This disclosure relates to the field of sensors, and in particular, to a vibration sensor and a microphone.
In the existing technology, vibration sensors such as an accelerometer, a speaker, a gyroscope, an energy harvester, a bone-conduction microphone, and an air-conduction microphone widely use a diaphragm and mass block structure or a cantilever beam and mass block structure. For example, a microphone uses a diaphragm and mass block structure or a cantilever beam and mass block structure in the vibration sensor to receive external vibrational excitation, and convert the vibrational excitation into an electrical signal. The electrical signal is output after being processed by a back-end circuit for collection of a sound signal. An air-conduction microphone may collect air vibration generated when a user makes a sound, and convert the air vibration into an electrical signal. A bone-conduction microphone may collect mechanical vibration of bones and skin generated when a user speaks, and convert the mechanical vibration into an electrical signal. Higher sensitivity and wider frequency response range to vibrational excitation have always been goals pursued for a vibration sensor. However, due to characteristics of a vibration system, sensitivity attenuates sharply after a resonance peak occurs, and generally the higher a resonance frequency, the lower the sensitivity. Consequently, it is difficult for a single-resonance peak vibration sensor to take into account characteristics of both high sensitivity and wide frequency band. In addition, the single-resonance peak often cannot meet a demand. Multi-resonance peak vibration sensors in the existing technology have a complex structure and high processing difficulty, resulting in high costs and low precision.
Therefore, there is a need to provide a vibration sensor and a microphone that have a wider frequency response range, higher sensitivity, and a simple structure.
The present disclosure provides a vibration sensor and a microphone that have a wider frequency response range, higher sensitivity, and a simple structure.
According to an aspect, the present disclosure provides a vibration sensor, including: a base, including a cavity; and a plurality of vibration beams, sequentially arranged on the base, where each vibration beam includes: a fixed terminal, including two parts respectively located at two ends of the vibration beam and connected to the base, and a movable terminal, connected to the fixed terminal, located between the two parts of the fixed terminal, and suspended in the cavity, a portion, suspended in the cavity, of each vibration beam has a different dimension and a different natural frequency, and each vibration beam generates, in response to an external vibrational excitation, a vibration signal in a sub-target frequency window including a natural frequency corresponding to the vibration beam.
According to another aspect, the present disclosure provides a microphone, including: a housing; a vibration sensor in the housing, the vibration sensor including: a base, including a cavity, and a plurality of vibration beams, sequentially arranged on the base, where each vibration beam includes: a fixed terminal, including two parts respectively located at two ends of the vibration beam and connected to the base, and a movable terminal, connected to the fixed terminal, located between the two parts of the fixed terminal, and suspended in the cavity, where a portion, suspended in the cavity, of each vibration beam has a different dimension and a different natural frequency, and each vibration beam generates, in response to an external vibrational excitation, a vibration signal in a sub-target frequency window including a natural frequency corresponding to the vibration beam, and the vibration sensor is mounted in the housing, and the base is fixedly connected to the housing; and a signal synthesizing circuit, connected to the plurality of vibration beams and configured to collect the vibration signals during operation and perform signal synthesis on the vibration signals, to generate a vibration signal within a target frequency window, where a plurality of sub-target frequency windows corresponding to the plurality of vibration beams cover different frequency ranges, and the plurality of sub-target frequency windows constitutes the target frequency window.
As can be learned from the foregoing technical solutions, for a vibration sensor and a microphone provided in this specification, both ends of a vibration beam may be fixed on a base, and a middle portion may be suspended in a cavity and generate deformation in response to external vibrational excitation. According to the vibration sensor and the microphone, portions, suspended in the cavity, of a plurality of vibration beams may have different dimensions by changing a structure and a dimension of the cavity and a dimension and a connection position of each vibration beam, so that different vibration beams may have different natural frequencies, and resonance peaks of different frequencies may be generated under vibrational excitation. The plurality of vibration beams may generate vibration signals with a plurality of different frequency ranges, and the vibration signals with the plurality of different frequency ranges may together constitute a vibration signal with a wide frequency band, making the vibration sensor have a wider frequency response range. In addition, a vibration signal selected by the vibration sensor and the microphone may be a vibration signal within a preset range near the resonance peak, so that the sensitivity may be higher. Moreover, for the vibration sensor and the microphone, a dimension of the cavity of the base may be designed to realize multi-resonance peaks and a wide frequency band. The structure can be simple, processing difficulty may be low, processing costs may be low, and a more accurate collection result of the vibration signal may be obtained.
Other functions of the vibration sensor and the microphone provided in this specification are listed in the following descriptions. Based on description, content introduced by the following figures and examples are obvious to those of ordinary skill in the art. Creative aspects of the vibration sensor and the microphone provided in this specification may be fully explained by practicing or using a method, an apparatus, and a combination described in the following detailed examples.
To clearly describe the technical solutions in the embodiments of this disclosure, the following briefly describes the accompanying drawings required for describing the embodiments. Evidently, the accompanying drawings in the following description show merely some exemplary embodiments of this disclosure, and a person of ordinary skill in the art may still derive other drawings from these accompanying drawings without creative efforts.
The following description provides specific application scenarios and requirements of this disclosure, with the purpose of enabling those skilled in the art to make and use the content in this disclosure. For those skilled in the art, various partial modifications to the disclosed embodiments are obvious, and without departing from the spirit and scope of this disclosure, the general principles defined herein can be applied to other embodiments and application. Therefore, this disclosure is not limited to the embodiments, but is consistent with the broadest scope of the claims.
The terms used herein are merely intended to describe specific exemplarily embodiments, rather than limiting this disclosure. For example, unless explicitly stated otherwise, the singular forms “a”, “an” and “the” used herein may also include plural forms. When used in this disclosure, the terms “comprise”, “include”, and/or “contain” indicate the presence of associated integers, steps, operations, elements, and/or components, but do not exclude the presence of one or more other features, integers, steps, operations, elements, components, and/or sets or addition of other features, integers, steps, operations, elements, components, and/or sets to the system/method.
In consideration of the following description, in this disclosure, these and other features, the operation and function of related elements of the structure, as well as the economics of the combination and manufacturing of components can be significantly improved. With reference to the accompanying drawings, all of these form part of this disclosure. However, it should be clearly understood that the accompanying drawings are merely intended for illustration and description purposes, rather than to limit the scope of this disclosure. It should be further understood that the accompanying drawings are not drawn to scale.
It should be understood that, to facilitate description of this disclosure, position relationships indicated by terms such as “center”, “upper surface”, “lower surface”, “upper”, “lower”, “top”, “bottom”, “inner”, “outer”, “axial”, “radial”, “periphery”, and “external” are position relationships based on the accompanying drawings, and are not intended to indicate that the apparatus, module, or unit referred to must have a particular position relationship, so that they cannot be interpreted as limiting this disclosure.
It should be understood that “system”, “apparatus”, “unit”, and/or “module” used in this disclosure are used to differentiate between different modules, elements, components, parts, or assemblies of different levels. However, if another word can achieve the same purpose as one word, this word can be replaced with another expression.
The flowchart used in this disclosure illustrates the operations implemented by the system according to some exemplary embodiments in this disclosure. It should be clearly understood that the operations of the flowchart may be implemented out of sequence. Instead, the operations may be implemented in reverse sequence or simultaneously. In addition, one or more other operations may be added to the flowchart. One or more operations may be removed from the flowchart.
For ease of understanding, the terms used in this disclosure are first explained as follows:
Sensitivity refers to a ratio of an output signal to an input signal. For a vibration sensor, the input signal may be external vibrational excitation, and the output signal may be an electrical signal generated in response to the vibrational excitation. Sensitivity of the vibration sensor refers to a ratio of an output electrical signal to input vibrational excitation, where the output electrical signal may be converted into the amplitude of a vibration signal. Therefore, the sensitivity of the vibration sensor may also be understood as a ratio of the amplitude of the output vibration signal to the amplitude of the input vibrational excitation. When a dimension of the output signal is the same as that of the input signal, the sensitivity may be understood as an amplification factor of the input signal. Higher sensitivity indicates better collection performance of the vibration sensor for tiny vibrational excitation.
Resonance, also referred to as “syntony”, refers to a phenomenon that, when a vibration system is under an action of periodic external vibrational excitation, an amplitude of the system increases sharply when a frequency of external vibrational excitation is the same as or very close to a natural vibration frequency of the system. A frequency at which resonance occurs is called “resonance frequency”.
Resonance peak refers to a peak value of the resonance frequency.
A vibration sensor and a microphone provided in this disclosure may be configured to collect external vibrational excitation, and convert the vibrational excitation into an electrical signal. The vibration sensor and the microphone may be configured to collect not only vibrational excitation caused by an air vibration, but also vibrational excitation caused by a mechanical vibration, such as vibrations of bones and skin generated when a person speaks. The vibration sensor and the microphone may be used as not only air-conduction microphones, but also bone-conduction microphones.
The base 200 may be a mounting base for the vibration sensor 001. Other components, such as the vibration beams 400, of the vibration sensor 001 may be connected to the base 200 directly or indirectly. The connection may be implemented in any manner, for example, a fixed connection manner such as welding, riveting, clamping, or bolting, or a deposition manner such as physical deposition (for example, physical vapor deposition) or chemical deposition (for example, chemical vapor deposition). The base 200 may be a structural body of any shape, for example, a regular-shaped structural body such as a cube, a cuboid, a cylinder, a prismoid, and a truncated cone, or any irregular-shaped structural body. A material of the base 200 may be Si, SiO2, SiNx, or the like. In some exemplary embodiments, the base 200 may include a cavity 220. In some exemplary embodiments, the cavity 220 may penetrate the base 200. In some exemplary embodiments, the cavity 220 may not penetrate the base 200. Referring to exemplary descriptions shown in
In some exemplary embodiments, the cavity 220 may be one piece. In some exemplary embodiments, the cavity 220 may include a plurality of spaced sub-cavities. For ease of description, the cavity 220 shown in
A dimension of the cavity 220 in a first direction 221 may vary along a second direction. That is, the dimension of the cavity 220 in the first direction 221 changes as its position in the second direction 222 changes. In other words, the cavity 220 has different dimensions in the first direction 221 at different positions of the cavity 220 in the second direction 222. The first direction 221 and the second direction 222 are not the same direction. That is, the first direction 221 and the second direction 222 form an angle. The angle may be an acute angle, a right angle, or an obtuse angle. In some exemplary embodiments, the first direction 221 is perpendicular to the second direction 222. A cross-sectional shape of the cavity 220 may be any shape that meets the foregoing conditions, such as a circle, an ellipse, a quadrilateral, a pentagon, a hexagon, a heptagon, an octagon, or even an irregular shape, such as a varied-curvature curve shape. The cavity 220 with different shapes may correspond to different first directions 221 and different second directions 222. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be a quadrilateral, such as a square, the first direction 221 may be a direction of one diagonal of the square, and the second direction 222 may be a direction of the other diagonal of the square. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be a rectangle, the first direction 221 may be a direction forming an acute angle with the length or width of the rectangle and the second direction 222 may be a direction perpendicular to the first direction. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be a parallelogram, the first direction 221 may be a direction forming an acute angle with one side of the parallelogram, and the second direction 222 may be a direction perpendicular to the first direction. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be a trapezoid, such as an isosceles trapezoid, the second direction 222 may be a height direction of the isosceles trapezoid, and the first direction 221 may be a direction perpendicular to the second direction 222. In some exemplary embodiments, the second direction 222 may alternatively be a direction forming an acute angle with a height direction of the isosceles trapezoid, and the first direction 221 may be a direction perpendicular to the second direction 222. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may alternatively be a right-angled trapezoid, the second direction 222 may be a height direction of the right-angled trapezoid, and the first direction 221 may be a direction perpendicular to the second direction 222. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may alternatively be another quadrilateral, such as a trapezoid other than isosceles trapezoid and right-angled trapezoid, for example, a rhombus, a trapezium, and so on. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be circular, the first direction 221 may be a direction of any diameter of the circular, and the second direction 222 may be a direction perpendicular to the first direction 221. In some exemplary embodiments, the cross-sectional shape of the cavity 220 may be an ellipse, the first direction 221 may be a long-axis direction or a short-axis direction of the ellipse, and the second direction 222 may be a direction perpendicular to the first direction.
The cross-sectional shape of the cavity 220 shown in
An edge of the cavity 220 may be straight, curved, jagged, or the like. In some exemplary embodiments, the edge of the cavity 220 may be formed by straight lines. The dimension of the cavity 220 may be designed based on an application scenario of the vibration sensor 001 and a requirement for vibrational excitation. For example, the cavity 220 may have different dimensions when the vibration sensor 001 is used as an accelerometer and as an air-conduction microphone. In some exemplary embodiments, the dimension of the cavity 220 may be related to a dimension of the vibration beam 400, which will be described in detail in the following description.
As shown in
The fixed terminal 420 may be located at both ends of the vibration beam 400. The fixed terminal 420 may be connected to the base 200 along the first direction 221. That is, both ends of the fixed terminal 420 may be distributed along the first direction 221. For ease of description, a distribution direction of both ends of the fixed terminal 420 is defined as a length direction, or an axial direction, of the vibration beam 400. The connection between the fixed terminal 420 and the base 200 may be implemented in any manner, for example, a fixed connection manner such as welding, riveting, clamping, or bolting, or a deposition manner such as physical deposition (for example, physical vapor deposition) or chemical deposition (for example, chemical vapor deposition). The fixed terminal 420 may be connected to the base 200 in an insulated manner. For example, the fixed terminal 420 may be connected to the base 200 through an insulation layer. A material of the fixed terminal 420 may be Si, SiO2, SiNx, or the like.
In some exemplary embodiments, the fixed terminal 420 may be fixedly connected to an upper surface or a lower surface of the base 200 or an inner wall of the cavity 220. In the schematic diagrams shown in
The movable terminal 440 may be connected to the fixed terminal 420, located between the fixed terminals 420, and suspended in the cavity 220. “Suspended in the cavity 220” may be suspended in, below, or above the cavity 220 of the base 200, without being in contact with the base 200. For ease of display, as shown in
The movable terminal 440 may generate deformation in response to the vibrational excitation, and convert the deformation into a vibration signal. In some exemplary embodiments, the movable terminal 440 may include a piezoelectric sensing component 442 and a connecting beam 444. The piezoelectric sensing component 442 may convert the deformation of the movable terminal 440 into the vibration signal, and the vibration signal may include an electrical signal. The connecting beam 444 may be connected to the piezoelectric sensing component 442.
The piezoelectric sensing component 442 may include a piezoelectric material. As described above, the vibration sensor 001 may receive external vibrational excitation, and convert the external vibrational excitation into an electrical signal. Specifically, the external vibrational excitation may deform the movable terminal 440, causing the piezoelectric material in the piezoelectric sensing component 442 to deform, thereby generating stress and outputting a voltage. Thus, the external vibrational excitation is converted into an electrical signal, and the electrical signal is then collected and regulated through a back-end circuit to obtain a required electrical signal. All piezoelectric materials conform to a piezoelectric effect constitutive equation. For the vibration sensor 001, a positive piezoelectric effect is applied, and a constitutive equation is as follows:
where dij is a piezoelectric strain coefficient, Tj is stress, εijT is a dielectric constant under a constant force, Ej is an electric field strength, and Di is electrical displacement. For the vibration sensor 001, the electrical displacement Di is mainly caused by the stress formed by the external vibrational excitation. The constitutive equation may be further simplified to:
It may be learned from the foregoing formula that a magnitude of an output electrical displacement Di of the piezoelectric material depends on a piezoelectric strain coefficient dij of the material itself and the stress Tj formed by the piezoelectric material during operation. After the piezoelectric material is determined, it is an effective measure to increase output of the piezoelectric sensing component 442 by designing a structure to increase stress in a partial region of an effective piezoelectric material.
The piezoelectric sensing component 442 may be suspended in the cavity 220. In some exemplary embodiments, the piezoelectric sensing component 442 may be distributed over all regions of the movable terminal 440. In some exemplary embodiments, the piezoelectric sensing component 442 may be alternatively distributed over some regions of the movable terminal 440. The piezoelectric sensing component 442 may convert the deformation of the movable terminal 440 into a vibration signal, and output the vibration signal. When the movable terminal 440 moves relative to the base 200, deformation degrees at different positions of the movable terminal 440 may be different, and deformation stress on the piezoelectric sensing component 442 is also different. To improve sensitivity of the vibration sensor 001, in some exemplary embodiments, the piezoelectric sensing component 442 can be disposed at only a position, having a relatively high deformation degree and relatively large stress, of the movable terminal 440, thereby improving the sensitivity of the vibration sensor 001. For ease of description, the position, having a relatively high deformation degree and relatively large stress, of the movable terminal 440 is defined as a first region, and a position, having a relatively low deformation degree and relatively small stress, of the movable terminal 440 is defined as a second region. A voltage of the electrical signal in the first region is higher than a voltage of the electrical signal in the second region. In some exemplary embodiments, the piezoelectric sensing component 442 can be disposed only in the first region. It should be noted that, the first region and the second region are regions corresponding to the movable terminal 440, and do not include a region of the fixed terminal 420, namely, a region at a junction between the vibration beam 400 and the base 200.
A direction of the stress on the movable terminal 440 is related to an overall deformation direction of the movable terminal 440. When the movable terminal 440 vibrates downwards and vibrates upwards, its deformation directions are opposite. In this case, directions of stress on a same portion of the movable terminal 440 are also opposite. A region under compressive stress during upward vibration is subjected to tensile stress in downward vibration, and a region under tensile stress during upward vibration is subjected to compressive stress in downward vibration. For example, when the movable terminal 440 vibrates downward, and when the movable terminal 440 is deformed, axial stress on a lower surface of the movable terminal 440 is symmetrical with respect to the center of the movable terminal 440, and tensile stress on the center side decreases to zero, and then increases from zero to compressive stress. The zero points are located at one-quarter and three-quarters of an axial length of the movable terminal 440. When the movable terminal 440 vibrates upwards, and when the movable terminal 440 is deformed, axial stress on a lower surface of the movable terminal 440 is symmetrical with respect to the center of the movable terminal 440, and compressive stress on the center side decreases to zero, and then increases from zero to the tensile stress. The zero points are located at one-quarter and three-quarters of the axial length of the movable terminal 440.
Therefore, in order to improve the sensitivity of the piezoelectric sensing component 442, the piezoelectric sensing component 442 may be arranged in a region where stress is relatively large and has a same direction. For ease of presentation, the following description is provided by using an example in which the movable terminal 440 vibrates downward. When the movable terminal 440 vibrates downward, in some exemplary embodiments, the piezoelectric sensing component 442 may be arranged in a region with a relatively large compressive stress. For example, the piezoelectric sensing component 442 may be arranged at portions, close to the fixed terminal 420, on both ends of the movable terminal 440, and within a range in which a distance between the piezoelectric sensing component 442 and the fixed terminal 420 is less than a quarter of a length of the movable terminal 440. That is, the first region may be located at both ends of the movable terminal 440 and within a range in which a distance between the first region and the fixed terminal 420 is less than a quarter of the length of the movable terminal 440. For example, the movable terminal 440 may include at least two piezoelectric sensing components 442. An example in which there are two piezoelectric sensing components 442 is used for description. The two piezoelectric sensing components 442 may be respectively close to both ends of the fixed terminal 420, and a distance between each piezoelectric sensing component 442 and an end, close to the piezoelectric sensing component 442, of the fixed terminal 420 may be less than ¼ of the length of the movable terminal 440. In this case, both ends of each piezoelectric sensing component 442 are connected to the fixed terminal 420 and the connecting beam 444, respectively.
In some exemplary embodiments, when the movable terminal 440 vibrates downward, the piezoelectric sensing component 442 may be arranged in a region with a relatively large tensile stress. For example, the piezoelectric sensing component 442 may be arranged on the movable terminal 440, and a distance between the piezoelectric sensing component 442 and one end of the fixed terminal 420 is within a range from one quarter to three quarters of the length of the movable terminal 440. That is, the first region may be on the movable terminal 440, and a distance between the first region and one end of the fixed terminal 420 is within a range from one quarter to three quarters of the length of the movable terminal 440.
It should be noted that the distance between the piezoelectric sensing component 442 and the fixed terminal 420 may be a distance from any position on the piezoelectric sensing component 442 to the fixed terminal 420. For example, the distance between the piezoelectric sensing component 442 and the fixed terminal 420 may be a distance between a center position of the piezoelectric sensing component 442 and the fixed terminal 420, or may be a distance between an end (any end) of the piezoelectric sensing component 442 and the fixed terminal 420, or may be a distance between another position of the piezoelectric sensing component 442 and the fixed terminal 420.
The piezoelectric sensing component 442 may include at least one of a laminated structure composed of a piezoelectric single crystal structure(s) and a laminated structure composed of a piezoelectric twin structure(s). In some exemplary embodiments, the piezoelectric sensing component 442 may be the laminated structure composed of the piezoelectric single crystal structure.
The elastic layer 442a-2 may be fixedly connected to the fixed terminal 420 and the connecting beam 444 directly or indirectly. The connection may be implemented in any manner, for example, a fixed connection manner such as welding, riveting, clamping, or bolting, or a deposition manner such as physical deposition (for example, physical vapor deposition) or chemical deposition (for example, chemical vapor deposition). When the vibration beam 400 receives vibrational excitation from the outside, the elastic layer 442a-2 may generate deformation based on the vibrational excitation. The elastic layer 442a-2 may be made of a material that is easily deformed under action of an external force. The elastic layer 442a-2 may be of a structure that is easily deformed and made of a semiconductor material. The elastic layer 442a-2 may be a single-layer material, such as Si, SiO2, SiNx, or SiC, or may be a multi-layer material, such as Si/SiO2, SiO2/Si, Si/SiNx, or SiNx/Si. A thickness of the elastic layer 442a-2 may range from 1 μm to 10 μm. In some exemplary embodiments, the thickness of the elastic layer 442a-2 may range from 1 μm to 3 μm. In some exemplary embodiments, the thickness of the elastic layer 442a-2 may range from 2 μm to 6 μm. In some exemplary embodiments, the thickness of the elastic layer 442a-2 may range from 4 μm to 8 μm. In some exemplary embodiments, the thickness of the elastic layer 442a-2 may range from 6 μm to 10 μm.
The piezoelectric sensing component 442 may include a piezoelectric layer 442a-6. The piezoelectric layer 442a-6 is a structure that may generate, under the action of an external force, a voltage on two end surfaces. The piezoelectric layer 442a-6 may be fixedly connected to the base 200 directly or indirectly. The connection may be implemented in any manner, for example, a fixed connection manner such as welding, riveting, clamping, or bolting, or a deposition manner such as physical deposition (for example, physical vapor deposition) or chemical deposition (for example, chemical vapor deposition). In some exemplary embodiments, the piezoelectric layer 442a-6 may generate the deformation when receiving a vibration signal, and generate a voltage based on the deformation.
The piezoelectric layer 442a-6 may be attached to a surface of the elastic layer 442a-2 directly or indirectly. In some exemplary embodiments, the elastic layer 442a-2 may be connected to the fixed terminal 420 and the connecting beam 444, and the piezoelectric layer 442a-6 may be connected to the fixed terminal 420 and the connecting beam 444 through the elastic layer 442a-2. An example in which the vibration beam 400 is located on the upper surface of the base 200 is used for description. In some exemplary embodiments, the piezoelectric layer 442a-6 may be located on a side, away from the base 200, of the elastic layer 442a-2. In some exemplary embodiments, the piezoelectric layer 442a-6 may be located on a side, close to the base 200, of the elastic layer 442a-2. When the vibration beam 400 receives vibrational excitation from the outside, the elastic layer 442a-2 generates deformation based on the vibrational excitation. Based on a piezoelectric effect, the piezoelectric layer 442a-6 may be stressed under the action of the deformation of the elastic layer 442a-2, thereby generating a voltage (a potential difference).
A beam structure with bending deformation includes a cantilever beam, a simply supported beam, a fixed/clamped beam, and the like. When first-order bending deformation occurs on the beam structure, there is a neutral layer along a thickness direction, and materials on both sides of the neutral layer are in opposite stress states. For example, when the clamped beam is bent and deformed upwards, a support arm material of a part above the neutral layer is in a state of tensile stress, and a support arm material of a part below the neutral layer is in a state of compressive stress. The positive or negative property of an output electrical signal of the piezoelectric material is related to the stress state. In order to maximize output efficiency of the piezoelectric material, the piezoelectric layer 442a-6 needs to be arranged on one side of the neutral layer.
A magnitude of the output electrical signal of the piezoelectric material is related to a magnitude of the stress. A distribution position of each layer of material in the thickness direction may affect stress distribution of each layer of material under same vibrational excitation. In some exemplary embodiments, the piezoelectric layer 442a-6 may be distributed on a side of the elastic layer 442a-2. Specifically, the piezoelectric layer 442a-6 is distributed on a position close to an upper surface or a lower surface of the vibration beam 400 in the thickness direction, so that the piezoelectric layer 442a-6 is far away from the neutral layer and the stress of the piezoelectric layer 442a-6 is maximized.
In some exemplary embodiments, the piezoelectric layer 442a-6 may be a piezoelectric polymer thin film obtained according to a semiconductor deposition process (for example, magnetron sputtering or MOCVD). In some exemplary embodiments, a material of the piezoelectric layer 442a-6 may include a piezoelectric crystal material and a piezoelectric ceramics material. The piezoelectric crystal material may be piezoelectric mono-crystal. In some exemplary embodiments, the piezoelectric crystal material may include quartz, sphalerite, boracite, tourmaline, zincite, GaAs, barium titanate and derived crystal thereof, KH2PO4, NaKC4H4O6·4H2O (rochelle salt), or any combination thereof. The piezoelectric ceramics material may be piezoelectric poly-crystal formed through irregular collection of fine grains that are obtained after solid-phase reaction and sintering between powder particles of different materials. In some exemplary embodiments, the piezoelectric ceramics material may include barium titanate (BT), lead zirconate titanate (PZT), lithium lead barium niobate (PBLN), modified lead titanate (PT), aluminum nitride (AlN), zinc oxide (ZnO), or any combination thereof. In some exemplary embodiments, the material of the piezoelectric layer 442a-6 may alternatively be a piezoelectric polymer material, for example, polyvinylidene fluoride (PVDF). In some exemplary embodiments, a thickness of the piezoelectric layer 442a-6 may be greater than 500 nm. In some exemplary embodiments, the thickness of the piezoelectric layer 442a-6 may range from 20 μm to 500 μm, for example, when the vibration sensor 001 is used in a macroscopic device. In some exemplary embodiments, the thickness of the piezoelectric layer 442a-6 may range from 0.5 μm to 1.5 μm, for example, when the vibration sensor 001 is used in an MEMS device.
In some exemplary embodiments, a ratio of the thickness of the elastic layer 442a-2 to the thickness of the piezoelectric layer 442a-6 may be 1-10. In some exemplary embodiments, a ratio of the thickness of the elastic layer 442a-2 to the thickness of the piezoelectric layer 442a-6 may be 2-7.
The bottom electrode layer 442a-4 and the top electrode layer 442a-8 may be respectively distributed on surfaces on both sides of the piezoelectric layer 442a-6. The piezoelectric layer 442a-6 may be disposed between the bottom electrode layer 442a-4 and the top electrode layer 442a-8. The piezoelectric layer 442a-6 may deform with the deformation of the elastic layer 442a-2 under the action of a vibrational excitation from the outside, and generate a voltage under the action of deformation stress. The bottom electrode layer 442a-4 and the top electrode layer 442a-8 may collect the voltage to generate the electrical signal. The bottom electrode layer 442a-4 is positionally aligned with the top electrode layer 442a-8. As described above, the piezoelectric layer 442a-6 is connected to the elastic layer 442a-2, and distributed on a side of the elastic layer 442a-2. The bottom electrode layer 442a-4 may be distributed between the piezoelectric layer 442a-6 and the elastic layer 442a-2, and the top electrode layer 442a-8 may be distributed on a side, away from the elastic layer 442a-2, of the piezoelectric layer 442a-6.
In some exemplary embodiments, the bottom electrode layer 442a-4 and the top electrode layer 442a-8 may be structures of a conductive material. Exemplarily, the conductive material may include a metal, an alloy material, a metal oxide material, graphene, or the like, or any combination thereof. In some exemplary embodiments, the metal and the alloy material may include nickel, iron, lead, platinum, titanium, copper, molybdenum, zinc, or any combination thereof. In some exemplary embodiments, the alloy material may include a copper-zinc alloy, a copper-tin alloy, a copper-nickel-silicon alloy, a copper-chromium alloy, a copper-silver alloy, or any combination thereof. In some exemplary embodiments, the metal oxide material may include RuO2, MnO2, PbO2, NiO, or the like, or any combination thereof.
The bottom electrode layer 442a-4 may include at least one bottom piezoelectric electrode slice. The top electrode layer 442a-8 may include at least one top piezoelectric electrode slice. Each of the at least one bottom piezoelectric electrode slice may be positionally aligned with at least one of the at least one top piezoelectric electrode slice. In some exemplary embodiments, each bottom piezoelectric electrode slice may positionally correspond to one top piezoelectric electrode slice. In some exemplary embodiments, each bottom piezoelectric electrode slice may positionally correspond to a plurality of top piezoelectric electrode slices, for example, 2, 3, 4, or another quantity of top piezoelectric electrode slices. The plurality of top piezoelectric electrode slices may use the bottom piezoelectric electrode slice as a common terminal to form output units connected in series, thereby increasing an output voltage, and improving sensitivity. The plurality of top piezoelectric electrode slices may alternatively form output units connected in parallel with the bottom piezoelectric electrode slice, thereby increasing an output charge, and improving sensitivity. The piezoelectric sensing component 442 may include only output units connected in series, only output units connected in parallel, or both output units connected in series and output units connected in parallel.
In some exemplary embodiments, a thickness of the bottom electrode layer 442a-4 may range from 50 nm to 200 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 100 nm to 150 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 100 nm to 200 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 80 nm to 150 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 150 nm to 200 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 120 nm to 150 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 120 nm to 200 nm. In some exemplary embodiments, the thickness of the bottom electrode layer 442a-4 may range from 150 nm to 200 nm. In some exemplary embodiments, a thickness of the top electrode layer 442a-8 may range from 50 nm to 200 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 100 nm to 150 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 100 nm to 200 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 80 nm to 150 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 150 nm to 200 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 120 nm to 150 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 120 nm to 200 nm. In some exemplary embodiments, the thickness of the top electrode layer 442a-8 may range from 150 nm to 200 nm.
In some exemplary embodiments, the piezoelectric single crystal structure 442a may further include a connection terminal layer 442a-9, which is connected to the bottom electrode layer 442a-4 or the top electrode layer 442a-8, to output the electrical signal to an external processing circuit. The connection terminal layer 442a-9 may or may not be of a same material as the bottom electrode layer 442a-4 and the top electrode layer 442a-8. In some exemplary embodiments, a thickness of the connection terminal layer 442a-9 may range from 100 nm to 200 nm. In some exemplary embodiments, the thickness of the connection terminal layer 442a-9 may range from 150 nm to 200 nm. In some exemplary embodiments, the thickness of the connection terminal layer 442a-9 may range from 100 nm to 150 nm. In some exemplary embodiments, the thickness of the connection terminal layer 442a-9 may range from 120 nm to 200 nm. In some exemplary embodiments, the thickness of the connection terminal layer 442a-9 may range from 160 nm to 200 nm.
In some exemplary embodiments, the piezoelectric sensing component 442 may be the laminated structure composed of the piezoelectric single crystal structure.
The connecting beam 444 may be used to connect piezoelectric sensing components 442. For example, the connecting beam 444 may be located between two piezoelectric sensing components 442 and connect the two piezoelectric sensing components 442. A material of the connecting beam 444 may be Si, SiO2, SiNx, or the like.
As show in
The counterweight 460 may make the movable terminal 440 more easily deformed under the action of an external force, thereby enhancing the electrical signal output by the piezoelectric sensing component 442. In some exemplary embodiments, the electrical signal output by the piezoelectric sensing component 442 may be increased by changing a dimension, a shape, or a position of the counterweight 460. Natural frequency and vibration amplitude of the vibration beam 400 during vibration may be changed by disposing the counterweight 460.
In some exemplary embodiments, a material of the counterweight 460 may be Si, SiO2, SiNx, or the like. A planar shape of the counterweight 460 may be a circle, a triangle, a quadrangle, a polygon, or the like. An example in which the planar shape of the counterweight 460 is a quadrangle is used for description. In some exemplary embodiments, a length of the counterweight 460 may range from 50 μm to 500 μm. In some exemplary embodiments, the length of the counterweight 460 may range from 80 μm to 300 μm. In some exemplary embodiments, a width of the counterweight 460 may range from 50 μm to 500 μm. In some exemplary embodiments, the width of the counterweight 460 may range from 80 μm to 200 μm. In some exemplary embodiments, the width of the counterweight 460 may be greater than, equal to, or less than a width of the vibration beam 400. In some exemplary embodiments, the width of the counterweight 460 may be equal to the width of the vibration beam 400.
Because the counterweight 460 is in rigid connection with the movable terminal 440, deformation, corresponding to a position where the counterweight 460 is disposed, of the movable terminal 440 is relatively small, and a voltage of an available electrical signal is relatively low. However, deformation and stress, at a position close to the counterweight 460, of the movable terminal 440 are relatively large, and the voltage of the available electrical signal is relatively large. Therefore, in some exemplary embodiments, for the vibration sensor 001, a piezoelectric sensing component 442 may be additionally added near the counterweight 460. The additionally added piezoelectric sensing component 442 may be disposed in a circumferential region close to the counterweight 460 and around the counterweight 460.
In some exemplary embodiments, when the vibrational excitation is a mechanical vibrational excitation (for example, when the vibration sensor 001 is used in a bone-conduction microphone), each vibration beam 400 may include a counterweight 460. In some exemplary embodiments, when the vibrational excitation is an air vibrational excitation (for example, when the vibration sensor 001 is used in an air-conduction microphone), each vibration beam 400 may not include a counterweight 460.
As described above, the dimension of the cavity 220 in the first direction 221 may vary along the second direction 222. That is, the dimension of the cavity 220 in the first direction 221 changes as its position in the second direction 222 changes. In other words, the cavity 220 has different dimensions in the first direction 221 when the cavity 220 is at different positions in the second direction 222. The plurality of vibration beams 400 may be sequentially arranged on the base 200 along the second direction 222. The movable terminal 440 of each vibration beam 400 is suspended in the cavity 220. In other words, the plurality of vibration beams 400 can be respectively located at different positions, in the second direction 222, of the cavity 220. Therefore, a portion where the movable terminal 440 of each vibration beam 400 is suspended in the cavity 220 has a different dimension (axial dimension of the vibration beam 400) in the first direction 221. Therefore, each vibration beam 400 has a different natural frequency. The plurality of vibration beams 400 correspond to a plurality of vibration frequencies. Each vibration beam 400 generates, in response to external vibrational excitation, a vibration signal in a sub-target frequency window including a natural frequency corresponding to the vibration beam. The vibration signals generated by different vibration beams 400 correspond to different sub-target frequency windows. A plurality of sub-target frequency windows corresponding to the plurality of vibration beams 400 cover different frequency ranges, and the plurality of sub-target frequency windows constitute a target frequency window. In some exemplary embodiments, the target frequency window may be a consecutive frequency window. The plurality of sub-target frequency windows together can constitute a continuous target frequency window. In some exemplary embodiments, the target frequency window may be any frequency range. The target frequency window may be set based on a usage scenario of the vibration sensor 001. For example, the target frequency window may be different for the vibration sensor 001 used as a microphone and as an acceleration sensor. In some exemplary embodiments, a plurality of natural frequencies corresponding to the plurality of vibration beams 400 may be evenly distributed within the target frequency window. In some exemplary embodiments, the plurality of natural frequencies corresponding to the plurality of vibration beams 400 may not be evenly distributed within the target frequency window.
As mentioned above, the sub-target frequency window may be a frequency window including the natural frequency. In some exemplary embodiments, the sub-target frequency window may be a frequency window set symmetrically with respect to the natural frequency. In some exemplary embodiments, the sub-target frequency window may be a frequency window set asymmetrically with respect to the natural frequency. In some exemplary embodiments, a length range of the sub-target frequency window should be within a preset length range. In some exemplary embodiments, a range covered by the sub-target frequency window may be determined based on an amplitude of a vibration signal corresponding to the sub-target frequency window. For example, the amplitude of the vibration signal in the sub-target frequency window should not be less than a preset proportion of a resonance peak corresponding to the natural frequency. The preset proportion may be any preset proportion, such as 20%, 30%, and 50%. In some exemplary embodiments, the range covered by the sub-target frequency window may be determined based on sensitivity of the vibration signal corresponding to the sub-target frequency window. For example, the sensitivity of the vibration signal in the sub-target frequency window should not be less than a preset threshold.
In some exemplary embodiments, a range of a target frequency window corresponding to the vibration sensor 001 may be determined according to a usage scenario and usage requirements of the vibration sensor 001, so as to determine a quantity of the plurality of vibration beams 400, and a natural frequency and a sub-target frequency window that are corresponding to each vibration beam 400. In some exemplary embodiments, when the vibration sensor 001 is used as a microphone (such as a bone-conduction microphone), the target frequency window may range from 100 Hz to 5000 Hz. In some exemplary embodiments, the target frequency window of the vibration sensor 001 may range from 20 Hz to 5000 Hz. In some exemplary embodiments, there may be two or more vibration beams 400. For example, in some exemplary embodiments, the quantity of the vibration beams 400 may range from 3 to 50. In some exemplary embodiments, the quantity of the vibration beams 400 may range from 10 to 20. In some exemplary embodiments, the quantity of the vibration beams 400 may be determined according to a usage scenario and usage requirements of the vibration sensor 001 and based on a quantity of resonance peaks required by the vibration sensor 001. In a case where only first-order resonance peaks of the vibration beams 400 are used, the quantity of vibration beams 400 is equal to the quantity of resonance peaks. In a case where high-order resonance peaks of the vibration beams 400 are used, the quantity of vibration beams 400 is less than the quantity of resonance peaks. However, a signal strength of a high-order resonance peak is usually much less than that of a first-order resonance peak, so that the first-order resonance peak of the vibration beam 400 is usually used in the vibration sensor 001.
The natural frequency of the vibration beam 400 is determined by characteristics of the vibration beam 400. The natural frequency of the vibration beam 400 is not only related to a material property of the vibration beam 400, but also related to a dimension of the movable terminal 440, suspended in the cavity 200, of the vibration beam 400. As mentioned above, the cavity 220 has different dimensions in the first direction 221 when the cavity 220 is at different positions in the second direction 222. Therefore, each vibration beam 400 may be designed based on a dimension of the cavity 220 in the first direction 221, a position of each vibration beam 400 on the cavity 220, and a dimension of each vibration beam 400, so that a natural frequency of each vibration beam 400 satisfies a preset value. Specifically, the movable terminal 440 of each vibration beam 400 suspended in the cavity 220 satisfies a preset rule by changing the dimension of the cavity 220 in the first direction 221, the position of each vibration beam 400 on the cavity 220, and the dimension of each vibration beam 400, so that the natural frequency of each vibration beam 400 satisfies the preset value. The preset value may be a predetermined natural frequency of each vibration beam 400.
In some exemplary embodiments, overall dimensions of the plurality of vibration beams 400 may be the same. For example, the vibration beams 400 may have a same axial length, a same width, and a same thickness. The movable terminals 440, suspended in the cavity 220, of the plurality of vibration beams 400 may have different dimensions by changing a position of each vibration beam 400 on the cavity 220 and a dimension of the cavity 220 in the first direction 221, so that the plurality of vibration beams 400 have different natural frequencies, and the natural frequencies satisfies the preset value. In this case, there is no need to customize the dimension of each vibration beam 400. A design of the natural frequencies of the plurality of vibration beams 400 may be realized and the natural frequencies satisfies the preset value only by changing the dimension of the cavity 220 and the position of each vibration beam 400 on the cavity 220. This method may reduce a processing difficulty and processing costs, and also improve precision of the vibration sensor 001.
In some exemplary embodiments, the overall dimensions of the plurality of vibration beams 400 may be different. For example, dimensions in at least one direction of the axial length, width, and thickness of the vibration beams 400 may be different. The movable terminals 440, suspended in the cavity 220, of the plurality of vibration beams 400 may have different dimensions by changing a position of each vibration beam 400 on the cavity 220, a dimension of the cavity 220 in the first direction 221, and dimensions of the plurality of vibration beams 400, so that the plurality of vibration beams 400 have different natural frequencies, and the natural frequencies satisfies the preset value.
For ease of description, an example in which the overall dimensions of the plurality of vibration beams 400 are the same is used for description.
For example, an example in which the target frequency window ranges from 20 Hz to 5000 Hz, a quantity of the vibration beams 400 is 10, and natural frequencies of the 10 vibration beams 400 are evenly distributed in the target frequency window is used for description. A frequency band width is required between the natural frequencies of the vibration beams 400 for differentiation, and the frequency band width between the natural frequencies may range from 50 Hz to 400 Hz. In some exemplary embodiments, the frequency band width between the natural frequencies may range from 100 Hz to 200 Hz. In some exemplary embodiments, a gap width between the vibration beams 400 may range from 1 μm to 200 μm. In some exemplary embodiments, the gap width between the vibration beams 400 may range from 10 μm to 100 μm. The gap widths between different vibration beams 400 may or may not be equal.
In some exemplary embodiments, a length of the movable terminal 440, suspended above the cavity 220, of each vibration beam 400 in the first direction 221 may vary linearly or non-linearly. In some exemplary embodiments, the vibration beams 400 may be arranged in sequence on the cavity 220 according to the length of the movable terminal 440, or may be arranged according to another rule. A planar shape of each vibration beam 400 may be a rectangle, a trapezoid, a curve, or the like. In some exemplary embodiments, a cross-sectional width of each vibration beam 400 may range from 50 μm to 300 μm. In some exemplary embodiments, the cross-sectional width of each vibration beam 400 may range from 80 μm to 200 μm. In some exemplary embodiments, an axial length of each vibration beam 400 may range from 100 μm to 1300 μm. In some exemplary embodiments, the axial length of each vibration beam 400 may range from 200 μm to 1200 μm.
As described above, in some exemplary embodiments, the vibration beam 400 may not include a counterweight 460. For example, in an air-conduction microphone, since energy of air vibrational excitation is small, gap widths between adjacent vibration beams 400 may be reduced to increase an output of a vibration signal.
In some exemplary embodiments, the vibration beam 400 may further include a counterweight 460. In this case, each vibration beam 400 may be designed based on a dimension of the cavity 220 in the first direction 221, a position of each vibration beam 400 on the cavity 220, a dimension of each vibration beam 400, and a dimension of the counterweight 460, so that a natural frequency of each vibration beam 400 satisfies a preset value. Specifically, the movable terminal 440 of each vibration beam 400 suspended in the cavity 220 may satisfy a preset rule by changing the dimension of the cavity 220 in the first direction 221, the position of each vibration beam 400 on the cavity 220, the dimension of each vibration beam 400, and the dimension of the counterweight 460, so that the natural frequency of each vibration beam 400 satisfies the preset value.
M is a mass of the vibration beam 400, namely, a mass of a movable terminal 440 and a counterweight 460; and K is an elastic coefficient of the vibration beam 400. As shown in
Different curves shown in
and R denotes a damping of the vibration beam 400. As shown in
When there is a plurality of vibration beams 400 on the base 200, vibration signals generated by the plurality of vibration beams 400 may be coupled and superimposed with each other. If the stiffness and mass of the base 200 are much greater than those of the vibration beam 400, a coupling effect between different vibration beams 400 may be ignored. That is, it may be considered that linear superposition is performed on electrical signals of the vibration signals output by the vibration sensor 001.
In some exemplary embodiments, the deviation of the normalized displacement A of the vibration signals output by different vibration beams 400 may alternatively be not within the preset deviation range on the corresponding natural frequencies. Those skilled in the art should understand that the normalized displacement A of the vibration signals output by different vibration beams 400 being not within the preset deviation range on the corresponding natural frequencies does not affect superposition processing of the vibration signals, which also falls within the protection scope of this disclosure.
This disclosure further provides a microphone. The microphone may include a housing and the vibration sensor 001 provided in this disclosure. The vibration sensor 001 may be mounted in the housing. The housing may be fixedly connected to the base 200. The housing and the base 200 may be integrated, or may be formed separately and fixedly connected in a manner such as welding, riveting, bolting, or bonding. When the housing vibrates under action of an external force (for example, when a person speaks, face vibration drives the housing to vibrate), the vibration of the housing drives the base 200 to vibrate. Because the vibration beam 400 and the housing structure (or the base 200) have different attributes, movement of the vibration beam 400 and movement of the housing structure (or the base 200) fails to keep fully consistent, thereby generating relative movement, and further causing the vibration beam 400 to generate the deformation. The piezoelectric sensing component 442 may convert the deformation into the vibration signal, and output the vibration signal.
In some exemplary embodiments, the microphone may further include a signal synthesizing circuit. The signal synthesizing circuit may be connected to the piezoelectric sensing component 442 of each vibration beam 400 and configured to collect the vibration signal of each piezoelectric sensing component 442 during operation and perform signal synthesis processing, to generate a vibration signal within a target frequency window. The signal synthesis processing may refer to performing linear superposition on a plurality of vibration signals generated by the plurality of vibration beams 400.
As exemplarily description, the microphone described in this disclosure may be applied to various electronic products, such as earphones (for example, bone-conduction earphones or air-conduction earphones, wireless earphones, or wired earphones), smart glasses, a smart wearable device, a smart helmet, a smart watch, or another device that has a voice collection function.
In conclusion, according to the vibration sensor 001 and the microphone provided in this disclosure, a vibration beam 400 is fixed on a base 200 through a fixed terminal 420 at both ends, and a movable terminal 440 of a middle portion is suspended in a cavity 220 and generates deformation in response to external vibrational excitation. According to the vibration sensor 001 and the microphone, portions, suspended in the cavity 220, of a plurality of vibration beams 400 may have different dimensions by changing a structure and a dimension of the cavity 220 and a dimension and a position of each vibration beam 400, so that different vibration beams 400 may have different natural frequencies, and resonance peaks of different frequencies may be generated under vibrational excitation. The plurality of vibration beams 400 may generate a vibration signal with a plurality of different frequency ranges, and the vibration signal with the plurality of different frequency ranges may together constitute a vibration signal with a wide frequency band, making the vibration sensor 001 have a wider frequency response range. In addition, a vibration signal selected by the vibration sensor 001 and the microphone may be a vibration signal within a preset range near the resonance peak, so that sensitivity may be higher. Moreover, in the vibration sensor 001 and the microphone, a dimension of the cavity 220 of the base 200 may be designed to realize multi-resonance peaks and a wide frequency band. The structure may be simple, processing difficulty may be low, processing costs may be low, and a more accurate collection result of the vibration signal may be obtained. In addition, based on the vibration signal collected by the vibration sensor 001 and the microphone 002 provided in this disclosure, in subsequent processing of the vibration signal, a displacement signal output at different frequencies with a steep cut-off edge may be extracted from the vibration signal shown in
The above describes specific embodiments of this disclosure. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps described in the claims may be performed in an order different from that in the embodiments and a desired result can still be achieved. In addition, the processes described in the accompanying drawings are not necessarily required to achieve a desired result in a specific order or a continuous order shown. In some implementations, multiple-task processing and parallel processing are also possible or may be advantageous.
In conclusion, after reading this detailed disclosure, those skilled in the art may understand that the foregoing detailed disclosure may be presented by way of example only, and may not be restrictive. Although it is not explicitly stated herein, those skilled in the art may understand that this disclosure needs to cover various reasonable changes, improvements, and modifications of the embodiments. These changes, improvements, and modifications are intended to be proposed in this disclosure, and are within the spirit and scope of the exemplary embodiments of this disclosure.
In addition, some terms in this disclosure have been used to describe the embodiments of this disclosure. For example, “one embodiment”, “an embodiment”, and/or “some embodiments” mean that specific features, structures, or characteristics described in combination with the embodiments may be included in at least one embodiment of this disclosure. Therefore, it may be emphasized and should be understood that two or more references to “embodiments”, “an embodiment”, or “an alternative embodiment” in various parts of this disclosure do not necessarily all refer to the same embodiment. In addition, specific features, structures, or characteristics may be appropriately combined in one or more embodiments of this disclosure.
It should be understood that in the foregoing description of the embodiments of this disclosure, to facilitate understanding of a feature, for the purpose of simplifying this disclosure, various features may be combined in a single embodiment, an accompanying drawing, or description thereof in this disclosure. However, this does not indicate that the combination of these features is necessary. It is entirely possible for those skilled in the art to extract some of these features as a separate embodiment for understanding when reading this disclosure. In other words, the embodiments in this disclosure may also be understood as integration of a plurality of secondary embodiments. The same is also true when content of each secondary embodiment contains features less than all the features of a separate embodiment disclosed above.
Each patent, patent application, publication of a patent application, and another material referenced in this disclosure, such as an article, a book, a disclosure, a print, a document, or an object, may be incorporated herein by reference. All content used for all purposes, except for any related litigation document history, history of any identical litigation document inconsistent with or in conflict with this document, or history of any identical litigation document that may have a restrictive effect on the widest scope of the claims may be associated with this document at present or in the future. For example, if there is any inconsistency or conflict between description, definition, and/or use of terms related to any material contained in this document and description, definition, and/or use of terms related to this document, the terms in this document prevail.
Finally, it should be understood that an implementation of the application disclosed in this document is used to describe a principle of an implementation of this disclosure. Other modified embodiments also fall within the scope of this disclosure. Therefore, the embodiments disclosed in this disclosure are only examples but not limitations. Those skilled in the art may implement the application in this disclosure by using an alternative configuration of the embodiments in this disclosure. Therefore, the embodiments of this disclosure are not limited to the embodiments described accurately in this application.
This application is a continuation application of PCT application No. PCT/CN2022/094006, filed on May 20, 2022, and the content of which is incorporated herein by reference in its entirety.
Number | Date | Country | |
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Parent | PCT/CN2022/094006 | May 2022 | WO |
Child | 18639803 | US |