This application claims the priority benefit of Taiwan application serial no. 111128897, filed on Aug. 2, 2022. The entirety of the above-mentioned patent application is hereby incorporated by reference herein and made a part of this specification.
The disclosure relates to a transducer device, and more particularly, to an ultrasonic transducer device.
Ultrasound transducer devices are technology that obtains images by emitting and receiving ultrasound, which can be applied to measure distance, such as being installed in a car to provide judgment on driving distance, in daily life, or can be applied to a medical diagnosis to check the physical condition of a patient. Generally, an ultrasonic transducer device includes multiple ultrasonic transducer units. The cell density of the ultrasonic transducer device may affect the bandwidth and output power of the ultrasonic transducer device, which in turn affects the performance of the ultrasonic transducer device. How to improve the cell density of the ultrasonic transducer device is an issue to be overcome at present.
The disclosure provides an ultrasonic transducer device with increased cell density, thereby improving the performance of the ultrasonic transducer device.
The ultrasonic transducer device of the disclosure includes a first electrode, an insulating layer, an oscillating membrane, a second electrode, and a third electrode. The insulating layer is disposed on the first electrode. The oscillating membrane is disposed over the insulating layer, and there is a cavity between the oscillating membrane and the insulating layer. The second electrode is disposed on the oscillating membrane. The third electrode is disposed in the cavity and has a plurality of first openings overlapping the second electrode, and the second electrode and the third electrode are each located on different sides of the oscillating membrane.
Referring to
The materials of the first electrode 110, the second electrode 150, and the third electrode 160 may be titanium (Ti), aluminum (Al), copper (Cu), tungsten (W), molybdenum (Mo), silver (Ag), an alloy thereof, a combination thereof, or other suitable conductive materials. In some embodiments, the first electrode 110, the second electrode 150, and the third electrode 160 may be a single-layer or multi-layer structure (e.g., each is a stacked structure of a titanium layer, an aluminum layer, and a titanium layer). In some embodiments, the materials of the first electrode 110, the second electrode 150, and the third electrode 160 may be the same or different, but the disclosure is not limited thereto. In some embodiments, the entire first electrode 110 may be disposed on the substrate (not shown) without being patterned.
The insulating layer 120 is disposed on the first electrode 110. The material of the insulating layer 120 may be silicon nitride, silicon oxide, silicon oxynitride, aluminum oxide, organic insulating material, or other suitable insulating materials, and the disclosure is not limited thereto. In some embodiments, the insulating layer 120 is directly formed on the first electrode 110 and covers the first electrode 110. The area of the insulating layer 120 may be the same as or different from the area of the first electrode 110.
The oscillating membrane 140 is disposed over the insulating layer 120, and there is a cavity 130 between the oscillating membrane 140 and the insulating layer 120. In other words, at least part of the region between the oscillating membrane 140 and the insulating layer 120 is not in direct contact. The oscillating membrane 140 is a thin film, and the material of the oscillating membrane 140 may be silicon nitride, silicon oxide, silicon oxynitride, aluminum oxide, organic insulating material, or other suitable thin film materials. In some embodiments, the oscillating membrane 140 has a first surface 140a and a second surface 140b opposite to the first surface 140a, and the second surface 140b faces the insulating layer 120.
The second electrode 150 and the third electrode 160 are each located on different sides of the oscillating membrane 140. For example, the second electrode 150 is disposed on the first surface 140a of the oscillating membrane 140, and the third electrode 160 is disposed on the second surface 140b of the oscillating membrane 140. That is, the third electrode 160 is disposed in the cavity 130. In some embodiments, the third electrode 160 is a mesh structure. For example, the third electrode 160 includes multiple longitudinal portions 162 extending toward the second direction D2 and arranged along the first direction D1, and multiple transverse portions 164 extending toward the first direction D1 and arranged along the second direction D2, and the first direction D1 and the second direction D2 intersect. In some embodiments, the first direction D1 orthogonally intersects the second direction D2. The third electrode 160 has multiple first openings OP1, and the first openings OP1 are defined by multiple intersected longitudinal portions 162 and transverse portions 164. In the embodiment, the first opening OP1 is square, but the disclosure is not limited thereto. In other embodiments, the first opening OP1 may be rectangular or in other suitable shapes.
The first openings OP1 overlap the second electrode 150. For example, the second electrode 150 may include multiple main parts 152 and multiple connecting parts 154. The area of each main part 152 is greater than the area of each connecting part 154. The main parts 152 are disposed in an array in the first direction D1 and the second direction D2 and overlap the first openings OP1 of the third electrode 160. In some embodiments, the projection of the main part 152 on the insulating layer 120 is square, but the disclosure is not limited thereto. The connecting parts 154 may be connected between adjacent main parts 152 in the first direction D1 and between adjacent main parts 152 in the second direction D2. Accordingly, the connecting parts 154 and the main parts 152 may constitute multiple second openings OP2. In the embodiment, the second opening OP2 is cross-shaped, but the disclosure is not limited thereto. In other embodiments, the second opening OP2 may be rectangular, round, zigzag, or in other suitable shapes.
In some embodiments, the oscillating membrane 140 has multiple through holes V, and the through holes V penetrate through the oscillating membrane 140. The through hole V is an etching hole configured to form the cavity 130 during the fabrication process of the ultrasonic transducer device 10. For example, the method of forming the cavity 130 includes steps as follows. A sacrificial layer (not shown) is formed on the insulating layer 120. Next, the third electrode 160, the oscillating membrane 140 and the second electrode 150 are formed on the sacrificial layer. Through holes V exposing the sacrificial layer are formed on the oscillating membrane 140. Finally, the sacrificial layer is etched through the through holes V to form the cavity 130. After the cavity 130 is formed, a filling material 170 may be filled into the through hole V to close the cavity 130. The filling material 170 is connected to the insulating layer 120. In some embodiments, the filling material 170 includes, for example, cured photoresist, silicon-containing nitride, silicon-containing oxide, or other insulating materials.
Referring to
In some embodiments, the oscillating membrane 140 is wavy when the third electrode 160 is applied with a bias voltage. The crests of the oscillating membrane 140 may correspond to the sub-cavities 132, and the troughs of the oscillating membrane 140 may correspond to the third electrode 160.
In some embodiments, the ultrasonic transducer device 10 may have an active region R1 and a peripheral region R2 located outside the active region R1. The peripheral region R2 may surround the active region R1 or only be located on one or more sides of the active region R1, which is not limited in the disclosure. The ultrasonic transducer unit 100 is located in the active region R1 to sense (e.g., receive or transmit) ultrasonic signals, so the first electrode 110, the second electrode 150 and the third electrode 160 can be located in the active region R1. In some embodiments, some of the through holes V may be located in the peripheral region R2, so that the active region R1 has more space for configuring the ultrasonic transducer units 100, so as to increase the cell density of the ultrasonic transducer device 10. In some embodiments, some of the through holes V may be located in the active region R1, and adjacent through holes V are separated by at least two first openings OP1, that is, at least two ultrasonic transducer units 100 are disposed between adjacent through holes V. Compared to other ultrasonic transducer devices having through holes between adjacent ultrasonic transducer units, the through holes V configured can be reduced in the embodiment, so as to increase the cell density of the ultrasonic transducer device 10. In some embodiments, the through hole V located in the active region R1 corresponds to the first opening OP1 of the third electrode 160.
In some embodiments, after applying a DC bias voltage to the third electrode 160, in the ultrasonic transducer unit 100, an AC bias voltage can be applied to the second electrode 150 so that the oscillating membrane 140 can oscillate back and forth to emit ultrasonic waves.
Referring to
In some embodiments, the first opening OP1 is rectangular, and the projection of the main part 152 on the insulating layer 120 is rectangular.
Referring to
Referring to
The following examples are given to verify the efficacy of the disclosure, but the disclosure is not limited to the followings. Note that the comparative examples of
In the case in which the following Embodiments 1-2 and Comparative examples 1-3 have the same overall area, that is, a length of 300 μm and a width of 4500 μm, the differences in cell density of the ultrasonic transducer units resulting from various configuration of the ultrasonic transducer units are compared.
The ultrasonic transducer device of Embodiment 1 is similar to that of the embodiment of
The relative dimensions, numbers, area ratios and cell densities of the ultrasonic transducer units of Embodiments 1-2 and Comparative examples 1-3 are listed in Table 1. The dimensions of the ultrasonic transducer units of Comparative examples 1-3 of Table 1 refer to the width W*length L of the oscillating membrane 140 corresponding to the main part 152 of the second electrode 150. The distances d1 and d2 refer to the distance between the centers of two adjacent ultrasonic transducer units 100/100′ in the first direction D1 and the second direction D2. The area ratio refers to the ratio of the total area of the ultrasonic transducer unit to the overall area of the active region R1 of the ultrasonic transducer device. The cell density is used to calculate the ratio of the area of the ultrasonic transducer unit to the area of the through hole. For example, in Comparative examples 1- 3, the number of ultrasonic transducer units is equal to the number of through holes, so the cell density is (the area of one ultrasonic transducer unit)/(the area of one ultrasonic transducer unit+the area of a through hole); for Embodiments 1-2, the number of ultrasonic transducer units is n times (e.g., 15 times) the number of through holes, so the cell density is (the area of n ultrasonic transducer units)/(the area of the n ultrasonic transducer units+the area of a through hole).
The ultrasonic transducer units 100 of Embodiments 1-2 are formed by forming the sub-cavity 132 among the insulating layer 120, the oscillating membrane 140 and the third electrode 160 when the third electrode 160 is applied with a bias voltage, so more ultrasonic transducer units 100 can be configured in the same area, or the ratio of the area occupied by the ultrasonic transducer units 100 is relatively high, and the cell density is higher, thereby improving the bandwidth and the power output of the ultrasonic transducer device.
Number | Date | Country | Kind |
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111128897 | Aug 2022 | TW | national |