Claims
- 1. A process for producing a coated glass, the process comprisingdepositing a first dielectric material layer on a glass substrate by pyrolysis of dielectric material precursors; cathodically sputtering a second dielectric material layer on the first dielectric material layer; forming the coated glass; and heating the coated glass to a temperature at of least 550° C., wherein the coated glass comprises the glass substrate; and an antireflection coating on at least one surface of the substrate, where the coating is a stack of dielectric material layers having alternating high and low refractive indices, and at least one of the layers is a shield layer which prevents diffusion of alkali metal ions from the substrate through the shield layer.
- 2. The process according to claim 1, wherein after the heating the coated glass has a light reflection RL of at most 2% and a blue or blue-green color in reflection, with a variation of RL of at most 0.3%.
- 3. The process according to claim 1, wherein the coated glass has variations of a* and b* of at most 2.0 after heating.
- 4. The process according to claim 1, whereinthe shield layer is a low refractive index dielectric material layer selected from the group consisting of SiO2, Al2O3, Al2O3:F and mixtures thereof; and the coated glass further comprises a high refractive index dielectric material layer between the glass substrate and the shield layer.
- 5. The process according to claim 1, whereinthe shield layer is a high refractive index dielectric material layer; and the shield layer has an optical thickness of 25 nm to 60 nm.
- 6. The process according to claim 1, wherein the high refractive index dielectric material layer and the shield layer is selected from the group consisting of tin oxide, doped tin oxide, zinc oxide, tantalum oxide and zirconium oxide.
- 7. The process according to claim 1, whereinthe antireflection coating comprises, in order outward from the glass substrate, a high refractive index layer directly on the glass substrate; a first low refractive index layer, serving as the shield layer, including SiO2 or a mixture of SiO2 and Al2O3; a layer including Nb2O5; and a second low refractive index layer including SiO2 or a mixture of SiO2 and Al2O3.
Priority Claims (1)
Number |
Date |
Country |
Kind |
95 02102 |
Feb 1995 |
FR |
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Parent Case Info
This application is a continuation of application Ser. No. 09/765,592, filed Jan. 22, 2001, abandoned, which is a continuation of application Ser. No. 09/157,516, filed Sep. 21, 1998, U.S. Pat. No. 6,238,781, which is a continuation of application Ser. No. 08/606,309, filed Feb. 23, 1996, U.S. Pat. No. 5,891,556.
US Referenced Citations (20)
Foreign Referenced Citations (3)
Number |
Date |
Country |
A-0 263 541 |
Apr 1988 |
EP |
A-0 544 577 |
Jun 1993 |
EP |
WO 9204185 |
Mar 1992 |
WO |
Non-Patent Literature Citations (1)
Entry |
CA 101:5913a No date. |
Continuations (3)
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Number |
Date |
Country |
Parent |
09/765592 |
Jan 2001 |
US |
Child |
09/916346 |
|
US |
Parent |
09/157516 |
Sep 1998 |
US |
Child |
09/765592 |
|
US |
Parent |
08/606309 |
Feb 1996 |
US |
Child |
09/157516 |
|
US |