This invention is in the field of traveling wave parametric amplifiers, and relates to a kinetic inductance type amplifier.
References considered to be relevant as background to the presently disclosed subject matter are listed below:
Acknowledgement of the above references herein is not to be inferred as meaning that these are in any way relevant to the patentability of the presently disclosed subject matter.
The rapid advance of the last few years in the field of superconducting qubits has led to a demand for reliable cryogenic micro-wave amplifiers, characterized by low noise and large bandwidth. Travelling-wave parametric amplifiers present a solution with two leading implementations: 1) Josephson Travelling-Wave Parametric Amplifiers (JTWPA), that employ the Josephson Junction's nonlinear (tunable) inductance to yield a nonlinear wave-equation and wave-mixing, and 2) Kinetic Inductance Travelling-Wave Amplifiers (KITWA), which exploit the high nonlinear kinetic inductance of certain materials (e.g. NbTiN or NbN).
Devices of both implementations share the challenge of matching their impedance to the 50Ω of conventional high-bandwidth electronics. Boosting the inductance increases the impedance by up to an order of magnitude but causes ripples in the transmission spectrum. Various attempts to cope with this issue include adiabatic tapers at the beginning and end of the amplifier, shunting the transmission line by fractal structures, and by multiple resonators to lower the impedance.
While the various attempts to match the impedance partially succeed, they suffer from certain disadvantages: Adiabatic tapers prolong the wave guide notably and despite the effort, ripples appear in the transmission spectrum. The JTWPA's primary problem is a lower dynamic range, and it too sometimes fails in fully matching the impedance of the external electronics. The fractal structure is sensitive to fabrication errors and spurious ground plane resonances, requiring wire bonds across the trace.
U.S. Pat. No. 8,878,626 discloses a traveling wave kinetic inductance parametric amplifier including a superconducting transmission line configured as a coplanar waveguide and a dispersion control element. The transmission line includes periodic variations of its dimensions along its length. Superconductor materials with a high normal state resistivity are used. Nitrogen is used as the high normal state resistivity material and the metal is selected from the group consisting of titanium, niobium, and vanadium. The traveling wave kinetic inductance parametric amplifier is expected to exhibit a noise temperature below 100 mK/GHz.
There is a need in the art for a novel approach for configuring traveling wave kinetic inductance parametric amplifiers, while meeting the impedance matching requirements (e.g. 50 Ohm) and the performance requirements, and providing for simplifying the manufacture of the amplifier and making it desirably small (short-length transmission line).
The present invention provides an impedance-matched traveling wave parametric amplifier (TWPA), which utilizes a transmission line formed by a microstrip structure configured to provide the desired performance of the amplifier (e.g. a wide bandwidth, large dynamic range, and a sub-Kelvin noise temperature, which features are especially beneficial for superconducting circuit readout protocols) and enable the desirable short length thereof.
According to one broad aspect of the invention, it provides a traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a parallel plate capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and being configured as a nanoscale thickness strip.
The capacitor element is configured with desirably high capacitance per unit length of the superconducting strip, thereby providing the desired impedance matching of microstrip structure (typically to 50 Ohm).
Preferably, the technique of the present invention derives the nonlinearity from tungsten-silicide's highly power-dependent kinetic inductance. Instead of Nb alloys commonly used in Josephson junction type and coplanar waveguide types parametric amplifiers, the present invention utilizes a nanometric layer (in thickness) of high kinetic inductance materials, such as amorphous tungsten-silicide, WSi, whose kinetic inductance is sufficiently large, allowing to neglect their magnetic inductance effects.
In order to meet the 50 Ohm impedance requirements while using such high kinetic inductance superconducting element (for the purposes of high performance), capacitance of the amplifier structure is to be significantly increased. The microstrip transmission line configuration enables this to be achieved/controlled by properly selecting the geometrical features/parameters of the structure. It should be understood that a significant outcome of increasing the capacitance (capacitance per unit length) Cl is a drop in the phase velocity νph=1/((LlCl)1/2) permitting to shorten the amplifier by an order of magnitude, while still obtaining appreciable amplification.
Preferably, the microstrip structure of the invention is configured and operable as an electrical transmission line having a phase velocity substantially not exceeding 0.005c, c being speed of light in vacuum
Preferably, the nanoscale-thickness superconducting strip has kinetic inductance per unit length of the strip of at least 50 μH/m and the capacitor element is configured with capacitance per unit length of at least 20 nF/m, thereby providing impedance of the microstrip structure matching 50 Ohm.
The microstrip configuration of the invention provides for using the superconducting strip with a few centimeters' length, e.g. substantially not exceeding 10 cm.
Preferably, the nanoscale-thickness strip has a pattern of width variation along the strip.
As indicated above, the superconducting material composition preferably comprises amorphous tungsten-silicide (WSi).
The dielectric spacer layer is preferably made of amorphous silicon; and the second electrically conductive layer (grounded layer) may be aluminum.
As indicated above, the superconducting strip is very thin (nanoscale thickness). The strip has a width-thickness aspect ratio of an order of 1000. Typically, the thickness is of a few nanometers and an average width of the strip is of several microns.
According to another broad aspect of the invention, it provides a traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and is configured as a nanoscale thickness strip having a pattern of strip width variation, said capacitor element being configured with desirably high capacitance per unit length of said strip providing impedance of said microstrip structure matching 50 Ohm.
According to yet another broad aspect of the invention, it provides a traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and said capacitor element being configured with desirably high capacitance per unit length of said strip, thereby providing impedance of said microstrip structure matching 50 Ohm at a length of said strip substantially not exceeding 10 cm.
The invention also provides a traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a parallel plate capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition of WSi having desirably high kinetic inductance and being configured as a nanoscale thickness strip, and said dielectric spacer layer being a silicon layer.
The patent or application file contains at least one drawing executed in color. Copies of this patent or patent application publication with color drawings will be provided by the Office upon request and payment of the necessary fee.
In order to better understand the subject matter that is disclosed herein and to exemplify how it may be carried out in practice, embodiments will now be described, by way of non-limiting example only, with reference to the accompanying drawings, in which:
Referring to
In some non-limiting examples, the layer 12A is a long trace (generally, a few centimeters length, e.g. 10-12 cm) of highly inductive tungsten-silicide (WSi). This strip 12A of the superconductive material composition preferably has a high width-thickness aspect ratio, of an order of 1000, e.g., has a thickness of a few nanometers and has a width (average width) of several microns along the strip.
For example, in the experiments conducted by the inventors, the strip 12A of 11.6 cm length with a cross section of 2 μm×5 nm was used, as well as the strips of some other dimensions. Such a strip was created by DC-magnetron sputtering of WSi target (55%/45%) directly onto the high-resistivity Si substrate 14.
The nanometric layer of e.g. WSi, whose kinetic inductance is sufficiently large (about 50 μH/m or higher), allows to neglect the magnetic inductance. This layer 12A is patterned by any known suitable technique (e.g. optical lithography) to form a desired shape of the strip, e.g. zig-zag like shape in order to even more decrease the dimensions of the entire structure.
As also shown in
It should be understood that all the layers of the microstrip structure 10 may, if needed, be appropriately patterned using any known suitable technique, and defined by selective wet-etch to form large pads at both ends of the trace 12 and periodic perturbations 16.
It should also be noted that the use of strip width variations, e.g. periodic perturbations, provides for variation of its impedance to thereby create stop-bands in the spectrum of a transmission line, which also serves to restrain shock wave generation. This is particularly useful during wave-mixing, in that it allows the control of phase matching of the wave numbers, ks, kp, and ki, corresponding to the three current tones, the signal, the pump, and the idler.
The material for dielectric layer spacer 12C is chosen according to the following two properties: its loss tangent tanδ (to minimize dielectric loss) and permittivity εr which, together with the thickness of this layer is selected in order to provide desirably high capacitance (capacitance per unit length, Cl,), keeping in mind the desirably high kinetic inductance of superconducting layer 12A.
For example, the dielectric spacer layer may be evaporated amorphous Si, as its tanδ is about 5×10−4, while εr is close to well-known values of εrSi (depends weakly on morphology). The amorphous Si film can be made a few nanometers thicker than the superconducting layer 12A (e.g. WSi) to ensure step coverage (i.e. physical contact between film domains above the WSi and next to it), and engineered to match 50Ω.
It should be noted that in this lithographic step Si is removed only from the WSi launchers 18 where metal in the next step enhances galvanic contact between wire-bonds and WSi pads.
The second electrically conductive layer (metal) 12B may be evaporated Al, which serves as the ground layer. This step of the structure fabrication is the last lithography step during which the launch pads 18 are formed.
It should be understood that using a parallel (top) ground plate 12B covering most of the structure (chip) ensures a common global ground, as opposed to the separated ground electrodes of co-planar wave guides, cut by the trace. Also, such ground plate protects the trace 12A from scratches during the subsequent handling and packaging.
It is to be noted that the TWPA device of the present invention provides capacitance C, resembling that of a parallel plate capacitor with the thickness of a few nanometers, and can be engineered rather easily to 50Ω. This is an essential and advantageous difference from known in the art implementations of kinetic inductance TWPAs which are typically coplanar waveguides with micronic gaps to the surrounding ground plates, presenting a challenge to match their impedance Z=(LlCl)1/2 (where Ll and Cl are the inductance and capacitance per unit length) to the 50Ω of conventional high-bandwidth electronics.
Generally, boosted inductance Ll increases the impedance Z by up to an order of magnitude causing ripples in the transmission spectrum [6]. Various attempts to cope with this issue include adiabatic tapers at the beginning and end of the amplifier, shunting the transmission line by fractal structures [4], and by multiple resonators to lower the impedance Z.
It should be noted that a significant outcome of increasing the capacitance per unit length Cl is a drop in the phase velocity νph=1/((LlCl)1/2) enabling to shorten the amplifier by an order of magnitude, while still obtaining appreciable amplification.
In the experimental TWPA device fabricated by the inventors, WSi was used as superconducting layer 12A having kinetic inductance per unit length, Lk, of about 50 μH/m. In order to properly measure this parameter, the inventors fabricated, in a separate experiment, a superconducting coplanar wave-guide resonators with relevant cross section (i.e. which was selected to be used in the microstrip, i.e. 2 μm×5 nm). For the kinetic inductance per unit length of 50 μH/m, a capacitance per unit length, Cl, of about 20 nF m is to be used to match the TWPA's impedance to 50Ω. These high values of Cl and Ll predict a phase velocity, νph, of −0.004c, where c is the speed of light in vacuum.
It should be understood that the microstrip structure of the invention provides for obtaining such reduced phase velocity resulting in the effective length of the superconducting strip of a 11.6 cm, which corresponds to 8.7 m of an equivalent coplanar waveguide having much higher phase velocity, i.e. νph=0.3c.
The maximum achievable parametric gain G is linked to the nonlinearity of the transmission line:
G≈exp(Δθ)/4
where Δθ=(θ/2)(I/Ix)2 is the additional phase shift acquired by the signal in response to a current I through the transmission line due to the non-linearity (I. is the nonlinearity parameter).
The nonlinear phase shift Δθ is proportional to the electrical length (total input-output phase shift acquired by small signal):
where ztot is the total physical length of the line, fs is the microwave frequency and υph is the phase velocity. In typical coplanar waveguides, due to the higher phase velocity υph, lines of several meters long are required to achieve 10 dB average gain.
Even through a short trace (e.g. 11.6 cm) used in the microstrip structure of the present invention the transmitted tones can accumulate a significant nonlinear phase sufficient for wave-mixing, and the TWPA can then be much shorter than previous implementations [3].
Moreover, simulations performed by the inventors have shown that lower phase velocity νph enhances the amplification (while narrowing the operational bandwidth).
The nonlinear inductance is scaled by a current I. (comparable to the critical current of the trace) by [3]:
wherein L0 is the geometrical inductance.
The power dependence of kinetic inductance Lkin leads to a power-dependent wave equation, which will be solved below, in connection with the amplification process within the structure, e.g. three-wave or four-wave mixing. In the description below, the four-wave technique is demonstrated, but this does not limit the principles of the present invention. method used in the present invention.
Under the undepleted pump assumption, |Ip|>>|Is|, |Ii|, the analytical solution for pump signal Ip is [3]:
where z is the wave propagation axis (i.e. length of the device); kp=fp/νph is the pump's wave number; and γ=|Ip(0)2/2|I*|2, i.e., in addition to the ordinary linear phase (inner brackets in exponent of Eq. 2), the current also accumulates a nonlinear phase shift, kpzγ.
The established formalism of nonlinear optics will be applied in the following to simulate the performance of the kinetic inductance TWPA of the current invention. The propagating current is described as a linear combination of pump, signal, and idler tones (Ip, Is, and Ii):
where other wave-mixing processes [9] than four wave-mixing with 2fp=fs+fi are ignored. The ansatz of Eq (3) is now used to solve the nonlinear wave equation:
The nonlinearity of phase velocity νph stems from the power-dependent inductance (see Eq (1)), and leads to the coupled equations, which under the undepleted pump assumption (Ip>>Is, Ii) take the form
Here δk=2kp−ks−ki is the mismatch between the wave numbers of the above three current tones, and the kinetic inductance ratio is neglected, since it is close to unity for WSi. The kinetic inductance ratio α is the kinetic inductance divided by the total inductance:
where Lkin is the kinetic inductance and Lmag is the magnetic inductance. Since the kinetic inductance dominates the total inductance Ltot, the kinetic inductance ratio α is close to unity. Therefore, in equations 5(a)-5(c) above, the kinetic inductance ratio α was omitted and does not multiply I*2.
Loss due to the dielectric material, expressed through the self-loss coefficient, is included:
where ΩRabi is the Rabi frequency of the two-level-systems in the standard two-level-system (TLS) model [7], tan δ0 is the loss tangent (without saturation effects), and T1 and T2 are the decay and dephasing times [7]. Specifically, ΩRabi=2d·E/ℏ, where E is the electric field, d is the dipole moment (in the simulations reported here, d=1 Db). For both T1 and T2 the value 100 ns is used.
In the TLS model, losses are due to absorption of energy by TLSs. At high pump powers the TLSs become saturated, and the energy absorption subsequently is decreased. The square-root in the denominator of Eq. (6) accounts for absorption of a pump at fp not only by TLSs at the same frequency, but also those slightly detuned.
When turning to two-tone measurements (with a strong pump at fp and a weaker signal at fs≠fp), the inventors have found that saturation effects are only caused by the pump, and that the absorption of the signal tone is linear. The signal loss is thus a function of the probability that TLSs at fs are excited by the signal itself rather than by the pump. This probability is approximated by means of the saturation parameter of TLSs at fs, when the pump is at fp:
where δf=fp−fTLS (in this case fTLS=fs), and ΩRabi is the Rabi frequency of the pump.
The excited population Pee of the TLSs due to the pump is subsequently
Thus, a pump-dependent decay constant is written both for the signal and for the idler as:
being the linear decay constant, referring to the linear loss of the signal (idler) only, as if no pump were present.
The analytic solution for the pump (Eq. 5(a)) is:
as shown in
In the following, the theoretical simulations will be confirmed by experimental measurement with the TWPA of the present invention. All experiments were performed at temperature 20 mK.
Referring to
Prior to amplification measurements, the performance of the device 10 of the present invention was demonstrated with linear and non-linear single-tone characterization. Initially, phase velocity νph was estimated by broadcasting a pulse through the TWPA 10, and in a different measurement, through a parallel control channel. The delay in arrival (not shown) was compared, and a phase velocity, νph, that was thus found, appeared to be consistent with the theoretical expectation. In a separate measurement the critical current Ic of the WSi trace was determined to be about 0.06 mA.
Reference is now made to
In the next, two-tone experiments using TWPA device 10 of the present invention, where wave-mixing between a low-powered signal at frequency fs and a high-powered pump at fp amplifies the former and produces an idler tone at f will be described. By initially changing fp and measuring the average amplification of the signal over a range fp±1 GHz, fp=4.95 GHz was chosen for subsequent experiments.
In this connection, reference is made to
The idler tone emerging at fi=2fp−fs is measured as fp and is kept constant at various powers, and the signal power is kept constant for changing fs.
where Ispump is the measured output current at fs with the pump, and Is0 is the measured output current at fs without the pump.
These matrices are chosen instead of the more commonly used signal gain Gs=|Iout|2/|Iin|2 as they emphasize the nonlinearity of the TWPA and the wave-mixing in it, respectively. The strong idler (
Theoretical estimates of the amplification were performed by initial simulation Eq (5a) to find the nonlinear transmission spectrum (insert in
As mentioned above, simulations performed by the inventors indicate that lower phase velocity νph enhances the amplification (while narrowing the operational bandwidth). Reference is made to
One of the essential properties of the amplifier device of the present invention is its large dynamic range. Reference is made to
Turning back to
where B is the bandwidth (91 Hz in all the measurements conducted by the inventors), and Teff is the effective noise temperature, related to the noise figure NF:
where T0 is the physical temperature. {tilde over (G)}s is the signal gain ratio (e.g., Gs=20 dB⇒{tilde over (G)}s=100).
Attenuators have input noise:
where {tilde over (G)}s still denotes the gain (0<{acute over (G)}s<1 for attenuators) analogue to the case of amplifiers.
The signal gain ratio Gs of the TWPA device is determined by comparing the measured output in the case of the highest transmission on
The SNR of the measurement line with the TWPA device can be read from
Assuming that the above estimation of the TWPA's noise temperature is conservative, it is evident that there is a possibility of reaching the quantum noise limit with the TWPA device of the present invention by moderate improvement of the dielectric loss tangent and by increasing the nonlinearity of the used superconducting material (e.g. WSi), e.g., by different alloy concentration.
Although it is known in the art that travelling wave parametric amplifiers which exploit the non-linear kinetic inductance of a superconducting transmission line are promising candidates to deliver a high gain, a quantum limited noise performance over a wide bandwidth (several GHz) and a high dynamic range, their practical realization is hampered by fabrication defects, since typically ˜1 m long transmission line is required to achieve substantial parametric gain. The inventors have shown that the TWPA device of the present invention can be fabricated using known technologies and is fully functional, and the inventors have succeeded amplifying signals repeatedly with four wave mixing with a short trace (less than 12 cm).
Also, the inventors have shown that three wave mixing was implemented successfully with the device of the invention, as shown in
Thus, the present invention provides impedance-matched, microstrip based TWPA device, which derives its nonlinearity from superconducting material composition (e.g. WSi) having highly power-dependent kinetic inductance. The amplifier according to the current invention operable with a wide bandwidth, large dynamic range, and a sub-Kelvin noise temperature, can be advantageously useful with superconducting circuit readout protocols, especially with minor improvements lowering the dielectric loss. It should be understood that the device of the present invention can be used in a variety of applications, not limited to pure amplification. The extraordinarily slow phase velocity νph allows the integration of the TWPA device of the present invention or similar interferometric structures in superconducting quantum circuits, where the propagation bounds due to chip size.
Number | Date | Country | |
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63112230 | Nov 2020 | US |