Turbo-molecular pump having enhanced pumping capacity

Information

  • Patent Grant
  • 6503050
  • Patent Number
    6,503,050
  • Date Filed
    Monday, December 18, 2000
    24 years ago
  • Date Issued
    Tuesday, January 7, 2003
    22 years ago
Abstract
In one aspect, a vacuum processing system comprising a vacuum processing chamber and a turbo-molecular pump disposed on the vacuum processing chamber is provided. The turbo-molecular pump comprises a casing having an inlet port and an outlet port, a stator disposed on an inner wall of the casing, a rotor disposed in the stator, and a motor extending coaxially with the rotor, wherein at least the first stage of the pump is enlarged with no correspondingly larger pump components other than the corresponding upper portion of the housing.
Description




BACKGROUND OF THE INVENTION




1. Field of the Invention




The present invention generally relates to semiconductor processing. Specifically, the present invention relates to semiconductor processing equipment and a turbo-molecular vacuum pump with increased pumping capacity for evacuating a vacuum processing chamber.




2. Background of the Related Art




Substrates are typically processed through various etch, chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implanting and cleaning steps to construct integrated circuits or other structures thereon. These steps are usually performed in an environmentally isolated and vacuum sealed substrate processing chamber. The substrate processing chamber generally comprises an enclosure having a side wall, a bottom and a lid. A substrate support member is disposed within the chamber to secure a substrate in place during processing by electrical or mechanical means such as an electrostatic chuck or a vacuum chuck. A slit valve is disposed on a chamber side wall to allow the transfer of the substrate into and out of the substrate processing chamber. In CVD processes, various process gases enter into the substrate processing chamber through a gas inlet, such as a shower-head type gas inlet, disposed through the lid of the processing chamber. In PVD processes, various process gases enter into the substrate processing chamber through a gas inlet in the processing chamber. In each type of process, the gases are exhausted from the substrate processing chamber through the use of a vacuum pump, such as a turbomolecular pump, which is attached to a gas outlet of the substrate processing chamber.




Turbo molecular pumps are used in high (10


−7


Torr) or ultra-high (10


−10


Torr) vacuum systems, exhausting to a backing pump that establishes a first pressure in the chamber. The turbo molecular pumps include a rotor with rows of oblique radial blades turning between a stator having inwardly facing rows of blades. The outer tips of the rotor blades approach molecular speed of the gas being pumped and when a molecule strikes the rotor, a significant component of momentum is transferred to the molecule in the direction of rotation. This transferred momentum causes the molecule of gas to move from the inlet side of the pump towards the exhaust side of the pump. Turbo molecular pumps are characterized by a rotational speed of 20,000 to 90,000 rpm and a pumping speed or capacity of 50 liters/sec. to 5,000 liters/sec.





FIG. 1

is a cross-sectional view of a typical turbo-molecular pump


10


. The turbo-molecular pump


10


generally comprises a cylindrical casing


72


, a base


74


closing the bottom of the casing


72


, a rotor


40


disposed coaxially in the casing


72


, a motor


20


coaxially disposed with the rotor


40


, and a stator


30


extending radially inwardly from the casing


72


. The casing


72


provides a support structure for the turbo-molecular pump


10


and includes an inlet port


12


disposed through the top of the casing


72


. An outlet port


14


is disposed through the base


74


and is attached to a backing pump and an abatement system (not shown) for recovery or disposal of the gases. The motor


20


is an electrical motor that rotates the rotor


40


about an axis. The rotor


40


may be suspended by mechanical bearings


37


or by magnetic bearings in a floating condition with the casing.




Rotor blades


46


and stator blades


36


are shaped to pump gas from the inlet port


12


to the outlet port


14


and to prevent gas flow back into the vacuum processing chamber (not shown). The rotor


40


includes rows of rotor blades


46


extending radially outwardly in levels from a central cylindrical portion of the rotor that receives a portion of the motor


20


. The stator


30


, likewise includes rows of blades


36


extending radially inwardly in levels from the casing


72


. The rows of stator blades


36


are arranged at alternating axial levels with the rows of rotor blades


46


, and a plurality of spacer rings


38


separate different levels of stator blades


36


to ensure that the rotor blades


46


can rotate freely between stator blades


36


. A “first stage” of the pump is defined by the first row of rotor blades


46


and the first row of stator blades


36


at the intake end of the pump. Each row of rotor blades


46


and corresponding row of stator blades


36


thereafter make up another stage and there are typically between 5 and 13 stages in a turbo-molecular pump. Additionally, a compound stage including a cylindrical member (not shown) extending from the exhaust end of the rotor


40


may be included to achieve a higher exhaust pressure and a higher inlet pressure.




Because of exacting temperature and cleanliness considerations in substrate processing, the substrate processing vacuum chambers are housed in an isolated clean room. Because the turbo molecular pumps must reduce pressure in the chambers down to 10


−7


Torr, they are necessarily located in the clean room adjacent the chambers to avoid any loss in pumping efficiency that would occur if the pumps were separated from the chambers by vacuum lines. Because the cost of building and maintaining clean rooms is so expensive, the physical size of components therein, including the turbo molecular pumps is always critical.





FIG. 2

is a simplified schematic, cross-sectional view of a vacuum substrate processing chamber


100


having a turbo-molecular pump


10


attached thereto. The turbo molecular pump


10


may be directly under the substrate


160


or offset, as depicted in FIG.


2


. The chamber


100


and pump


10


make up part of a processing apparatus typically comprising several processing chambers and at least one transfer chamber. The substrate processing chamber


100


provides an isolated environment where the substrate


160


is processed through etching, deposition, implanting, cleaning, cooling and/or other pre-processing and post-processing steps. The substrate processing chamber


100


generally comprises an enclosure having side walls


104


, a bottom


106


and a lid


108


. A substrate support member


110


disposed in the bottom


106


of the chamber secures the substrate


160


in place during processing. The substrate support member


110


typically comprises a vacuum chuck or an electrostatic chuck to retain the substrate


160


. A slit valve


112


is disposed on the chamber side wall


104


to allow the transfer of the substrate


160


into and out of the substrate processing chamber


100


. In a CVD process, various process gases enter into the substrate processing chamber


100


through a gas inlet


120


, such as a shower-head type gas inlet or nozzle, disposed through the lid


108


of the processing chamber. To exhaust the gases from the substrate processing chamber, a turbo-molecular pump


10


is attached to a gas outlet


130


of the substrate processing chamber


100


.




Advances in substrate processing and increased capacity of vacuum processing chambers continuously call for higher capacity pumps. Some substrate processes like plasma-based etch and CVD processes require particularly high process gas flow rates and relatively shallow vacuum levels. As the flow rate of the reactants across the substrate processing surface is increased (i.e., the throughput of the vacuum pump increases to exhaust a higher volume), the time required for completion of the process is reduced. Thus, to increase throughput of the processing chamber, the vacuum pumping system used for plasma-based etch and CVD requires a high throughput or exhaust capacity. Furthermore, as the chamber sizes increase to accommodate larger substrates (i.e., 300 mm substrates), the turbo-molecular pumps used for these larger chambers must provide correspondingly larger exhaust capacities. For example, an exhaust capacity of 4000 l/sec. is required for a 300 mm chamber.




One way to decrease exhaust time and increase throughput of the pump is to increase the rotational speed of the rotor of the turbo-molecular pump. However, increasing the rotational speed of a rotor and the rotor blades necessarily results in additional stresses on the rotor and other components that can lead to failure of the pump components. Additionally, because of the high throughput of the process gases through the vacuum pump, unused reactants as well as reaction byproducts are removed from the processing chamber at a high rate and can either adhere to or react with the surfaces of the components inside the vacuum pump, causing the components to heat up significantly and resulting in breakdown of the component and the pump. For example, in HDP applications the pump internal components, such as a rotor, can rise to a temperature above 120° C., and the stress caused by the high temperature can cause a physical break down of the component and the pump. Therefore, simply increasing the rotational speed of the pump is not a realistic solution.




Another way to increase the throughput or exhaust capacity of the vacuum pump and to decrease the time it takes to exhaust gases from a processing chamber is to increase the physical size of the turbo-molecular pump. For example, adding surface area to the blades of the rotor and stator by increasing their length will increase the flow of gas through the pump. However, because of the radial stresses brought to bear by the larger blades upon the rotor, the rotor must also be enlarged and strengthened to tolerate the larger blades. Likewise, the rotor bearings must be larger and more robust to compensate for the added vibration of the pump and there must be a corresponding increase in the size of the pump housing. The result is a pump with increased overall dimensions and weight. The larger pumps are more expensive to build, use additional energy to operate and cause more vibration in the clean room. Further, the larger pumps take up more of the precious envelope and clean room space below the vacuum chamber, giving the apparatus a larger footprint.




Therefore, there is a need for a turbo-molecular vacuum pump that provides a higher exhaust capacity than existing turbo-molecular pumps without a corresponding increase in the physical size and weight of the pump. There is a further need for a turbo molecular pump with enlarged capacity that requires a reduced amount of clean room space. There is a further need for a turbo molecular pump that creates less vibration than other pumps having the same capacity.




SUMMARY OF THE INVENTION




In one aspect, a vacuum processing system comprising a vacuum processing chamber and a turbo-molecular pump disposed on the vacuum processing chamber is provided. The turbo-molecular pump comprises a casing having an inlet port and an outlet port, a stator disposed on an inner wall of the casing, a rotor disposed in the stator, and a motor extending coaxially with the rotor, wherein at least the first stage of the pump is enlarged with no correspondingly larger pump components other than the corresponding upper portion of the housing.











BRIEF DESCRIPTION OF THE DRAWINGS




So that the manner in which the above recited features, advantages and objects of the present invention are attained and can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings.




It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefor not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.





FIG. 1

is a cross-sectional view of a prior art, turbo molecular pump.





FIG. 2

is a simplified schematic cross-sectional view of a vacuum substrate processing chamber


100


having a turbo-molecular pump


10


attached thereto.





FIG. 3

is a cross-sectional view of a turbo-molecular pump


10


of the invention having the first three pump stages enlarged.





FIG. 4

is a cross-sectional view of another embodiment of the turbo-molecular pump


10


of the invention showing the first three stages enlarged and thereafter, tapered stages.





FIGS. 5

is a section view showing tapered blades wherein the rotor blades are strengthened at their base.





FIG. 6

is a simplified, schematic view illustrating the space saving features of the present invention as compared to a prior art pump.











DETAILED DESCRIPTION OF A PREFERRED EMBODIMENT





FIG. 3

is a cross-sectional view showing one embodiment of the pump


200


of the present invention. The pump includes a stator


220


extending radially inwardly from the casing


201


and a rotor


210


disposed within the casing. A motor


248


is coaxially disposed with the rotor and rotates the rotor


210


about a shaft


225


. The rotor


210


includes two outer diameters, a smaller diameter


226


adjacent an inlet


205


of the pump and a lower, larger diameter


228


extending towards an outlet


206


of the pump. In the embodiment illustrated in

FIG. 3

, the first two rows of rotor blades


250


, or those blades extending from the smaller diameter portion


226


of the rotor


210


, have an increased length as compared to the other rotor blades


225


extending from the larger diameter


228


of the rotor


225


. The corresponding stator blades


251


are also increased in length extending inwards from an enlarged diameter portion


253


of the stator


220


. The longer stator and rotor blades


250


,


251


provide an increased surface area and a corresponding increase in pumping capacity. Because of their increased length, the tips of the rotor blades


250


move at a speed exceeding the speed of sound of a pumped process gas (about 300m/s for nitrogen). This results in enhanced compression of gas in the first stages and an overall increase in the pumping speed or exhaust capacity of the pump


200


.




Because the longer rotor blades


250


extend from the smaller diameter portion


226


of the rotor


210


, a relatively small increase in the diameter of the casing


201


is necessary. Also, because the enlarged portion of the casing


201


is limited to the upper portion or that portion typically attached to a vacuum chamber, the increase in size is less likely to interfere with other equipment or personnel working in the clean room. Further, the increased stress on the rotor brought about by the longer blades with their higher tip speed is minimized since the rotor diameter is smaller at the point where the longer blades


250


are attached and radial forces are not nearly so high as they are along the larger diameter portion


228


of the shaft


225


.





FIG. 4

is a section view showing an alternative embodiment of a pump


400


of the invention. The pump includes a rotor


310


having a smaller diameter


326


portion adjacent a pump inlet


305


and a larger diameter portion


328


extending toward a pump outlet


306


. A stator


320


includes blades of different lengths extending inwards from a casing


301


. Like the embodiment of

FIG. 3

, the first two rows of rotor blades


302


and the first two rows of stator blades


301


and an inlet


305


at the intake end of the pump


400


are increased in length as compared to the subsequent rotor and stator blades. Thereafter, the rotor blades extending towards a pump outlet


306


gradually decrease in length. For example, in one embodiment, each subsequent rotor blade is about 10-15% shorter than the preceding blade. The casing


305


likewise is tapered to house the longer blades but no other modifications are necessary to compensate for the increased capacity brought about by the increased surface area of the longer blades. The result of the tapered blades is a greater increase in overall blade surface area and a greater increase in pumping capacity.




While the embodiments of the present invention increase pumping capacity with no enlargement of the rotor itself, the lengthened rotor blades can benefit by a high strength connection to the rotor to compensate for the higher tip speed of the blades.

FIG. 5

is a section view of a pump


500


having similar components of pump


400


of FIG.


4


. In the pump


500


of

FIG. 5

, the base of each rotor blade


505


is modified to add additional strength to the rotor blades at their point of attachment to the rotor. Specifically, the base


520


of each rotor blade is widened by adding additional material which serves to increase the strength of the blade at its point of attachment to the rotor


510


. The increase in blade material at the base of the blade results in a corresponding increase in strength and stress resistance of the blade. In this manner, the blade design compensates for any additional stress brought about by the increased length and surface area of the blade. The corresponding stator blades


510


are tapered at their ends


512


to better match the opening


550


created between the two adjacent rotor blades.





FIG. 6

is a schematic view of a chamber with a pump attached at a lower surface thereto. The Figure is divided along a vertical axis to illustrate the physical size of the pump


650


of the present invention as compared to a conventional pump


625


having the same capacity. As illustrated, the conventional pump


625


has a casing


626


with a constant outer diameter in order to house blades having a uniform length. In contrast, the pump


650


includes a casing


655


widened only at the intake end


656


of the pump. Thereafter, the pump housing is narrower since the blades are not as long in that area of the pump. The unused space can be utilized by plumbing, cables or other clean room equipment.




The increase in the surface area of the blades at the intake end of the pump increases the pump capacity significantly. For example, modifying a pump rated at 2000 l/sec by enlarging only the first two or three stages as depicted in

FIG. 3

, will bring the capacity of the pump to almost 4000 l/sec, with no additional increase in size or weight other than the enlarged housing in the area around the longer blades of the pump. The benefits of the present invention are equally realizable in various vacuum processing chambers and vacuum processing systems that utilize turbo-molecular pumps.




While the foregoing is directed to the preferred embodiment of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims which follow.



Claims
  • 1. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including: i) a casing having an inlet port and an outlet port; ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are about 50% longer than the other rows of rotor and stator blades and an outer diameter of the pump is enlarged in an area of the longer rotor and stator blades.
  • 2. The vacuum processing system of claim 1, wherein the vacuum processing chamber is a chemical vapor deposition chamber.
  • 3. The vacuum processing system of claim 1, wherein the vacuum processing chamber is an etch chamber.
  • 4. The vacuum processing system of claim 1, wherein the vacuum processing chamber is an ion implanter.
  • 5. The vacuum processing system of claim 1, wherein the at least one row of rotor blades and the adjacent row of stator blades has about 100% more surface area than the other rotor and stator blades.
  • 6. The vacuum processing system of claim 5, wherein the blades of the at least one row of rotor blades are widened at a connection point to the rotor.
  • 7. A turbo-molecular pump for use with a vacuum chamber, comprising:(a) a casing having an inlet port and an outlet port; (b) a rotor having a plurality of rows of rotor blades disposed thereon; (c) a stator having a plurality of rows of stator blades extending radially ad inwardly from an inner surface of the casing in an alternating arrangement with the rows of rotor blades, wherein at least one of the rows of rotor blades and one of the rows of stator blades adjacent the inlet port include blades that are longer than the other rows of rotor and stator blades and the other rows of rotor and stator blades are increasingly shorter in the direction of the outlet port and whereby the casing has a larger outer diameter in an area of the at least one row of rotor blades and the at least one row of stator blades.
  • 8. The turbo-molecular pump of claim 7, wherein the other rows of rotor and stator blades,are-increasingly shorter in the direction of the outlet port.
  • 9. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including; (i) a casing having an inlet port and an outlet port; (ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are about 50% longer than the other rows of rotor and stator blades and have about 100% more surface area than the other rows of rotor and stator blades, and wherein the blades of the at least one row of rotor blades are widened at a connection point to the rotor.
  • 10. A vacuum processing system, comprising:(a) a vacuum processing chamber; and (b) a turbo-molecular pump disposed on the vacuum processing chamber, including: i) a casing having an inlet port and an outlet port; ii) a stator having a plurality of rows of stator blades extending radially inwardly; (iii) a motor disposed coaxially with a rotor; and (iv) the rotor having a plurality of rows of rotor blades extending radially outwards from an outer surface of the rotor, the rows of rotor blades disposed in an alternating arrangement with the rows of stator blades, wherein the blades of at least one row of rotor blades and the blades of at least one row of stator blades adjacent the inlet port are longer than the other rows of rotor and stator blades and an outer diameter of the pump is enlarged in an area of the longer rotor and stator blades.
  • 11. The turbo molecular pump of claim 10, wherein as the pump operates, gas moves through the pump in an axial fashion between the inlet port and an outlet port.
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Number Name Date Kind
4111595 Becker et al. Sep 1978 A
RE33129 Mase et al. Dec 1989 E
4978276 Kabelitz et al. Dec 1990 A
5386166 Reimer et al. Jan 1995 A
5577883 Schutz et al. Nov 1996 A
5729065 Fremery et al. Mar 1998 A
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