Claims
- 1. At least one unsaturated oligophenol cyanate selected from the group consisting of:(I) an unsaturated oligophenol cyanate of the formula: [A—]n[B—A—]xB[—A]m I in which A is in each case a group of formula: and B is in each case a group of formula: wherein R1, R2 and R3 each, independent of one another, are hydrogen or a bond to a group B with the proviso that each group A has either one or two bonds to a group B; (i) R4 and R4′, and (ii) R5 and R5′ each, independent of one another, are either together a direct bond or are hydrogen and a bond to a group A, with the proviso that at least one of (i) R4 and R4′ and (ii) R5 and R5′ of at least one group B are together a direct bond, and with the proviso that each group B has either one or two bonds to a group A; the indices m and n independent of one another are 0 or 1 and x is an integer from 0 to 10, with the proviso that at least one of the numbers m, n, and x is other than 0 and m and n are not both at the same time 1;(II) a mixture of at least two unsaturated oligophenol cyanates of formula I; and (III) a mixture of at least one unsaturated oligophenol cyanate of formula I and at least one compound of formula I in which n and m deviate from the above definitions by both being 1.
- 2. The at least one unsaturated oligophenol cyanate according to claim 1, wherein x is from 0 to 5.
- 3. A process for preparing the at least one unsaturated oligophenol cyanate according to claim 1, comprising reacting at least one oligophenol of the formula:[A—]n[B—A—]xB[—A]m in which A is a group of the formula: and B, R1, R2, R3, R4, R5, R6, m, n and x are as previously defined with cyanogen chloride in the presence of a tertiary amine.
- 4. A process comprising preparing a radiation-curable lacquer comprising the at least one unsaturated oligophenol cyanate according to claim 1.
- 5. The radiation-curable lacquer prepared by the process according to claim 4.
- 6. A process comprising applying the radiation-curable lacquer according to claim 5 and radiation-curing the radiation-curable lacquer.
- 7. A process comprising preparing a radiation-curable varnish comprising the at least one unsaturated oligophenol cyanate according to claim 1.
- 8. The process according to claim 7, wherein the radiation-curable varnish is a radiation curable lithographic varnish.
- 9. The radiation-curable varnish prepared by the process according to claim 7.
- 10. The radiation-curable lithographic varnish prepared by the process according to claim 8.
- 11. At least one unsaturated oligophenol cyanate selected from the group consisting of:(I) an unsaturated oligophenol cyanate of the formula: [A—]n[B—A—]xB[—A]m I in which A is in each case a group of formula: and B is in each case a group of formula: wherein R1, R2 and R3 each, independent of one another, are hydrogen or a bond to a group B with the proviso that each group A has either one or two bonds to a group B; (i) R4 and R4′, and (ii) R5 and R5′ each, independent of one another, are either together a direct bond or are hydrogen and a bond to a group A, with the proviso that at least one of (i) R4 and R4′ and (ii) R5 and R5′ of at least one group B are together a direct bond, and with the proviso that each group B has either one or two bonds to a group A; the indices m and n independent of one another are 0 or 1 and x is an integer from 0 to 10, with the proviso that at least one of the numbers m, n, and x is other than 0 and m and n are not both at the same time 1; (II) a mixture of at least two unsaturated oligophenol cyanates of formula I; and (III) a mixture of at least one unsaturated oligophenol cyanate of formula I and at least one unsaturated oligophenol cyanate of formula:[A″—]n[B″—A″—]xB″[—A″]m I″in which A″ is in each case a group of formula II and B″ in each case is a group of formula III, wherein R1, R2 and R3 each, independent of one another, are hydrogen or a bond to a group B″ with the proviso that each group A″ has either one or two bonds to group B″; (i) R4 and R4′, and (ii) R5 and R5′ each, independent of another, are either together a direct bond or are hydrogen and a bond to a ground A″, with the proviso that each group B″ has either one or two bonds to group A″; the indices m and n are each 1 and x is an integer from 0 to 10.
Priority Claims (1)
Number |
Date |
Country |
Kind |
98202692 |
Aug 1998 |
EP |
|
Parent Case Info
This application is a continuation (national stage) application of International (PCT) Patent Application No. PCT/EP99/05757, filed on Aug. 9, 1999, which is a continuing application of U.S. Provisional Application Ser. No. 60/096,253, filed on Aug. 12, 1998, and both International Patent Application No. PCT/EP99/05757 and U.S. Provisional Application Ser. No. 60/096,253 have benefit of the priority of European Patent Application No. 98202692.4, filed on Aug. 11, 1998.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/EP99/05757 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO00/09477 |
2/24/2000 |
WO |
A |
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4713442 |
Woo et al. |
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A |
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A |
5932762 |
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Aug 1999 |
A |
Foreign Referenced Citations (2)
Number |
Date |
Country |
0147548 |
Jul 1985 |
EP |
0315089 |
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EP |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/096253 |
Aug 1998 |
US |