Claims
- 1. A process for treatment of offgas from production of a metal chloride by chlorination of the corresponding metal oxide, said offgas comprising COCl.sub.2, SiCl.sub.4 and gaseous metal chlorides, said process comprising the steps of
- (a) reacting SiCl.sub.4 and metal chlorides in the offgas with water vapor for a space time of at least 0.11 minute in a first reaction chamber containing a bed of solid particles selected from the class consisting of carbon and oxides of metals of the groups IIA, IIIA, IVA, IVB and mixtures thereof, said offgas being maintained at a temperature of about 100.degree. to 200.degree. C. in the bed, thereby forming SiO.sub.2, metal oxides, CO.sub.2 and HCl;
- (b) transferring the offgas from the first reaction chamber to a second reaction chamber containing a bed of solid particles selected from the class consisting of carbon and oxides of metals of groups IIA, IIIA, IVA, IVB and mixtures thereof, said offgas being maintained at a temperature of about 100.degree. to 200.degree. C. in the second reaction chamber;
- (c) reacting COCl.sub.2 in the offgas with water vapor in the second reaction chamber for a space time of at least 0.035 minute, thereby forming CO.sub.2 and HCl and reducing the concentration of COCl.sub.2 in the offgas to below 10 ppm; and
- (d) removing HCl from the offgas by contacting the offgas with liquid water at a temperature of from 20.degree. to 100.degree. C. to remove HCl vapors therefrom.
- 2. The process of claim 1 wherein the offgas also comprises 0.01 to 20% by weight Cl.sub.2, and further comprising the additional step of reacting Cl.sub.2 in the offgas with CO for a space time of at least 0.05 minute prior to performing step (a) of claim 1, said additional step being performed in a reaction chamber containing activated carbon with the gas being maintained at a temperature of about 100.degree. to 200.degree. C. and with sufficient CO to reduce content of Cl.sub.2 in the offgas to below 100 ppm.
- 3. The process of claim 1 wherein the offgas also comprises SO.sub.2, and further comprising the step of scrubbing the offgas in a scrubber maintained at a pH of about 5.6 by addition of sufficient NaOH or Na.sub.2 CO.sub.3 to remove SO.sub.2 from the offgas.
- 4. The process of claim 1 wherein the offgas also comprises partially oxidized carbon compounds, and further comprising the step of incinerating the offgas to oxidize any partially oxidized carbon compounds to CO.sub.2.
- 5. The process of claim 1 wherein the first reaction chamber contains particles of sand having an iron content of less than about 0.03% by weight and is maintained at a temperature of about 100.degree. to 115.degree. C.
- 6. The process of claim 1 wherein the first reaction chamber contains particles of partially calcined alumina and is maintained at a temperature of about 150.degree. C.
- 7. The process of claim 1 wherein the solid particles in the second reaction chamber are activated carbon.
- 8. The process of claim 7 wherein the solid particles in the second reaction chamber have a particle size range of -4 to +30 mesh U.S. Sieve Series.
- 9. The process of claim 1 wherein the H.sub.2 O/M.sub.x Cl.sub.y concentration ratio in the first reaction chamber is at least 10 and as high as 75 to ensure complete hydrolysis of metal chlorides.
- 10. The process of claim 1 wherein the offgas entering the second reaction chamber also includes Cl.sub.2, and further comprisng the step of adding CO to the offgas so that the molar ratio of CO to Cl.sub.2 in the offgas in the second reaction chamber is at least about 1.3:1, thereby to convert the Cl.sub.2 to COCl.sub.2.
- 11. A process for treatment of offgas from production of aluminum chloride by chlorination of aluminous material, said offgas comprising SiCl.sub.4, gaseous metal chlorides, COCl.sub.2 and from 0.01 to 20% Cl.sub.2, said process comprising the steps of
- (a) reacting Cl.sub.2 in the offgas with CO in a first reactor containing activated carbon for a space time of at least 0.05 minute at a temperature of about 100.degree. to 200.degree. C., thereby forming COCl.sub.2 and reducing the content of Cl.sub.2 in the offgas to below 100 ppm;
- (b) transferring the offgas from the first reactor to a second reactor containing a fluidized bed of particles of an oxide of metals of the groups IIA, IIIA, IVA, IVB and mixtures thereof;
- (c) reacting COCl.sub.2, SiCl.sub.4 and metal chlorides in the offgas with water vapor in the second reactor at a temperature of about 100.degree. to 200.degree. C. for a space time of at least 0.20 minute, thereby forming SiO.sub.2, metal oxides, CO.sub.2 and HCl, and reducing the content of COCl.sub.2 in the offgas to below 10 ppm; and
- (d) removing HCl from the offgas by contacting the offgas with liquid water at a temperature of about 20.degree. to 100.degree. C.
- 12. The process of claim 11 wherein the first reactor contains particles of activated carbon maintained at a temperature of about 150.degree. C., and the second reactor contains a fluidized bed of particles of alumina maintained at a temperature of about 150.degree. C.
- 13. A process for treatment of offgas from the production of aluminum chloride by chlorination of aluminous material, said offgas comprising SiCl.sub.4, gaseous metal chlorides and COCl.sub.2, said process comprising the steps of
- (a) reacting SiCl.sub.4 and metal chlorides in the offgas with water vapor for a space time of at least 0.11 minute in a first reaction chamber containing a fluidized bed of particles of an oxide of metals of the groups IIA, IIIA, IVA, IVB and mixtures thereof, said offgas being maintained at a temperature of about 100.degree. to 115.degree. C. in the bed, thereby forming SiO.sub.2, metal oxides, CO.sub.2 and HCl;
- (b) transferring the offgas from the first reaction chamber to a second reaction chamber containing a bed of activated carbon;
- (c) reacting any COCl.sub.2 remaining in the offgas with water vapor in the second reaction chamber at a temperature of about 100.degree. to 150.degree. C. for a space time of at least 0.035 minute, thereby forming CO.sub.2 and HCl and reducing the content of COCl.sub.2 in the offgas to below 10 ppm; and
- (d) removing HCl from the offgas by contacting the offgas with liquid water at a temperature of from 20.degree. to 100.degree. C.
- 14. The process of claim 13 wherein the first reaction chamber contains particles of silicon dioxide maintained at a temperature of about 110.degree. C., and the second reaction chamber contans particles of activated carbon maintained at a temperature of about 110.degree. C.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. application Ser. No. 765,346, filed Feb. 3, 1977 (now abandoned) and continuation-in-part of U.S. application Ser. No. 859,927, filed Dec. 12, 1977 now U.S. Pat. No. 4,157,374.
US Referenced Citations (11)
Foreign Referenced Citations (2)
Number |
Date |
Country |
2600387 |
Jul 1976 |
DEX |
51-108667 |
Sep 1976 |
JPX |
Non-Patent Literature Citations (1)
Entry |
Hudson, R. "The Vapour Phase Hydrolysis of Non Metallic Chlorides", Proceedings of the 11th International Congress of Pure and Applied Chemistry, (London), 1947, pp. 297-305. |
Related Publications (1)
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Number |
Date |
Country |
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859927 |
Dec 1977 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
765346 |
Feb 1977 |
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