Claims
- 1. An industrial vapor pressure device for providing a controlled amount of liquid vapor in a gas stream being fed to a process furnace comprising:
- a sealed casing having inlet ports and an outlet port;
- a means for introducing a gas stream into said casing through one of said inlet ports, said means including a porous member within said casing through which said gas passes; and
- a means for introducing a controlled amount of liquid into said casing through another of said inlet ports, said means including a manifold having a plurality of orifices and a wick through which said liquid passes in fluid communication with said orifices, said manifold and said wick being located within said casing;
- said wick being located adjacent to and in operable contact with said porous member whereby said gas passing through said porous member also passes through said liquid laden wick thereby providing a controlled amount of said liquid in said gas before said gas passes through said outlet port.
- 2. The vapor pressure device of claim 1 wherein said manifold is annular and extends around said porous member.
- 3. The vapor pressure device of claim 1 wherein said porous member comprises a sintered tube connected to said means for introducing a gas stream and located in said casing.
- 4. The vapor pressure device of claim 3 wherein said wick is positioned operatively adjacent and at least partially surrounding said sintered tube whereby the gas passes through said sintered tube and through said wick.
- 5. Industrial pressure device for providing a controlled amount of vapor in a gas stream being fed to a process furnace comprising:
- a sealed casing having a liquid inlet port and a gas inlet port at one end and an outlet port at the other end;
- a liquid carrying line connected to said liquid inlet port and passing therethrough into the interior of said casing;
- a manifold having a plurality of orifices, said manifold located within said casing and connected to said liquid carrying line;
- a liquid distributing tubular wick in fluid communication with said orifices in said manifold and adapted to absorb liquid therefrom;
- a gas carrying line connected to said gas inlet port and passing therethrough into the interior of said casing; and
- a sintered tube connected to the end of said gas carrying line and located within said casing and within and in contact with said tubular wick whereby said gas passes through said sintered tube and through said liquid laden wick to provide a controlled amount of said liquid in said gas before said gas passes through said outlet port.
- 6. The vapor pressure device of claim 5 wherein said manifold is annular and extends around said sintered tube.
Parent Case Info
This application is a continuation of application Ser. No. 785,025, filed Oct. 30, 1991, now abandoned.
US Referenced Citations (11)
Non-Patent Literature Citations (3)
Entry |
Glass To Metal Sealing: Improved Yields And Quality Using Nitrogen Based Atmospheres by J. Schmidt and J. Carter, International Microelectronics Symposium (ISHM 84). |
Improved Glass To Metal Sealing Through Furnace Atmosphere Composition Control by W. Yext and B. Shook of Air Products, and W. Katzenberger and R. Michaleh from Elecpac Div. of Wilbrecht Electronics presented at 33rd Electronics Components Conference, Orlando, Fla., May 1983. |
Advanced Gas Moisturizing System for Ceramic Processing Applications by F. W. Giacobbe. |
Continuations (1)
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Number |
Date |
Country |
Parent |
785025 |
Oct 1991 |
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