The disclosure relates to micro-fluid ejection devices and in particular to ultra-low energy devices for ejecting ultra-small liquid droplets.
Since the inception of thermal fluid ejection devices, the size of droplets ejected by the devices has continually decreased. For the production of printed images by the ejection of inks, the droplet size need not be decreased below about 10 femtoliters (0.01 picoliters) as the spot size provided by such droplet is about 3 microns in diameters. Human vision measurements have shown that spot sizes of 42 microns are easily detectable, whereas spot sizes of less than 28 microns were substantially undetectable. Only about 0.07% of people can detect a spot size of about 20 microns, and less than 1 person per million can see a 3 micron spot. Nevertheless, fluid droplets of 10 femtoliters or less may be suitable for other non-printing applications including, but not limited to, pharmaceutical applications, electronics fabrication, and other applications where visual detection of spots of fluid on a media are not required.
One of the challenges for producing micro-fluid ejection devices for ultra-small droplets is the ability to provide high frequency droplet ejection without a substantial increase in wasted heat energy. For example, an ejection head containing 9000 nozzles operating at a frequency of 200 KHz and requiring 0.08 microjoules of energy per activation may require 144 watts of precisely regulated power resulting in about 0.125 picloliters per microjoule of energy. Such a power requirement results in a significant amount of wasted heat energy.
In order to reduce the amount of wasted heat energy for micro-fluid ejection devices for ultra-small fluid ejection, unique ejection devices and manufacturing techniques are needed.
With regard to the above, embodiments of the disclosure provides a micro-fluid ejection device for ultra-small droplet ejection and method of making a micro-fluid ejection device. The micro-fluid ejection device includes a semiconductor substrate containing a plurality of thermal ejection actuators disposed thereon. Each of the thermal ejection actuators includes a resistive layer and a protective layer for protecting a surface of the resistive layer. The resistive layer and the protective layer together define an actuator stack thickness. The actuator stack thickness ranges from about 500 to about 2000 Angstroms and provides an ejection energy per unit volume of from about 10 to about 20 gigajoules per cubic meter. A nozzle plate is attached to the semiconductor substrate to provide the micro-fluid ejection device.
In another embodiment there is provided a method of ejecting ultra-small fluid droplets on demand. The method includes providing a micro-fluid ejection device containing a resistive layer and a protective layer on the resistive layer. In combination, the resistive layer and protective layer define a thermal actuator stack. The thermal actuator stack has a thickness ranging from about 1000 to about 2500 Angstroms and a thermal actuator stack volume ranging from about 1 cubic micron to about 5.4 cubic microns. An electrical energy is applied to the thermal actuator stack sufficient to eject less than about 10 femtoliters of fluid from the micro-fluid ejection device with a pumping effectiveness of greater than about 125 femtoliters per microjoule to provide a fluid spot size ranging from about 1 up to about 3 microns on a substantially non-porous surface.
An advantage of embodiments of the disclosure is that apparatus for delivery of ultra-small volumes of liquids may be provided for use in electrical fabrication, pharmaceutical delivery, biotechnology research applications, and the like. Another advantage of the embodiments is that the methods may provide ultra-small volume delivery devices that may be fabricated in existing micro-fluid ejection device fabrication facilities.
Further advantages of the embodiments will become apparent by reference to the detailed description of preferred embodiments when considered in conjunction with the drawings, wherein like reference characters designate like or similar elements throughout the several drawings as follows:
In accordance with embodiments described herein, micro-fluid ejection actuators for micro-fluid ejection devices having improved operating characteristics for ultra-small drop volumes will now be described.
For the purposes of this disclosure, the term “ultra-small” is intended to include fluid droplets of less than about 10 femtoliters. The terms “heater stack”, “ejector stack”, and “actuator stack” are intended to refer to an ejection actuator having a combined layer thickness of a resistive material layer and passivation or protection material layer. The passivation or protection material layer is applied to a surface of the resistive material layer to protect the actuator from chemical or mechanical corrosion or erosion effects of fluids ejected by the micro-fluid ejection device.
With reference to
The thermal insulation layer 16 may be formed from a thin layer of silicon dioxide and/or doped silicon glass overlying the relatively thick silicon substrate 14. The total thickness of the thermal insulation layer 16 is preferably from about 1 to about 3 microns thick. The underlying silicon substrate 14 may have a thickness ranging from about 0.5 to about 0.8 millimeters thick.
A protective layer 20 overlies the fluid ejection actuators 12. The protective layer 20 may be a single material layer or a combination of several material layers. In the illustration in
The first passivation layer 22 may be formed from a dielectric material, such as silicon nitride, or silicon doped diamond-like carbon (Si-DLC) having a thickness of from about 1000 to about 3200 Angstroms thick. The second passivation layer 24 may also be formed from a dielectric material, such as silicon carbide, silicon nitride, or silicon-doped diamond-like carbon (Si-DLC) having a thickness preferably from about 500 to about 1500 Angstroms thick. The combined thickness of the first and second passivation layers 22 and 24 typically ranges from about 1500 to about 5000 Angstroms.
The cavitation layer 26 is typically formed from tantalum having a thickness greater than about 500 Angstroms thick. The cavitation layer 26 may also be made of TaB, Ti, TiW, TiN, WSi, or any other material with a similar thermal capacitance and relatively high hardness. The maximum thickness of the cavitation layer 26 is such that the total thickness of protective layer 20 is less than about 7200 Angstroms thick. The total thickness of the protective layer 20 is defined as a distance from a top surface 28 of the resistive material layer 18 to an outermost surface 30 of the protective layer 20. An ejector stack thickness 32 is defined as the combined thickness of layers 18 and 20.
The fluid ejection actuator 12 is defined by depositing and etching a metal conductive layer 34 on the resistive layer 18 to provide power and ground conductors 34A and 34B as illustrated in
Overlying the power and ground conductors 34A and 34B is another insulating layer or dielectric layer 36 typically composed of epoxy photoresist materials, polyimide materials, silicon nitride, silicon carbide, silicon dioxide, spun-on-glass (SOG), laminated polymer and the like. The insulating layer 36 and has a thickness ranging from about 5,000 to about 20,000 Angstroms and provides insulation between a second metal layer 38 and conductive layer 34.
Layers 14, 16, 18, 20, 34, 36, and 38 provide a semiconductor substrate 40 for use in the micro-fluid ejection head 10. In order to complete the ejection head 10, a nozzle plate 42 is attached, as by an adhesive 44, to the semiconductor substrate 40. The nozzle plate 42 contains nozzle holes 46 corresponding the plurality of fluid ejection actuators 12. A fluid in fluid chamber 48 is heated by the fluid ejection actuators 12 to form a fluid bubble which expels fluid from the fluid chamber 48 through the nozzle holes 46. A fluid supply channel 50 provides fluid to the fluid chamber 48.
One disadvantage of the micro-fluid ejection head 10 described above is that the multiplicity of protective layers 20 within the micro-fluid ejection head 10 increases the ejection stack thickness 32, thereby increasing an overall jetting energy required to eject a drop of fluid through the nozzle holes 46.
Upon activation of the fluid ejection actuator 12, some of the energy ends up as waste heat energy used to heat the protective layer 20 via conduction, while the remainder of the energy is used to heat the fluid adjacent the surface 30 of the cavitation layer 26. When the surface 30 reaches a fluid superheat limit, a vapor bubble is formed. Once the vapor bubble is formed, the fluid is thermally disconnected from the surface 30. Accordingly, the vapor bubble prevents further thermal energy transfer to the fluid.
It is the thermal energy transferred into the fluid, prior to bubble formation, that drives the liquid-vapor change of state of the fluid. Since thermal energy must pass through the protective layer 20 before heating the fluid, the protective layer 20 is also heated. It takes a finite amount of energy to heat the protective layer 20. The amount of energy required to heat the protective layer 20 is directly proportional to the thickness of the protective layer 20 and the thickness of the resistive layer 18. An illustrative example of the relationship between the protective layer 20 thickness and jetting energy requirement for a specific fluid ejection actuator 12 size is shown in
Jetting energy is important because it is related to power (power being the product of energy and firing frequency of the fluid ejection actuators 12). The temperature rise experienced by the substrate 40 is also related to power. Adequate jetting performance and fluid characteristics, such as print quality in the case of an ink ejection device, are related to the temperature rise of the substrate 40.
Because power equals the product of energy and frequency, and the substrate 40 temperature is a function of input power, there is thus a maximum jetting frequency for operation of such micro-fluid ejection actuators 12. Accordingly, a primary goal of modern micro-fluid ejection head technology using the micro-fluid ejection actuators described herein is to maximize the level of jetting frequency while still maintaining the substrate 40 at an optimum temperature. While the optimum temperature of the substrate 40 varies due to other design factors, it is generally desirable to limit the substrate 40 temperature to about 75° C. to prevent excessive flooding of the nozzle plate 42, air devolution, droplet volume variation, premature nucleation, and other detrimental effects.
With regard to the foregoing, providing the ejection head 10 with 9000 of the fluid ejection actuators 12 operating at a firing frequency of 200 KHz and requiring an energy of 0.08 microjoules per fire would require 144 watts of precisely regulated power. Such an ejection head 10 ejecting 10 femtoliters per fire would have a pumping effectiveness of 0.125 picoliters per microjoule. It will be appreciated from
The disclosed embodiments improve upon the prior art micro-fluid ejection head structures 10 by reducing the number layer and thickness of the protective layer 20 in the micro-fluid ejection head structure, thereby reducing a total ejection actuator stack thickness for a micro-fluid ejection head. A reduction in protective layer thickness translates into less waste energy and improved ejection head performance. Since there is less waste energy, jetting energy that was used to penetrate a thicker protective layer may now be allocated to higher jetting frequency while maintaining the same energy conduction as before to an exposed surface of the protective layer.
With reference to
Unlike the ejection head 10 illustrated in
In the case of a Ta—Al resistive layer 18, the protective layer 72 may be provided by an oxidized an upper about 100 to about 300 Angstrom portion of the Ta—Al resistive layer 18. Hence, the protective layer 72 may be provided by oxidizing the Ta—Al resistive layer 18 either by post deposition plasma, or in-situ by adding oxygen during the final moments of a sputtering deposition process for the resistive layer 18. A thin oxide protective layer 72 may provide all of the cavitation protection needed for the ejection of ultra-small fluid droplets through nozzle holes 70.
For example, an 800 Angstrom Ta—Al resistive layer 18 having a sheet resistance of about 28 ohms per square providing a ejection actuator 12 of about 1 square is provided. The ejection actuator 12 contains a 200 Angstrom oxidized protective layer 72 which may be effective to lower the applied current for the fluid ejection actuator 12 from about 45 milliamps to about 18 milliamps with a nucleation response similar to the nucleation response of the ejection head 10 illustrated in
The micro-fluid ejection head 60 for ultra-small fluid droplets may be attached to a fluid supply cartridge 80 as shown in
An illustrative control device 100 for activation of the ejection head 60 is illustrated in
In
The control device 100 includes a digital microprocessor 116 that receive input data 118 a host computer 120. In the case of an ink jet printer, the input data 118 is image data generated by a host computer 120 that describes the indicia 114 to be printed in a bit-map format.
During operation of the control device 100, the scanning mechanism 110 moves the cartridge 80 across the media 112 in a scanning direction as indicated by arrow 122. The scanning mechanism 110 may include a carriage that slides horizontally on one or more rails, a belt attached to the carriage, and a motor that engages the belt to cause the carriage to move along the rails. The motor is driven in response to the commands generated by the digital microprocessor 116.
The control device 100 may also include a media advance mechanism 124 that moves the media 112 in the direction of arrow 126 based on input commands from the digital microprocessor 116. Typically, the advance mechanism 124 advances the media 112 between consecutive scans of the cartridge 80 and ejection head 60. In one embodiment, the media advance mechanism 124 is a stepper motor rotating a platen which is in contact with the media 112. The control device 100 also includes a power supply 128 for providing a supply voltage to the ejection head 60, scanning mechanism 110 and media advance mechanism 124.
It is contemplated, and will be apparent to those skilled in the art from the preceding description and the accompanying drawings, that modifications and changes may be made in the embodiments of the disclosure. Accordingly, it is expressly intended that the foregoing description and the accompanying drawings are illustrative of preferred embodiments only, not limiting thereto, and that the true spirit and scope of the present disclosure be determined by reference to the appended claims.
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