TWO-WAVELENGTH ANTIREFLECTION FILM AND OBJECTIVE LENS COATED WITH TWO-WAVELENGTH ANTIREFLECTION FILM

Abstract

A two-wavelength antireflection film to prevent light in two-wavelength regions of a deep-ultraviolet region and a region from a visible region to the near-infrared region on a surface of a substrate by coating the two-wavelength antireflection film on the surface of the substrate which penetrates light from the deep-ultraviolet region to the near-infrared region, comprising a first thin film which is formed on the substrate, and has a refractive index of 1.6 to 2.0 and optical film thickness of 0.4λ to 0.7λ for design main wavelength (λ), a second thin film which is formed on the first thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.05λ to 0.6λ for the design main wavelength λ, a third thin film which is formed on the second thin film, and has a refractive index of 1.6 to 2.0 and an optical film thickness of 0.1λ to 0.5λ for the design main wavelength λ, and a fourth thin film which is formed on the third thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.2λ to 0.35λ for the design main wavelength λ.

Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a two-wavelength antireflection film which prevents reflection for two-wavelength regions of a deep-ultraviolet region and a region from a visible region to a near-infrared region, and relates to an objective lens for optical device with a high numerical aperture and a high magnification, on which the two-wavelength antireflection film is coated.

[0003] 2. Description of the Related Art

[0004] Recently, the magnetic head used for the semiconductor such as CPU and the hard disk drive etc. is remarkably downsized, and extremely high resolving power is required, to accurately detect the defect of the product etc. in the inspection apparatus used for these inspections.

[0005] An optical microscope using a visible ray is used for the above-mentioned inspection apparatus in general. In this case, a resolution of the optical microscope is determined by 0.61λ (wavelength/NA) Therefore, it is necessary to enlarge an NA of the objective lens or to shorten the wavelength of the ray in order to obtain an enough resolution.

[0006] However, recently, enlarging NA of object lens is near limitation. Therefore, to obtain further resolving power, a microscope which shortens wavelength, i.e., a DUV microscope which makes resolving power twice or more by using a deep-ultraviolet region (Deep UV), has been put to practical use.

[0007] By the way, the DUV microscope uses the laser and/or a general-purpose arc lamp such as the mercury lamps, as a light source. The laser outputs light with high intensity ray at a specific wavelength, but apparatus thereof becomes large and expensive. On the other hand, the general-purpose arc lamp outputs light with low intensity at a specific wavelength, but apparatus thereof can be downsized and becomes cheap.

[0008] Then, it is noted that the general-purpose arc lamp emits light in wideband. The general-purpose arc lamp, that an optical amount is secured by widening the wavelength region, is considered to be used as a light source. However, when such a general-purpose arc lamp is used as the light source, it is necessary to compensate the chromatic aberration. Therefore, the single lens having the medium with different refractive index, for example, a lens which can compensate the chromatic aberration by bonding, for instance, fluorite glass and quartz glass with the bonding agent has been put to practical use as the DUV objective lens used for the DUV microscope.

[0009] However, irradiation of light in the DUV region degrades the bonding agent to reduce the transmittance of the objective lens in the lens in which fluorite glass and quartz glass are bonded.

[0010] Therefore, recently, as disclosed in, for example, Japanese Patent Application KOKAI Publication No. 11-167067 and Japanese Patent Application KOKAI Publication No. 2001-318317, the objective lens with no bonding to correct the chromatic aberration using a single lens of the medium with a different refractive index (fluorite glass and quartz glass), and to prevent the reduce in transmittance caused by the degradation of the adhesive by not bonding between these single lenses is developed.

[0011] By the way, the objective lens of no bonding as mentioned above is used to observe the sample image by the light of the deep-ultraviolet region wavelength (for instance, 248 nm). In addition, the objective lens of no bonding might be used to correspond also to the automatic focusing by using the light of wavelength from the visible region to the near-infrared region (for instance, 650 to 1000 nm), so-called auto focus function (hereafter, AF).

[0012] In this case, the objective lens should have high transmittance simultaneously with the light of the deep-ultraviolet region wavelength and for the light of wavelength from the visible region to the near-infrared region.

BRIEF SUMMARY OF THE INVENTION

[0013] The two-wavelength antireflection film to prevent light in two-wavelength regions of a deep-ultraviolet region and a region from a visible region to the near-infrared region on a surface of a substrate by coating the two-wavelength antireflection film on the surface of the substrate which penetrates light from the deep-ultraviolet region to the near-infrared region according to one aspect of the present invention is characterized by comprising: a first thin film which is formed on the substrate, and has a refractive index of 1.6 to 2.0 and optical film thickness of 0.4λ to 0.7λ for design main wavelength (λ); a second thin film which is formed on the first thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.05λ to 0.6λ for the design main wavelength λ; a third thin film which is formed on the second thin film, and has a refractive index of 1.6 to 2.0 and an optical film thickness of 0.1λ to 0.5λ for the design main wavelength λ; and a fourth thin film which is formed on the third thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.2λ to 0.35λ for the design main wavelength λ.

[0014] The objective lens used for an optical equipment, which performs an observation by the light of the deep-ultraviolet region wavelength of 300 nm or less and has a focusing mechanism (auto focus) in the wavelength region from a visible region to a near-infrared region according to one aspect of the present invention is characterized by comprising a plurality of single lenses, wherein each of the plurality of single lenses has a two-wavelength antireflection film according to claim 1 on the surface thereof.

[0015] Advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Advantages of the invention may be realized and obtained by means of the instrumentalities and combinations particularly pointed out hereinafter.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

[0016] The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention, and together with the general description given above and the detailed description of the embodiments given below, serve to explain the principles of the invention.

[0017] FIG. 1 is a figure showing a schematic configuration of the two-wavelength antireflection film according to the first embodiment of the present invention;

[0018] FIG. 2 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the first embodiment of the present invention;

[0019] FIG. 3 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the second embodiment of the present invention;

[0020] FIG. 4 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the third embodiment of the present invention;

[0021] FIG. 5 is a figure showing change of 246 nm reflectance according to the incident angle in the first to third embodiments of the present invention;

[0022] FIG. 6 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the fourth embodiment of the present invention;

[0023] FIG. 7 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the fifth embodiment of the present invention;

[0024] FIG. 8 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the sixth embodiment of the present invention;

[0025] FIG. 9 is a figure showing change of 248 nm reflectance according to the incident angle in the fourth to seventh embodiments of the present invention;

[0026] FIG. 10 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the seventh embodiment of the present invention;

[0027] FIG. 11 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the eighth embodiment of the present invention;

[0028] FIG. 12 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the ninth embodiment of the present invention;

[0029] FIG. 13 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the tenth embodiment of the present invention;

[0030] FIG. 14 is a figure showing change of 248 nm reflectance according to the incident angle in the eighth to twelfth embodiments of the present invention;

[0031] FIG. 15 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the eleventh embodiment of the present invention;

[0032] FIG. 16 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film according to the twelfth embodiment of the present invention;

[0033] FIG. 17 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film in the first comparison example to explain the present invention;

[0034] FIG. 18 is a figure showing spectral reflectance characteristic of two-wavelength antireflection film in the second comparison example to explain the present invention;

[0035] FIG. 19 is a figure showing a schematic configuration of the objective lens used for the thirteenth embodiment of the present invention;

[0036] FIG. 20 is a figure to explain the angle of the incident (or output) light into (or from) the normal of the lens of the thirteenth embodiment of the present invention;

[0037] FIG. 21 is a figure to explain an example of comparing transmittance of the thirteenth embodiment of the present invention;

[0038] FIG. 22 is a figure showing a schematic configuration of the objective lens used for the fourteenth embodiment of the present invention; and

[0039] FIG. 23 is a figure to explain an example of comparing transmittance of the fourteenth embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

[0040] Hereinafter, embodiments of the present invention will be explained referring to the drawings.

[0041] (First Embodiment)

[0042] FIG. 1 shows a schematic configuration of the two-wavelength antireflection film to which the first embodiment of the present invention is applied. In FIG. 1, quartz glass, which is transparent from the deep-ultraviolet region to the near-infrared region, is used as a substrate material for the substrate 1. Thin films 2, 3, 4, and 5 are formed on the substrate 1 as two-wavelength antireflection film to form a four-layer structure.

[0043] The film material and the film thickness of each of thin films 2, 3, 4, and 5 is shown in (A) of Table 1. Table 1 collectively shows the film material and the film thickness corresponding to the first to third embodiments ((A) to (C)) as described later

	TABLE 1
	A	B	C
	Substrate 1
	Quartz glass	Quartz glass	Quartz glass
	Design wavelength λ
	248 nm	248 nm	248 nm
		Film		Film		Film
	Film	thickness		thickness		thickness
	material	(×λ)	Film material	(×λ)	Film material	(×λ)
Thin film 2	Al2O3	0.51	Al2O3 + La2O3	0.46	Al2O3 + La2O3	0.46
			(Substance M2)		(Substance M3)
Thin film 3	MgF2	0.46	MgF2	0.47	MgF2	0.50
Thin film 4	Al2O3	0.16	Al2O3 + La2O3	0.26	Al2O3 + La2O3	0.16
			(Substance M2)		(Substance M3)
Thin film 5	MgF2	0.30	MgF2	0.25	MgF2	0.30

[0044] In (A) of Table 1, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. Al2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the middle refractive index of about 1.7 is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (A) of Table 1.

[0045] FIG. 2 shows each spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (A) of Table 1, when changing the incident angle of the light to 0°, 30°, 50°, and 65°, respectively. By changing the incident angle of the light, the curve (a) of FIG. 5 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0046] As is clear from FIG. 2, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (a) of FIG. 5. Therefore, by forming the two-wavelength antireflection film configured with thin films 2, 3, 4, and 5 according to the first embodiment on the substrate 1 of quartz glass which is transparent from the deep-ultraviolet region to the near-infrared region, high transmittance can be achieved for light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and light from the visible region to the near-infrared region in the vicinity of the range of 650 nm to 800 nm, which are used for auto focus.

[0047] (Second Embodiment)

[0048] The schematic configuration of the two-wavelength antireflection film according to the second embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0049] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (B) of Table 1.

[0050] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows The mixture of Al2O3 and La2O3 with the middle refractive index material is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. Specifically, Substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1 similar to the first embodiment. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (B) of Table 1.

[0051] FIG. 3 shows each spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (B) of Table 1, when changing the incident angle of the light to 0°, 30°, 50°, and 65°, respectively. By changing the incident angle of the light, the curve (b) of FIG. 5 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0052] As is clear from FIG. 3, it becomes possible to perform antireflection because reflectance becomes small in two- two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (b) of FIG. 5.

[0053] Therefore, high transmittance can be achieved for light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and light from the visible region to the near-infrared region in the vicinity of the range of 650 nm to 800 nm, which are used for auto focus similar to that described in the first embodiment.

[0054] (Third Embodiment)

[0055] The schematic configuration of the two-wavelength antireflection film according to the third embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0056] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (C) of Table 1.

[0057] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. The mixture of Al2O3 and La2O3 with the middle refractive index material, whose mixture ratio of Al2O3 and La2O3 and refractive index are different from those in the second embodiment, is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. Specifically, Substance M3 made by the Merck, which as the mixture of Al2O3 and La2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is about 1.95, is used. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1 similar to the firsts embodiment. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (C) of Table 1.

[0058] FIG. 4 shows each spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (C) of Table 1, when changing the incident angle of the light to 0°, 30°, 50°, and 65°, respectively. By changing the incident angle of the light, the curve (c) of FIG. 5 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0059] As is clear from FIG. 4, it becomes possible to perform antireflection because reflectance becomes small in two- two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (c) of FIG. 5.

[0060] Therefore, high transmittance can be achieved for light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and light from the visible region to the near-infrared region in the vicinity of the range of 650 nm to 800 nm, which are used for auto focus similar to that described in the first embodiment.

[0061] (Fourth Embodiment)

[0062] The schematic configuration of the two-wavelength antireflection film according to the fourth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1. In this case, fluorite glass, which is transparent from the deep-ultraviolet region to the near-infrared region, is used as a substrate material for the substrate 1.

[0063] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (A) of Table 2. Table 2 collectively shows the film material and the film thickness corresponding to the fourth to fifth embodiments ((A) to (C)) as described later.

	TABLE 2
	A	B	C
	Substrate 1
	Fluorite glass	Fluorite glass	Fluorite glass
	Design wavelength λ
	248 nm	248 nm	248 nm
		Film		Film		Film
	Film	thickness		thickness		thickness
	material	(×λ)	Film material	(×λ)	Film material	(×λ)
Thin film 2	Al2O3	0.47	Al2O3 + La2O3	0.48	Al2O3 + La2O3	0.49
			(Substance M2)		(Substance M3)
Thin film 3	MgF2	0.41	MgF2	0.44	MgF2	0.49
Thin film 4	Al2O3	0.20	Al2O3 + La2O3	0.27	Al2O3 + La2O3	0.11
			(Substance M2)		(Substance M3)
Thin film 5	MgF2	0.27	MgF2	0.25	MgF2	0.31

[0064] In (A) of Table 2, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are similar to the first embodiment. Al2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the middle refractive index of about 1.7 is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (A) of Table 2.

[0065] FIG. 6 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (A) of Table 2, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (a) of FIG. 9 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0066] As is clear from FIG. 6, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (a) of FIG. 9. As a result, a similar advantage to the first embodiment can be expected.

[0067] (Fifth Embodiment)

[0068] The schematic configuration of the two-wavelength antireflection film according to the fifth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1. In this case, fluorite glass, which is transparent from the deep-ultraviolet region to the near-infrared region, is used as a substrate material for the substrate 1.

[0069] The film material and the film thickness of each of thin film 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (B) of Table 2.

[0070] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are similar to the second embodiment. Substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (B) of Table 2.

[0071] FIG. 7 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (B) of Table 2, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (b) of FIG. 9 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0072] As is clear from FIG. 7, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (b) of FIG. 9. As a result, a similar advantage to the second embodiment can be expected.

[0073] (Sixth Embodiment)

[0074] The schematic configuration of the two-wavelength antireflection film according to the sixth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1. In this case, fluorite glass, which is transparent from the deep-ultraviolet region to the near-infrared region, is used as a substrate material for the substrate 1.

[0075] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (C) of Table 2.

[0076] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are similar to the second embodiment. Substance M3 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is about 1.95, is used is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (C) of Table 2.

[0077] FIG. 8 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (C) of Table 2, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (c) of FIG. 9 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0078] As is clear from FIG. 8, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (c) of FIG. 9. As a result, a similar advantage the third embodiment can be expected.

[0079] (Seventh Embodiment)

[0080] The schematic configuration of the two-wavelength antireflection film according to the seventh embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0081] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in Table 4.

	TABLE 3
	Substrate 1	Quartz glass
	Design
	wavelength λ	248 nm
	Layer number		Film
	(from substrate)	Film material	thickness (×λ)
	Thin film 2	Al2O3 + La2O3	0.52
		(Substance M2)
	Thin film 3	MgF2	0.53
	Thin film 4	Al2O3 + La2O3	0.29
		(Substance M2)
	Thin film 5	MgF2	0.28

[0082] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are similar to the second embodiment Substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in Table 3.

[0083] FIG. 10 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in Table 3, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (d) of FIG. 9 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0084] As is clear from FIG. 10, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. Especially, it becomes possible to reduce reflectance further within the range from 30° to 50° in incident angle of design main wavelength (248 nm) as shown in curve (d) of FIG. 9. Therefore, transmittance can be further improved by using such two-wavelength antireflection film.

[0085] (Eighth Embodiment)

[0086] The schematic configuration of the two-wavelength antireflection film according to the eighth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1. In this case, quartz glass, which is transparent from the deep-ultraviolet region to the near-infrared region, is used as a substrate material for the substrate 1.

[0087] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (A) of Table 4. Table 4 collectively shows the film material and the film thickness corresponding to the eighth to tenth embodiments ((A) to (C)) as described later.

	TABLE 4
	A	B	C
	Substrate 1
	Fluorite glass	Fluorite glass	Fluorite glass
	Design wavelength λ
	248 nm	248 nm	248 nm
		Film		Film		Film
	Film	thickness		thickness		thickness
	material	(×λ)	Film material	(×λ)	Film material	(×λ)
Thin film 2	Al2O3	0.60	Al2O3 + La2O3	0.67	Al2O3 + La2O3	0.59
			(Substance M2)		(Substance M3)
Thin film 3	MgF2	0.12	MgF2	0.87	MgF2	0.98
Thin film 4	Al2O3	0.34	Al2O3 + La2O3	0.31	Al2O3 + La2O3	0.48
			(Substance M2)		(Substance M3)
Thin film 5	MgF2	0.26	MgF2	0.30	MgF2	0.22

[0088] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are similar to the first embodiment. Al2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the middle refractive index of about 1.7 is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (A) of Table 4.

[0089] FIG. 11 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (A) of Table 4, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (a) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0090] As is clear from FIG. 11, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (a) of FIG. 14. Therefore, if two wavelength antireflection film configured with thin films 2, 3, 4, and 5 of the eighth embodiment is formed on the substrate 1 of quartz glass which is transparent from the deep-ultraviolet region to the near-infrared region, high transmittance can be achieved for light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and light in the visible region used for auto focus within the range of 550 nm to 650 nm different from light from the visible region to the near-infrared region used for auto focus within the range of 650 nm to 800 nm described in the first to seventh embodiments.

[0091] (Ninth Embodiment)

[0092] The schematic configuration of the two-wavelength antireflection film according to the ninth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0093] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (B) of Table 4.

[0094] In this case, the film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. The mixture of Al2O3 and La2O3 with the middle refractive index material is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. Specifically, Substance M2 made by the Merck, which is the mixture of Al2O3 and La2C3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1 similar to the first embodiment. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (2) of Table 4.

[0095] FIG. 12 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (B) of Table 4, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (b) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0096] As is clear from FIG. 12, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region within the range of the vicinity of 248 nm and 550 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (b) of FIG. 14. Therefore, high transmittance can be achieved for light in the visible region similarly used for auto focus within the range of light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and 550 nm to 650 nm when having described in the eighth embodiment.

[0097] (Tenth Embodiment)

[0098] The schematic configuration of the two-wavelength antireflection film according to the tenth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0099] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (C) of Table 4.

[0100] The film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. Substance M3 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is about 1.95, is used is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin fills 2, 3, 4, and 5 is shown in (C) of Table 4.

[0101] FIG. 13 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (C) of Table 4, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (c) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0102] As is clear from FIG. 13, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (c) of FIG. 14. Therefore, high transmittance can be achieved for light from the visible region used for auto focus in the vicinity of the range of light in the deep-ultraviolet region in the vicinity of design main wavelength (248 nm) and 550 nm to 650 nm to the near-infrared region similar to that described in the eighth embodiment.

[0103] In the above-mentioned first to tenth embodiment, MgF2 as the low refraction material and Al2O3 or the mixture of Al2O3 and La2O3 as the middle refractive index material is used. It is not limited to this, even when material having similar refractive index to these materials such as a plurality of components selected from group of MgF2, SiO2, NaF, LiF, and mixture thereof or compound thereof as the low refractive index material and material one or more components selected from group of Al2O3, LaF3, NdF3, YF3, La2O3, and mixture thereof or compound thereof as the middle refractive index material is used, and advantages of above mentioned embodiments can be expected.

[0104] (Eleventh Embodiment)

[0105] The schematic configuration of the two-wavelength antireflection film according to the eleventh embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0106] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (A) of Table 5. Table 5 collectively shows the film material and the film thickness corresponding to the fourth and fifth embodiments ((A) and (B)) as described later.

	TABLE 5
	B	C
	Substrate 1
	Quartz glass	Quartz glass
	Design wavelength λ
	248 nm	248 nm
		Film		Film
		thickness		thickness
	Film material	(×λ)	Film material	(×λ)
Thin film 2	Al2O3 + La2O3	0.64	Al2O3 + La2O3	0.50
	(Substance M2)		(Substance M2)
Thin film 3	SiO2	0.11	SiO2	0.19
Thin film 4	Al2O3 + La2O3	0.37	Al2O3 + La2O3	0.32
	(Substance M2)		(Substance M2)
Thin film 5	MgF2	0.28	SiO2	0.28

[0107] The film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. Substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. SiO2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.5, is used to thin film 3 in the second layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 5 in the fourth layer front the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (A) of Table 5.

[0108] FIG. 15 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (A) of Table 5, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (d) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0109] As is clear from FIG. 15, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (d) of FIG. 14. As a result, a similar advantage to the first embodiment can be expected.

[0110] (Twelfth Embodiment)

[0111] The schematic configuration of the two-wavelength antireflection film according to the twelfth embodiment is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

[0112] The film material and the film thickness of each of thin films 2, 3, 4, and 5 of two-wavelength antireflection films configured as FIG. 1 is shown in (B) of Table 5.

[0113] The film materials of thin films 2, 3, 4, and 5, each of which forms each layer, are as follows. Substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index is about 1.8 in design main wavelength (248 nm in the deep-ultraviolet region) is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. SiO2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.5, is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in (B) of Table 5.

[0114] FIG. 16 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in (B) of Table 5, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (e) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0115] As is clear from FIG. 16, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm. It is also clear that the reflection of design main wavelength (248 nm) is small in the range of 0° to 70° in incident angle of light as shown in curve (e) of FIG. 14. As a result, a similar advantage to the first embodiment can be expected.

FIRST COMPARISON EXAMPLE

[0116] Next, two-wavelength antireflection film of the film configuration and the design value indicated in Table 6 as a comparison example with two-wavelength antireflection film by each embodiment mentioned above has been examined. The schematic configuration of the two-wavelength antireflection film of this case is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

	TABLE 6
	Substrate 1	Quartz glass
	Design
	wavelength λ	248 nm
	Layer number		Film
	(from substrate)	Film material	thickness (×λ)
	Thin film 2	Al2O3 + La2O3	0.96
		(Substance M2)
	Thin film 3	MgF2	0.35
	Thin film 4	Al2O3 + La2O3	0.12
		(Substance M2)
	Thin film 5	MgF2	0.29

[0117] In the above-mentioned configuration, substance M2 made by the Merck, which is the mixture of Al2O3 and La2O3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is about 1.8, is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1 similar to the second embodiment. Each film thickness of these thin films 2, 3, 4, and 5 is shown in Table 6.

[0118] FIG. 17 shows each spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in Table 6, when changing the incident angle of the light to 0°, 30°, 50°, and 65°, respectively. By changing the incident angle of the light, the curve (d) of FIG. 5 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0119] As is clear from FIG. 17, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm when the incident angle of light is 00 and 30°. However, reflectance in the vicinity of 248 nm becomes large as the incident angle of light becomes large. Especially, as shown in curve (d) of FIG. 5, when the incident angle becomes 55° or more, the function as the antireflection film is nor obtained at all because the reflectance of 248 nm becomes larger than the substrate on which the film is not coated as shown in curve (e) of FIG. 5.

SECOND COMPARISON EXAMPLE

[0120] Next, two-wavelength antireflection film of the film configuration and the design value indicated in Table 7 as other comparison example with two-wavelength antireflection film by each embodiment mentioned above has been examined. The schematic configuration of the two-wavelength antireflection film of this case is similar to that in FIG. 1, and the explanation will be described by using FIG. 1.

	TABLE 7
	Substrate 1	Quartz glass
	Design
	wavelength λ	248 nm
	Layer number		Film
	(from substrate)	Film material	thickness (×λ)
	Thin film 2	Al2O3 + La2O3	0.47
		(Substance M2)
	Thin film 3	MgF2	0.35
	Thin film 4	Al2O3 + La2O3	0.13
		(Substance M2)
	Thin film 5	MgF2	0.29

[0121] Substance M2 made by the Merck, which is the mixture of Al2O3 and La2o3 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is about 1.8, is used to thin film 2 of the first layer and thin film 4 of the third layer from the substrate 1. MgF2 whose refractive index in design main wavelength (248 nm in the deep-ultraviolet region) is the low refractive index of about 1.4 is used to thin film 3 in the second layer and thin film 5 in the fourth layer from the substrate 1. Each film thickness of these thin films 2, 3, 4, and 5 is shown in Table 7.

[0122] FIG. 18 shows spectral reflectance characteristic for the two wavelength antireflection film made for trial purposes with the configuration shown in Table 7, when the incident angle of light is assumed to be 0° (vertical). By changing the incident angle of the light, the curve (f) of FIG. 14 is obtained as a result of simulating the numerical value how the reflectance of the light of design main wavelength (248 nm) is changed.

[0123] As is clear from FIG. 18, it becomes possible to perform antireflection because reflectance becomes small in two-wavelength region in the vicinity of 248 nm and within the range of 650 nm to 800 nm when the incident angle of light is 0°. However, when the incident angle becomes large, the reflectance of 248 nm abruptly becomes large as shown in curve (f) of FIG. 14. Especially, when the incident angle becomes 65° or more, the reflectance of 248 nm becomes large, and becomes larger than the reflectance of the substrate on which the film is not coated as shown in curve (g) of FIG. 14. The function as the antireflection film is not obtained at all.

[0124] Next, the objective lens on which two-wavelength antireflection film mentioned above is actually coated on the surface of the lens will be explained.

[0125] (Thirteenth Embodiment)

[0126] FIG. 19 is a figure showing a schematic configuration of the objective lens applied to the thirteenth embodiment of the present invention.

[0127] The objective lens is used for an optical equipment which observes by the light of wavelength of the ultra-violet region of 300 mm or less and has the mechanism to focus (auto focus) by the light in the wavelength region from a visible region to the near-infrared region. Specifically, light of 248±5 nm in the deep-ultraviolet region as wavelength used for the observation and light of 785 nm in the near-infrared region as wavelength used for auto focus are applied.

[0128] The objective lens has the first lens group 1G and the second lens group G2 arranged between the first lens group 1G and the object as shown in FIG. 19. The first lens group 1G has five single lenses L1 to L5 which include positive lens and negative lens with the different medium and has negative power as a whole. The second lens group 2G has thirteen single lenses L6 to L18 which include positive lens and negative lens with the different medium In the first and second lens group 1G and 2G, the air interval is provided between a positive lens and negative lens.

[0129] Tables 8 to 11 show the angle of the light which is incident (emitted) to (from) the normal of the lens, reflectance and the transmittance, etc. corresponding thereto, which are obtained when two wavelength antireflection film explained in detail in the seventh embodiment is coated to each lens surface of each single lens L1 to L18 for each of NA=09, 0.8, 0.7, and 0.5 of such an objective lens, and the lens data of each single lens L1 to L18 (curvature, thickness, interval, and material name).

[0130] The angle of the light which is incident (emitted) to (from) the normal of the lens is an angle r of the light which is incident (emitted) to (from) normal h of the objective lens L as shown in FIG. 20.

[0131] Reflectance and transmittance are obtained from the value of the incident angle obtained as mentioned above.

TABLE 8
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	40	0.476	0.995
	2	2.11	0.7		23	0.421	0.996
L2	3	−2.503	0.7	Fluorite glass	31	0.329	0.997
	4	3.929	5.212314		29	0.057	0.999
L3	5	INF	2.786	Fluorite glass	13	1.091	0.989
	6	−4.1	0.585821		47	0.68	0.993
L4	7	−3.179	1	Quartz glass	61	10.316	0.897
	8	13.25	0.205879		53	10823	0.982
L5	9	14.51	2.792	Fluorite glass	53	1.787	0.982
	10	−8.069	0.135719		16	0.278	0.997
L6	11	9.175	4.016	Fluorite glass	43	0.959	0.990
	12	−8.107	0.473387		59	2.554	0.974
L7	13	−6.806	1	Quartz glass	65	7.46	0.925
	14	9.394	0.205775		54	1.668	0.983
L8	15	9.73	4.65	Fluorite glass	54	1.709	0.983
	16	−7.998	0.105412		53	1.314	0.987
L9	17	−8.397	1	Quartz glass	50	0.958	0.990
	18	13.99	0.1		40	0.611	0.994
L10	19	12.513	4.035695	Fluorite glass	43	0.968	0.990
	20	−10.732	0.1		39	0.852	0.991
L11	21	35.892	1	Quartz glass	2	0.079	0.999
	22	6.835	0.201239		52	1.419	0.986
L12	23	6.916	4.203	Fluorite glass	52	1.359	0.986
	24	−10.627	0.2075		51	1.626	0.984
L13	25	−10.072	0.96	Quartz glass	52	1.71	0.983
	26	101.798	0.1		7	1.232	0.988
L14	27	10.53	0.9	Quartz glass	12	0.037	1.000
	28	4.509	0.527319		62	9.5	0.905
L15	29	5.379	2.576	Fluorite glass	52	1.308	0.987
	30	−51.505	0.1		16	0.888	0.991
L16	31	6.736	1.742	Fluorite glass	15	0.157	0.998
	32	17.567	0.1		12	0.814	0.992
L17	33	4.099	1.818	Fluorite glass	15	0.656	0.993
	34	9.003	0.10016		21	0.357	0.996
L18	35	1.883	1.872	Quartz glass	17	0.27	0.997
	36	5.293	0.262779		58	2.765	0.972
Transmittance of the objective lens at NA = 0.9:0.537

[0132]

TABLE 9
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	35	0.774	0.993
	2	2.11	0.7		21	0.195	0.998
L2	3	−2.503	0.7	Fluorite glass	26	0.091	0.999
	4	3.929	5.212314		26	0.122	0.999
L3	5	INF	2.786	Fluorite glass	12	1.12	0.989
	6	−4.1	0.585821		41	0.702	0.993
L4	7	−3.179	1	Quartz glass	53	2.825	0.972
	8	13.25	0.205879		44	0.541	0.995
L5	9	14.51	2.792	Fluorite glass	43	0.435	0.996
	10	−8.069	0.135719		15	0.019	1.000
L6	11	9.175	4.016	Fluorite glass	36	0.616	0.994
	12	−8.107	0.473387		46	1.128	0.989
L7	13	−6.806	1	Quartz glass	51	1.157	0.988
	14	9.394	0.205775		41	0.845	0.992
L8	15	9.73	4.65	Fluorite glass	41	0.82	0.992
	16	−7.998	0.105412		42	0.931	0.991
L9	17	−8.397	1	Quartz glass	40	0.881	0.991
	18	13.99	0.1		31	0.079	0.999
L10	19	12.513	4.035695	Fluorite glass	33	0.196	0.998
	20	−10.732	0.1		31	0.329	0.997
L11	21	35.892	1	Quartz glass	2	1.029	0.990
	22	6.835	0.201239		42	0.77	0.992
L12	23	6.916	4.203	Fluorite glass	42	0.77	0.992
	24	−10.627	0.2075		41	0.648	0.994
L13	25	−10.072	0.96	Quartz glass	41	0.686	0.993
	26	101.798	0.1		6	1.25	0.988
L14	27	10.53	0.9	Quartz glass	10	0.178	0.998
	28	4.509	0.527319		49	0.881	0.991
L15	29	5.379	2.576	Fluorite glass	42	0.77	0.992
	30	−51.505	0.1		15	1.032	0.990
L16	31	6.736	1.742	Fluorite glass	12	0.021	1.000
	32	17.567	0.1		12	0.912	0.991
L17	33	4.099	1.818	Fluorite glass	12	0.333	0.997
	34	9.003	0.10016		20	0.465	0.995
L18	35	1.883	1.872	Quartz glass	13	0.68	0.993
	36	5.293	0.262779		50	0.893	0.991
Transmittance of the objective lens at NA = 0.8:0.777

[0133]

TABLE 10
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	30	00.604	0.994
	2	2.11	0.7		19	0.04	1.000
L2	3	−2.503	0.7	Fluorite glass	23	0.04	1.000
	4	3.929	5.212314		23	0.235	0.998
L3	5	INF	2.786	Fluorite glass	11	1.15	0.989
	6	−4.1	0.585821		36	0.788	0.992
L4	7	−3.179	1	Quartz glass	46	0.59	0.994
	8	13.25	0.205879		37	0.155	0.998
L5	9	14.51	2.792	Fluorite glass	36	0.134	0.999
	10	−8.069	0.135719		13	0.023	1.000
L6	11	9.175	4.016	Fluorite glass	30	0.151	0.998
	12	−8.107	0.473387		38	0.65	0.990
L7	13	−6.806	1	Quartz glass	42	0.959	0.994
	14	9.394	0.205775		33	0.227	0.990
L8	15	9.73	4.65	Fluorite glass	33	0.196	0.998
	16	−7.998	0.105412		34	0.527	0.995
L9	17	−8.397	1	Quartz glass	33	0.411	0.996
	18	13.99	0.1		25	0.135	0.999
L10	19	12.513	4.035695	Fluorite glass	27	0.064	0.999
	20	−10.732	0.1		26	0.046	1.000
L11	21	35.892	1	Quartz glass	1	1.189	0.988
	22	6.835	0.201239		35	0.728	0.993
L12	23	6.916	4.203	Fluorite glass	35	0.709	0.993
	24	−10.627	0.2075		33	0.122	0.999
L13	25	−10.072	0.96	Quartz glass	34	0.143	0.999
	26	101.798	0.1		5	1.268	0.987
L14	27	10.53	0.9	Quartz glass	9	0.443	0.996
	28	4.509	0.527319		40	0.725	0.993
L15	29	5.379	2.576	Fluorite glass	34	0.698	0.993
	30	−51.505	0.1		13	1.091	0.989
L16	31	6.736	1.742	Fluorite glass	9	0.105	0.999
	32	17.567	0.1		11	1.146	0.989
L17	33	4.099	1.818	Fluorite glass	9	0.056	0.999
	34	9.003	0.10016		17	0.75	0.993
L18	35	1.883	1.872	Quartz glass	10	0.573	0.994
	36	5.293	0.262779		42	0.288	0.997
Transmittance of the objective lens at NA = 0.7:0.842

[0134]

TABLE 11
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	21	0.027	1.000
	2	2.11	0.7		14	0.277	0.997
L2	3	−2.503	0.7	Fluorite glass	16	0.436	0.996
	4	3.929	5.212314		17	0.657	0.993
L3	5	INF	2.786	Fluorite glass	8	1.215	0.988
	6	−4.1	0.585821		25	0.091	0.999
L4	7	−3.179	1	Quartz glass	32	0.637	0.994
	8	13.25	0.205879		25	0.433	0.996
L5	9	14.51	2.792	Fluorite glass	24	0.474	0.995
	10	−8.069	0.135719		10	1.282	0.987
L6	11	9.175	4.016	Fluorite glass	20	0.255	0.997
	12	−8.107	0.473387		25	0.071	0.999
L7	13	−6.806	1	Quartz glass	27	0.051	0.999
	14	9.394	0.205775		21	0.231	0.998
L8	15	9.73	4.65	Fluorite glass	21	0.29	0.997
	16	−7.998	0.105412		23	0.074	0.999
L9	17	−8.397	1	Quartz glass	22	0.119	0.999
	18	13.99	0.1		16	0.693	0.993
L10	19	12.513	4.035695	Fluorite glass	17	0.568	0.994
	20	−10.732	0.1		17	0.28	0.997
L11	21	35.892	1	Quartz glass	1	0.189	0.998
	22	6.835	0.201239		23	0.034	1.000
L12	23	6.916	4.203	Fluorite glass	23	0.034	1.000
	24	−10.627	0.2075		22	0.395	0.996
L13	25	−10.072	0.96	Quartz glass	22	0.326	0.997
	26	101.798	0.1		3	1.28	0.987
L14	27	10.53	0.9	Quartz glass	6	0.844	0.992
	28	4.509	0.527319		26	0.144	0.999
L15	29	5.379	2.576	Fluorite glass	22	0.035	1.000
	30	−51.505	0.1		9	1.197	0.988
L16	31	6.736	1.742	Fluorite glass	6	0.6	0.994
	32	17.567	0.1		8	1.11	0.989
L17	33	4.099	1.818	Fluorite glass	6	0.274	0.997
	34	9.003	0.10016		12	1.015	0.990
L18	35	1.883	1.872	Quartz glass	6	0.018	1.000
	36	5.293	0.262779		28	0.476	0.995
Transmittance of the objective lens at NA = 0.5:0.850

[0135] Thus, the transmittance at wavelength 248 nm and NA=0.9 shown in Table 8 becomes 53.8%. Similarly, the transmittance at wavelength 248 nm and NA=0.8 shown in Table 9 becomes 77.7%. The transmittance at wavelength 248 nm and NA=0.7 shown in Table 10 becomes 84.2%. The transmittance at wavelength 248 nm and NA=0.5 shown in Table 11 becomes 85%.

[0136] On the other hand, Tables 12 to 15 show the angle of the light which is incident (emitted) to (from) the normal of the lens, reflectance and the transmittance, etc. corresponding thereto, which are obtained when two wavelength antireflection film explained in detail in the first comparison example is provided to each lens surface of each single lens L1 to L18 for each of NA=0.9, 10.8, 0.7, and 0.5 of such an objective lens, and the lens data of each single lens L1 to L18 (curvature, thickness, interval, and material name).

TABLE 12
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	40	12.006	0.880
	2	2.11	0.7		23	4.17	0.958
L2	3	−2.503	0.7	Fluorite glass	31	3.548	0.965
	4	3.929	5.212314		29	0.916	0.991
L3	5	INF	2.786	Fluorite glass	13	0.02	1.000
	6	−4.1	0.585821		47	13.356	0.866
L4	7	−3.179	1	Quartz glass	61	12.418	0.876
	8	13.25	0.205879		53	9.536	0.905
L5	9	14.51	2.792	Fluorite glass	53	9.126	0.909
	10	−8.069	0.135719		16	2.994	0.970
L6	11	9.175	4.016	Fluorite glass	43	10.694	0.893
	12	−8.107	0.473387		59	17.194	0.828
L7	13	−6.806	1	Quartz glass	65	17.58	0.824
	14	9.394	0.205775		54	15.092	0.849
L8	15	9.73	4.65	Fluorite glass	54	14.998	0.850
	16	−7.998	0.105412		53	14.768	0.852
L9	17	−8.397	1	Quartz glass	50	14.076	0.859
	18	13.99	0.1		40	5.229	0.948
L10	19	12.513	4.035695	Fluorite glass	43	8.244	0.918
	20	−10.732	0.1		39	8.632	0.914
L11	21	35.892	1	Quartz glass	2	0.026	1.000
	22	6.835	0.201239		52	13.928	0.861
L12	23	6.916	4.203	Fluorite glass	52	14.038	0.860
	24	−10.627	0.2075		51	11.992	0.880
L13	25	−10.072	0.96	Quartz glass	52	13.038	0.870
	26	101.798	0.1		7	0.032	1.000
L14	27	10.53	0.9	Quartz glass	12	0.51	0.995
	28	4.509	0.527319		62	13.7	0.863
L15	29	5.379	2.576	Fluorite glass	52	14.144	0.859
	30	−51.505	0.1		16	0.0085	1.000
L16	31	6.736	1.742	Fluorite glass	15	2.163	0.978
	32	17.567	0.1		12	0.006	1.000
L17	33	4.099	1.818	Fluorite glass	15	6.229	0.938
	34	9.003	0.10016		21	0.079	0.999
L18	35	1.883	1.872	Quartz glass	17	10.502	0.895
	36	5.293	0.262779		58	10.261	0.897
Transmittance of the objective lens at NA = 0.9:0.038

[0137]

TABLE 13
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	35	9.479	0.905
	2	2.11	0.7		21	2.506	0.975
L2	3	−2.503	0.7	Fluorite glass	26	1.75	0.983
	4	3.929	5.212314		26	0.402	0.996
L3	5	INF	2.786	Fluorite glass	12	0.022	1.000
	6	−4.1	0.585821		41	11.585	0.884
L4	7	−3.179	1	Quartz glass	53	12.649	0.874
	8	13.25	0.205879		44	3.864	0.961
L5	9	14.51	2.792	Fluorite glass	43	3.204	0.968
	10	−8.069	0.135719		15	0.886	0.991
L6	11	9.175	4.016	Fluorite glass	36	5.7	0.943
	12	−8.107	0.473387		46	11.252	0.887
L7	13	−6.806	1	Quartz glass	51	14.298	0.857
	14	9.394	0.205775		41	7.34	0.927
L8	15	9.73	4.65	Fluorite glass	41	7.022	0.930
	16	−7.998	0.105412		42	10.306	0.897
L9	17	−8.397	1	Quartz glass	40	8.73	0.913
	18	13.99	0.1		31	1.38	0.986
L10	19	12.513	4.035695	Fluorite glass	33	2.464	0.975
	20	−10.732	0.1		31	3.548	0.965
L11	21	35.892	1	Quartz glass	2	0.026	1.000
	22	6.835	0.201239		42	11.607	0.884
L12	23	6.916	4.203	Fluorite glass	42	11.607	0.884
	24	−10.627	0.2075		41	5.334	0.947
L13	25	−10.072	0.96	Quartz glass	41	5.678	0.943
	26	101.798	0.1		6	0.034	1.000
L14	27	10.53	0.9	Quartz glass	10	0.145	0.999
	28	4.509	0.527319		49	13.44	0.866
L15	29	5.379	2.576	Fluorite glass	42	11.607	0.884
	30	−51.505	0.1		15	0.0148	1.000
L16	31	6.736	1.742	Fluorite glass	12	0.868	0.991
	32	17.567	0.1		12	0.01	1.000
L17	33	4.099	1.818	Fluorite glass	12	3.288	0.967
	34	9.003	0.10016		20	0.0315	1.000
L18	35	1.883	1.872	Quartz glass	13	8.304	0.917
	36	5.293	0.262779		50	4.377	0.956
Transmittance of the objective lens at NA = 0.8:0.129

[0138]

TABLE 14
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	30	5.862	0.941
	2	2.11	0.7		19	1.2252	0.988
L2	3	−2.503	0.7	Fluorite glass	23	0.717	0.993
	4	3.929	5.212314		23	0.181	0.998
L3	5	INF	2.786	Fluorite glass	11	0.25	0.998
	6	−4.1	0.585821		36	8.619	0.914
L4	7	−3.179	1	Quartz glass	46	13.062	0.869
	8	13.25	0.205879		37	1.346	0.987
L5	9	14.51	2.792	Fluorite glass	36	1.148	0.989
	10	−8.069	0.135719		13	0.662	0.993
L6	11	9.175	4.016	Fluorite glass	30	2.228	0.978
	12	−8.107	0.473387		38	5.819	0.942
L7	13	−6.806	1	Quartz glass	42	9.288	0.907
	14	9.394	0.205775		33	2.72	0.973
L8	15	9.73	4.65	Fluorite glass	33	2.447	0.976
	16	−7.998	0.105412		34	5.018	0.950
L9	17	−8.397	1	Quartz glass	33	4.12	0.959
	18	13.99	0.1		25	0.32	0.997
L10	19	12.513	4.035695	Fluorite glass	27	0.708	0.993
	20	−10.732	0.1		26	1.18	0.988
L11	21	35.892	1	Quartz glass	1	0.033	1.000
	22	6.835	0.201239		35	7.157	0.928
L12	23	6.916	4.203	Fluorite glass	35	6.861	0.931
	24	−10.627	0.2075		33	1.76	0.982
L13	25	−10.072	0.96	Quartz glass	34	1.95	0.981
	26	101.798	0.1		5	0.0359	1.000
L14	27	10.53	0.9	Quartz glass	9	0.019	1.000
	28	4.509	0.527319		40	11.156	0.888
L15	29	5.379	2.576	Fluorite glass	34	6.839	0.932
	30	−51.505	0.1		13	0.02	1.000
L16	31	6.736	1.742	Fluorite glass	9	0.25	0.998
	32	17.567	0.1		11	0.019	1.000
L17	33	4.099	1.818	Fluorite glass	9	1.33	0.987
	34	9.003	0.10016		17	0.006	1.000
L18	35	1.883	1.872	Quartz glass	10	5.136	0.949
	36	5.293	0.262779		42	1.632	0.984
Transmittance of the objective lens at NA = 0.7:0.316

[0139]

TABLE 15
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L1	1	2.562	2.562	Quartz glass	21	0.938	0.991
	2	2.11	0.7		14	0.084	0.999
L2	3	−2.503	0.7	Fluorite glass	16	0.032	1.000
	4	3.929	5.212314		17	0.008	1.000
L3	5	INF	2.786	Fluorite glass	8	0.031	1.000
	6	−4.1	0.585821		25	1.769	0.982
L4	7	−3.179	1	Quartz glass	32	6.208	0.938
	8	13.25	0.205879		25	0.0686	0.999
L5	9	14.51	2.792	Fluorite glass	24	0.057	0.999
	10	−8.069	0.135719		10	0.04	1.000
L6	11	9.175	4.016	Fluorite glass	20	0.12	0.999
	12	−8.107	0.473387		25	0.503	0.995
L7	13	−6.806	1	Quartz glass	27	1.154	0.988
	14	9.394	0.205775		21	0.16	0.998
L8	15	9.73	4.65	Fluorite glass	21	0.115	0.999
	16	−7.998	0.105412		23	0.483	0.995
L9	17	−8.397	1	Quartz glass	22	0.337	0.997
	18	13.99	0.1		16	0.005	1.000
L10	19	12.513	4.035695	Fluorite glass	17	0.014	1.000
	20	−10.732	0.1		17	0.044	1.000
L11	21	35.892	1	Quartz glass	1	0.033	1.000
	22	6.835	0.201239		23	0.85	0.992
L12	23	6.916	4.203	Fluorite glass	23	0.85	0.992
	24	−10.627	0.2075		22	0.074	0.999
L13	25	−10.072	0.96	Quartz glass	22	0.106	0.999
	26	101.798	0.1		3	0.0371	1.000
L14	27	10.53	0.9	Quartz glass	6	0.009	1.000
	28	4.509	0.527319		26	2.185	0.978
L15	29	5.379	2.576	Fluorite glass	22	0.076	0.992
	30	−51.505	0.1		9	0.029	1.000
L16	31	6.736	1.742	Fluorite glass	6	0.005	1.000
	32	17.567	0.1		8	0.025	1.000
L17	33	4.099	1.818	Fluorite glass	6	0.07	0.999
	34	9.003	0.10016		12	0.016	1.000
L18	35	1.883	1.872	Quartz glass	6	0.772	0.992
	36	5.293	0.262779		28	0.105	0.999
Transmittance of the objective lens at NA = 0.5:0.832

[0140] Thus, the transmittance at wavelength 248 nm and NA=0.9 shown in Table 12 becomes 3.8%. Similarly, the transmittance at wavelength 248 nm and NA=0.8 shown in Table 13 becomes 12.9%. The transmittance at wavelength 248 nm and NA=0.7 shown in Table 14 becomes 31.6%. The transmittance at wavelength 248 nm and NA=0.5 shown in Table 15 becomes 83.5%.

[0141] As a result, when comparing the transmittance of the objective lens of the seventh embodiment in which two wavelength antireflection film is coated and the objective lens of the first comparison example in which two wavelength antireflection film is coated with each lens surface of each single lens L1 to L18, when two wavelength antireflection film of the seventh embodiment as shown in FIG. 21 is coated, high transmittance can be obtained even when NA is 0.9, 0.8, 0.7, and 0.5 as shown in curve A. In contrast, when two-wavelength antireflection film of the first comparison example is applied, it is apparent that transmittance reduces rapidly as shown in curve B as NA becomes large such as 0.7, 0.8, 0.9 as shown in curve B. As a result, high transmittance in 248 nm used for the observation and a high NA, that is, high resolutions can be achieved by coating two-wavelength antireflection film according to the seventh embodiment to each lens surface of each single lens L1 to L18 which configures the objective lens.

[0142] (Fourteenth Embodiment)

[0143] FIG. 22 is a figure showing a schematic configuration of the objective lens applied to the fourteenth embodiment of the present invention.

[0144] In this case, the objective lens is used for an optical equipment which observes by the light of wavelength of the ultra-violet region of 300 nm or less and has the mechanism to focus (auto focus) by the light in the wavelength region from a visible region to the near-infrared region. Specifically, 248 nm in the deep-ultraviolet region as wavelength used for the observation and 633 nm in the visible region as wavelength used for auto focus are applied.

[0145] The objective lens has the first lens group 1G and the second lens group G2 arranged between the first lens group 1G and the object side as shown in FIG. 22. The first lens group 1G has four single lenses L21 to L24 which include positive lens and negative lens with the different medium and has negative power as a whole. The second lens group 2G has eight single lenses L25 to L32 which include positive lens and negative lens with the different medium. In the first and second lens groups 1G and 2G, the air interval is provided between a positive lens and negative lens.

[0146] Tables 16 to 19 show the angle of the light which is incident (emitted) to (from) the normal of the lens, reflectance and the transmittance, etc. corresponding thereto, which are obtained when two wavelength antireflection film explained in detail in the seventh embodiment is coated to each lens surface of each single lens L21 to L32 for each of NA=0.9, 0.8, 0.7, and 0.5 of such an objective lens, and the lens data of each single lens L21 to L32 (curvature, thickness, interval, and material name).

TABLE 16
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	31	0.4	0.996
	2	6.765	0.10358		52	1.5	0.958
L22	3	6.181	3.06	Fluorite glass	55	2.06	0.979
	4	−4.042	0.153241		53	4.6	0.954
L23	5	−4.08	0.92	Quartz glass	52	4	0.960
	6	8.682	0.16626		54	2	0.980
L24	7	8.883	3.11	Fluorite glass	54	2	0.980
	8	−6.824	0.106344		31	0.32	0.997
L25	9	24.853	0.9	Quartz glass	9	0.03	1.000
	10	6.181	0.101063		55	3.54	0.965
L26	11	5.251	3.77	Fluorite glass	66	13	0.870
	12	−9.936	0.61551		45	0.96	0.990
L27	13	−6.165	0.9	Quartz glass	58	5	0.950
	14	6.165	0.502246		59	5.5	0.945
L28	15	8.596	2.78	Fluorite glass	49	1.2	0.988
	16	−12.005	0.197219		17	0.47	0.995
L29	17	5.353	3.51	Fluorite glass	46	2.9	0.971
	18	−11.031	0.488166		54	2	0.980
L30	19	−6.791	1.35	Quartz glass	65	7.52	0.925
	20	−155.13	0.196741		14	0.01	1.000
L31	21	4.438	2.12	Quartz glass	23	0.22	0.998
	22	13.067	0.095		19	0.15	0.999
L32	23	7.961	2.33	Quartz glass	30	2.58	0.974
	24	10.691	0.2647.8		61	4.1	0.959
Transmittance of the objective lens at NA = 0.9:0.506

[0147]

TABLE 17
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	27	0.52	0.995
	2	6.765	0.10358		44	1	0.990
L22	3	6.181	3.06	fluorite glass	46	1	0.990
	4	−4.042	0.153241		44	1.3	0.987
L23	5	−4.08	0.92	Quartz glass	43	1.2	0.988
	6	8.682	0.16626		46	1.2	0.988
L24	7	8.883	3.11	fluorite glass	46	1.2	0.988
	8	−6.824	0.106344		27	0.48	0.995
L25	9	24.853	0.9	Quartz glass	9	0.01	1.000
	10	6.181	0.101063		48	1.3	0.987
L26	11	5.251	3.77	fluorite glass	56	5	0.950
	12	−9.936	0.61551		36	0.8	0.992
L27	13	−6.165	0.9	Quartz glass	47	1	0.990
	14	6.165	0.502246		51	1.5	0.985
L28	15	8.596	2.78	Fluorite glass	43	0.85	0.992
	16	−12.005	0.197219		16	0.4	0.996
L29	17	5.353	3.51	Fluorite glass	40	1.07	0.989
	18	−11.031	0.488166		45	1.16	0.988
L30	19	−6.791	1.35	Quartz glass	54	5	0.950
	20	−155.13	0.196741		14	0.01	1.000
L31	21	4.438	2.12	Quartz glass	18	0.43	0.996
	22	13.067	0.095		18	0.1	0.999
L32	23	7.961	2.33	Quartz glass	22	0.6	0.994
	24	10.691	0.2647.8		51	1.9	0.981
Transmittance of the objective lens at NA = 0.8:0.745

[0148]

TABLE 18
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.562	Quartz glass	23	0.61	0.994
	2	6.765	0.10358		37	0.83	0.992
L22	3	6.181	3.06	Fluorite glass	39	0.88	0.991
	4	−4.042	0.153241		37	0.4	0.996
L23	5	−4.08	0.92	Quartz glass	36	0.4	0.996
	6	8.682	0.16626		39	0.9	0.991
L24	7	8.883	3.11	Fluorite glass	39	0.9	0.991
	8	−6.824	0.106344		23	0.61	0.994
L25	9	24.853	0.9	Quartz glass	8	0.01	1.000
	10	6.181	0.101063		41	0.6	0.994
L26	11	5.251	3.77	Fluorite glass	47	1.2	0.988
	12	−9.936	0.61551		29	0.62	0.994
L27	13	−6.165	0.9	Quartz glass	38	0.59	0.994
	14	6.165	0.502246		43	0.7	0.992
L28	15	8.596	2.78	Fluorite glass	37	0.8	0.992
	16	−12.005	0.197219		14	0.22	0.998
L29	17	5.353	3.51	Fluorite glass	34	0.33	0.997
	18	−11.031	0.488166		38	0.85	0.992
L30	19	−6.791	1.35	Quartz glass	45	0.96	0.990
	20	−155.13	0.196741		13	0.01	1.000
L31	21	4.438	2.12	Quartz glass	15	0.58	0.994
	22	13.067	0.095		16	0.07	0.999
L32	23	7.961	2.33	Quartz glass	18	0.19	0.998
	24	10.691	0.2647.8		43	1.15	0.989
Transmittance of the objective lens at NA = 0.7:0.865

[0149]

TABLE 19
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	16	0.4	0.996
	2	6.765	0.10358		25	0.15	0.999
L22	3	6.181	3.06	Fluorite glass	26	0.4	0.996
	4	−4.042	0.153241		25	0.64	0.994
L23	5	−4.08	0.92	Quartz glass	24	0.64	0.994
	6	8.682	0.16626		26	0.4	0.996
L24	7	8.883	3.11	Fluorite glass	26	0.4	0.996
	8	−6.824	0.106344		16	0.42	0.996
L25	9	24.853	0.9	Quartz glass	6	0.004	1.000
	10	6.181	0.101063		28	0.65	0.994
L26	11	5.251	3.77	Fluorite glass	32	0.66	0.993
	12	−9.936	0.61551		19	0.23	0.998
L27	13	−6.165	0.9	Quartz glass	26	0.6	0.994
	14	6.165	0.502246		29	0.67	0.993
L28	15	8.596	2.78	Fluorite glass	25	0.46	0.995
	16	−12.005	0.197219		10	0.07	0.999
L29	17	5.353	3.51	Fluorite glass	23	0.61	0.994
	18	−11.031	0.488166		25	0.29	0.997
L30	19	−6.791	1.35	Quartz glass	30	0.61	0.994
	20	−155.13	0.196741		9	0.01	1.000
L31	21	4.438	2.12	Quartz glass	10	0.39	0.996
	22	13.067	0.095		11	0.01	1.000
L32	23	7.961	2.33	Quartz glass	12	0.57	0.994
	24	10.691	0.2647.8		29	0.3	0.997
Transmittance of the objective lens at NA = 0.5:0.908

[0150] Thus, the transmittance at wavelength 248 nm and NA=0.9 shown in Table 16 becomes 50.6%. Similarly, the transmittance at wavelength 248 nm and NA=0.8 shown in Table 17 becomes 74.5%. The transmittance at wavelength 248 nm and NA=0.7 shown in Table 18 becomes 86.5%. The transmittance at wavelength 248 nm and NA=0.5 shown in Table 19 becomes 90.8%.

[0151] On the other hand, Tables 20 to 23 show the angle of the light which is incident (emitted) to (from) the normal of the lens, reflectance and the transmittance, etc. corresponding thereto, which are obtained when two wavelength antireflection film explained in detail in the first comparison example is provided to each lens surface of each single lens L21 to L32 for each of NA 0.9, 0.8, 0.7, and 0.5 of such an objective lens, and the lens data of each single lens L21 to L32 (curvature, thickness, interval, and material name).

TABLE 20
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	31	3.3	0.967
	2	6.765	0.10358		52	7	0.930
L22	3	6.181	3.06	Fluorite glass	55	10	0.900
	4	−4.042	0.153241		53	14	0.860
L23	5	−4.08	0.92	Quartz glass	52	14	0.860
	6	8.682	0.16626		54	9	0.910
L24	7	8.883	3.11	Fluorite glass	54	9.3	0.907
	8	−6.824	0.106344		31	3.9	0.961
L25	9	24.853	0.9	Quartz glass	9	0.01	1.000
	10	6.181	0.101063		55	11.5	0.885
L26	11	5.251	3.77	Fluorite glass	66	22	0.780
	12	−9.936	0.61551		45	4.2	0.958
L27	13	−6.165	0.9	Quartz glass	58	15	0.850
	14	6.165	0.502246		59	16	0.840
L28	15	8.596	2.78	Fluorite glass	49	7.5	0.925
	16	−12.005	0.197219		17	0.2	0.998
L29	17	5.353	3.51	Fluorite glass	46	12.5	0.975
	18	−11.031	0.488166		54	7.5	0.925
L30	19	−6.791	1.35	Quartz glass	65	19.5	0.805
	20	−155.13	0.196741		14	0.02	1.000
L31	21	4.438	2.12	Quartz glass	23	4	0.960
	22	13.067	0.095		19	0.04	1.000
L32	23	7.961	2.33	Quartz glass	30	11	0.890
	24	10.691	0.2647.8		61	9	0.910
Transmittance of the objective lens at NA = 0.9:0.105

[0152]

TABLE 21
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	27	2	0.980
	2	6.765	0.10358		44	3.3	0.967
L22	3	6.181	3.06	Fluorite glass	46	4.3	0.957
	4	−4.042	0.153241		44	10	0.900
L23	5	−4.08	0.92	Quartz glass	43	9	0.910
	6	8.682	0.16626		46	4	0.960
L24	7	8.883	3.11	Fluorite glass	46	4	0.960
	8	−6.824	0.106344		27	2	0.980
L25	9	24.853	0.9	Quartz glass	9	0.01	1.000
	10	6.181	0.101063		48	9	0.910
L26	11	5.251	3.77	Fluorite glass	56	15	0.850
	12	−9.936	0.61551		36	1.6	0.984
L27	13	−6.165	0.9	Quartz glass	47	8	0.920
	14	6.165	0.502246		51	10	0.900
L28	15	8.596	2.78	Fluorite glass	43	4	0.960
	16	−12.005	0.197219		16	0.1	0.999
L29	17	5.353	3.51	Fluorite glass	40	9	0.910
	18	−11.031	0.488166		45	3	0.970
L30	19	−6.791	1.35	Quartz glass	54	10	0.900
	20	−155.13	0.196741		14	0.02	1.000
L31	21	4.438	2.12	Quartz glass	18	1.9	0.981
	22	13.067	0.095		18	0.03	1.000
L32	23	7.961	2.33	Quartz glass	22	7	0.930
	24	10.691	0.2647.8		51	3	0.970
Transmittance of the objective lens at NA = 0.8:0.285

[0153]

TABLE 22
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	23	0.9	0.991
	2	6.765	0.10358		37	1.2	0.988
L22	3	6.181	3.06	Fluorite glass	39	2	0.980
	4	−4.042	0.153241		37	5.5	0.945
L23	5	−4.08	0.92	Quartz glass	36	5	0.950
	6	8.682	0.16626		39	1.5	0.985
L24	7	8.883	3.11	Fluorite glass	39	1.5	0.985
	8	−6.824	0.106344		23	1.95	0.981
L25	9	24.853	0.9	Quartz glass	8	0.01	1.000
	10	6.181	0.101063		41	5	0.950
L26	11	5.251	3.77	Fluorite glass	47	9.5	0.905
	12	−9.936	0.61551		29	0.55	0.995
L27	13	−6.165	0.9	Quartz glass	38	3.6	0.964
	14	6.165	0.502246		43	5.5	0.945
L28	15	8.596	2.78	Fluorite glass	37	2	0.980
	16	−12.005	0.197219		14	0.05	1.000
L29	17	5.353	3.51	Fluorite glass	34	5.3	0.947
	18	−11.031	0.488166		38	1.2	0.988
L30	19	−6.791	1.35	Quartz glass	45	4.2	0.958
	20	−155.13	0.196741		13	0.01	1.000
L31	21	4.438	2.12	Quartz glass	15	0.85	0.992
	22	13.067	0.095		16	0.02	1.000
L32	23	7.961	2.33	Quartz glass	18	4.5	0.955
	24	10.691	0.2647.8		43	1.6	0.984
Transmittance of the objective lens at NA = 0.7:0.522

[0154]

TABLE 23
Surface		Thickness and		Incident
number	Curvature	Interval	Material	Angle	Reflectance	Transmittance
L21	1	−3.543	2.15	Quartz glass	16	0.1	0.999
	2	6.765	0.10358		25	0.15	0.999
L22	3	6.181	3.06	Fluorite glass	26	0.2	0.998
	4	−4.042	0.153241		25	0.85	0.992
L23	5	−4.08	0.92	Quartz glass	24	0.85	0.992
	6	8.682	0.16626		26	0.2	0.998
L24	7	8.883	3.11	Fluorite glass	26	0.2	0.998
	8	−6.824	0.106344		16	0.15	0.999
L25	9	24.853	0.9	Quartz glass	6	0.01	1.000
	10	6.181	0.101063		28	0.75	0.993
L26	11	5.251	3.77	Fluorite glass	32	1.8	0.982
	12	−9.936	0.61551		19	0.07	0.999
L27	13	−6.165	0.9	Quartz glass	26	0.45	0.996
	14	6.165	0.502246		29	0.7	0.993
L28	15	8.596	2.78	Fluorite glass	25	0.24	0.998
	16	−12.005	0.197219		10	0.02	1.000
L29	17	5.353	3.51	Fluorite glass	23	0.85	0.992
	18	−11.031	0.488166		25	0.13	0.999
L30	19	−6.791	1.35	Quartz glass	30	0.47	0.995
	20	−155.13	0.196741		9	0.01	1.000
L31	21	4.438	2.12	Quartz glass	10	0.1	0.999
	22	13.067	0.095		11	0.01	1.000
L32	23	7.961	2.33	Quartz glass	12	0.8	0.992
	24	10.691	0.2647.8		29	0.19	0.998
Transmittance of the objective lens at NA = 0.5:0.911

[0155] Thus, the transmittance at wavelength 248 nm and NA=0.9 shown in Table 20 becomes 105%. Similarly, the transmittance at wavelength 248 nm and NA=0.8 shown in Table 21 becomes 28.5%. The transmittance at wavelength 248 nm and NA=0.7 shown in Table 22 becomes 52.2%. The transmittance at wavelength 248 nm and NA=0.5 shown in Table 23 becomes 91.1%.

[0156] As a result, when comparing the transmittance of the objective lens of the seventh embodiment in which two wavelength antireflection film is coated and the objective lens of the first comparison example in which two wavelength antireflection film is coated with each lens surface of each single lens L21 to L32, when two wavelength antireflection film of the ninth embodiment as shown in FIG. 23 is coated, high transmittance can be obtained even in a case that NA is 0.8, and 0.9 as shown in curve A. In contrast, when two-wavelength antireflection film of the second comparison example is coated, it is apparent that transmittance reduces rapidly as shown in curve B as NA becomes large such as 0.7, 0.8, 0.9 as shown in curve B. As a result, high transmittance in 248 nm used for the observation and a high NA, that is, high resolutions can be achieved by coating two-wavelength antireflection film according to the ninth embodiment to each lens surface of each single lens L21 to L32 which configures the objective lens.

[0157] As mentioned above, according to the embodiment of the present invention, the antireflection effect can be achieved in the vicinity of 248 nm and the wavelength region of 600 to 800 nm for substrate (lens) material whose refractive index in the deep-ultraviolet region is 1.4 to 1.52. Even when the incident angle of light becomes large, the antireflection effect is never lost in the vicinity of especially 248 nm. Therefore, high transmittance can be achieved even when the incident angle of the light to the surface of the lens is from vertical to about 65°.

[0158] A high antireflection effect can be achieved according to the embodiment of the present invention when applying to quartz glass and fluorite glass which are transparent material in the deep-ultraviolet region used well, especially 248 nm wavelength.

[0159] It is preferable the material of refractive index of 1.35 to 1.5 in the deep-ultraviolet region is used as a low refractive index material according to the embodiment of the present invention. Especially, a higher effect can be achieved by using one or more component chosen by the group of MgF2, SiO2, NaF, LiF, and mixture or compound thereof as a material with excellent productivity and a little absorption film in the low refractive index. Among these, MgF2 and SiO2, which have withstand extreme environmental conditions and can be easily obtained, is easy to use for production the effect is high. A high antireflection characteristic can be obtained by using MgF2 to the low refraction layer of the fourth layer (surface layer) from the substrate caused by the low refractive index thereof. Similarly, It is preferable the material is used as the middle refractive index material whose the refractive index in the deep-ultraviolet region is 1.6 to 1.9. Especially, a higher effect can be achieved by using one or more component chosen by the group of Al2O3, CaF3, NdF3, YF3, La2O3, and mixture or compound thereof as a material with excellent productivity and a little absorption film in the low refractive index.

[0160] According to the embodiment of the present invention, when the visible or the near-infrared wavelength (auto focus wavelength), which performs antireflection, is within the rage of 650 to 800 nm, the above-mentioned effect can be achieved by setting the range of the film thickness of the first layer from the substrate to 0.4λ≦nd1≦0.6λ, that of the second layer to 0.4λ≦nd2≦0.6λ, that of the third layer to 0.1λ<nd3≦0.3λ, and that of the fourth layer to 0.2λnd4≦0.35λ, for wavelength λ (λ=248 nm). In addition, when the range of the film thickness of the first to fourth layer from the substrate are set to 0.4λ≦nd1≦0.6λ, 0.4λ≦nd2≦0.6λ, 0.2λ≦nd3≦0.3λ, and 0.2λ≦nd4≦0.3λ, respectively, two wavelength antireflection film with high antireflection performance can be obtained in the combination of film material with high refractive index stability and excellent productivity (MgF2, La2O3, and Al2O3 mixture material). When the auto focus wavelength is selected in the vicinity of 750 nm, a higher effect can be obtained according to such a range of the film thickness.

[0161] Similarly, when auto focus wavelength is in 650 to 800 nm, the above-mentioned effect can be achieved by setting the range of the film thickness of the first layer from the substrate to 0.5λ≦nd1≦0.7λ, that of the second layer to 0.05λ≦nd2≦0.2λ, that of the third layer to 0.25λ≦nd3≦0.5λ, and that of the fourth layer to 0.2λ≦nd4≦0.35λ, for wavelength λ (λ=248 nm). In addition, when the range of the film thickness of the first to fourth layer from the substrate are set to 0.6λ≦nd1≦0.7λ, 0.05λ≦nd2≦0.1λ, 0.25λ≦nd3≦0.35λ, and 0.25λ<nd4≦0.35λ, respectively, two wavelength antireflection film with high antireflection performance can be obtained in the combination of film material with high refractive index stability and excellent productivity (MgF2, La2O3, and Al2O3 mixture material). When the auto focus wavelength is selected in the vicinity of 750 nm, a higher effect can be obtained according to such a range of the film thickness.

[0162] In the objective lens used for the microscope, which observes by the light of wavelength of the ultraviolet region of 300 nm or less and has the focusing mechanism (auto focus) in the wavelength from the visible region to the near-infrared region, high transmittance and a high NA, that is, high resolving power can be achieved.

[0163] The present invention is not limited to the above-described embodiments. Various modifications can occur at its embodying stage without departing from the scope of the invention.

[0164] In addition, for example, even if some of all the constituent elements shown in the embodiments are deleted, in the case where the problems described in the Brief Summary of the Invention section can be solved, and advantageous effect described in the Advantageous Effect of the Invention section can be achieved, the configuration can be excerpted after these constituent elements have been deleted.

[0165] As mentioned above, according to the present invention, two-wavelength antireflection film in which high transmittance can be achieved in a deep-ultraviolet region and from the visible region to the near-infrared region, and the objective lens on which two-wavelength antireflection film is coated can be achieved.

[0166] Additional advantages and modifications will readily occur to those skilled in the art. Therefore, the present invention in its broader aspects is nor limited to the specific details, representative devices, and illustrated examples shown and described herein. Accordingly, various modifications may be made without departing from the spirit or scope of the general inventive concept as defined by the appended claims and their equivalents.

Claims

1. A two-wavelength antireflection film for antireflection in two-wavelength regions of light between 200 nanometers and 850 nanometers wherein one of the two-wavelength regions ranges from about 200 nanometers to 350 nanometers and includes a design main wavelength and the other two-wavelength region extends from about 650 nanometers to 850 nanaometers comprising: a substrate which is transparent in wavelength regions in which the substrate is to be used; a first thin film which is formed on the substrate, and has a refractive index of 1.6 to 2.0 and optical film thickness of 0.4λ to 0.7λ for the design main wavelength (λ); a second thin film which is formed on the first thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.05λto 0.6λ for the design main wavelength λ; a third thin film which is formed on the second thin film, and has a refractive index of 1.6 to 2.0 and an optical film thickness of 0.1λ to 0.5λ for the design main wavelength λ; and a fourth thin film which is formed on the third thin film, and has a refractive index of 1.35 to 1.55 and optical film thickness of 0.2λ to 0.35λ for design main wavelength λ.

2. The two-wavelength antireflection film according to claim 1, wherein, the substrate is quartz glass or fluorite glass.

3. The two-wavelength antireflection film according to claim 1, wherein, the first thin film and the third thin film contain material which has a plurality of components chosen by a group of Al2O3, LaF3, NdF3, YF3, La2O3, and mixture or compound thereof, and the second thin film and the fourth thin film contain material which has a plurality of components chosen by a group of MgF2, SiO2, NaF, LiF, and mixture or compound thereof.

4. The two-wavelength antireflection film according to claim 1, wherein an incident angle of the light of the design main wavelength is set within a range of 0° to 70°.

5. The two-wavelength antireflection film according to claim 1, wherein the design main wavelength is 248 nm.

6. The two-wavelength antireflection film according to claim 5, wherein a wavelength which performs antireflection includes two wavelength regions of a wavelength in vicinity of main design wavelength and a wavelength from 650 to 800 nm, an optical film thickness of the first thin film is 0.4λ to 0.6λ, an optical film thickness of the second thin film is 0.4λ to 0.6λ, an optical film thickness of the third thin film is 0.1λ to 0.3λ, and an optical film thickness of the fourth thin film is from 0.35λ to 0.2λ.

7. The two-wavelength antireflection film according to claim 5, wherein, a wavelength which performs antireflection includes two wavelength regions of a wavelength in vicinity of main design wave length and a wavelength in the vicinity of 750 nm, the first thin film and the third thin film include mixture of Al2O3 and La2O3, and the second thin film and fourth thin film include MgF2, an optical film thickness of the first thin film is 0.4λ to 0.6λ, an optical film thickness of the second thin film is 0.4λ to 0.6λ, an optical film thickness of the third thin film is 0.2λ to 0.3λ, and an optical film thickness of the fourth thin film is 0.2λ to 0.3×.

8. The two-wavelength antireflection film according to claim 5, wherein, a wavelength which performs antireflection includes two wavelength regions of a wavelength in vicinity of main design wavelength and a wavelength from 550 to 650 nm, an optical film thickness of the first thin film is 0.5λ to 0.7λ, an optical film thickness of the second thin film is 0.05λ to 0.2λ, an optical film thickness of the third thin film is 0.25λ to 0.5λ, and an optical film thickness of the fourth thin film is 0.2λ to 0.35λ.

9. The two-wavelength antireflection film according to claim 5, wherein a wavelength which performs antireflection includes two wavelength regions of a wavelength in vicinity of main design wave length and a wavelength in vicinity of 600 nm, the first thin film and the third thin film include mixture of Al2O3, and La2O3, and the second thin film and fourth thin film include MgF2, an optical film thickness of the first thin film is 0.6λ to 0.7λ, an optical film thickness of the second thin film is 0.05λ to 0.1λ, an optical film thickness of the third thin film is 0.25λ to 0.35λ, and an optical film thickness of the second thin film is 0.25λ to 0.35λ.

10. An objective lens used for an optical equipment, which performs an observation by the light of the deep-ultraviolet region wavelength of 300 nm or less and has a focusing mechanism (auto focus) in the wavelength region from a visible region to a near-infrared region, comprising a plurality of single lenses, wherein each of the plurality of single lenses has a two-wavelength antireflection film according to claim 1 on the surface thereof.

11. The objective lens according to claim 10, further comprising a first lens group which contains a plurality of single lenses having positive lens and negative lens whose medium are different from each other and has negative power as a whole; and a second lens group which is arranged from the first lens group to the object side, and contains a plurality of single lenses having positive lens and negative lens whose medium are different form each other, wherein the first and second lens groups have air intervals between the positive lens and negative lens, respectively, and a numerical aperture is 0.7 or more.