator. As will be seen from the drawings, particularly by referring to FIG. 20 , the resonant element 480 has three portions, i.e., first and second folded patch elements 480 C, folded into irregular rings dimensioned to engage the inside of the quartz tube 180 , and an interconnecting intermediate narrow strip 480 L. These components are all formed from a single piece of conductive material, here spring stainless steel, the resilience of which causes the element to bear against tube 180 .

It will be appreciated that the rings 480 C, in electrical terms, are predominately capacitive, whilst the connecting strip 480 L is predominately inductive. The length of the component approaches λ/4. These properties give it a resonant frequency in the region of the operating frequency and a tendency to concentrate the E-field in the region of its end portions 480 C.

In an alternative embodiment (not shown) the focussing element may be a helix of circular or polygonal cross section made from, e.g., a springy material such as tungsten. Other structures may be used.

The focussing element is positioned so that it partly overlaps the needle electrode 54 in the axial direction of the instrument and, preferably has one of the regions where it induces high voltage in registry with the electrode tip 54 T.

It will be understood by those skilled in the art that at resonance the voltage standing wave on the focussing element 480 is of greatest magnitude in the capacitive regions 480 C. The irregular, folded, polygonal shape of the capacitive sections 480 C results in substantially point contact between the focussing element and the inner surface of the quartz tube 180 . This property, together with the E-field concentrating effect of the resonator element structure and the presence close by of the high dielectric constant material of the inserted tube 180 , all serve to maximise the filed intensity, thereby to ensure striking of a plasma in gas flowing through the assembly.

In practice, arcing produced by the focussing element 480 acts as an initiator for plasma formation in the region surrounding the electrode tip 54 T. Once a plasma has formed at the tip 54 T it propagates along the tube, mainly due to the flow of gas towards the nozzle 180 N. Once this has happened, the instrument presents an impedance match for the generator, and power is transferred to the gas with good efficiency.

One advantage of the focussing element is that its resonant frequency is not especially critical, thereby simplifying manufacture.

As mentioned above, the use of UHF signals is not essential to the operation of the present invention, and the invention may be embodied at any frequency from DC signals upwards. However, the use of UHF signals has an advantage in that components whose length is one quarter wavelength long may be incorporated within compact surgical instruments to provide voltage transformation or matching. In addition several instruments have been illustrated which have resonant assemblies for the purpose of step-up voltage transformation, but this is not essential, and upward voltage transformation can be performed within an instrument without making use of resonance.

If the instruments disclosed herein are intended for clinical use, it is possible to sterilise them, and this may be performed in a number of ways which are known in the art, such as the use of gamma radiation, for example, or by passing a gas such as ethylene oxide through the instrument (which will ensure that the conduit for the gas is sterilised). The sterilised instruments will then be wrapped in a suitable sterile package which prevents the ingress of contagion therein.

The various modifications disclosed herein are not limited to their association with the embodiments in connection with which they were first described, and may be applicable to all embodiments disclosed herein.

EXAMPLES

To calibrate the system used in the present examples, the copper disc test described above was conducted as follows: the instrument was positioned such that the stand-off distance (i.e., separation between the distal tip of the exit nozzle and the upper surface of the measurement jig ( 14 )) was 5 mm. This was set using a 5.0 mm slip gauge (GML 1601 ).

Measurements of the temperature rise were repeated to provide a total of 10 samples for a given pulse generator setting for averaging. The jig was allowed to cool to ambient between consecutive pulses.

Setting 2.0 J, all temperatures are ° C.:

	Sample	1	2	3	4	5
	Temp Rise	12.8	12.8	12.8	12.8	12.8
	Sample	6	7	8	9	10
	Temp Rise	12.8	12.8	12.8	12.8	12.8
	Average rise = 12.8° C.

Setting 2.5 J, all temperatures are ° C.:

	Sample	1	2	3	4	5
	Temp Rise	16.2	16.2	16.2	16.2	16.2
	Sample	6	7	8	9	10
	Temp Rise	16.4	16.4	16.2	16.2	16.2
	Average rise = 16.2° C.

Setting 3.0 J, all temperatures are ° C.:

	Sample	1	2	3	4	5
	Temp Rise	19.4	19.4	19.4	19.2	19.6
	Sample	6	7	8	9	10
	Temp Rise	19.6	19.2	19.2	19.4	19.4
	Average rise = 19.4° C.

Setting 3.5 J, all temperatures are ° C.:

	Sample	1	2	3	4	5
	Temp Rise	23.0	23.0	23.0	22.6	22.6
	Sample	6	7	8	9	10
	Temp Rise	22.8	22.4	22.4	22.4	22.4
	Average rise = 22.7° C.

Setting 4.0 J, all temperatures are ° C.:

	Sample	1	2	3	4	5
	Temp Rise	25.4	25.4	25.2	25.2	25.2
	Sample	6	7	8	9	10
	Temp Rise	25.2	25.2	25.2	25.2	25.0
	Average rise = 25.2° C.

The time for which the RF pulse was applied to the instrument was, for each setting:

Setting, J Pulse, ms
2.0        8.64
2.5        10.54
3.0        12.46
3.5        14.46
4.0        16.38

To confirm correct operation of the PSR System (generator 028/023 used), the energy delivered by the instrument used (S/No. PSR 033/51) was measured using the calorimeter comprising GML 1489 , GML 1490 and GML 1613 . Results for 4 J setting were:

Before start of jig measurements:

	Sample	1	2	3	4	5
	Measured J	4.07	4.14	4.19	4.14	4.08
	Sample	6	7	8	9	10
	Measured J	4.14	4.12	4.12	4.13	4.13

Following jig measurements:

	Sample	1	2	3	4	5
	Measured J	4.20	4.17	4.17	4.12	4.09
	Sample	6	7	8	9	10
	Measured J	4.12	4.16	4.08	4.11	4.17

Ambient temperature measurements using the jig were compared between a calibrated temperature meter (Kane May KM330, GML 21 ) and the set-up described above. Using the jig connected to the scope the indicated temperature was 23.9° C., connected to the meter GML 21 (which has a quoted accuracy of +2, −1° C.) the indicated temperature was 23.1° C.

Using the jig and measurement method specified above, the temperature rise for each setting was (taking the averages of 10 samples at each setting):

	2.0 J	12.8 ° C.	RF Pulse applied for 864 ms
	2.5 J	16.2 ° C.	RF Pulse applied for 10.54 ms
	3.0 J	19.4 ° C.	RF Pulse applied for 12.46 ms
	3.5 J	22.7 ° C.	RF Pulse applied for 14.46 ms
	4.0 J	25.2 ° C.	RF Pulse applied for 16.38 ms

Temperature measurement error is estimated to be +/−1.08° C. for the AD595 circuit.

A skin treatment is applied to pigs. Treatment is applied to various sites, according to the following regimes:

1. Laser, low fluence

2. Laser, medium fluence

3. Laser, high fluence

4. PSR, 2 Joules (which as indicted above provides a temperature rise of 12.8° C. with the present system), shortest pulse time @ 1.5 Hz

5. PSR, 2.5 Joules (which as indicted above provides a temperature rise of 16.2° C. with the present system), shortest pulse time @ 1.5 Hz

6. PSR, 3 Joules (which as indicted above provides a temperature rise of 19.4° C. with the present system), shortest pulse time @ 1.5 Hz

7. PSR, 3.5 Joules (which as indicted above provides a temperature rise of 22.7° C. with the present system), shortest pulse time @ 1.5 Hz

8. PSR, 4 Joules (which as indicted above provides a temperature rise of 25.2° C. with the present system), shortest pulse time @ 1.5 Hz

9. No treatment as control tissue.

The PSR plasma system is used to initiate the plasma pulses. A cylinder of pharmacopoeial nitrogen is used to supply gas to the instrument at a controlled rate of a few liters per minute when the instrument is operated. The instrument produces a circular treatment zone up to about 6 mm diameter depending on the settings. Treatment is applied at a sequence of adjacent zones. The time between each individual zone is determined by the surgeon's skill, the specific timing between zones not being significant when longer than 300 milliseconds.

The gas plasma is a highly “excited,” ionised gas that has been created by exposing it to high levels of RF (radio frequency) energy inside the instrument. Precise control of the RF energy allows the amount and timing of the plasma within the remaining, unionised gas to be set. The plasma “decays” in a defined manner releasing the energy used to create it. As the gas impacts the tissue, it delivers the energy only to the surface. The gas flow is pulsed at a rate commensurate with the delivery of RF energy, reducing gas consumption to levels that minimize the nitrogen cylinder change frequency. Performance is principally defined by the energy and duration of each pulse. The instrument does not contact the tissue but is held approximately 5 mm from the treated area. Larger “stand-offs” are possible but because the plasma is decaying, the power of the device is reduced.

Treatment effect of each individual application, as identified by the plasma flash, is easily and immediately seen, making placement of the adjacent individual application obvious and defined. A single pass using the PSR device achieves the relevant treatment. This is seen as an advantage compared to multi-passes with inter-treatment debris removal.

The Ultrapulse laser is used at low, medium and high fluence settings and the PSR device is used at 2, 2.5, 3, 3.5 and 4 Joules energy settings. The effects of these various settings are determined through skin biopsies immediately after treatment and at 2, 7 and 14 days post-treatment.

Each sample analysed consists of one haematoxylin and eosin stained five-micron section from a strip biopsy of the complete width of the treated area including untreated skin at each end.

Sections are examined and each section is scored for the presence and amount of stratum corneum, epidermal ablation, epidermal regeneration, dermal ablation, dermal hypervascularity, dermal cellular reaction, vacuolation and residual thermal change.

Skin treated with the PSR device shows a range of treatment effects across the energy settings used. At the lower energy setting (2 Joules), epidermal ablation is achieved only to a maximum of 5 to 6 cells deep to the stratum corneum. This effect is highly consistent and is seen immediately after treatment as cytoplasmic vacuolation of the 5 to 6 cells deep to the stratum corneum. By day 2 after treatment, these cells have formed a distinct layer above the remaining unaffected epidermis. By day 7 after treatment, this layer has separated from the underlying epidermis of which the upper cells are forming a new stratum corneum. By day 14 after treatment, the epidermis has fully regenerated and is barely distinguishable from adjacent normal untreated tissue.

At medium (2.5, 3, 3.5 Joules) energy settings, immediately after treatment cells lower in the epidermis, sometimes including those at the very lowest border of the epidermis, show cytoplasmic vacuolation. The cells above those showing cytoplasmic vacuolation do not appear at this stage to be affected by the treatment. By day 2 after treatment, these vacuolated cells, together with the cells above the vacuolated cells have formed a distinct layer under which regenerating epidermis can be seen. This layer is now obviously made up of non-functioning dead cells but the fact that it remains in-situ appears to offer some protection to the underlying regenerating epidermis. The uppermost layer of cells in the regenerating epidermis show formation of early stratum corneum. The underlying dermis show limited zones of residual thermal change but this does not appear to alter the rate or quality of epidermal repair. By day 14 after treatment, the epidermis is complete along the whole length of the biopsy with a stratified stratum corneum, although there are residual areas where active epidermal regeneration is still seen.

At the highest (4 Joules) energy setting, immediately after treatment all cells in the lower levels of the epidermis show cytoplasmic vacuolation. Additionally, a zone of cellular damage can be seen in the dermis extending from the basement membrane of the epidermis deep to around 150 microns. By day 2 after treatment, these changes have translated into complete destruction of the epidermis concomitant with ablation of some areas of dermis. Where ablation of the dermis is evident, depth of effect is at most 50 microns. By day 7 after treatment, there is considerable epidermal regeneration with around 35 percent of the total length of the biopsies covered with new epidermis. The zone of residual thermal change seen in the dermis immediately after treatment is still visible but the damaged cells have been replaced. Much of this zone now consists of active fibroblasts and fibrous matrix with little collagen present. These dermal changes to not appear to have affected the epidermal repair rate or quality. By day 14 after treatment, the epidermal cover is complete with some regeneration continuing and a new, complete stratum corneum present. The underlying zone of dermal change remained but now contains visible amounts of fresh collagen.

Five micron histological sections of the skin biopsies are stained with picrosirius red F3BA and examined, using polarized light microscopy, for thermal denaturation of collagen and subsequent neocollagenesis.

The low fluence setting of the Ultrapulse laser is associated with some very small, isolated areas of collagen denaturation immediately after treatment. At day 7 after treatment with a low fluence laser, there is no evidence of tissue change and all sections show all normal features of untreated skin.

For PSR power setting of 2 Joules, there are small isolated areas of collagen denaturation seen immediately after treatment, which sometimes coincide with slightly thinner areas of epidermis and are immediately below areas of epidermal cellular cytoplasmic vacuolation (FIG. 21 ). Most of these areas appear as small raised features of thermally denatured collagen with the non-raised adjacent collagen unaffected. The areas are approximately 2-6 cells in depth extending to approximately 4-8 cells in length and appear to be slightly decreased in volume compared to adjacent unaffected areas of the same numbers of cells. By day 2 after treatment, these areas are reduced to almost undetectable size but those visible appear as thin lines of denatured collagen under which the normal collagen has risen to “flatten” the profile line of the sub-epidermal dermis. By day 7 after treatment, most of these areas are seen as thinner lines of very minimal denaturation with occasional slightly raised areas but there is no evidence of neocollagenesis (FIG. 22 ). At day 14 after treatment, all sections show the features of normal skin (FIG. 23 ). The repair rate seems to be similar to the low power Ultrapulse laser treated skin but the initial tissue change is greater with PSR. None of these features approach those seen in skin treated with medium fluence Ultrapulse laser.

For PSR power settings of 2.5 and 3.0 Joules, immediately after treatment there is an increase in the number and size of raised areas of denatured collagen compared to PSR treatment at 2.0 Joules. For PSR at 3.0 Joules, there are some areas that show a continuous band of collagen denaturation (FIG. 24 ). The features are the same in appearance in terms of cellular change but some areas are approximately 3-8 cells in depth and extend to approximately 6-10 cells in length. These areas are again associated with severe cellular cytoplasmic vacuolation of the overlying epidermis. By day 2, some of these areas are reduced to thin lines of denatured collagen but maintain their lateral extent (FIG. 25 ), while other areas remain at their original proportions. By day 7, no features of collagen denaturation are detectable at sites where thin lines of thermal denaturation are seen at 2 days, and, at these sites, there is no evidence of neocollagenesis (FIG. 26 ). However, very small single fiber neocollagenesis is seen at sites that maintain their proportions at day 2 after treatment (FIG. 27 ). By day 14, all sections resemble normal skin. Similar observations are made in sections treated with a medium fluence Ultrapulse laser.

For PSR settings of 3.5 Joules, immediately after treatment an almost continuous band of thermally denatured collagen is present in the upper dermis immediately below what is left of the epidermis. This region is approximately 10-20 cells in depth and is associated with totally or almost totally removed epidermis. Occasionally there is an area where this affected region is removed from the underlying dermis. By day 2, the affected region has increased to approximately 20-30 cells in depth but does not appear to have narrowed as seen in affected areas from treatments of 2.5 and 3.0 Joules (FIG. 28 ). The uppermost layer of the affected regions is occasionally overlayed with early granulation tissue. At day 7, this feature is still visible ( FIG. 29 ) but with many islands of neocollagenesis seen under a rapidly regenerating epidermis, and, by day 14, there is significant neocollagenesis together with a completely regenerated epidermis (FIG. 30 ). Similar effects are seen using the high fluence laser except that in all features the effects are slightly more severe (FIG. 31 ). With laser treatment, neocollagenesis does not appear to be as active as early after treatment, and, at day 14, there is less neocollagenesis and more dermal disruption than seen with the PSR 3.5 Joule treatments.

For PSR settings of 4.0 Joules, immediately after treatment a continuous band of thermally denatured collagen is present in the upper dermis immediately below what is left of the epidermis. This region is approximately 20 to 30 cells in depth and is associated with totally or almost totally removed epidermis. There are many areas that show destruction and removal of the upper layer of the dermis. At day 2, the affected region is increased to approximately 40 to 50 cells in-depth and shows considerable removal of damaged dermis (FIG. 32 ). By day 7, there are large areas of overlying granulation tissue that is often haemorrhagic in nature (FIG. 33 ). In addition, there are occasional small islands of neocollagenesis under a rapidly regenerating epidermis. Several areas of granulation tissue not overlaid with regenerating epidermis remain. By day 14, the epidermis is completely regenerated and the underlying dermis shows neocollagensis present in patchy areas throughout the previously denatured collagen (FIG. 34 ). The granulation tissue has been elevated and removed and is now seen as extraneous features outside of the regenerated epidermis.

For PSR settings of 2.0, 2.5, 3.0, 3.5 and 4.0 Joules, after one pass treatment, there are detectable features of thermal denaturation of dermal collagen. Neocollagenesis appears to be faster in PSR treated cases than for the laser treatment required to induce the equivalent original treatment-associated tissue changes. This is particularly seen at 3.5 Joules PSR energy setting when compared to high fluence Ultrapulse C laser treatment, as demonstrated in FIGS. 39 and 40 .

From the results of this study, the PSR settings of 2.5 and 3.0 Joules may produce a small amount of thermal tissue change in the cells at the lowest aspect of the epidermis and the upper few cells of the dermis. The epidermis is not removed at the time of treatment, shows elevation and detachment by day 2 after treatment and is replaced by day 7 after treatment by a new epidermis. The dermal cells seen as thermally denatured immediately after treatment appear to be sloughed off with the epidermis. This activity has the effect of “flattening” the undulations in the epidermis and the cellular layer immediately below the epidermis seen microscopically in skin prior to treatment. Thus, the level of thermal tissue change and the rate of repair and remodelling post treatment suggest the use of PSR settings of 2.5 and 3.0 Joules, possibly in multiple pass treatments, particularly for repair of minor skin blemishes such as sun damaged skin, rhytids, wrinkles, etc. Additionally, these settings could be used for tissue removal limited in depth to the upper few layers of cells of the dermis.

Treatment at PSR settings of 3.5 and 4.0 Joules induce, in this study, immediate epidermal removal and thermal denaturation of a band of upper dermis in the region of 20 cells deep. This region of denaturation is increased in depth by 2 days and is characterized in places, at 4.0 Joules, by removal of some upper dermis and by some granulation. Repair and remodelling took place by small, single fiber, areas of new collagen appearing at 7 days post treatment within the previously totally denatured dermal area. Also by day 7 there is a considerable amount of new epidermis formed over the surface of the denatured dermal collagen. The development of new collagen continues to infill the area of previously totally denatured tissue and this activity is still evident at 14 days post treatment. Additionally, by day 14, there is a complete new epidermis formed over the newly forming collagen. These dermal denaturation, repair and remodelling activities indicate PSR settings of 3.5 and 4.0 Joules for, in particular, treatment of moderate skin blemishes where it is important to remove the upper layers of the dermis. Additionally these settings may be appropriate for the removal, by thermal ablation, of skin surface neoplasas that extend into the upper layers of the dermis.

Whilst the particular arrangement of the following claims has been prepared with a view to presenting essential and preferred features of the invention in a logical and concise way, we hereby specifically include as part of the content of this application as originally filed all possible combinations of the individual features contained in the claims or the preceding description.

Claims

1. A method of skin treatment, comprising the steps of:providing a gas conduit including at least two electrodes; delivering at least one pulse of radio frequency power to at least one of said electrodes in order to create an electric field between at least two said electrodes; passing gas through said electric field in order to form plasma from said gas; and emitting said plasma from the gas conduit such that it is applied to a surface of skin, wherein the application of plasma to the surface of skin causes denaturation of collagen within collagen-containing tissue beneath the skin surface without causing the complete removal of epidermis at said surface of skin.

2. A method according to claim 1, wherein the generation of new collagen within said collagen-containing tissue is promoted.

3. A method according to claim 1, wherein said at least one pulse of radio frequency power has an energy such as to produce a temperature rise of up to 22.7° C. under the copper disc test.

4. A method according to claim 3, wherein said at least one pulse of radio frequency power has an energy such as to produce a temperature rise of between 12.8° C. and 19.4° C. under the copper disc test.

5. A method according to claim 1, wherein said at least one pulse has a duration in the range of from 2 ms to 100 ms.

6. A method according to claim 5, wherein said at least one pulse has a duration in the range of from 5 ms to 20 ms.

7. A method according to claim 1, wherein said at least one pulse is delivered at a rate of 0.5 Hz to 15 Hz.

8. A method according to claim 1, wherein said at least one pulse is delivered at a rate of 0.5 Hz to 10 Hz.

9. A method according to claim 1, wherein said at least one pulse is delivered at a rate of 1 Hz to 6 Hz.

10. A method according to claim 1, wherein a series of pulses of plasma are applied to a series of regions of the skin surface.

11. A method according to claim 10, wherein said regions of the skin surface overlap.

12. A method according to claim 10, wherein one of said series of plasma pulses is applied to each said region of the skin surface.

13. A method according to claim 10, wherein at least two plasma pulses are applied to each of said regions of the skin surface.

14. A method according to claim 13, wherein said at least two plasma pulses are applied to each region consecutively.

15. A method according to claim 14, wherein one plasma pulse is applied to each of said regions of the skin surface before a second plasma pulse is applied to each of said regions.

16. A method of skin treatment, comprising the steps of:providing a gas conduit including at least two electrodes; delivering at least one pulse of radio frequency power to at least one of said electrodes to create an electric field between at least two said electrodes; passing gas through said electric field in order to form plasma from said gas; and emitting said plasma from the gas conduit such that it is applied to the surface of skin, such that the application of plasma to the surface of skin causes denaturation of collagen with collagen-containing tissue beneath the skin surface, wherein said at least one pulse of radio frequency power has an energy such as to produce a temperature rise of up to 22.7° C. under the copper disc test.

17. A method according to claim 16, wherein the generation of new collagen within said collagen-containing tissue is promoted.

18. A method according to claim 16, wherein said at least one pulse of radio frequency power has an energy such as to produce a temperature rise of between 12.8° C. and 19.4° C. under the copper disc test.

19. A method according to claim 16, wherein said at least one pulse has a duration in the range of from 5 ms to 20 ms.

20. A method according to claim 16, wherein a series of pulses of plasma are applied to a series of regions of the skin surface.

21. A method according to claim 20, wherein said regions of the skin surface overlap.

22. A method according to claim 20, wherein one of said series of pulses is applied to each said region of the skin surface.

23. A method according to claim 20, wherein at least two pulses of plasma are applied to each of said regions of the skin surface.

24. A method according to claim 23, wherein said at least two pulses of plasma are applied to each region consecutively.

25. A method according to claim 24, wherein one pulse of plasma is applied to each of said regions of the skin surface before a second pulse of plasma is applied to each of said regions.