Claims
- 1. A UV curable paintable composition consisting essentially of UV curable material selected from the class consisting of an acrylic monomer-polymer mixture, a polyester resin, an epoxy resin, and a polythiol-polyene resin, from 1 to 10 parts of a photoinitiator selected from the class consisting of ketones, benzoin ethers, quinones, and a cationic initiator, per 100 parts of the UV curable organic material and 0.1 to 10% by weight of the UV curable composition of a sulfonate ester of the formula,
- Z--SO.sub.2 --R,
- where Z is ##STR4## R is selected from C.sub.(6-13) aryl radicals and R.sup.1, R.sup.2, and R.sup.3 are the same of different monovalent radicals selected from hydrogen, halogen, C.sub.(1-20) alkyl, C.sub.(1-20) alkoxy, and R radicals.
- 2. A UV curable composition in accordance with claim 1, where the UV curable organic material is an acrylic monomer-polymer mixture.
- 3. A UV curable composition in accordance with claim 1, where the sulfonate ester is 2-(2H-benzotriazole-2-yl)-4-t-octylphenylbenzenesulfonate.
- 4. A UV curable composition in accordance with claim 1, where the sulfonate ester is 2-(2H-benzotriazole-2-yl)-4-methylphenylbenzenesulfonate.
- 5. A UV curable composition consisting essentially of polymethylmethacrylate and olefinically unsaturated monomer, an effective amount of paraffin wax, from 1 to 10 parts of benzoin ethyl ether per 100 parts of the polymethylmethacrylate and 0.1 to 10% by weight of the UV curable composition of 2-(2H-benzotriazole-2-yl)-4-t-octylphenylbenzenesulfonate.
Parent Case Info
This application is a continuation of copending application Ser. No. 660,260, filed Feb. 23, 1976, now abandoned.
US Referenced Citations (4)
Non-Patent Literature Citations (4)
Entry |
Kosar, "Light Sensitive Systems" Wiley 1965, pp. 160, 161, 170, 171, 172. |
Stratenus et al., "Photoreactions . . ." Recueil (1966) vol. 85, pp. 434-436. |
Snell "Pyrimidines . . ." Journal of the Chemical Society (London) (C) 1968, pp. 2367-2370. |
Nasielski et al., "Photo-Fries Rearr. . . ." Tetrahedron vol. 28, 1972, pp. 5025-5028. |
Continuations (1)
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Number |
Date |
Country |
Parent |
660260 |
Feb 1976 |
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