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"250--A Linewidths With PMMA Electron Resist"; by: A. N. Broers et al., pp. 392-394. |
Filtration Technology; "Nuclepore Membrane Filters", 1 page. |
"Replication Of 175--A Lines and Spaces In Polymethylmethacrylate Using X-Ray Lithography"; by: D. C. Flanders, pp. 93-96. |
"Ensembles Of Microelectrodes: Digital Simulation By The Two-Dimensional Expanding Grid Method"; by: H. Reller et al., pp. 247-268. |
"Electrochemical Characterization Of Electrodes With Submicrometer Dimensions"; by: T. Hepel et al pp. 752-757. |
"Resolution Limits Of PMMA Resist For Exposure With 50kV Electrons"; by: A. N. Broers pp.166-170. |
"Charge Transfer At Partially Blocked Surfaces"; by: C. Amatorre, J. M. Saveant & D. Tessier; pp. 39-51. |
"Simulation Of Edge Effects In Electroanalytical Experiments By Orthogonal Collocation-VI. Cyclic Voltammetry AT Ultramicroelectrode Ensembles"; by: J. Cassidy et al.; pp. 629-636. |
Technical Article-"Preparation and Electrochemical Characterization of Ultramicroelectrode Ensembles" Reginald M. Penner and Charles R. Martin. |