BRIEF DESCRIPTION OF THE DRAWINGS
Exemplary embodiments of the present invention will be understood in more detail from the following descriptions taken in conjunction with the attached drawings in which;
FIGS. 1A through 2 illustrate examples of a conventional bipolar junction transistor (BJT) device implemented by a complementary metal-oxide semiconductor (CMOS) process.
FIG. 3 is a cross-sectional view of a vertical NPN BJT implemented by a deep N-well CMOS process, according to an exemplary embodiment of the present invention;
FIG. 4 is a cross-sectional view of a vertical NPN BJT implemented by a deep N-well CMOS process, according to an exemplary embodiment of the present invention;
FIG. 5 is a diagram of a bandgap voltage reference circuit according to an exemplary embodiment of the present invention;
FIG. 6 is a diagram of a bandgap voltage reference circuit according to an exemplary embodiment of the present invention; and
FIG. 7 is a diagram of a current reference circuit according to an exemplary embodiment of the present invention.