A transparent barrier sheet comprising on one side of a substrate sheet at least one transparent inorganic layer and at least one transparent organic layer, wherein an outermost layer of the inorganic layer and the organic layer exhibits a surface roughness Ra of not more than 5 nm and the transparent inorganic layer exhibits a thickness of 20 nm to 500 nm, and the transparent barrier sheet meeting the requirement:
Description
BRIEF EXPLANATION OF THE DRAWINGS
FIGS. 1-5 each illustrate a sectional view of a transparent barrier sheet of the invention.
FIG. 6 illustrates a film deposition apparatus usable in the invention, according to a catalytic chemical vapor deposition process.
Claims
1. A transparent barrier sheet comprising on one side of a substrate sheet at least one transparent inorganic layer and at least one transparent organic layer, wherein an outermost layer of the inorganic layer and the organic layer exhibits a surface roughness Ra of not more than 5 nm and the transparent inorganic layer exhibits a thickness of 20 nm to 500 nm, and the transparent barrier sheet meeting the requirement (1):
0.5≦d2/d1≦10 (1)wherein d1 is a thickness of the inorganic layer and d2 is a thickness of the organic layer.
2. The transparent barrier sheet of claim 1, wherein the transparent barrier sheet meets the requirement (2):
1.0≦d2/d1≦5.0 (2)
3. The transparent barrier sheet of claim 1, wherein the organic layer exhibits a thickness of 50 nm to 2.0 μm.
4. The transparent barrier sheet as claimed in claim 1, wherein the inorganic layer and the organic layer are provided in that order on the substrate sheet and the outermost layer is the organic layer.
5. The transparent barrier sheet of claim 4, wherein a transparent primer layer is provided between the substrate sheet and the inorganic layer.
6. The transparent barrier sheet of claim 4, wherein at least two of a unit comprising the inorganic layer and the organic layer are provided on the substrate sheet.
7. The transparent barrier sheet of claim 1, wherein the inorganic layer comprises a metal oxide or a metal nitride.
8. The transparent barrier sheet of claim 7, wherein the inorganic layer comprises at least one selected from the group consisting of silicon oxide, aluminum oxide, silicon nitride and silicon oxynitride.
9. The transparent barrier sheet of claim 1, wherein the organic layer comprises a polymer formed by polymerization of a polymerizable compound.
10. The transparent barrier sheet of claim 9, wherein the polymerizable compound is at least one selected from the group consisting of a radically polymerizable compound, a cationically polymerizable compound, an anionically polymerizable compound and a co-polymerizable compound.
11. A method of preparing a transparent barrier sheet comprising on one side of a substrate sheet at least one transparent inorganic layer and at least one transparent organic layer, the method comprising the steps of:
(a) depositing an inorganic compound to form the transparent inorganic layer and(b) depositing an organic compound to form the transparent organic layer,wherein an outermost layer of the transparent inorganic layer and the transparent organic layer exhibits a surface roughness Ra of not more than 5 nm and the transparent inorganic layer exhibits a thickness of 20 nm to 500 nm, and the transparent barrier sheet meeting the requirement (1):
0.5≦d2/d1≦10 (1)
12. The method of claim 11, wherein the inorganic compound is a metal oxide or a metal nitride.
13. The method of claim 11, wherein the organic compound is a polymerizable compound selected from the group consisting of a radically polymerizable compound, a cationically polymerizable compound, an anionically polymerizable compound and a co-polymerizable compound.
14. The method of claim 11, wherein in step (a), the transparent inorganic layer is formed by depositing the inorganic compound by a process of at least one of catalytic chemical vapor deposition, reaction plasma deposition and electron cyclotron resonance plasma deposition.
15. The method of claim 13, wherein step (b) comprises:
(b1) depositing the polymerizable compound to form a layer of the polymerizable compound and(b2) exposing the layer of the polymerizable compound to an actinic ray to form the transparent organic layer.
16. A method of preparing a transparent barrier sheet comprising on one side of a substrate sheet at least one transparent inorganic layer and at least one transparent organic layer, the method comprising the steps of:
(a) depositing an inorganic compound to form the transparent inorganic layer and(b) depositing an organic compound to form the transparent organic layer,wherein an outermost layer of the transparent inorganic layer and the transparent organic layer exhibits a surface roughness (Ra) of not more than 5 nm and the transparent inorganic layer exhibits a thickness of 20 nm to 500 nm, and the transparent barrier sheet meeting the requirement (1):
0.5≦d2/d1≦10 (1)
17. The method of claim 16, wherein the inorganic compound is a metal oxide or a metal nitride.
18. The method of claim 16, wherein the organic compound is a polymerizable compound selected from the group consisting of a radically polymerizable compound, a cationically polymerizable compound, an anionically polymerizable compound and a co-polymerizable compound.
19. The method of claim 16, wherein in step (a), the transparent inorganic layer is formed by depositing the inorganic compound by a process of at least one of catalytic chemical vapor deposition, reaction plasma deposition and electron cyclotron resonance plasma deposition.
20. The method of claim 18, wherein step (b) comprises:
(b1) depositing the polymerizable compound to form a layer of the polymerizable compound and(b2) exposing the layer of the polymerizable compound to an actinic ray to form the transparent organic layer.
Patent Application
20070224393
