This relates generally to electronic devices and, more particularly, to electronic devices with touch screen displays.
Electronic devices often include displays. For example, cellular telephones and computers have displays.
Displays in electronic devices sometimes incorporate touch sensor functionality. As an example, a display may be provided with a touch sensor that is formed from an array of transparent capacitive touch sensor electrodes. During operation of an electronic device, a touch sensor may be used in gathering touch input from a user.
To ensure that the electrodes of a capacitive touch sensor array do not block light that is being emitted from the display, the electrodes are formed from a transparent conductive material such as indium tin oxide.
Indium tin oxide capacitor electrodes are typically supported by a clear substrate such as a layer of glass or plastic. The index of refraction of indium tin oxide is relatively high compared to these substrate materials. As a result, there is a significant index-of-refraction mismatch between the capacitive touch sensor electrodes and the substrate. If care is not taken, the index-of-refraction mismatch may give rise to increased reflection from the touch screen display and visible artifacts on the display from the presence of the patterned capacitive touch sensor electrodes.
It would therefore be desirable to be able to provide improved touch screen displays for electronic devices.
An electronic device may have a touch screen display or other input-output device that includes transparent conductive electrodes. The transparent conductive electrodes may be used in forming an array of capacitive touch sensor electrodes for a touch sensor that overlaps display layers associated with a display.
The transparent conductive electrodes may be formed from a material that has a relatively high index of refraction such as indium tin oxide. Surrounding layers of the touch screen display such as a touch sensor substrate for the touch sensor and an underlying display layer associated with a liquid crystal display or organic light-emitting display may have lower index of refraction values. For example, a substrate in the touch screen display may have an index of refraction in the range of 1.5 to 1.7 and a display layer in a display such as a liquid crystal display or organic light-emitting diode display may have an index of refraction of about 1.5, whereas transparent conductive electrodes for a touch sensor that are formed from indium tin oxide may have an index of refraction of about 1.9.
Some touch sensor electrodes may be relatively large (e.g., several millimeters in width or more) and therefore may have the potential to be visible to a user of an electronic device. To prevent abrupt index-of-refraction discontinuities that lead to unwanted reflections and visible artifacts on the display, the transparent conductive electrodes may be embedded within a dielectric layer that has a varying index of refraction.
The dielectric layer may have a graded index of refraction. The graded index of refraction may be varied continuously or in a stepwise fashion by adjusting the composition of materials that are incorporated into the dielectric layer as a function of position within the layer. As an example, the graded index-of-refraction layer may be produced from a mixture of silicon oxide (which has an index of refraction of 1.5) and a metal oxide with an index of refraction of more than 2.0 (as an example). By adjusting the ratio between the silicon oxide and the metal oxide (or other high-index material), the index of refraction of the dielectric layer can be adjusted as a function of position in the dielectric layer.
The graded index-of-refraction dielectric layer may have an index of refraction that is matched to that of a touch sensor substrate within portions of the dielectric layer that are adjacent to the substrate, may have an index of refraction that is matched to that of the transparent conductive capacitive touch sensor electrodes within portions of the dielectric layer that are adjacent to the electrodes, and may have an index of refraction that is matched to that of the underlying display (i.e., the display layers that are overlapped by the touch sensor) within portions of the dielectric layer that are adjacent to the underlying display. The index of refraction of the dielectric layer may increase monotonically between the substrate and the electrodes and may increase monotonically between the underlying display and the electrodes.
Use of a graded index dielectric layer in a touch screen display may reduce reflections from the display and may help minimize display discoloration effects during off-axis viewing.
Electronic devices may be provided with input-output devices such as touch screen displays. Components such as touch screen displays may be formed from multiple layers of material. For example, a touch screen display may have one or more display layers for producing visible images for a user and one or more layers that form a touch sensor. Displays may also be provided with protective cover layers such as a cover glass layer or a plastic display cover layer.
In forming an input-output device for an electronic device such as a touch screen display, it may be desirable to form patterned structures from a material that has an index of refraction that differs from its surroundings. When forming a capacitive touch sensor for a display, for example, it may be desirable to form an array of patterned transparent conductive electrodes on a transparent substrate. The array of patterned transparent conductive electrodes may be formed from a transparent conductive material such as indium tin oxide on a transparent substrate such as a layer of glass or plastic.
The index of refraction of indium tin oxide is 1.9, whereas the index of refraction of glass is about 1.5. Due to the index-of-refraction mismatch between indium tin oxide and glass of the substrate on which the indium tin oxide electrodes are formed, there is a potential for undesired reflections and visible artifacts.
To minimize the visibility of structures in an input-output device such as a touch screen display due to index-of-refraction mismatch, the material surrounding the high index of refraction material can be configured to have a graded index of refraction. The presence of the graded index in the vicinity of the indium tin oxide electrodes helps to reduce index mismatch at the interface between the indium tin oxide electrodes and surrounding materials and thereby helps reduce reflections and visible artifacts.
The graded index of refraction may be produced by using a continuously or stepwise varying mixture of high and low index materials. As an example, the graded index of refraction may be produced by depositing a continuously varying (or stepwise varying) mixture of silicon oxide (SiO2) and niobium oxide (Nb2O5). The deposited mixture may have an index of refraction of close to that of glass at the interface with the glass substrate by adjusting the mixture to include mostly silicon oxide. Near the interface between the deposited mixture and the indium tin oxide electrodes, more niobium oxide may be incorporated into the mixture to raise the index of refraction to match that of indium tin oxide (1.9). The index profile associated with the graded index may have endpoints that match the index of adjoining layers. For example, the upper (outermost) portion of the graded index material may have an index that matches the index of an overlapping substrate on which the indium tin oxide electrodes are formed and the lower (innermost) portion of the graded index material may have an index that matches the index of refraction of a display layer in an underlying display module.
A graded index of refraction region may be used to reduce reflections and visible artifacts in a stand-alone touch sensor, in a touch sensor that is incorporated into a display to form a touch screen display, in a display without a touch sensor that contains one or more traces of material with a potentially mismatched index of refraction, in a display in which touch sensor layers are attached to display layers with adhesive or other attachment mechanisms, in a display in which touch sensor and display features are formed using one or more shared display layers or in other suitable input-output device structures. Configurations in which a graded index of refraction region is formed as part of a touch screen display to help conceal capacitive touch sensor electrodes are sometimes described herein as an example.
Illustrative electronic devices that have touch sensor displays with graded index regions are shown in
Electronic device 10 of
In the example of
Displays such as the displays of
Touch sensor display layers 34 may include, for example, a substrate layer of a transparent material such as glass or plastic, optional coatings, layers of transparent dielectric that serve as electrical isolation layers between deposited conductive layers, etc. Touch sensor layers 34 may include touch sensor electrodes 36. Touch sensor electrode 36 may include patterned conductive electrodes that serve as capacitive electrodes in a capacitive touch sensor.
Conductive paths 40 may be used to couple touch sensor electrodes 36 to touch sensor processing circuitry 38. Touch sensor processing circuitry 38 may use electrodes 36 to gather touch input associated with an external object such as external object 42 (e.g., a user's finger).
Adhesive 48 such as pressure sensitive adhesive or optically clear liquid adhesive may be used in attaching display layers 46 to touch sensor 32. Touch sensor 32 may have a substrate layer such as substrate 34-1. Substrate 34-1 may be a planar layer of clear glass (e.g., a rectangular sheet of glass), a layer of transparent plastic, ceramic, multiple layers of transparent dielectric, or other suitable material. Substrate 34-1 may be formed above or below electrodes 36. In the example of
Electrodes 36 may be embedded within graded index layer 34-2. Graded index layer 34-2 may be formed from a transparent dielectric such as a mixture of silicon oxide and dielectric that has a higher index of refraction than silicon oxide. Silicon oxide has an index of refraction of 1.5. Dielectric materials that have an index of refraction higher than silicon oxide include niobium oxide, tantalum oxide, titanium oxide, other metal oxides, oxynitrides, silicon nitride, etc.
The index of refraction of indium tin oxide is 1.9. When touch sensor electrodes 36 are formed from a material such as indium tin oxide, touch sensor electrodes 36 may therefore have an index of refraction that is relatively large relative to the index of material of surrounding materials. Graded index layer 34-2 preferably has an index profile that helps minimize reflections at the interface between lower surface 54 of graded index layer 34-2 and adhesive 48 and/or display layers 46. For example, if display layers 46 (i.e., a polarizer layer or other plastic or glass layer in layers 46) and/or adhesive layer 48 have and index of refraction of 1.5, graded index layer 34-2 is preferably configured to have an index of refraction of about 1.5 at surface 54. Graded index layer 34-2 preferably also has an index profile that helps minimize reflections at the interface between upper surface 56 of graded index layer 34-2 and the corresponding lower surface of substrate layer 34-1. For example, if substrate 34-1 is formed from glass having an index of refraction of 1.55, graded index layer 34-2 preferably has an index of about 1.55 at upper surface 56. If substrate 34-1 is formed form a material with a larger index of refraction such as sapphire, which has an index of refraction of 1.7, graded index layer 34-2 preferably has an index of refraction of about 1.7 at upper surface 56.
At intermediate positions within graded index layer 34-2 (i.e., midway between upper surface 56 and lower surface 54 in the vicinity of electrodes 36), graded index layer 34-2 preferably has an index of refraction that is matched to the index of refraction of electrodes 36 (i.e., an index of refraction of about 1.9 to match the index of refraction of indium tin oxide).
Optional display cover layer 52 may be formed form a layer of glass or plastic (e.g., glass or plastic that is index matched to substrate 34-1 when substrate 34-1 is formed from glass or plastic), may be formed from a layer of material having a higher index of refraction (e.g., sapphire), or may be formed from other suitable materials. Adhesive layer 50 (e.g., a layer of pressure sensitive adhesive or optically clear liquid adhesive) may be used to attach display cover layer 52 to touch sensor 32.
Graded index layer 34-2 may have a continuously graded profile as illustrated by continuously varying index of refraction profile 60 or may have a stepwise varying index of refraction profile as illustrated by stepped index of refraction profile 70. There may be any suitable number of discrete steps in a stepped index of refraction profile (e.g., two or more, three or more, four or more, five or more, six or more, ten or more, twenty or more, etc.) each formed from a respective sublayer of transparent dielectric material with a corresponding index of refraction in graded index layer 34-2. The number of illustrative discrete sublayers of material used to form steps 70 of
Electrodes 36 may be buried within layer 34-2 (i.e., electrodes 36 may be formed at a location that is about midway vertically through layer 34-2). Upper display layer 34-1 (e.g., a glass or sapphire substrate layer or other display layer) may have an upper surface at position Z0 and a lower surface at position Z1. Between Z0 and Z1, layer 34-1 has an index of refraction of n1, as illustrated by index of refraction profile segment 62. At point 64, the index of refraction of graded index layer 34-2 is exactly or approximately matched to the index of refraction n1 of layer 34-1. In a continuously variable graded index configuration, for example, the index of refraction of graded index layer 34-2 is preferably close to or equal to n1 at point 64, as shown by line 60. The value of n1 may be 1.5 (e.g., for glass or plastic), 1.6, 1.7 (e.g., for sapphire), less than 1.75, 1.6 to 1.8, less than 1.7, less than 1.6, 1.4 to 1.6, less than 1.8, etc.
The index of refraction of electrodes 36 is n3. When, for example, electrodes 36 are formed from indium tin oxide, the value of n3 is about 1.9. Other values of n3 that may be associated with electrodes 36 include values in the range of 1.8 to 2.0, more than 1.7, more than 1.8, more than 1.85, less than 1.95, 1.8 to 2.0, less than 2.0, etc. Between point 64 and point 72, the index of refraction of graded index layer 34-2 preferably increases monotonically (i.e., graded index layer 34-2 exhibits an ever-increasing magnitude when transitioning between point 64 and point 72). At point 72, the index of refraction of graded index layer 34-2 is exactly or approximately matched to the index of refraction of touch sensor electrode 36. In a continuously variable graded index configuration, for example, the index of refraction of graded index layer 34-2 is preferably close to or equal to n3 at point 72.
Between positions Z2 and Z3, the index of refraction of electrode 36 is fixed at n3, as illustrated by line segment 74. At point 76, the index of refraction of graded index layer 34-2 is preferably matched (exactly or approximately) to the index of refraction of touch sensor electrode 36. For example, in a continuously variable graded index configuration, the index of refraction of graded index layer 34-2 is preferably close to or equal to n3 at point 76.
Between point 76 and 68, the index of refraction in graded index of refraction layer 34-2 preferably decreases monotonically (i.e., the index of refraction is ever decreasing at decreasing values of position Z and the index of refraction is monotonically increasing as Z increases when transitioning between point 68 and 76). At point 68, the index of refraction of graded index layer 34-2 is exactly or approximately matched to the index of refraction of display layers 46. If, for example, layers 46 (e.g., the uppermost layer/layers 46) have an index of refraction of n2 between heights Z4 and Z5 as indicated by line segment 66, the index of refraction of graded index layer 34-2 may be exactly or approximately equal to n2 at point 68. In a continuously variable graded index configuration, for example, the index of refraction of graded index layer 34-2 is preferably close to or equal to n2 at point 68. The value of n2 may be 1.5, less than 1.5, 1.6, less than 1.6, or other suitable value.
The index of refraction of adhesive layers 50 and 48 of
With the arrangement of
Line 82 of the graph of
Line 92 illustrates how much reflected light from display 14 is expected when using a graded index adjacent to touch sensor electrodes 36. As demonstrated by this example, less than 0.1% reflection is expected from electrodes 36 in scenarios in which electrodes 36 are buried within a graded index layer such as layer 34-2 of
The foregoing is merely illustrative and various modifications can be made by those skilled in the art without departing from the scope and spirit of the described embodiments. The foregoing embodiments may be implemented individually or in any combination.