Patent Application
20230131569
This application claims priority to and the benefit of Korean Patent Application No. 10-2021-0141253 filed in the Korean Intellectual Property Office on Oct. 21, 2021, the entire contents of which are incorporated herein by reference.
The present invention relates to a pump and a chemical liquid supply apparatus including the same.
In order to manufacture a semiconductor device or a liquid crystal display, various processes, such as photography, etching, ashing, ion implantation, thin film deposition, and cleaning, are performed on a substrate. Among them, in the photography, etching, ashing, and cleaning processes, a liquid treating process supplying a liquid onto the substrate is performed.
In general, the liquid treating process is a process for liquid-processing the substrate by discharging a processing liquid from a nozzle.
Various pumps are used for the chemical liquid supply apparatus of the liquid processing process. Among them, the mini pump (Entegris, rolling diaphragm method) is difficult to be applied to micro process equipment (ArF, EUV equipment) because of its poor chemical liquid replacement rate and high possibility of causing particles by the stagnant photoresist (PR).
Another EPT pump (Korea Institute of Industrial Technology, jointly developed with Koganei, tube diaphragm method) requires a ball screw, LM guide, LM block, and the like for converting the rotational force of the motor into up-and-down moving force, which increases the size of the pump.
The present invention has been made in an effort to provide a torsion pump and a chemical liquid supplying unit capable of improving a chemical liquid replacement ratio.
The present invention has also been made in an effort to provide a torsion pump and a chemical liquid supplying unit of which a size may be reduced.
The present invention has also been made in an effort to provide a torsion pump and a chemical liquid supplying unit capable of compensating for a length of a tube according to torsional deformation of the tube.
The problem to be solved by the present invention is not limited to the above-mentioned problems. The problems not mentioned will be clearly understood by those skilled in the art from the descriptions below.
An exemplary embodiment of the present invention provides a torsion pump including: a tube including a pump chamber communicating with a chemical liquid inlet and a chemical liquid outlet; and a driving unit for transmitting rotational force to the tube to twist the tube, in which the tube has a non-linear shape.
Further, the tube may have a bent portion bent at a predetermined angle.
Further, the tube may include: a flexible tube body; a first flange provided at one end of the tube body; and a second flange provided at the other end of the tube body, and the second flange is connected to the driving unit and is rotated.
Further, the tube body may be provided such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body cross each other at the bent portion.
Further, the tube body may be provided in an oval or rectangular cross-section with a large aspect ratio.
Further, the torsion pump may further include a compensating member which is provided to the first flange and compensates for vertical length deformation when the tube body is twisted.
Further, the compensating member may be any one of a rolling diaphragm and an elastic member.
Further, the driving unit may have a rotation shaft connected to the second flange; and the rotation shaft may be positioned on the same line as the second central axis.
Another exemplary embodiment of the present invention provides an apparatus for supplying a chemical liquid, the apparatus including: a pump for supplying a chemical liquid to a nozzle that discharges the chemical liquid to a substrate; a trap tank in which the chemical liquid to be supplied from the pump to the nozzle is temporarily stored; a bottle containing the chemical liquid stored in the trap tank; and a filter provided on a path through which the chemical liquid is supplied from the trap tank to the pump, in which the pump includes: a tube including a pump chamber communicating with a chemical liquid inlet and a chemical liquid outlet and having a non-linear shape; and a driving unit for transmitting rotational force to the tube to twist the tube.
Further, the tube may have a bent portion bent at a predetermined angle.
Further, the tube may include: a flexible tube body; a first flange provided at one end of the tube body; and a second flange provided at the other end of the tube body, and the second flange may be connected to the driving unit.
Further, the tube body may be provided such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body cross each other at the bent portion.
Further, the tube body may be provided in an oval or rectangular cross-section with a large aspect ratio.
Further, the torsion pump may further include a compensating member which is provided to the first flange and compensates for vertical length deformation when the tube body is twisted.
Further, the compensating member may be any one of a rolling diaphragm and an elastic member.
Further, the driving unit may have a rotation shaft connected to the second flange; and the rotation shaft may be positioned on the same line as the second central axis.
Still another exemplary embodiment of the present invention provides a torsion pump including: a flexible tube body including a pump chamber; a first flange provided at one end of the tube body; and a second flange provided at the other end of the tube body; and a driving unit for transmitting rotational force to the tube body to twist the tube body, in which the tube body has a bent portion bent at a predetermined angle.
Further, the tube body may be provided such that a first central axis passing through one end of the tube body and a second central axis passing through the other end of the tube body cross each other at the bent portion.
Further, the tube body may be provided in an oval or rectangular cross-section with a large aspect ratio.
Further, the torsion pump may further include a compensating member which is provided on the first flange and compensates for vertical length deformation when the tube body is twisted, in which the compensating member may be any one of a rolling diaphragm and an elastic member.
According to the exemplary embodiment of the present invention, it is possible to substitute a chemical liquid replacement ratio.
According to the exemplary embodiment of the present invention, it is possible to decrease a size of the pump.
According to the exemplary embodiment of the present invention, it is possible to stably twist the tube.
According to the exemplary embodiment of the present invention, a stable torsional operation of the tube is possible by compensating for the length of the tube according to the torsional deformation of the tube.
Advantages and characteristics, and a method for achieving them will be clear when exemplary embodiments described in detail with reference to the accompanying drawings are referred to. However, the present disclosure is not limited to exemplary embodiments disclosed herein but will be implemented in various forms, and the exemplary embodiments are provided so that the present disclosure is completely disclosed, and a person of ordinary skilled in the art can fully understand the scope of the present disclosure, and the present disclosure will be defined only by the scope of the appended claims.
Even if not defined, all terms (including technical or scientific terms) used herein have the same meaning as commonly accepted by common skill in the related art to which this invention belongs. Terms defined by the general dictionaries may be interpreted as having the same meaning as in the related art and/or in the text of the present application, and the terms will not be conceptualized or interpreted overly formal even if the term is not a clearly defined expression here. The terms used in the present specification is for the purpose of describing exemplary embodiments, and do not intend to limit the present invention.
In the present specification, a singular form includes a plural form as well, unless otherwise mentioned. A term “include” and/or various conjugations of this verb do not exclude the existence or an addition of one or more other compositions, components, constituent elements, steps, operations, and/or devices, in addition to the mentioned composition, component, constituent element, step, operation, and/or device. Further, “is provided”, “have” and the like should be interpreted in the same way.
The equipment of the present exemplary embodiment is described as being used to perform a photolithography process on a substrate, such as a semiconductor wafer or a flat panel display panel, but this is for convenience of description and the present invention may also be used for other apparatuses using a pump for supplying a chemical liquid to treat a substrate.
Hereinafter, an embodiment of the present invention will be described with reference to
Referring to
According to the exemplary embodiment, the index module 100, the processing module 300, and the interface module 500 are sequentially arranged in a line. Hereinafter, the direction in which the index module 100, the processing module 300, and the interface module 500 are arranged is called a first direction 12, and when viewed from the top, a direction perpendicular to the first direction 12 is defined as a second direction 14, and a direction perpendicular to both the first direction 12 and the second direction 14 is defined as a third direction 16.
The index module 100 transfers a substrate W to the processing module 300 from a container F in which the substrate W is accommodated, and receives the completely treated substrate W into the container F. A longitudinal direction of the index module 100 is provided in the second direction 14. The index module 100 includes a load port 110 and an index frame 130. With respect to the index frame 130, the load port 110 is located on the opposite side of the processing module 300. The container F in which the substrates W are accommodated is placed on the load port 110. A plurality of load ports 110 may be provided, and the plurality of load ports 110 may be disposed along the second direction 14.
As the container F, an airtight container F, such as a Front Open Unified Pod (FOUP), may be used. The container F may be placed on the load port 110 by a transfer means (not illustrated), such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle, or an operator.
An index robot 132 is provided inside the index frame 130. A guide rail 136 of which a longitudinal direction is provided in the second direction 14 is provided within the index frame 130, and the index robot 132 may be provided to be movable on the guide rail 136. The index robot 132 includes a hand on which the substrate W is placed, and the hand is provided to be movable forward and backward, rotatable about the third direction 16, and movable in the third direction 16.
The processing module 300 may perform a coating process and a developing process on the substrate W. The processing module 300 may receive the substrate W accommodated in the container F and perform a substrate treating process. The processing module 300 includes a coating block 300a and a developing block 300b. The coting block 300a performs a coating process on the substrate W, and the developing block 300b performs a developing process on the substrate W. A plurality of coating blocks 300a is provided, and the coating blocks 300a are provided to be stacked on each other. A plurality of developing blocks 300b is provided, and the developing blocks 300b are provided to be stacked on each other. According to the exemplary embodiment of
Referring to
The transfer chamber 350 is provided so that a longitudinal direction thereof is parallel to the first direction 12. The transfer robot 350 is provided to the transfer chamber 900. The transfer robot 352 transfers the substrate between the heat processing chamber 320, the liquid processing chamber 360, and the buffer chambers 312 and 316. According to an example, the transfer robot 900 includes a hand on which the substrate W is placed, and the hand may be provided to be movable forward and backward, rotatable about the third direction 16, and movable in the third direction 16. A guide rail 356, of which a longitudinal direction is parallel to the first direction 12, is provided within the transfer chamber 350, and the transfer robot 900 may be provided to be movable on the guide rail 356.
Referring back to
Referring to
The housing 321 is provided in the shape of a generally rectangular parallelepiped. An entrance (not illustrated) through which the substrate W enters and exits is formed on the sidewall of the housing 321. The entrance may remain open. Optionally, a door (not illustrated) may be provided to open and close the entrance. The cooling unit 322, the heating unit 323, and the transfer plate 324 are provided inside the housing 321. The cooling unit 322 and the heating unit 323 are arranged along the second direction 14. According to an example, the cooling unit 322 may be located closer to the transfer chamber 350 than the heating unit 322.
The cooling unit 322 has a cooling plate 322a. The cooling plate 322a may have a generally circular shape when viewed from the top. The cooling plate 322a is provided with a cooling member 322b. According to an example, the cooling member 322b is formed inside the cooling plate 322a and may be provided as a flow path through which the cooling fluid flows.
The heating unit 323 includes a heating plate 323a, a cover 323c, and a heater 323b. The heating plate 323a has a generally circular shape when viewed from the top. The heating plate 323a has a larger diameter than the substrate W. The heater 323b is installed on the heating plate 323a. The heater 323b may be provided as a heating resistor to which current is applied. The heating plate 323a is provided with lift pins 323e drivable in the vertical direction along the third direction 16. The lift pin 323e receives the substrate W from a transfer means outside the heating unit 323 and places the received substrate W on the heating plate 323a or lifts the substrate W from the heating plate 323a and hands over the substrate W to the external transfer means. According to the example, three lift pins 323e may be provided. The cover 323c has a space with an open lower portion therein.
The cover 323c is located above the heating plate 323a and is moved in a vertical direction by a driver 3236d. The space formed by the cover 323c and the heating plate 323a according to the movement of the cover 323c is provided as a heating space for heating the substrate W.
The transfer plate 324 is provided in a substantially disk shape, and has a diameter corresponding to that of the substrate W. A notch 324b is formed at an edge of the transfer plate 324. The notch 324b may have a shape corresponding to a protrusion 3543 formed on the hand 354 of the transfer robot 352 described above. In addition, the notches 324b are provided in a number corresponding to the number of protrusions 3543 formed on the hand 354, and are formed at positions corresponding to the protrusions 3543. When the upper and lower positions of the hand 354 and the transfer plate 324 are changed in the position where the hand 354 and the transfer plate 324 are aligned in the vertical direction, the substrate W is transferred between the hand 354 and the transfer plate 324. The transport plate 324 is mounted on a guide rail 324d and may be moved between a first area 3212 and a second area 3214 along the guide rail 324d by a driver 324c. A plurality of slit-shaped guide grooves 324a is provided in the transfer plate 324. The guide groove 324a extends from the end of the transfer plate 324 to the inside of the transfer plate 324. The longitudinal direction of the guide grooves 324a is provided along the second direction 14, and the guide grooves 324a are spaced apart from each other along the first direction 12. The guide groove 324a prevents the transfer plate 324 and the lift pins 323e from interfering with each other when the substrate W is transferred between the transfer plate 324 and the heating unit 323.
The substrate W is cooled in the state where the transfer plate 324 on which the substrate W is placed is in contact with the cooling plate 322a. The transfer plate 324 is made of a material having high thermal conductivity so that heat transfer is well performed between the cooling plate 322a and the substrate W. According to the example, the transfer plate 324 may be made of a metal material.
The heating units 323 provided in some of the heat treating chambers 320 may supply a gas while heating the substrate W to improve the adhesion rate of the photoresist to the substrate. According to the example, the gas may be hexamethyldisilane (HMDS) gas.
Referring back to
The front liquid processing chamber 362 applies a first liquid onto the substrate W, and the rear liquid processing chamber 284 applies a second liquid onto the substrate W. The first liquid and the second liquid may be different types of liquid. According to the exemplary embodiment, the first liquid is an antireflection film, and the second liquid is a photoresist. The photoresist may be applied onto the substrate W coated with the antireflection film. Optionally, the first liquid may be a photoresist, and the second liquid may be an antireflection film. In this case, the antireflection film may be applied onto the substrate W coated with the photoresist. Optionally, the first liquid and the second liquid are the same type of liquid, and both the first liquid and the second liquid may be the photoresist.
The developing block 300b has the same structure as the coating block 300a, and the liquid processing chamber provided in the developing block 300b supplies a developer onto the substrate.
The interface module 500 connects the processing module 300 to an external exposing device 700. The interface module 500 includes an interface frame 510, an additional process chamber 520, an interface buffer 530, and an interface robot 550.
A fan filter unit for forming a descending airflow therein may be provided at an upper end of the interface frame 510. The additional process chamber 520, the interface buffer 530, and the interface robot 550 are disposed inside the interface frame 510. The additional process chamber 340 may perform a predetermined additional process before the substrate W, which has been completely treated in the coating block 300a, is loaded into the exposing device 700. Optionally, the additional process chamber 520 may perform a predetermined additional process before the substrate W, which has been completely processed in the exposing device 700, is loaded into the developing block 300b. According to one example, the additional process may be an edge exposure process of exposing an edge region of the substrate W, a top surface cleaning process of cleaning the upper surface of the substrate W, or a lower surface cleaning process of cleaning the lower surface of the substrate W. A plurality of additional process chambers 520 is provided, and may be provided to be stacked on each other. All of the additional process chambers 520 may be provided to perform the same process. Optionally, a part of the additional process chambers 520 may be provided to perform different processes.
The interface buffer 530 provides a space in which the substrate W transferred between the coating block 300a, the additional process chamber 520, the exposing device 700, and the developing block 300b temporarily stays during the transfer. A plurality of interface buffers 530 may be provided, and the plurality of interface buffers 530 may be provided to be stacked on each other.
According to the example, the additional process chamber 520 may be disposed on one side of the transfer chamber 350 based on an extended line in the longitudinal direction and the interface buffer 530 may be disposed on the other side thereof.
The interface robot 550 transfers the substrate W between the coating block 300a, the additional process chamber 520, the exposing device 700, and the developing block 300b. The interface robot 550 may have a transfer hand that transfers the substrate W. The interface robot 550 may be provided as one or a plurality of robots. According to the example, the interface robot 550 has a first robot 552 and a second robot 554. The first robot 552 may be provided to transfer the substrate W between the coating block 300a, the additional process chamber 520, and the interface buffer 530, and the second robot 554 may be provided to transfer the substrate W between the interface buffer 530 and the exposing device 700, and the second robot 554 may be provided to transfer the substrate W between the interface buffer 530 and the developing block 300b.
The first robot 552 and the second robot 554 each include a transfer hand on which the substrate W is placed, and the hand may be provided to be movable forward and backward, rotatable about an axis parallel to the third direction 16, and movable along the third direction 16.
Hereinafter, the structure of the liquid processing chamber will be described in detail. Hereinafter, the liquid processing chamber provided in the coating block will be described as an example. In addition, the liquid processing chamber will be described based on the case of a chamber for applying the photoresist onto the substrate as an example. However, the liquid processing chamber may be a chamber in which a film, such as a protective film or an antireflection film, is formed on the substrate W. In addition, the liquid processing chamber may be a chamber for developing the substrate W by supplying a developer to the substrate W.
Referring to
The housing 1100 is provided in a rectangular cylindrical shape having an inner space. Openings 1101a and 1101b are formed at one side of the housing 1100. The openings 1101a and 1101b function as passages through which the substrate W is loaded in and out. Doors 1103a and 1103b are installed in the openings 1101a and 1101b, and the doors 1103a and 1103b open and close the openings 1101a and 1101b.
A fan filter unit 1130 is disposed on the upper wall of the housing 1100 to supply a descending airflow into the inner space. The fan filter unit 1130 includes a fan for introducing external air into the inner space and a filter for filtering external air.
The first processing unit 1201a and the second processing unit 1201b are provided in the inner space of the housing 1100. The first processing unit 1201a and the second processing unit 1201b are arranged along one direction. Hereinafter, a direction in which the first processing unit 1201a and the second processing unit 1201b are arranged is referred to as a unit arrangement direction, and is illustrated in the X-axis direction in
The first processing unit 1201a has a first processing container 1220a and a first support unit 1240a.
The first processing container 1220a has a first inner space 1222a. The first inner space 1222a is provided with an open top.
The first support unit 1240a supports the substrate W in the first inner space 1222a of the first processing container 1220a. The first support unit 1240a includes a first support plate 1242a, a first driving shaft 1244a, and a first driver 1246a. The first supporting plate 1242a has a circular top surface. The first support plate 1242a has a smaller diameter than that of the substrate W. The first support plate 1242a is provided to support the substrate W by vacuum pressure. Optionally, the first support plate 1242a may have a mechanical clamping structure for supporting the substrate W. A first driving shaft 1244a is coupled to the center of the bottom surface of the first support plate 1242a, and a first driver 1246a for providing rotational force to the first driving shaft 1244a is provided to the first driving shaft 1244a. The first driver 1246a may be a motor.
The second processing unit 1201b includes a second processing container 1220b and a second support unit 1240b, and the second support unit 1240b includes a second support plate 1242b, a second driving shaft 1244b, and a second driver 1246b. The second processing container 1220b and the second supporting unit 1240b have substantially the same structure as the first processing container 1220a and the first supporting unit 1240a.
The liquid supply unit 1400 supplies the liquid onto the substrate W. The liquid supply unit 1400 includes a first nozzle 1420a, a second nozzle 1420b, and a processing liquid nozzle 1440. The first nozzle 1420a supplies a liquid to the substrate W provided to the first support unit 1240a, and the second nozzle 1420b supplies a liquid to the substrate W provided to the second support unit 1240b. The first nozzle 1420a and the second nozzle 1420b may be provided to supply the same type of liquid. According to the example, the first nozzle 1420a and the second nozzle 1420b may supply a rinse liquid for cleaning the substrate W. For example, the rinse liquid may be water. According to another example, the first nozzle 1420a and the second nozzle 1420b may supply a removal liquid for removing the photoresist from the edge region of the substrate W. For example, the removal liquid may be a thinner Each of the first nozzle 1420a and the second nozzle 1420b may be rotated between a process position and a standby position about a rotation shaft thereof. The process position is a position at which the liquid is discharged onto the substrate W, and the standby position is a position at which the first nozzle 1420a and the second nozzle 1420b stand by without discharging the liquid onto the substrate W.
The processing liquid nozzle 1440 supplies the processing liquid to the substrate W provided to the first support unit 1240a and the substrate W provided to the second support unit 1240b. The treatment solution may be a photoresist. The nozzle driver 1448 drives the processing liquid nozzle 1440 so that the processing liquid nozzle 1440 moves between a first process position, the standby position, and a second process position along a guide 1442. The first process position is a position for supplying the processing liquid to the substrate W supported by the first support unit 1240a, and the second process position is a position for supplying the processing liquid to the substrate W supported by the second support unit 1240b. The standby position is a position in which the nozzle waits the standby port 1444 located between the first processing unit 1201a and the second processing unit 1201b when the photoresist is not discharged from the processing liquid nozzle 1440.
A gas-liquid separation plate 1229a may be provided in the inner space 1201a of the first processing container 1220a. The gas-liquid separation plate 1229a may be provided to extend upwardly from the bottom wall of the first processing container 1220a. The gas-liquid separation plate 1229a may be provided in a ring shape.
According to the example, the outside of the gas-liquid separation plate 1229a may be provided as a discharging space for discharging the liquid, and the inside of the gas-liquid separation plate 1229a may be provided as an exhaust space for exhausting the atmosphere. A discharge pipe 1228a for discharging the processing liquid is connected to the bottom wall of the first processing container 1220a. The discharge pipe 1228a discharges the processing liquid introduced between the sidewall of the first processing container 1220a and the gas-liquid separation plate 1229a to the outside of the first processing container 1220a. The airflow flowing into the space between the sidewall of the first processing container 1220a and the gas-liquid separation plate 1229a is introduced into the gas-liquid separation plate 1229a. In this process, the processing liquid contained in the airflow is discharged from the discharging space to the outside of the first processing container 1220a through the discharge pipe 1228a, and the airflow is introduced into the exhaust space of the first processing container 1220a.
Although not illustrated, a lift driver for adjusting the relative height of the first support plate 1242a and the first processing container 1220a may be provided.
Hereinafter, the present invention will be described based on the case where a robot 900 of
Referring to
The robot main body 902 may include a hand 910 capable of moving forward and backward (X direction) and rotating (0 direction) while supporting the substrate, and a hand driving unit 920 including a base supporting the hand 910.
The hand driving unit 920 horizontally moves the hands 910, and the hands 910 are individually driven by the hand driving unit 920. The hand driving unit 920 includes a connecting arm 912 connected to an internal driving unit (not illustrated), and the hand 910 is installed at an end of the connecting arm 912. In the present exemplary embodiment, the transfer robot 900 includes two hands 910, but the number of hands 910 may increase according to the process efficiency of the substrate treating apparatus 10. A rotating unit (not illustrated) is installed under the hand driving unit 920. The rotating unit is coupled to the hand driving unit 920 and rotates to rotate the hand driving unit 920. Accordingly, the hands 910 rotate together.
The horizontal driving unit 930 and the vertical driving unit 940 are mounted on one body frame 990.
The body frame 990 may be provided in a form in which several frames are coupled to each other. The body frame 990 may include an upper horizontal driving unit 930a and a lower horizontal driving unit 930b for guiding the robot main body in the Y direction, a vertical auxiliary frame 992 erected in the vertical direction between the upper and lower horizontal driving units 930a and 930b, a horizontal auxiliary frame 993 extending in parallel to the lower horizontal driving unit 930b to form the body frame 990, an auxiliary frame 994 for coupling the upper and lower horizontal driving units 930a and 930b and the ends of the horizontal auxiliary frame 993 to each other to form a side shape of the body frame 990.
In this way, since the body frame 990 is coupled by a plurality of auxiliary frames 992, 993, and 994, the rigidity of the body frame 990 is strengthened, and thus durability is enhanced, such as being able to maintain the shape thereof completely even when used for a long time.
As described above, the horizontal driving units 930a and 930b are traveling guides for moving the robot main body 902 in the Y direction, and are coupled to both leading ends of the vertical driving unit 940. Among the horizontal driving units 930a and 930b, in particular, a horizontal driving unit (not illustrated) including a transfer belt is built in the inner surface of the lower horizontal driving unit 930b. Accordingly, the robot main body 902 is horizontally moved along the horizontal driving unit 930a and 930b by the driving of the transfer belt.
The vertical driving unit 940 is a type of traveling driving unit for moving the robot main body 902 in the Z direction, and is coupled to the horizontal driving units 930b and 930a. Accordingly, the robot main body 902 may be guided by the horizontal driving units 930b and 930a to move in the Y direction, and at the same time be guided by the vertical driving unit 940 to move in the Z direction. That is, the robot body 902 may be moved in an oblique direction corresponding to the sum of the Y direction and the Z direction.
On the other hand, the vertical driving unit 940 is formed of a plurality of frames, for example, two vertical frames, which are spaced apart from each other, so that the robot body 902 may freely enter and exit the space between the two frames.
A vertical driving unit (hereinafter referred to as a vertical driving unit) including a transfer belt is built in the vertical frame 950 of the vertical driving unit 940.
Referring to
The liquid supply line 1430 connects the nozzle 1420 and the liquid receiving member 1410. In the liquid supply line 1430, a trap tank 1450, a pump 2000, and a filter 1460 are installed between the nozzle 1420 and the liquid receiving member 1410. The liquid receiving member 1410 has a receiving space in which the processing liquid is accommodated. The liquid receiving member 1410 may be a bottle in which the processing liquid is accommodated. The processing liquid may be a photoresist containing fluorine (F).
In the trap tank 1450, bubbles of the processing liquid flowing through the liquid supply line 1430 may be removed. The trap tank 1450 is positioned between the nozzle 1420 and the liquid receiving member 1410 in the liquid supply line 1430.
The pump 2000 pressurizes the liquid supply line 1430 so that the processing liquid flowing through the liquid supply line 1430 is supplied in a direction toward the nozzle 1420. The pump 2000 is located downstream the trap tank 1450 in the liquid supply line 1430. According to the example, the pump 2000 may discharge the processing liquid in a manner of discharging the processing liquid in the tube by applying torsion to the tube to induce a change in the volume of the tube.
The filter 1500 filters impurities in the processing liquid flowing through the liquid supply line 1200. The filter 1500 is positioned between the trap tank 1300 and the pump 2000 in the liquid supply line 1200. The filter 1500 may be located closer to the pump 2000 than the trap tank 1300 in the liquid supply line 1200. In the process of passing the processing liquid through the filter 1500, impurities are filtered.
The purge line 1470 is connected to the liquid supply line 1200 so that the processing liquid that has passed through the pump 2000 is returned to the trap tank 1300.
Referring to
The pump 2000 is a method of discharging the processing liquid in the tube 2100 by applying torsion to the tube 2100 to induce a change in volume.
For example, the tube 2100 may include a flexible tube body 2110, a first flange 2120 provided at one end of the tube body 2110, and a second flange 2130 provided at the other end of the tube body 2110, and a compensating member 2180.
The tube 2100 performs a twist motion by rotational force applied from the outside. The tube 2100 may be made of a flexible polymer material. Of course, as long as the material of the tube 2100 is capable of being twisted when external force is applied, any material may be used. The tube 2100 is preferably manufactured to have elastic restoring force so that the tube can be restored to its initial state when the force applied from the outside is released. Of course, the tube 2100 may be manufactured so as not to have elastic restoring force. This is because the tube 2100 may be restored to its initial state by using force applied from the outside for the twist motion of the tube 2100. However, when the tube 2100 is manufactured to have elastic restoring force so that the tube 2100 can be restored to its initial state by itself, it is possible to reduce the load of externally applied force, so that the tube 2100 is preferably manufactured to have elastic restoring force.
The tube body 2110 has a certain length and has a hollow part (pump chamber) therein. Both ends of the tube body 2110 are opened to allow the processing liquid to enter and exit. Referring to the cross section of the tube body 2110, although the tube body 210 is illustrated as having an elliptical shape with a large aspect ratio, the shape of the tube body is not limited thereto. Here, the aspect ratio may be 1:2 to 1:10.
As shown in
Referring back to 11 to 13, the tube body 2110 has a non-linear shape in the longitudinal direction. The tube body 2110 has a bent portion 2119 bent at a predetermined angle in the middle, and a first central axis S1 passing through one end of the tube body 2110 and a second central axis S2 passing through the other end of the tube body 2110 may be provided to cross each other in the bent portion 2119. For reference, the tube body 2110 may be divided into an upper body 2111 through which the first central axis S1 passes and a lower body 2112 through which the second central axis S2 passes based on the bent portion 2119.
As such, the pump has a shape in which the tube body 2100 is bent at the predetermined angle, so that when the tube body 2110 is rotated by the driving unit 2900, the tube body 2110 is folded from the bent portion 2119 rather than both ends of the tube body 2110. In addition, the upper body 2111 of the tube body 2110 may have a smaller torsional deformation than the lower body 2112. The reason is that the rotational force of the driving unit 2900 is concentrated on the lower body 2112 and the bent portion 2119. As such, the tube body 2110 may be twisted stably by the bent portion 2119. Here, the bending angle of the tube body 2110 may be variously changed.
On the other hand, the tube body 2110 may have a different cross-sectional shape between the upper end and the lower end.
Referring back to
The second flange 2130 is coupled to the lower end of the tube body 2110 to seal the lower portion of the tube body 2110. The second flange 2130 may be formed with an outlet 2132 through which the processing liquid is discharged from the inner space of the tube body 2110.
The first flange 2120 may be fixed to a separate structure so that rotation is not allowed. The second flange 2130 is connected to the rotation shaft 2920 of the driving unit 2900 so as to be rotated by receiving rotational force. Although not shown, the second flange 2130 may include an inner flange rotated by the rotation shaft 2920 and an outer flange having an outlet 2132. A bearing may be provided between the outer flange and the inner flange so that the outer flange is not rotated even when the inner flange is rotated, and a flow path connecting the inner space of the tube body 2110 and the outlet may be provided in the inner flange and the outer flange. With this structure, it is possible to prevent twisting of the liquid supply line 1430 connected to the outlet 2132 when the second flange 2130 is rotated.
The compensating member 2180 may be provided between the first flange 2120 and the fixing flange 2150. The fixing flange 2150 may be fixedly installed on a surrounding structure. The compensation member 2180 is for compensating for vertical length deformation when the tube body 2110 is twisted. For example, the compensating member 2180 may include a rolling diaphragm 2182.
As shown in
The driving unit 2900 transmits rotational force to the tube to twist the tube 2100. The driving unit 349 may include a motor. The driving unit 2900 may include a speed reducer for speed control or the like.
The driving unit 2900 is connected to the variable member 2700. The rotational force of the driving unit 2900 may be provided to the second flange 2130 through the variable member 2700.
According to the present invention, since the motor force of the driving unit 2900 is transmitted as force that directly twists the tube, there is no need for an additional device, such as an LM guide or a ball screw, for changing the direction of the force, thereby reducing the size of the pump.
The operation of the pump having the above-described structure is as follows.
In the suction operation of the pump 2100, when the tube body 2110 is restored to its initial state in the state where the inlet 2122 is opened and the outlet 2132 is closed, the processing liquid is introduced into the hollow of the tube body 2110 through the inlet 2122. In the discharging operation of the pump 2100, when the inlet 2122 is closed and the tube body 2110 is twisted in a state where the outlet 2132 is open, as the volume of the hollow portion of the tube body 2110 is reduced, the processing liquid filled in the hollow portion of the tube body 2110 is discharged through the outlet 2132.
Referring to
In this modified example, the compensating member 2180a is provided in the form of an elastic body, such as the spring 2184, which is a difference. For example, the spring 2184 may be connected to the first flange 2120a by a ball joint 2186.
Referring to
The present embodiment is characterized in that an outlet 2132b is provided in the tube body 2110b. The outlet 2132b is formed on one side of an upper body 2111b of the tube body. The upper body 2111b of the tube body 2110b is a portion in which torsional deformation is generated smaller than that of the lower body 2112b, and is a suitable portion for the outlet 2132b to be formed.
As shown in
The foregoing detailed description illustrates the present invention. In addition, the above description illustrates and describes the exemplary embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, the foregoing content may be modified or corrected within the scope of the concept of the invention disclosed in the present specification, the scope equivalent to that of the disclosure, and/or the scope of the skill or knowledge in the art. The foregoing exemplary embodiment describes the best state for implementing the technical spirit of the present invention, and various changes required in specific application fields and uses of the present invention are possible. Accordingly, the detailed description of the invention above is not intended to limit the invention to the disclosed exemplary embodiment. Further, the accompanying claims should be construed to include other exemplary embodiments as well.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2021-0141253 | Oct 2021 | KR | national |
