Tool with a hard coating containing an aluminum-nitrogen compound and a boron-nitrogen compound and method of making the same

Information

  • Patent Grant
  • 6593015
  • Patent Number
    6,593,015
  • Date Filed
    Thursday, November 18, 1999
    25 years ago
  • Date Issued
    Tuesday, July 15, 2003
    21 years ago
Abstract
A tool which includes a substrate which has a first surface and a second surface wherein the first surface ad the second surface intersect to form an edge. A adhesion coating scheme is on the substrate. The adhesion coating scheme comprises an innermost layer which contains titanium, and is on the surface of the substrate. The adhesion coating scheme includes an outermost adhesion layer. A wear coating scheme is on the adhesion coating scheme. The wear coating scheme includes one or more wear coating sequences wherein each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen.
Description




FIELD OF THE INVENTION




The invention pertains to tools with a hard coating. More specifically, the invention pertains to tools (e.g., round tools and cutting inserts) with a hard coating which includes a compound containing aluminum and nitrogen and a compound containing boron and nitrogen.




BACKGROUND OF THE INVENTION




As materials technology advances many new materials, including new hard materials, become commercially useful. Such new hard materials include without limitation sintered ultra-fine powdered metals, metal-matrix composites, heat treated hardened steels (hardnesses of between 50 to 65 Rockwell C), and high temperature alloys. These new materials have extraordinary combinations of properties, such as, for example, hardness, toughness and wear resistance, that make them very suitable for uses in heavy industries, aerospace, transportation, and consumer products.




For these new hard materials to realize their optimum commercial potential, one must overcome the challenges these materials present to existing manufacturing and finishing processes. One of the reasons these challenges exist is that these materials are very difficult and expensive to drill, cut, form, and otherwise perform work on as workpiece materials. One can best address these challenges by the use of strong tools such as, for example, round tools (which include without limitation drills, end mills, reamers), as well as cutting inserts, that use a hard coating. This invention pertains to just such strong tools with a hard coating.




SUMMARY OF THE INVENTION




In one form thereof, the invention is a tool comprising a substrate which has a first surface and a second surface wherein the first surface and the second surface intersect to form an edge. There is an adhesion coating scheme on the substrate wherein the adhesion coating scheme comprises an innermost layer including titanium on the surface of the substrate and an outermost adhesion layer. There is a wear coating scheme on the adhesion coating scheme wherein the wear coating scheme includes one or more wear coating sequences wherein each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen.




In another form thereof, the invention is a tool comprising a substrate which has a first surface and a second surface wherein the first surface and the second surface intersect to form an edge. There is an innermost layer containing titanium on the surface of the substrate. There is a wear coating scheme on the innermost layer wherein the wear coating scheme includes one or more wear coating sequences. Each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen wherein the outer layer is on the inner layer.




In still another form, the invention is a process of making a coated tool comprising the steps of: providing a substrate; applying an adhesion coating scheme to the substrate wherein the adhesion coating scheme comprising an innermost layer containing titanium being on the surface of the substrate and an outermost adhesion layer; and applying a wear coating scheme on the adhesion coating scheme wherein the wear coating scheme including one or more wear coating sequences wherein each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen.




In another form thereof, the invention is a process of making a coated tool comprising the steps of: providing a substrate having a first surface and a second surface, the first surface and the second surface intersect to form an edge; applying an innermost layer containing titanium on the surface of the substrate; and applying a wear coating scheme on the innermost layer wherein the wear coating scheme includes one or more wear coating sequences with each wear coating sequence comprising an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen on the inner layer.











BRIEF DESCRIPTION OF THE DRAWINGS




These and other features, aspects and advantages of the present invention will be better understood with reference to the following description, appended claims, and accompanying drawings wherein:





FIG. 1

is an isometric view of a specific embodiment of a cutting insert of the invention;





FIG. 2

is a cross-sectional view of a corner of the cutting insert depicted in

FIG. 1

illustrating the coating scheme thereof;





FIG. 3

is a cross-sectional view of a corner of a second specific cutting insert illustrating the coating scheme thereof;





FIG. 4

depicts in schematic an arrangement of a substrate, an electron beam vapor source, and an ion source; and





FIG. 5

is a side view of a specific embodiment of a drill (i.e., a round tool) of the invention.











DETAILED DESCRIPTION OF THE INVENTION




Referring to the drawings,

FIG. 1

depicts a specific embodiment of a cutting insert, generally designated as


10


. Cutting insert


10


presents a first surface (e.g., a rake face


12


) and a second surface (e.g., a flank face


14


). The rake face


12


and the flank face


14


intersect to form a cutting edge


16


. The cutting insert


10


further includes a bottom surface


18


.




Referring to

FIG. 2

, cutting insert


10


includes a substrate


20


. Substrate


20


has a first surface (e.g., a rake surface


22


) and a second surface (e.g., a flank surface


24


). The rake surface


22


intersects the flank surface


24


to form a substrate cutting edge


26


.




A thin layer


30


of a titanium-containing compound is directly on the surface of the substrate


20


. A preferred example of a titanium-containing compound is titanium metal alone. However, it should be appreciated that applicant does not intend to restrict the scope of the thin layer


30


to comprise titanium metal alone, but such thin layer


30


may comprise other titanium-containing compounds such as, for example, titanium nitride, titanium carbide, or titanium carbonitride.




A layer


32


of a compound containing boron, carbon and nitrogen, i.e., a B—C—N compound, is on the surface of the thin titanium-containing layer


30


. A preferred example of such a B—C—N compound is boron carbonitride; however, applicant does not intend to restrict the scope of the layer


32


to comprise only boron carbonitride, but such layer


32


may comprise any compound that includes boron, carbon and nitrogen.




A thicker layer


34


of a compound containing boron and nitrogen, i.e., a B—N compound, is on the surface of the B—C—N compound layer


32


. An example of a compound containing boron and nitrogen is boron nitride which includes amorphous boron nitride and/or hexagonal boron nitride as well as at least a portion of cubic boron nitride. It should be appreciated that applicant does not intend to limit the scope of the thicker layer


34


to only boron nitride, but the thicker layer


34


may comprise any compound that contains boron and nitrogen.




The combination of the Ti-containing layer


30


, the B—C—N compound layer


32


and the B—N compound layer


34


forms an adhesion coating scheme. It should be appreciated that applicant does not intend for layer


30


, layer


32


or layer


34


to wholly comprise the same compound. In other words, layer


30


is not similar in composition to layer


32


or layer


34


, and layer


32


is not similar in composition to layer


34


.




It should be appreciated that the boundary between adjacent layers is generally not distinct. More specifically, there generally is some degree of intermixing of the compounds (or components) of the layers at the interface between adjacent layers. This intermixing is due to ion bombardment so as to form what may be called an intermixed layer at this interface.




This intermixed layer generally presents a concentration gradient of the elements wherein the composition is a mixture of the elements of the adjacent layers with the composition at any one location being more heavily weighted toward the closest layer. What this means for the above-described adhesion coating scheme, assuming that the layers (


30


,


32


, and


34


) comprise the preferred compounds, is that there is an intermixed layer (not illustrated) between the thin layer


30


of titanium and the adjacent layer


32


of boron carbonitride. This intermixed layer has a higher concentration of titanium the closer it is to the titanium layer and a higher concentration of boron and carbon and nitrogen the closer it is to the boron carbonitride layer.




There is an intermixed layer (not illustrated) between the layer


32


of boron carbonitride and the adjacent layer


34


of boron nitride. This intermixed layer has a higher concentration of carbon the closer it is to the layer


32


of boron carbonitride. The concentration of boron and nitrogen remains substantially constant throughout this intermixed layer since both the layer


32


(of boron carbonitride) and the layer


34


(of boron nitride) contain boron and nitrogen.




A wear coating scheme is on the surface of the outermost layer of the adhesion coating scheme. In this specific embodiment, the outermost layer of the adhesion coating scheme comprises the B—N compound layer


34


.




In regard to the wear coating scheme, a thin layer


36


of a compound containing aluminum and nitrogen, i.e., an Al—N compound, is on the surface of the B—N compound outermost layer


34


. One preferred example of the thin layer


36


is aluminum nitride; however, it should be appreciated that other compounds containing aluminum and nitrogen are contemplated to be within the scope of thin layer


36


. Generally there is an intermixed layer (not illustrated) between the outermost layer


34


of the adhesion coating scheme and the thin layer


36


. Assuming that layers


34


and


36


comprise the preferred compositions, the intermixed layer comprises boron and aluminum and nitrogen wherein the concentration of boron decreases (and the concentration of aluminum increases) as the intermixed layer moves away from the boron nitride layer to the aluminum nitride layer. The nitrogen concentration remains substantially constant throughout this intermixed layer since both layer


34


and layer


36


contain nitrogen.




A thicker layer


38


of a compound containing boron and nitrogen, i.e., a B—N compound, is on the surface of the Al—N compound layer


36


. One preferred example of the thicker layer


38


comprises boron nitride, which includes amorphous boron nitride and/or hexagonal boron nitride and cubic boron nitride. However, applicant does not intend to restrict the scope of the thicker layer


38


only boron nitride, but such a layer may comprise other compounds containing boron and nitrogen. There is an intermixed layer (not illustrated) between the thin layer


36


and the layer


38


. Assuming that layers


36


and


38


comprise the preferred compositions, the intermixed layer comprises boron and aluminum and nitrogen wherein the concentration of boron decreases (and the concentration of aluminum increases) as this intermixed layer moves away from the boron nitride layer to the aluminum nitride layer. The concentration of nitrogen remains substantially constant throughout this intermixed layer since layer


36


and layer


38


each contain nitrogen.




The combination of the Al—N compound layer


36


and the B—N compound layer


38


comprises a repeatable sequence of the wear coating scheme.




Although not mandatory for all cutting inserts, cutting insert


10


includes as a part of the wear coating scheme an outermost layer


40


of a compound containing titanium and nitrogen, i.e., a Ti—N compound. In the alternative, the outermost layer


40


may comprise a compound containing titanium and aluminum and nitrogen, i.e., a Ti—Al—N compound. One preferred example of the Ti—N compound is titanium nitride. One preferred example of the Ti—Al—N compound is titanium aluminum nitride.




There is an intermixed layer (not illustrated) between the layer


40


and the layer


38


. Assuming that layer


38


comprises boron nitride and that layer


40


comprises titanium nitride, the intermixed layer comprises boron and titanium and aluminum and nitrogen wherein the concentration of the boron increases (and the concentration of the titanium decreases) as the intermixed layer moves away from the titanium nitride layer to the boron nitride layer. The concentration of nitrogen remains substantially constant throughout the intermixed layer since layer


38


and layer


40


each contain nitrogen.




Referring to

FIG. 3

, there is depicted a second specific embodiment of the cutting insert, generally designated as


50


. Cutting insert


50


has a first surface (e.g., a rake face


52


) and a second surface (e.g., a flank face


54


) which intersect to form a cutting edge


56


. Cutting insert


50


includes a substrate


60


. The substrate


60


has a rake surface


62


and a flank surface


64


which intersect to form a substrate cutting edge


66


. The cutting insert


50


also includes a coating scheme thereon. The coating scheme includes an adhesion coating scheme and a wear coating scheme.




The adhesion coating scheme includes a thin layer


68


including titanium, either alone or in a compound, on the surface of the substrate


60


. Although not intended to be restrictive on the scope of thin layer


68


, such a layer (


68


) may comprise titanium nitride, titanium carbide, or titanium carbonitride.




A layer


70


of a compound containing boron and carbon, i.e., a B—C compound, is on the surface of the titanium-containing layer


68


. A preferred example of layer


70


comprises boron carbide. It should be appreciated that other compounds containing boron and carbon are contemplated to be within the scope of the layer


70


.




A layer


72


of a compound containing boron, carbon and nitrogen, i.e., a B—C—N compound, is on the surface of the B—C compound layer


70


. A preferred example of layer


72


comprises boron carbonitride. It should be appreciated that other compounds containing boron, carbon and nitrogen are contemplated to be within the scope of layer


72


.




A layer


74


of a compound containing boron and nitrogen, i.e., a B—N compound, is on the B—C—N compound layer


72


. A preferred example of layer


74


comprises boron nitride which includes amorphous boron nitride and/or hexagonal boron nitride and at least a portion of cubic boron nitride. It should be appreciated that other compounds containing boron and nitrogen are contemplated to be within the scope of layer


74


.




It can thus be seen that the titanium-containing layer


68


, the B—C compound layer


70


, the B—C—N compound layer


72


, and the B—N compound layer


76


comprise the adhesion coating scheme of cutting insert


50


. Like for the embodiment of

FIGS. 1 and 2

, the boundaries between adjacent ones of the above layers are not distinct in that intermixed layers generally exist between these adjacent layers due to ion bombardment and the resultant intermixing of the elements. Thus, while these intermixed layers will not be described in detail, it should be appreciated that they generally exist and the above description of these layers with respect to the embodiment of

FIGS. 1 and 2

provides guidance as to the nature of these intermixed layers for the embodiment of FIG.


3


.




The wear coating scheme includes a thin layer


76


of a compound containing aluminum and nitrogen, i.e., an Al—N compound, on the surface of the B—N compound layer


76


(the outermost layer of the adhesion coating scheme). A preferred example of the thin layer


76


is aluminum nitride; however, other compounds containing aluminum and nitrogen are contemplated to be within the scope of the thin layer


76


.




A layer


78


of a compound containing boron and nitrogen, i.e., a B—N compound, is on the surface of the Al—N compound layer


76


. A preferred example of layer


78


comprises boron nitride which includes amorphous boron nitride and/or hexagonal boron nitride and at least a portion of cubic boron nitride. Other compounds containing boron and nitrogen are contemplated to be within the scope of layer


76


.




A thin layer


80


of a compound containing aluminum and nitrogen, i.e., an Al—N compound, is on the surface of the B—N compound layer


78


. A preferred compound for layer


80


comprises aluminum nitride. Other compounds containing aluminum and nitrogen are contemplated to be within the scope of the layer


80


.




A layer


82


of a compound containing boron and nitrogen, i.e., a B—N compound, is on the surface of the Al—N compound layer


80


. A preferred compound for layer


82


comprises boron nitride including amorphous boron nitride and/or hexagonal boron nitride and at least a portion of cubic boron nitride. Other compounds comprising boron and nitrogen are contemplated to be within the scope of the layer


82


.




It can thus be seen that the Al—N compound layer


76


, the B—N compound layer


78


, the Al—N compound layer


80


, and the B—N compound layer


82


comprise the wear coating scheme. In this regard, the combination of the Al—N compound layer (


76


or


80


) and its adjacent B—N compound layer (


78


or


82


) form a repeatable sequence. While the specific embodiment of

FIG. 3

depicts two sequences of an Al—N compound/B—N compound, it should be appreciated that a tool (e.g., a cutting insert) may include a plurality of sequences.




Like for the embodiment of

FIGS. 1 and 2

, intermixed layers generally exist between adjacent layers due to ion bombardment and the resultant intermixing of the elements. Thus, while these intermixed layers will not be described in detail, it should be appreciated that they generally exist and the above description of these layers with respect to the embodiment of

FIGS. 1 and 2

provides guidance as to the nature of these intermixed layers for the embodiment of FIG.


3


.




Referring to

FIG. 5

, there is illustrated a drill generally designated as


120


. Drill


120


has an axially rearward end


122


and an axially forward end


124


. There is a forward surface


126


which intersects with a surface


128


defined by the flute to form a forward cutting edge


130


. The surface


128


defined by the flute also intersects the cylindrical side surface


132


to form a side cutting edge


134


. It can thus be appreciated that the drill presents one pair of surfaces (surface


126


and surface


128


) which define one edge (edge


130


), and another pair of surfaces (surface


128


and surface


132


) which define another edge (edge


134


). Although not shown, drill


120


has a multi-layer coating scheme of the invention deposited thereon.




The present invention is illustrated by the following examples of cutting inserts, which are provided to demonstrate and clarify various aspects of the present invention. The following should not be construed as limiting the scope of the claimed invention. In addition to cutting inserts, applicant contemplates that the invention applies to other tools which include without limitation round tools (e.g., drills, end mills, and reamers).




Referring now to the examples, an AIRCO TEMESCAL FC 1800 fast cycle electron beam (e-beam) evaporator unit with a water cooled (e.g., at a standard temperature of about 20° C.) high vacuum chamber equipped with a four-pocket Super Source e-beam gun was used to coat the substrates. The unit also included a residual gas analyzer (IQ 200 from Inficon), a quartz lamp for chamber heating, an ion source (Mark I gridless end-Hall type from Commonwealth Scientific Corp., Alexandria, Va.), an evaporation rate sensor (or monitor) (interfaced to an IQ 6000 controller from Inficon), and hot filaments(i.e., electrically resistively heated filaments) or an additional quartz lamp for supplemental substrate heating.





FIG. 4

depicts a substrate holder


90


, an evaporant compound


94


, an electron beam


92


for creating a vapor


104


from the evaporant compound


94


, an evaporation rate sensor


96


(located on the periphery of the vapor


104


about 254 millimeters (10 inches) above the plane of the surface of the evaporant compound


94


and about 165 millimeters (6.5 inches) from the center of the evaporant compound


94


for measuring the evaporation rate of the evaporant compound


94


, and an ion source


98


. Angle a was measured between the plane of the substrate holder


90


and a line perpendicular to the surface of the evaporant compound


94


and substantially parallel to the line of sight from the evaporant compound


94


. Angle β was measured between the plane of the substrate holder and the line of sight of the ion source.




The compounds used as the evaporant compound


94


included titanium, boron carbide, boron, and aluminum. The titanium and boron carbide each comprised 99.9 weight percent (wt%) commercially available compounds, while the boron comprised 99.5 wt % commercially available material. The aluminum comprised a high purity grade of commercially available aluminum.




Each run comprised the deposition of a coating scheme on a number of different SNMA432 style cutting insert substrates. These substrates included: (1) a silicon nitride based material having a coating of alumina on the surface of the substrate and a coating of titanium nitride on the alumina coating wherein the substrate comprises about 98.0 weight percent silicon nitride, about 1.0 weight percent magnesia, and about 1.0 weight percent yttria; (2) a silicon nitride based material which comprises about 98.0 weight percent silicon nitride, about 1.0 weight percent magnesia, and about 1.0 weight percent yttria; (3) a P-type doped silicon wafer; (4) a cemented tungsten carbide material comprising about 6.0 weight percent cobalt, about 0.5 weight percent chromium carbide, and the balance tungsten carbide wherein the material has a hardness of 93.0 Rockwell A;, and (5) a cemented tungsten carbide material comprising about 6.0 weight percent cobalt, about 2.0 weight percent tantalum niobium carbide, and the balance tungsten carbide wherein the material has a hardness of 92.7 Rockwell A.




Tables I through VIII set forth the parameters for the deposition of the coating layers. The row identified as “Description of the Composition of the Layer & Thickness” sets forth the composition of the layer and the thickness in Kiloangstroms (KÅ) of the coating layer. Referring to the description of the composition of the layers found in Tables I through VIII, the use of the expression “containing titanium” means that the layer contains titanium and is predominantly titanium metal. The use of the expression “containing boron and carbon” means that the layer contains boron and carbon and is predominantly boron carbide. The use of the expression “containing boron, carbon and nitrogen” means that the layer contains boron, carbon and nitrogen and is predominantly boron carbonitride. The use of the expression “containing boron and nitrogen” means that the layer contains boron and nitrogen and is predominantly boron nitride including amorphous boron nitride and/or hexagonal boron nitride and cubic boron nitride. The use of the expression “containing aluminum and nitrogen” means that the layer contains aluminum and nitrogen and is predominantly aluminum nitride.




The electron beam setting is set forth in a percentage of the input power as supplied by the power supply (i.e., the CV14 e-beam power supply). The chamber pressure is presented in torr. The evaporation rate is presented in angstroms per second as measured on the evaporation rate monitor located (at a position about 254 millimeters away from the surface of the vaporizing source and about 165 millimeters away from the center of the vaporizing source). The substrate temperature is in degrees centigrade (° C.). The duration of the deposition is in minutes. The ion beam energy is in electron volts (eV). The nitrogen flow rate is standard cubic centimeters per minute (sccm).




Generally speaking, all of the Runs Nos. 1-8 started with the deposition of a thin (1.00 Kiloangstroms) layer of a titanium-containing compound that was predominantly titanium metal. Except for Runs Nos. 7 and 8, all of the runs (Runs Nos. 1-6) next included the deposition of a layer of a boron and carbon containing compound that was predominantly boron carbide on the surface of the titanium-containing layer.




Runs Nos. 1-6 next had a layer of a compound containing boron, carbon and nitrogen deposited on the surface of the boron carbide layer according to the parameters. This layer was predominantly boron carbonitride which was a result of the nitrification of boron carbide.




Runs Nos. 1-6 next had a layer of boron and nitrogen containing compound applied on the surface of the boron, carbon and nitrogen containing layer. The layer of boron and nitrogen was predominantly boron nitride and included amorphous boron nitride and/or hexagonal boron nitride and at least some portion of cubic boron nitride.




Runs Nos. 1-6 next had a layer of a compound containing aluminum and nitrogen deposited on the surface of the boron nitride layer. This layer was predominantly aluminum nitride.




Runs Nos. 1-6 next had a layer of compound containing boron and nitrogen applied on the surface of the aluminum nitride layer. This layer was predominantly boron nitride and included amorphous boron nitride and/or hexagonal boron nitride and at least some portion of cubic nitride.




Runs Nos. 2, 3 and 5 next had a layer of compound containing aluminum and nitrogen deposited on the surface of the boron nitride layer. This later was predominantly aluminum nitride.




Runs Nos. 3 and 5 next had a layer of compound containing boron and nitrogen applied on the surface of the aluminum nitride. This layer was predominantly boron nitride includes amorphous boron nitride and/or hexagonal boron nitride and at least some portion of cubic boron nitride.




Referring to the deposition parameters for Run No. 7, a layer of a boron, carbon and nitrogen containing compound, which was predominantly boron carbonitride, was deposited on the titanium-containing layer previously mentioned. A layer of compound containing boron and nitrogen, which was predominantly boron nitride (including amorphous boron nitride and/or hexagonal boron nitride and at least some portion of cubic boron nitride), was deposited on the layer which was predominantly boron carbonitride. A layer of compound containing aluminum and nitrogen, which was predominantly aluminum nitride, was deposited on the layer containing boron and nitrogen. A layer of compound containing boron and nitrogen, which was predominantly boron nitride (including amorphous boron nitride and/or hexagonal boron nitride and at least some portion of cubic boron nitride), was deposited on the layer which was predominantly aluminum nitride.




In reference to Run No. 8, three sequences of the predominantly aluminum nitride layer-predominantly boron nitride layer were applied to the initial layer which was predominantly titanium.




Runs Nos. 3 through 8 had an outermost layer comprising titanium and nitrogen, which was predominantly titanium nitride, applied to the surface of the outermost layer which was predominantly boron nitride.




Referring to the set up of the equipment as depicted in

FIG. 4

for the runs, the operating parameters comprised the angle α being between about forty-five degrees and about seventy-five degrees, angle β being between about sixty-five degrees and about eighty degrees, the distance d


1


being equal to about 444 millimeters, and the distance d


2


being equal to between about 90 millimeters and about 165 millimeters.












TABLE I











Parameters for the Deposition of Coatings During Run No. 1

















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth









Description of the




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




boron and




boron, carbon,




boron and




aluminum and




boron and






Layer & Thickness (KÅ)




1.00




carbon




and nitrogen




nitrogen




nitrogen




nitrogen








2.00




2.00




5.00




1.00




5.00






Electron Beam Setting




12




11-12




11




11-12




15




11






(% of Power)






Chamber Pressure (torr)




1.0 × 10


−5






3.9-4.8 × 10


−6






2.1 × 10


−4






3.5-6.0 × 10−4




3.6 × 10


−4






3.4 × 10


−4








Evaporation Rate




4.8-5.3




1.6-2.1




1.3-2.2




1.6-2.4




1.5-1.6




1.4-2.0






(angstroms/second)






Substrate Temperature (° C.)




364-457




373-466




377-450




376-464




369-475




380-469






Duration of Deposition (minutes)




4




18




18




37




14




43






ion beam energy (eV)




N/A




N/A




Not Rec'd




170.5




Not Rec'd




170






nitrogen flow rate (sccm)




N/A




N/A




Not Rec'd




9.7




Not Rec'd




Not Rec'd






















TABLE II











Parameters for the Deposition of Coatings During Run No. 2



















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh




Eighth









Description of the




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




boron and




boron, carbon,




boron and




aluminum




boron and




aluminum




boron and






Layer & Thickness (KÅ)




1.00




carbon




and nitrogen




nitrogen




and




nitrogen




and




nitrogen








2.00




2.00




10.00




nitrogen




10.00




nitrogen




9.450











1.00





1.00






Electron Beam Setting




11




11




11




 9-11




13-14




 9-10




14






(% of Power)






Chamber Pressure (torr)




8 × 10


−6






7.0-7.2 × 10


−6






1.8-2.2 × 10


−4






4.7-5.2 × 10


−4






3.5 × 10


−4






5.1-5.3 × 10


−4






3.0 × 10


−4








Evaporation Rate




4.9-5.0




1.3-2.3




2.1-2.5




1.4-2.7




1.2-2.1




1.4-2.4




1.8-2.4






(angstroms/second)






Substrate Temperature




359-466




364-463




371-452




380-450




368-450




374-450




369-460






(° C.)






Duration of Deposition




4




18




21




25




12




94




10






(minutes)






ion beam energy (eV)




N/A




N/A




170.9




170.5




170




170




170






nitrogen flow rate (sccm)




N/A




N/A




10




5.3




Not Rec'd




Not Rec'd




Not Rec'd






















TABLE III











Parameters for the Deposition of Coatings During Run No. 3




















Layer/















Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh




Eighth




Ninth









Description




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing






of the




titanium




boron and




boron, carbon,




boron and




aluminum




boron and




aluminum




boron and




titanium






Composition




1.00




carbon




and nitrogen




nitrogen




and




nitrogen




and




nitrogen




and






of the Layer &





2.00




2.00




7.00




nitrogen




7.00




nitrogen




7.00




nitrogen






Thickness








1.00





1.00





1.00






(KÅ)






Electron




9




8




8




7-8




10




7




11




7




7






Beam Setting






(% of Power)






Chamber




5.3 × 10


−6






7.0-8.5 ×




1.6-2.0 × 10


−4






5.2-5.6 × 10


−4






3.3 × 10


−4






5.4 × 10


−4






3.3 × 10


−4






5.4 × 10


−4






2.8 × 10


−4








Pressure





10


−6








(torr)






Evaporation




5.1-5.2




1.5-2.4




1.3-2.0




1.6-2.4




2.0-2.2




1.9-2.1




2.0-2.2




1.6-2.2




5.0-5.1






Rate






(angstroms/






second)






Substrate




361-499




356-499




366-496




374-482




374-500




Not Rec'd




377-500




376-487




381-501






Temperature






(° C.)






Duration of




4




21




20




125




10




57




10




56




5






Deposition






(minutes)






ion beam




N/A




N/A




170.5




170.2




170.9




170.2




170.5




170




170.5






energy (eV)






nitrogen




N/A




N/A




10.0




9.5




8.7




6.3




8.6




6.2




9.4






flow rate






(sccm)






















TABLE IV











Parameters for the Deposition of Coatings During Run No. 4


















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh









Description of the




Containing




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




boron and




boron, carbon,




boron and




aluminum




boron and




titanium






Layer & Thickness (KÅ)




1.00




carbon




and nitrogen




nitrogen




and nitrogen




nitrogen




and








2.00




2.00




10.00




1.00





nitrogen






Electron Beam Setting




9




8




8




7-8




11




7




7






(% of Power)






Chamber Pressure (torr)




4.6 × 10


−6






3.3-3.5 × 10


−6






1.7-2.0 × 10


−4






5.2-5.5 × 10


−4






3.2 × 10


−4






5.2 × 10


−4






Not Rec'd






Evaporation Rate




5.0-5.2




1.4-2.2




1.5-2.4




1.7-2.7




1.8-2.2




1.9-2.0




Not Rec'd






(angstroms/second)






Substrate Temperature (° C.)




364-475




364-470




370-462




343-400




347-408




338-400




Not Rec'd






Duration of Deposition (minutes)




5




20




22




82




10




9




5






ion beam energy (eV)




N/A




N/A




170.5




170.2




170




Not Rec'd




150






nitrogen flow rate (sccm)




N/A




N/A




10.0




8.1




Not Rec'd




Not Rec'd




Not Rec'd






















TABLE V











Parameters for the Deposition of Coatings During Run No. 5




















Layer/















Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh




Eighth




Ninth









Description




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing






of the




titanium




boron and




boron, carbon,




boron and




aluminum




boron and




aluminum




boron and




titanium






Composition




1.00




carbon




and nitrogen




nitrogen




and




nitrogen




and




nitrogen




and






of the Layer &





2.00




2.00




10.00




nitrogen




10.00




nitrogen




10.00




nitrogen






Thickness








1.00





1.00





1.00






(KÅ)






Electron




10




9




9




8




11




7




11




7-8




7






Beam Setting






(% of Power)






Chamber




5.7 × 10


−6






6.0-7.5 ×




1.7-1.9 × 10


−4






5.0-5.8 × 10


−4






3.3 × 10


−4






5.1-5.2 ×




3.2 × 10


−4






5.1 × 10


−4






2.8 × 10


−4








Pressure





10


−6









10


−4








(torr)






Evaporation




5.1-5.2




1.3-2.0




1.5-2.5




1.5-2.4




2.0-2.2




1.5-2.4




2.1-2.2




1.3-2.4




4.8-5.1






Rate






(angstroms/






second)






Substrate




369-499




373-503




382-516




379-450




374-458




376-450




374-454




377-450




381-452






Temperature






(° C.)






Duration of




3




21




19




82




11




180




8




84




4






Deposition






(minutes)






ion beam




N/A




N/A




170.5




170.4




170




170




170




170.4




150.3






energy (eV)






nitrogen




N/A




N/A




10.0




8.2




8.5




6.2




Not Rec'd




6.1




9.4






flow rate






(sccm)






















TABLE VI











Parameters for the Deposition of Coatings During Run No. 6


















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh









Description of the




Containing




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




boron and




boron, carbon,




boron and




aluminum




boron and




titanium






Layer & Thickness (KÅ)




1.00




carbon




and nitrogen




nitrogen




and nitrogen




nitrogen




and








2.00




2.00




10.00




1.00




10.00




nitrogen













1.00






Electron Beam Setting




8




8




8




7




11




7




7






(% of Power)






Chamber Pressure (torr)




7.5 × 10


−6






1.2 × 10


−5






1.1-1.6 × 10


−4






5.0-5.2 × 10


−4






5.0 × 10


−4






4.9-5.1 × 10


−4






2.8 × 10


−4








Evaporation Rate




4.0-5.1




1.8-2.4




 .5-4.8




1.5-2.6




1.8-2.4




1.0-4.2




4.5-5.6






(angstroms/second)






Substrate Temperature (° C.)




365-491




368-492




379-487




Not Rec'd




373-495




Not Rec'd




400-556






Duration of Deposition (minutes)




4




14




12




85




12




66




3






ion beam energy (eV)




N/A




N/A




170.3




170.1




170




170.2




Not Rec'd






nitrogen flow rate (sccm)




N/A




N/A




10.1




6.3




Not Rec'd




6.2




Not Rec'd






















TABLE VII











Parameters for the Deposition of Coatings During Run No. 7

















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth









Description of the




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




boron,




boron and




aluminum




boron and




titanium and






Layer & Thickness (KÅ)




1.00




carbon,




nitrogen




and nitrogen




nitrogen




nitrogen








and nitrogen




2.00




1.00




10.00




1.00








2.00






Electron Beam Setting




10




8-9




7-8




11




7




7






(% of Power)






Chamber Pressure (torr)




3.6 × 10


−6






1.7-2.5 × 10


−4






5.0-5.2 × 10


−4






2.9 × 10−4




4.8-4.9 × 10


−4






2.5 × 10


−4








Evaporation Rate




5.1-5.3




1.6-2.4




1.8-2.3




1.8-2.3




1.8-2.3




5.0-5.2






(angstroms/second)






Substrate Temperature (° C.)




370-513




384-499




379-480




378-501




378-478




384-495






Duration of Deposition (minutes)




4




18




82




4




80




9






ion beam energy (eV)




N/A




N/A




170.0




170




170.1




170






nitrogen flow rate (sccm)




N/A




N/A




6.2




8.7




6.1




Not Rec'd






















TABLE VIII











Parameters for the Deposition of Coatings During Run No. 8



















Layer/Parameter




First




Second




Third




Fourth




Fifth




Sixth




Seventh




Eighth









Description of the




Containing




Containing




Containing




Containing




Containing




Containing




Containing




Containing






Composition of the




titanium




aluminum




boron and




aluminum




boron and




aluminum




boron and




titanium






Layer & Thickness (KÅ)




1.00




and nitrogen




nitrogen




and nitrogen




nitrogen




and nitrogen




nitrogen




and nitrogen








1.00




10.00




1.00




10.00




1.00




10.00




1.00






Electron Beam Setting




10




10




7-8




11-12




7




10




7




7






(% of Power)






Chamber Pressure (torr)




3.2 × 10


−6






4.6 × 10


−4






4.4-4.5 × 10


−4






4.4-4.5 × 10


−4






4.3-4.4 × 10


−4






2.2 × 10


−4






4.6 × 10


−4






2.2 × 10


−4








Evaporation Rate




5.1-5.2




2.1




1.2-3.3




1.8-2.2




1.6-2.8




1.3-1.4




1.9-2.4




5.0-5.1






(angstroms/second)






Substrate Temperature




372-501




369-500




379-480




374-496




379-476




373-496




379-475




378-495






(° C.)






Duration of Deposition




4




23




83




7




84




11




80




3






(minutes)






ion beam energy (eV)




N/A




170.3




170.4




170




170.6




170




170.6




170






nitrogen flow rate (sccm)




N/A




10




5.6




Not Rec'd




5.5




Not Rec'd




5.4




Not Rec'd














In regard to the coating scheme for each one of the runs, Table IX sets forth the coating layers and the thickness of each coating layer in Kiloangstroms (KA). In Table IX the designation “Ti” means that the layer contains titanium and is predominantly titanium metal; the designation “BC” means that the layer contains boron and carbon and is predominantly boron carbide; the designation “BCN” means that the layer contains boron, carbon and nitrogen and is predominantly boron carbonitride; the designation “BN” means that the layer contains boron and nitrogen and includes boron nitride including amorphous boron nitride and/or hexagonal boron nitride and at least a portion of cubic boron nitride; and the designation “TiN” means that the layer contains titanium and nitrogen and is predominantly titanium nitride.












TABLE IX











Coating Scheme (Compound and Thickness) for Runs Nos. 1 through 8



















Run No./














Layer




Run No. 1




Run No. 2




Run No. 3




Run No. 4




Run No. 5




Run No. 6




Run No. 7




Run No. 8









1st




Ti/1.00




Ti/1.00




Ti/1.00




Ti/1.00




Ti/1.00




Ti/1.00




Ti/1.00




Ti/1.00






2nd




BC/2.00




BC/2.00




BC/2.00




BC/2.00




BC/2.00




BC/2.00




BC/2.00




AlN/1.00






3rd




BCN/2.00




BCN/2.00




BCN/2.00




BCN/2.00




BCN/2.00




BCN/2.00




BN/2.00




BN/10.00






4th




BN/5.00




BN/10.00




BN/7.00




BN/10.00




BN/10.00




BN/10.00




AlN/1.00




AlN/1.00






5th




AlN/1.00




AlN/1.00




AlN/1.00




AlN/1.00




AlN/1.00




AlN/1.00




BN/10.00




BN/10.00






6th




BN/5.00




BN/10.00




BN/7.00




BN/




BN/10.00




BN/10.00




TiN/1.00




AlN/1.00






7th









AlN/1.00




AlN/1.00




TiN




AlN/1.00




TiN/1.00









BN/10.00






8th









BN/9.45




BN/7.00









BN/10.00














TiN/1.00






9


th
















TiN/1.00









TiN/1.00





























In regard to the component layers of the adhesion coating scheme and the wear coating scheme of the Runs Nos. 1 through 8, for Run No. 1, the first through the fourth layers comprised the adhesion coating scheme while the fifth and sixth layers comprised the wear coating scheme. For Run No. 2, the first through he fourth layers comprised the adhesion coating scheme while the fifth through the eighth layers comprised the wear coating scheme.




For Run No. 3, the first through the fourth layers comprised the adhesion coating scheme while the fifth through the ninth layers comprised the wear coating scheme. In Run No. 3, the fifth and sixth layers and the same (or repeats of) the seventh and eighth layers.




For Run No. 4, the first through the fourth layers comprised the adhesion coating scheme while the fifth through the seventh layers comprised the wear coating scheme.




For Run No. 5, the first through the fourth layers comprised the adhesion coating scheme while the fifth through the ninth layers comprised the wear coating scheme. In Run No. 5, the fifth and sixth layers and the same (or repeats of) the seventh and eighth layers.




For Run No. 6, the first through the fourth layers comprised the adhesion coating scheme while the fifth through the seventh layers comprised the wear coating scheme.




For Run No. 7, the first through the third layers comprised the adhesion coating scheme while the fourth through the sixth layers comprised the wear coating scheme.




For Run No. 8, the first layer comprised the adhesion coating scheme while the second through the eighth layers comprised the wear coating scheme. The second and third layers are the same as the fourth and fifth layers and the sixth and seventh layers. In other words, the fourth and fifth layer is a repeat of the second and third layer, and the sixth and-seventh layer is a repeat of the second and third layer.




While the above examples were carried out under the conditions set forth above, it should be appreciated that the invention can be carried out under different conditions. For example, in the deposition of the layer comprising the compound containing boron and nitrogen, it would be expected that the use of a higher ion beam energy would result in a different (e.g., greater) amount of cubic boron nitride in the layer. One preferred way to increase the ion beam energy is to use multiple (e.g., two) ion beam guns wherein each ion beam gun may have a wide (e.g., higher) range of ion beam energies.




The patents and other documents identified herein are hereby incorporated by reference herein.




Other embodiments of the invention will be apparent to those skilled in the art from a consideration of the specification or practice of the invention disclosed herein. It is intended that the specification and specific runs be considered as illustrative only, with the true scope and spirit of the invention being indicated by the following claims.



Claims
  • 1. A tool comprising:a substrate having a first surface and a second surface, the first surface and the second surface intersect to form an edge; an adhesion coating scheme on the substrate, the adhesion coating scheme comprising an innermost layer including titanium, the innermost layer being on the surface of the substrate, and an outermost adhesion layer; a wear coating scheme on the adhesion coating scheme, the wear coating scheme including one or more wear coating sequences wherein each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen; and the adhesion coating scheme having a different composition than the wear coating scheme.
  • 2. The tool of claim 1 wherein the adhesion coating scheme further includes a first intermediate layer on the innermost layer, the first intermediate layer including boron and carbon, the first intermediate layer being between the innermost adhesion layer and the outermost adhesion layer.
  • 3. The tool of claim 2 wherein the first intermediate layer predominantly comprises boron carbide.
  • 4. The tool of claim 2 wherein the first intermediate layer consists essentially of boron carbide.
  • 5. The tool of claim 2 wherein the first intermediate layer includes boron and carbon and nitrogen.
  • 6. The tool of claim 5 wherein the first intermediate layer predominantly comprises boron carbonitride.
  • 7. The tool of claim 5 wherein the first intermediate layer consists essentially of boron carbonitride.
  • 8. The tool of claim 2 wherein the outermost adhesion layer includes boron and nitrogen.
  • 9. The tool of claim 8 wherein the outermost adhesion layer comprises boron nitride including one or both of amorphous boron nitride and hexagonal boron nitride; and the outermost adhesion layer further including cubic boron nitride.
  • 10. The tool of claim 8 wherein the outermost adhesion layer consists essentially of boron nitride including one or both of amorphous boron nitride and hexagonal boron nitride; and the outermost adhesion layer further including cubic boron nitride.
  • 11. The tool of claim 2 wherein the adhesion coating scheme further including a second intermediate layer on the first intermediate layer, the second intermediate layer including boron, carbon and nitrogen, the second intermediate layer being between the innermost adhesion layer and the outermost adhesion layer.
  • 12. The tool of claim 11 wherein the second intermediate layer predominantly comprises boron carbonitride.
  • 13. The tool of claim 11 wherein the second layer consists essentially of boron carbonitride.
  • 14. The tool of claim 11 wherein the outermost adhesion layer predominantly comprises boron nitride including one or both of amorphous boron nitride and hexagonal boron nitride; and the outermost adhesion layer further including cubic boron nitride.
  • 15. The tool of claim 11 wherein the outermost adhesion layer consisting essentially of boron nitride including one or more of amorphous boron nitride and hexagonal boron nitride; and the outermost adhesion layer further including cubic boron nitride.
  • 16. The tool of claim 1 wherein the wear coating scheme further includes an exterior layer on the outer layer of the outermost wear coating sequence, and the exterior layer containing titanium.
  • 17. The tool of claim 16 wherein the exterior layer comprises titanium aluminum nitride.
  • 18. The tool of claim 1 wherein the inner layer of each wear coating sequence comprises a layer of aluminum nitride and the outer layer for each wear coating sequence comprises a layer of boron nitride including one or more of amorphous boron nitride and hexagonal boron nitride; and the layer of boron nitride further including cubic boron nitride; and for each wear coating sequence the layer of boron nitride has a thickness that is between about five times to about ten times greater than the thickness of the layer of aluminum nitride.
  • 19. The tool of claim 1 wherein the tool includes a round tool.
  • 20. The tool of claim 1 wherein the tool comprises a cutting insert wherein the first surface comprises a rake surface and the second surface comprises a flank surface so that the rake surface and the flank surface intersect to form a cutting edge.
  • 21. A tool comprising:a substrate having a first surface and a second surface, the first surface and the second surface intersect to form an edge; an adhesion coating scheme on the substrate, the adhesion coating scheme comprising an innermost layer including titanium, the innermost layer being on the surface of the substrate, and an outermost adhesion layer; a wear coating scheme on the adhesion coating scheme, the wear coating scheme including one or more wear coating sequences wherein each wear coating sequence comprises an inner layer including aluminum and nitrogen and an outer layer including boron and nitrogen wherein the outer layer is on the inner layer; and the adhesion coating scheme having a different composition than the wear coating scheme.
  • 22. The tool of claim 21 wherein the wear coating scheme further includes an exterior layer containing titanium, the exterior layer being on the outer layer of the outermost wear coating sequence.
  • 23. The tool of claim 22 wherein the exterior coating is titanium nitride.
  • 24. The tool of claim 21 wherein the inner layer of each coating sequence comprises a layer of aluminum nitride and the outer layer for each coating sequence comprises a layer of boron nitride including one or more of amorphous boron nitride and hexagonal boron nitride; and the layer of boron nitride further including cubic boron nitride; and the thickness of the outer layer of boron nitride is about ten times greater than the thickness of the inner layer of aluminum nitride.
US Referenced Citations (40)
Number Name Date Kind
4035541 Smith et al. Jul 1977 A
4237184 Gonseth et al. Dec 1980 A
4282289 Kullander et al. Aug 1981 A
4399168 Kullander et al. Aug 1983 A
4599281 Schinlmeister et al. Jul 1986 A
4619865 Keem et al. Oct 1986 A
4643951 Keem et al. Feb 1987 A
4717632 Keem et al. Jan 1988 A
4724169 Keem et al. Feb 1988 A
4731303 Hirano et al. Mar 1988 A
4762729 Hirano et al. Aug 1988 A
4892791 Watanabe et al. Jan 1990 A
4919773 Naik Apr 1990 A
4965140 Sarin Oct 1990 A
5002798 Donley et al. Mar 1991 A
5053245 Kiyama et al. Oct 1991 A
5096740 Nakagama et al. Mar 1992 A
5137772 Watanabe et al. Aug 1992 A
5249554 Tamor et al. Oct 1993 A
5266388 Santhanam et al. Nov 1993 A
5330611 Doll Jul 1994 A
5398639 Doll et al. Mar 1995 A
5409622 Chapman et al. Apr 1995 A
5503913 Konig et al. Apr 1996 A
5545249 Tanaka et al. Aug 1996 A
5618509 Shioi et al. Apr 1997 A
5633214 Nishio et al. May 1997 A
5639551 Ong et al. Jun 1997 A
5643842 Unno et al. Jul 1997 A
5670252 Makowiecki et al. Sep 1997 A
5691260 Suzuki et al. Nov 1997 A
5723188 Luthje et al. Mar 1998 A
5725913 Wong et al. Mar 1998 A
5882777 Kukino et al. Mar 1999 A
5882778 Sugizaki et al. Mar 1999 A
5948541 Inspektor Sep 1999 A
5976716 Inspektor Nov 1999 A
6054185 Inspektor Apr 2000 A
6117533 Inspektor Sep 2000 A
6213692 Guehring et al. Apr 2001 B1
Foreign Referenced Citations (12)
Number Date Country
0476825 Oct 1995 EP
0709483 May 1996 EP
5930769 Aug 1982 JP
6243273 Dec 1985 JP
6326349 Feb 1988 JP
0225562 Jul 1988 JP
3260054 Nov 1991 JP
4124272 Apr 1992 JP
4168263 Apr 1992 JP
4337064 Nov 1992 JP
5286789 Nov 1993 JP
7-18415 Jan 1995 JP
Non-Patent Literature Citations (83)
Entry
International Search Report in PCT Patent Application No. PCT/US00/30207 (Mailed Mar. 15, 2001).
Devries, Cubic Boron Nitride: Handbook of Properties, General Electric Report 72CRD178 (Jun. 1972), pp. 2-17.
Franchi, et al., New Generation PVD “PLATIT” Coatings for Cutting Tools, Punches, and Dies. Fourth Euro Ceramics vol. 9, pp. 396-406.
Kessler et al., Laser Pulse vapour deposition of polycrystalline wurtzire-type BN, Thin Solid Films, 147 (1987), L-45-L50.
Brochure, Guhring 222 vol. 16, Coated Tools for Small Batches, [20 pages] (1996).
Rechberger et al., High performance cutting tools with a solid lubricant physically-vapor deposited coated, Surface and Coatings Tech., 62 (1993), pp. 393-398.
Program and Abstracts, Int. Conf. On Met. Coatings and Thin Films, San Diego, CA (1997).
Richter et al., Utilization of the Cathodic Arc Evaporation for the Deposition of Boron Nitride Thin Films, Poster BN.07, presented at ICMCTF-96, pp. 1-10.
Tsuda et al., Mass and Energy Measurements of the species responsible for cBN growth in rf sputter conditions, J. Vac. Sci Tech. A 15(6) (1997) pp. 2859-2863.
Park et al., Observation of a hexagonal BN surface layer on the cubic BN film growth by dual ion beam sputter deposition, pp. 1-12 (1996) [accepted by Applied Phys. Letter].
Park et al., Growth mechanism of cubic boron nitride thin films by ion beam assist sputter deposition, J. Vac. Sci. Tech. A15(3) (1997), pp. 1041-1047.
Ilias et al., Microstructure of cBN Films Deposited by IBAD: IR and HREM analyses, 6 pages [accepted by Nat. Res. Soc. Symp. Proc. (1997)].
Bozzolo et al. texture Investigations by ATEM of IBAD Deposited c-BN Films, 9 pages [submitted to Applied Physics Letters] (date unknown).
Widmayer et al., Electron Energy Loss Spectroscopy- An Additional Tool to Characterize Thin Films of Cubic Boron Nitride, [15 pages] accepted for publication by Diamond and Related Materials.
Barth et al., Deposition of cubic boron nitride layers- characterization of substrate-layer interface, Thin Solid Films, 301 (1997), pp. 65-70.
Loeffler et al., PACVD nano-crlsstalline BCN thin films obtained by use of an organoboron precursor, Diamond and Related Materials 6 (1997), pp. 608-611.
Plass et al., Layered structure diagnostic and optical modeling of c-BN films, Nuclear Instruments & Methods in Physics Research, B127/128 (1997), pp. 857-860.
Plass et al., Growth and characterization of boron nitride films: layer sequence and phase identification, Diamond and Related Materials 6 (1997), pp. 594-598.
Plass et al., Layered growth of boron nitride thin films, Thin Solid Films 305 (1997), pp. 172-184.
Konyashin et al., Plasma-assisted CVD of Cubic Boron Nitride, Chem Vap Deposition 1997, 3 No. 5.
Ilias et al., Microstructure and Stress Investigations of Cubic Boron Nitride Thin Films, Diamond and Related Materials (1997).
Zhao et al., Physical properties of dual beam depositedB0.5-xSix)No. 5 Films, J. Vac. Sci. Technol. A 15(4) Jul./Aug. 1997 pp 2297-2306.
Xin et al., Phase evolution in boron nitride thin films prepared by a dc-gas discharge assisted pulsed laser deposition, Thin Solid Films 293 (1997) pp. 17-21.
Berns et al., Near-edge X-ray absorption fine structure spectroscopy of arcjet-deposited cubic boron nitride, Diamond and Related Materials 6 (1997) pp. 1883-1886.
Setsuhara et al., Interfacial structure control of cubic boron nitride films prepared by ion-beam assisted deposition, Nuclear Instr and Meth. In Phys Research B 127/128 (1997) pp. 851-856.
Hofsass et al., Thresholds for the phase formation of cubic boron nitride thin films, Physical Review B, vol. 55, No. 19 (1997) pp. 230-233.
Edgar et al., c-Boron-aluminum nitride alloys prepared by ion-beam assisted deposition, Thin solid Films 298 (1997) 33-38.
Gimeno et al., Cubic boron nitride thin films by tuned rf magnetron sputtering, Diamond and Related Materials 6 (1997) 604-607.
Yoshida, State of the Art Vapor Phase Deposition of Cubic Boron Nitride, Diamond Films and Tech, vol. 7 No. 2 (1997) pp. 87-104.
Gafri et al., Boron Nitride Coating on Steel and Graphite Produced with a Low Pressure RF Plasma, Thin Solid Films, 72 (1980) pp. 523-527.
Rechberger et al., High Performance cutting tools with a solid lubricant physically vapor deposited coating, Surface and Coatings Tech. 62 (1993) pp. 393-398.
Kuhr et al., Deposition of cubic boron nitride with a inductively coupled plasma, Surface and Coatings Tech. 74-75 (1995) pp. 806-812.
Ikeda et al., Formation of cubic boron nitride films by arc-like plasma enhanced ion plating method, J. Vac. Sci. Techol. A8(4) Jul./Aug. 1990.
Montasser et al., A Promising Boron-Carbon Nitrogen Thin Film, Materials Science For, vol. 54 & 55 (1990) pp. 295-312.
Karnezos, Boron-Nitrogen-Hydrogen Thin Films, Materials Science Forum vols. 54 &55 (1990) pp. 261-276.
Ikeda et al., Formation and characteristics of cubic boron nitride films by an arc-like plasma-enhanced ion plating method, Surface and Coatings Tech. 50 (1991) pp. 33-39.
Herr et al., Fundamental properties and wear resistance of rf sputtered TiB2 and Ti(B,N) coatings, Materials Science and Engineering A140 (1991) pp. 616-624.
Aromaa, et al., A comparative study of the corrosion performance of TiN, Ti(B,N) and (Ti,AI)N coatings produced by physical vapor deposition methods, Materials Science and Engineering A140 (1991) pp. 722-726.
Doll et al., Growth and characterization of epitaxial cubic boron nitride films on silicon, Physical Review 43 (1991) pp. 6816-6819.
Edgar, Prospects for device implementation of wide band gap semiconductors, J. Mater. Rse. vol. 7 No. 1 (1992) pp. 235-252.
Ikeda, Cubic boron nitride films synthesized by low-energy ion-beam enhanced vapor deposition, Appl Phys. Lett 61(7) (1992) p. 786-788.
Kester et al., Phase control of cubic boron nitride thin films, J. Appl. Phys. 72(2) (1992) pp. 504-513.
Mieno et al., Preparation of Cubic Boron Nitride Films by Rf Sputtering, J. Appl. Phys. 29(7) (1990) pp. L1175-L1177.
Murakawa et al., Characteristics of C-BN Film Made by a Reactive Ion Plating Method, pp. 1099-1104.
Wada et al., Formation of cBN Films by ion beam assisted deposition, J. Vac. Sci. Technol. A vol. 10 No. 3 (1992) pp. 515-520.
Stovicek, Hard-part turning, Tool & production ( Feb. 1992).
Noaker, Hard Facts on Turning, Manufacturing Engineering Feb. 1992.
Matthes et al., Tribological properties and wear behavior of sputtered titanium-based coatings under sheet-metal forming conditions, Materials Science and engineering A140 (1991) 593-601.
Sueda et al., Fundamental research on the deposition of cubic boron nitride films on curved substrates by ion-beam assisted vapor deposition, Thin Solid Films 228 (1993) 97-99.
Brookes, Tools on the cutting edge, American Machinist Dec. 1993 pp. 30-32.
Stoviek, Turning to hard part turning, Tool & Production Magazine (Jan. 1993).
Gissler, Preparation and Characterization of Cubic Boron Nitride and Metal Boron Nitride Films, Surface and Interface Analysis vol. 22 pp. 139-148 (1994).
Ong et al., Deposition of Cubic BN on Diamond Interlayers, NASA Tech Brief vol. 18 No. 8 Item 74.
Riefel, Novel Ultrahard Materials, Adv. Mater. (1994) 6, No. 7/8 pp. 549-560.
Zhang et al., Deposition of high quality cubic boron nitride films on nickel substrates, Appl. Phys Lett 65(8) Aug. 1994 pp. 971-973.
Kroczynski et al., Ion Beam-Assisted Deposition of Boron Nitride from a Condensed Layer of Diborane and Ammonia at 78 K, Mat Res Soc Sympos Proc vol. 316 (1994) pp. 869-873.
Ichiki et al., Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition, Jpn. J. appl. Phys 33 (1993) pp. 4385-4388.
Inspektor et al., Superhard coatings for metal cutting applications, Surface and Coatings Tech 68/69 (1994) pp. 359-368.
Song et al., Textured growth of cubic boron nitride film on nickel substrates, Appl. Phys Lett 65(21) (1994) pp. 2669-2671.
Vasilash, The Superhard Coatings: More than Meets the Eye, Production (Dec. 1995) pp. 52-54.
Kuhr et al., Deposition of cubic boron nitride with an inductively coupled plasma, Surface and Coatings Tech. 74-75 (1995) pp. 806-812.
Noaker, Hard turning heats up, Manufacturing Engineering Jun. 1995 pp. 47-50.
Sprow, Diamond Coatings: Ready to Rip?, Manufacturing Engineering Feb. 1995 pp. 41-46.
Cook, PCBNs cut into marketplace, Canadian Machinery and Metalworking, pp. 13-14.
Murakawa et al., The Synthesis of Cubic BN Films using a Hot Cathode Plasma Discharge in a Parallel Magnetic Field, (1990) pp. 128-136.
Vilab Literature on Movic (date unknown).
Ceme Con Literature on CS-800 Coating Systems (date unknown).
Ceme Con Literature on HIS Process Module (date unknown).
Ikeda et al., Formation and characterization of cubic boron nitride films by an arc-like plasma enhanced ion plating method, Surface and Coatings tech. 50 (1991) pp. 33-39.
Kester et al., Phase control of cubic boron nitride films, J. Appl. Phys. 72(2) Jul. 1992 pp. 504-514.
Nishiyama et al., The synthesis and properties of BN films prepared by ion irradiation and vapor deposition, Nuclear Instr. and Methods in Phys Res. B80/81 (1993) pp. 1485-1488.
Mitterer et al., Sputter Deposition of Ultrahard Coatings within the System Ti-B-C-N, Surface and Coatings Technol. 41 (1990) pp. 351-363.
Inagawa et al., Structure and properties of c-BN films deposited by an activated reactive evaporation with a gas activation nozzle, Surface and Coatings technol. 39/40 (1989) pp. 253-264.
Arya et al., Preparation and Properties and Applications of Boron Nitride Thin Films, Thin Solid Films 157 (1988) pp. 267-282.
Andoh et al., On the Formation of BN Films by Ion Beam and Vapor Deposition, Nuclear Instr. And Methods of Research B33 (1988) pp. 678-680.
Goranchev et al., Compressive stress of thin cubic BN films prepared by rf sputtering on rf-biased substrates, Thin Solid Films 149 (1987) L-77-L80.
Satou et al., Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment, Japanese Journal of Applied Physics 22(3) (1983) pp. L171-L172.
Peytavy et al., Chemical vapor deposition of titanium boron nitride, High Temperature-High Pressure (1978) vol. 10 pp. 341-345.
cBN Consortium Penn State Status and Work Statement for 1998.
Messier, cBNC Program and Directions, Penn State (1997).
Yarbrough, Thermodynamics of c-BN?, DRMC Meeting (Oct. 10, 1994) Penn State.
Collins et al., Real Time Spectroscopic Ellipsometry for cBN Nucleation and Growth Analysis, 4th cBNC Meeting (Dec. 8-9, 1997) Penn State.
Pilione et al., AIN-BN Deposition, 4th cBNC Meeting (Dec. 8-9, 1997) Penn State.