Claims
- 1. An underwater laser processing apparatus, comprising:
- a pulse laser device configured to provide a series of laser beam pulses, each laser beam pulse having a duration of 100 nanoseconds or less;
- a laser beam strength adjusting device configured to adjust an output power of each said laser beam pulse to a peak power value in a range of from 0.1 to 10 GW/cm.sup.2 ; and
- a working head including a mechanism configured to irradiate each said laser beam pulse of a duration of 100 nanoseconds or less and adjusted power value in a range of from 0.1 to 10 GW/cm.sup.2 as a train of laser beam spots having a coverage factor of 100% onto a surface of a metal material covered with water at a processing position.
Priority Claims (2)
Number |
Date |
Country |
Kind |
P7-013880 |
Jan 1995 |
JPX |
|
P7-018087 |
Feb 1995 |
JPX |
|
Parent Case Info
This application is a division of application Ser. No. 08/593,970, filed on Jan. 30, 1996 and now U.S. Pat. No. 5,790,620.
US Referenced Citations (16)
Foreign Referenced Citations (9)
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EPX |
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FRX |
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JPX |
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May 1991 |
JPX |
5-138377 |
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JPX |
6-13725 |
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6-269975 |
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JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
593970 |
Jan 1996 |
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