Average Energy Deposited Per Atom: A Universal Parameter For Describing Ion-Assisted Film Growth; Petrov et al.; Applied Physics Letters, Jul. 5, 1993, pp. 36-38. |
Titanium Aluminum Nitride Films: A New Alternative to TiN Coatings; Muenz; Journal Of Vacuum Science & Technology, Nov.-Dec. 1986, pp. 2717-2225. |
Interrelationship Between Processing, Coating Properties And Functional Properties of Steered ARC Physically Vapour Deposited (Ti,Al)N And (Ti,Nb)N Coatings; Roos et al.; Elsevier Sequoia; Dec. 1, 1990; pp. 547-556. |
Effects Of R.F. Bias And Nitrogen Flow Rates On The Reactive Sputtering Of TiAlN Films; Shew et al.; Elsevier; 1997; pp. 212-219 no month. |
Effects of High-Flux Low-Energy (20-100 eV) Ion Irradiation During Deposition On The Microstructure And Preferred Orientation of TI.sub.0.5 Al.sub.0.5 N Alloys Grown By Ultra-High-Vacuum Reactive Magnetron Sputtering; Adibi et al.; Journal of Applied Physics, Jun. 15, 1993; pp. 8580-8589. |
The Structure And Composition Of Ti-Zr-N, Ti-Al-Zr-N and Ti-Al-V-N Coatings, Knotek et al.; Materials Science and Engineering, 1988; pp. 481-488 (no month). |