Information
-
Patent Grant
-
6503050
-
Patent Number
6,503,050
-
Date Filed
Monday, December 18, 200024 years ago
-
Date Issued
Tuesday, January 7, 200322 years ago
-
Inventors
-
Original Assignees
-
Examiners
Agents
- Moser Patterson & Sheridan
- Bach; Joseph
-
CPC
-
US Classifications
Field of Search
US
- 415 90
- 416 175
- 416 198 R
- 416 201 R
- 416 201 A
- 416 203
-
International Classifications
-
Abstract
In one aspect, a vacuum processing system comprising a vacuum processing chamber and a turbo-molecular pump disposed on the vacuum processing chamber is provided. The turbo-molecular pump comprises a casing having an inlet port and an outlet port, a stator disposed on an inner wall of the casing, a rotor disposed in the stator, and a motor extending coaxially with the rotor, wherein at least the first stage of the pump is enlarged with no correspondingly larger pump components other than the corresponding upper portion of the housing.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention generally relates to semiconductor processing. Specifically, the present invention relates to semiconductor processing equipment and a turbo-molecular vacuum pump with increased pumping capacity for evacuating a vacuum processing chamber.
2. Background of the Related Art
Substrates are typically processed through various etch, chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implanting and cleaning steps to construct integrated circuits or other structures thereon. These steps are usually performed in an environmentally isolated and vacuum sealed substrate processing chamber. The substrate processing chamber generally comprises an enclosure having a side wall, a bottom and a lid. A substrate support member is disposed within the chamber to secure a substrate in place during processing by electrical or mechanical means such as an electrostatic chuck or a vacuum chuck. A slit valve is disposed on a chamber side wall to allow the transfer of the substrate into and out of the substrate processing chamber. In CVD processes, various process gases enter into the substrate processing chamber through a gas inlet, such as a shower-head type gas inlet, disposed through the lid of the processing chamber. In PVD processes, various process gases enter into the substrate processing chamber through a gas inlet in the processing chamber. In each type of process, the gases are exhausted from the substrate processing chamber through the use of a vacuum pump, such as a turbomolecular pump, which is attached to a gas outlet of the substrate processing chamber.
Turbo molecular pumps are used in high (10
−7
Torr) or ultra-high (10
−10
Torr) vacuum systems, exhausting to a backing pump that establishes a first pressure in the chamber. The turbo molecular pumps include a rotor with rows of oblique radial blades turning between a stator having inwardly facing rows of blades. The outer tips of the rotor blades approach molecular speed of the gas being pumped and when a molecule strikes the rotor, a significant component of momentum is transferred to the molecule in the direction of rotation. This transferred momentum causes the molecule of gas to move from the inlet side of the pump towards the exhaust side of the pump. Turbo molecular pumps are characterized by a rotational speed of 20,000 to 90,000 rpm and a pumping speed or capacity of 50 liters/sec. to 5,000 liters/sec.
FIG. 1
is a cross-sectional view of a typical turbo-molecular pump
10
. The turbo-molecular pump
10
generally comprises a cylindrical casing
72
, a base
74
closing the bottom of the casing
72
, a rotor
40
disposed coaxially in the casing
72
, a motor
20
coaxially disposed with the rotor
40
, and a stator
30
extending radially inwardly from the casing
72
. The casing
72
provides a support structure for the turbo-molecular pump
10
and includes an inlet port
12
disposed through the top of the casing
72
. An outlet port
14
is disposed through the base
74
and is attached to a backing pump and an abatement system (not shown) for recovery or disposal of the gases. The motor
20
is an electrical motor that rotates the rotor
40
about an axis. The rotor
40
may be suspended by mechanical bearings
37
or by magnetic bearings in a floating condition with the casing.
Rotor blades
46
and stator blades
36
are shaped to pump gas from the inlet port
12
to the outlet port
14
and to prevent gas flow back into the vacuum processing chamber (not shown). The rotor
40
includes rows of rotor blades
46
extending radially outwardly in levels from a central cylindrical portion of the rotor that receives a portion of the motor
20
. The stator
30
, likewise includes rows of blades
36
extending radially inwardly in levels from the casing
72
. The rows of stator blades
36
are arranged at alternating axial levels with the rows of rotor blades
46
, and a plurality of spacer rings
38
separate different levels of stator blades
36
to ensure that the rotor blades
46
can rotate freely between stator blades
36
. A “first stage” of the pump is defined by the first row of rotor blades
46
and the first row of stator blades
36
at the intake end of the pump. Each row of rotor blades
46
and corresponding row of stator blades
36
thereafter make up another stage and there are typically between 5 and 13 stages in a turbo-molecular pump. Additionally, a compound stage including a cylindrical member (not shown) extending from the exhaust end of the rotor
40
may be included to achieve a higher exhaust pressure and a higher inlet pressure.
Because of exacting temperature and cleanliness considerations in substrate processing, the substrate processing vacuum chambers are housed in an isolated clean room. Because the turbo molecular pumps must reduce pressure in the chambers down to 10
−7
Torr, they are necessarily located in the clean room adjacent the chambers to avoid any loss in pumping efficiency that would occur if the pumps were separated from the chambers by vacuum lines. Because the cost of building and maintaining clean rooms is so expensive, the physical size of components therein, including the turbo molecular pumps is always critical.
FIG. 2
is a simplified schematic, cross-sectional view of a vacuum substrate processing chamber
100
having a turbo-molecular pump
10
attached thereto. The turbo molecular pump
10
may be directly under the substrate
160
or offset, as depicted in FIG.
2
. The chamber
100
and pump
10
make up part of a processing apparatus typically comprising several processing chambers and at least one transfer chamber. The substrate processing chamber
100
provides an isolated environment where the substrate
160
is processed through etching, deposition, implanting, cleaning, cooling and/or other pre-processing and post-processing steps. The substrate processing chamber
100
generally comprises an enclosure having side walls
104
, a bottom
106
and a lid
108
. A substrate support member
110
disposed in the bottom
106
of the chamber secures the substrate
160
in place during processing. The substrate support member
110
typically comprises a vacuum chuck or an electrostatic chuck to retain the substrate
160
. A slit valve
112
is disposed on the chamber side wall
104
to allow the transfer of the substrate
160
into and out of the substrate processing chamber
100
. In a CVD process, various process gases enter into the substrate processing chamber
100
through a gas inlet
120
, such as a shower-head type gas inlet or nozzle, disposed through the lid
108
of the processing chamber. To exhaust the gases from the substrate processing chamber, a turbo-molecular pump
10
is attached to a gas outlet
130
of the substrate processing chamber
100
.
Advances in substrate processing and increased capacity of vacuum processing chambers continuously call for higher capacity pumps. Some substrate processes like plasma-based etch and CVD processes require particularly high process gas flow rates and relatively shallow vacuum levels. As the flow rate of the reactants across the substrate processing surface is increased (i.e., the throughput of the vacuum pump increases to exhaust a higher volume), the time required for completion of the process is reduced. Thus, to increase throughput of the processing chamber, the vacuum pumping system used for plasma-based etch and CVD requires a high throughput or exhaust capacity. Furthermore, as the chamber sizes increase to accommodate larger substrates (i.e., 300 mm substrates), the turbo-molecular pumps used for these larger chambers must provide correspondingly larger exhaust capacities. For example, an exhaust capacity of 4000 l/sec. is required for a 300 mm chamber.
One way to decrease exhaust time and increase throughput of the pump is to increase the rotational speed of the rotor of the turbo-molecular pump. However, increasing the rotational speed of a rotor and the rotor blades necessarily results in additional stresses on the rotor and other components that can lead to failure of the pump components. Additionally, because of the high throughput of the process gases through the vacuum pump, unused reactants as well as reaction byproducts are removed from the processing chamber at a high rate and can either adhere to or react with the surfaces of the components inside the vacuum pump, causing the components to heat up significantly and resulting in breakdown of the component and the pump. For example, in HDP applications the pump internal components, such as a rotor, can rise to a temperature above 120° C., and the stress caused by the high temperature can cause a physical break down of the component and the pump. Therefore, simply increasing the rotational speed of the pump is not a realistic solution.
Another way to increase the throughput or exhaust capacity of the vacuum pump and to decrease the time it takes to exhaust gases from a processing chamber is to increase the physical size of the turbo-molecular pump. For example, adding surface area to the blades of the rotor and stator by increasing their length will increase the flow of gas through the pump. However, because of the radial stresses brought to bear by the larger blades upon the rotor, the rotor must also be enlarged and strengthened to tolerate the larger blades. Likewise, the rotor bearings must be larger and more robust to compensate for the added vibration of the pump and there must be a corresponding increase in the size of the pump housing. The result is a pump with increased overall dimensions and weight. The larger pumps are more expensive to build, use additional energy to operate and cause more vibration in the clean room. Further, the larger pumps take up more of the precious envelope and clean room space below the vacuum chamber, giving the apparatus a larger footprint.
Therefore, there is a need for a turbo-molecular vacuum pump that provides a higher exhaust capacity than existing turbo-molecular pumps without a corresponding increase in the physical size and weight of the pump. There is a further need for a turbo molecular pump with enlarged capacity that requires a reduced amount of clean room space. There is a further need for a turbo molecular pump that creates less vibration than other pumps having the same capacity.
SUMMARY OF THE INVENTION
In one aspect, a vacuum processing system comprising a vacuum processing chamber and a turbo-molecular pump disposed on the vacuum processing chamber is provided. The turbo-molecular pump comprises a casing having an inlet port and an outlet port, a stator disposed on an inner wall of the casing, a rotor disposed in the stator, and a motor extending coaxially with the rotor, wherein at least the first stage of the pump is enlarged with no correspondingly larger pump components other than the corresponding upper portion of the housing.
BRIEF DESCRIPTION OF THE DRAWINGS
So that the manner in which the above recited features, advantages and objects of the present invention are attained and can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings.
It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefor not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
FIG. 1
is a cross-sectional view of a prior art, turbo molecular pump.
FIG. 2
is a simplified schematic cross-sectional view of a vacuum substrate processing chamber
100
having a turbo-molecular pump
10
attached thereto.
FIG. 3
is a cross-sectional view of a turbo-molecular pump
10
of the invention having the first three pump stages enlarged.
FIG. 4
is a cross-sectional view of another embodiment of the turbo-molecular pump
10
of the invention showing the first three stages enlarged and thereafter, tapered stages.
FIGS. 5
is a section view showing tapered blades wherein the rotor blades are strengthened at their base.
FIG. 6
is a simplified, schematic view illustrating the space saving features of the present invention as compared to a prior art pump.
DETAILED DESCRIPTION OF A PREFERRED EMBODIMENT
FIG. 3
is a cross-sectional view showing one embodiment of the pump
200
of the present invention. The pump includes a stator
220
extending radially inwardly from the casing
201
and a rotor
210
disposed within the casing. A motor
248
is coaxially disposed with the rotor and rotates the rotor
210
about a shaft
225
. The rotor
210
includes two outer diameters, a smaller diameter
226
adjacent an inlet
205
of the pump and a lower, larger diameter
228
extending towards an outlet
206
of the pump. In the embodiment illustrated in
FIG. 3
, the first two rows of rotor blades
250
, or those blades extending from the smaller diameter portion
226
of the rotor
210
, have an increased length as compared to the other rotor blades
225
extending from the larger diameter
228
of the rotor
225
. The corresponding stator blades
251
are also increased in length extending inwards from an enlarged diameter portion
253
of the stator
220
. The longer stator and rotor blades
250
,
251
provide an increased surface area and a corresponding increase in pumping capacity. Because of their increased length, the tips of the rotor blades
250
move at a speed exceeding the speed of sound of a pumped process gas (about 300m/s for nitrogen). This results in enhanced compression of gas in the first stages and an overall increase in the pumping speed or exhaust capacity of the pump
200
.
Because the longer rotor blades
250
extend from the smaller diameter portion
226
of the rotor
210
, a relatively small increase in the diameter of the casing
201
is necessary. Also, because the enlarged portion of the casing
201
is limited to the upper portion or that portion typically attached to a vacuum chamber, the increase in size is less likely to interfere with other equipment or personnel working in the clean room. Further, the increased stress on the rotor brought about by the longer blades with their higher tip speed is minimized since the rotor diameter is smaller at the point where the longer blades
250
are attached and radial forces are not nearly so high as they are along the larger diameter portion
228
of the shaft
225
.
FIG. 4
is a section view showing an alternative embodiment of a pump
400
of the invention. The pump includes a rotor
310
having a smaller diameter
326
portion adjacent a pump inlet
305
and a larger diameter portion
328
extending toward a pump outlet
306
. A stator
320
includes blades of different lengths extending inwards from a casing
301
. Like the embodiment of
FIG. 3
, the first two rows of rotor blades
302
and the first two rows of stator blades
301
and an inlet
305
at the intake end of the pump
400
are increased in length as compared to the subsequent rotor and stator blades. Thereafter, the rotor blades extending towards a pump outlet
306
gradually decrease in length. For example, in one embodiment, each subsequent rotor blade is about 10-15% shorter than the preceding blade. The casing
305
likewise is tapered to house the longer blades but no other modifications are necessary to compensate for the increased capacity brought about by the increased surface area of the longer blades. The result of the tapered blades is a greater increase in overall blade surface area and a greater increase in pumping capacity.
While the embodiments of the present invention increase pumping capacity with no enlargement of the rotor itself, the lengthened rotor blades can benefit by a high strength connection to the rotor to compensate for the higher tip speed of the blades.
FIG. 5
is a section view of a pump
500
having similar components of pump
400
of FIG.
4
. In the pump
500
of
FIG. 5
, the base of each rotor blade
505
is modified to add additional strength to the rotor blades at their point of attachment to the rotor. Specifically, the base
520
of each rotor blade is widened by adding additional material which serves to increase the strength of the blade at its point of attachment to the rotor
510
. The increase in blade material at the base of the blade results in a corresponding increase in strength and stress resistance of the blade. In this manner, the blade design compensates for any additional stress brought about by the increased length and surface area of the blade. The corresponding stator blades
510
are tapered at their ends
512
to better match the opening
550
created between the two adjacent rotor blades.
FIG. 6
is a schematic view of a chamber with a pump attached at a lower surface thereto. The Figure is divided along a vertical axis to illustrate the physical size of the pump
650
of the present invention as compared to a conventional pump
625
having the same capacity. As illustrated, the conventional pump
625
has a casing
626
with a constant outer diameter in order to house blades having a uniform length. In contrast, the pump
650
includes a casing
655
widened only at the intake end
656
of the pump. Thereafter, the pump housing is narrower since the blades are not as long in that area of the pump. The unused space can be utilized by plumbing, cables or other clean room equipment.
The increase in the surface area of the blades at the intake end of the pump increases the pump capacity significantly. For example, modifying a pump rated at 2000 l/sec by enlarging only the first two or three stages as depicted in
FIG. 3
, will bring the capacity of the pump to almost 4000 l/sec, with no additional increase in size or weight other than the enlarged housing in the area around the longer blades of the pump. The benefits of the present invention are equally realizable in various vacuum processing chambers and vacuum processing systems that utilize turbo-molecular pumps.
While the foregoing is directed to the preferred embodiment of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims which follow.
Claims
- 1. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including: i) a casing having an inlet port and an outlet port; ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are about 50% longer than the other rows of rotor and stator blades and an outer diameter of the pump is enlarged in an area of the longer rotor and stator blades.
- 2. The vacuum processing system of claim 1, wherein the vacuum processing chamber is a chemical vapor deposition chamber.
- 3. The vacuum processing system of claim 1, wherein the vacuum processing chamber is an etch chamber.
- 4. The vacuum processing system of claim 1, wherein the vacuum processing chamber is an ion implanter.
- 5. The vacuum processing system of claim 1, wherein the at least one row of rotor blades and the adjacent row of stator blades has about 100% more surface area than the other rotor and stator blades.
- 6. The vacuum processing system of claim 5, wherein the blades of the at least one row of rotor blades are widened at a connection point to the rotor.
- 7. A turbo-molecular pump for use with a vacuum chamber, comprising:(a) a casing having an inlet port and an outlet port; (b) a rotor having a plurality of rows of rotor blades disposed thereon; (c) a stator having a plurality of rows of stator blades extending radially ad inwardly from an inner surface of the casing in an alternating arrangement with the rows of rotor blades, wherein at least one of the rows of rotor blades and one of the rows of stator blades adjacent the inlet port include blades that are longer than the other rows of rotor and stator blades and the other rows of rotor and stator blades are increasingly shorter in the direction of the outlet port and whereby the casing has a larger outer diameter in an area of the at least one row of rotor blades and the at least one row of stator blades.
- 8. The turbo-molecular pump of claim 7, wherein the other rows of rotor and stator blades,are-increasingly shorter in the direction of the outlet port.
- 9. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including; (i) a casing having an inlet port and an outlet port; (ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are about 50% longer than the other rows of rotor and stator blades and have about 100% more surface area than the other rows of rotor and stator blades, and wherein the blades of the at least one row of rotor blades are widened at a connection point to the rotor.
- 10. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including: i) a casing having an inlet port and an outlet port; ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are longer than the other rows of rotor and stator blades and an outer diameter of the pump is enlarged in an area of the longer rotor and stator blades.
- 11. The turbo molecular pump of claim 10, wherein as the pump operates, gas moves through the pump in an axial fashion between the inlet port and an outlet port.
US Referenced Citations (10)