Patent Application
20160011374
The present invention pertains to the fields of electrical engineering/electronics and communication technology and relates to a waveguide resonator component which can be used, for example, in integrated circuits and in data processing and transfer or as a sensor, and to a method for the production of this type of waveguide resonator component.
In optical circuits, signals can be transported in the form of light at different frequencies via light conductors, referred to as waveguides. Here, waveguides are coupled, for example, to resonators, in order to filter out certain discrete signals, frequencies or frequency ranges from the waveguides, for instance. In a very general sense, these filters have the task of limiting and/or transforming a wide spectrum of frequencies present at their inlet and supplying them at their outlet. By coupling a second waveguide to the resonator, the frequencies filtered out of the first waveguide can be diverted to the second waveguide. Thus, with the aid of the resonator, signals are removed from the first waveguide in a targeted manner and transmitted into the second waveguide (drop filter). As a result of the coupling of a second waveguide to the resonator, it is also possible to add additional signals from the second waveguide to the signals already present in the first waveguide (add-drop filter). The role of the waveguides is thereby interchangeable.
One important quality criterion of a filter is how effectively a desired frequency range (width of the resonance) can be transmitted exclusively. It is also important that a filter is available which, in the most accurate manner possible, blocks only those frequencies which lie outside the desired range and which allows the frequencies within the desired range to pass virtually unhindered, that is, losslessly.
A frequently used physical principle for implementing filters involves the utilization of a resonant frequency; accordingly, these types of filters are called resonant filters. These filters use, for example, ring resonators or microsphere resonators, which can also be used as sensors.
What are referred to as ring resonant filters or ring resonators are used for the requirement of mass production. The structures of ring resonant filters of this type are thereby produced from silicon wafers (SIO—silicon on insulator) by means of etching, for example. This etching can occur in a wet-chemical process or using dry-etching methods (reactive ion etching). With suitable etching processes, waveguides and ring resonators can also lie on different planes, or by the etching of multiple individual wafers that are placed on top of one another and, with respect to the resonators and waveguides, precisely positioned relative to one another and permanently connected to one another.
From DE 100 25 307 A1, an optical grid-assisted add/drop filter is known which comprises a structure of a directional coupler filter having at least two waveguides extending in a closely adjacent manner with different refractive indices. Here, the material of the two waveguides is formed from two different material classes with different optical parameters, wherein different properties of the two materials differ such that different effects occur when they are acted on by the same technical means, and wherein means are provided for altering the optical parameters.
From US 2003 118 270 A1, an optical waveguide coupler is known in which a waveguide is directly coupled to a microsphere resonator under resonance conditions or under non-resonance conditions.
Also, from US 2006 239 614 A1, an optical microresonator coupled to waveguides is known which is composed of a plurality of microcylinders coupled to one another, and each microcylinder contains one resonant waveguide.
From US 2005 013 529 A1, a microring resonator and a method for the manufacture of such a resonator are known. A plurality of microring resonators are produced in that precursor resonator structures are brought into a specific position relative to waveguides and transformed into resonators.
Furthermore, according to M. Pollinger et al.: Optics Express Vol. 18, (2010) 17764, bottle-like microresonators are known which utilize the Kerr effect, in which two conical waveguides are coupled with the bottle-like microresonator.
Additionally, according to S. Böttner et al.: Optics Letters, Vol. 37, (2012) 5136, rolled microstructures are known for the frequency-selective coupling of two layer stacks on one chip.
Disadvantageous according to the prior art is the costly and time-intensive production of the microresonators, in particular for vertically aligned microresonators, as well as their not yet adequately controllable coupling to waveguides.
The object of the invention is to provide a waveguide resonator component in which the coupling of the resonator to waveguides can be suitably controlled, as well as to specify a method with which these waveguide resonator components can be produced in a simple and cost-effective manner.
The object is attained by the invention disclosed in the claims. Advantageous embodiments are the subject matter of the dependent claims.
In the waveguide resonator component according to the invention, at least one substrate comprises at least two waveguides, or at least two substrates comprise at least one waveguide each, and at least one microtube is present as a resonator, which microtube comprises, directly or via one or multiple layers, a partial materially-bonded contact with the substrate(s), wherein the material and/or the dimensions and/or the media in and around the resonator achieve a resonant frequency upon excitation, and wherein the resonator comprises, at least in the region of each waveguide, a recess in order to form an intermediate space between the waveguide and the resonator, via which space the coupling of light between the waveguides and the resonator is achieved.
Advantageously, the microtube is composed of oxides such as SiO2, SiO, TiO2, Al2O3, HfO2, Y2O3, ZrO2), of semiconductors such as Si, or of III-V and II-VI compound semiconductors such as GaAs, InGaAs, ALInGaAs, AlGaAs, or of combinations thereof.
Likewise advantageously, the waveguides are optical waveguides with wavelengths in the IR range, in the range of visible light, in the UV range.
Also advantageously, the substrate or substrates is/are composed of silicon (Si), glass, silicon nitride, silicon on insulator material (SOI), plastics or semiconductors such as GaAs.
And also advantageously, the waveguides are composed of silicon (Si), glass, silicon nitride, silicon on insulator material (SOI), plastics or semiconductors such as GaAs.
It is also advantageous if the resonator is a rolled-up microtube.
It is likewise advantageous if the microtubes comprise at their ends respective regions which have a larger total diameter than in the regions of the tube in the region of the waveguide(s), and if the regions with the larger total diameter achieve the materially-bonded contact with the substrate(s).
It is furthermore advantageous if the recess in the microtube has in the region of the waveguide(s) a smaller dimension to the waveguide and/or partially has a concave, curved, jagged or undulated shape.
And it is also advantageous if the dimensions of the intermediate space between the waveguide and the resonator are less than half of the diameter of the microtube.
It is also advantageous if the intermediate space between the waveguide and the resonator and/or the interior space of the microtube is filled with air and/or a liquid.
In the method according the invention for the production of a waveguide resonator component, at least two waveguides are positioned on at least one substrate, or at least one waveguide each is positioned on at least two substrates; at least one first layer is subsequently applied as a sacrificial layer to a substrate with one or multiple waveguides, and at least one second layer is applied thereto; the sacrificial layer is then at least partially removed; and by means of the rolling-up of the at least second layer, the resonator produced is, in the shape of a microtube, brought into materially-bonded contact with the at least second substrate in the case of multiple substrates.
Advantageously, photoresists or a layer of germanium are applied as a sacrificial layer.
Also advantageously, a layer of SiO2, SiO, TiO2, Al2O3, HfO2, Y2O3, ZrO2, of semiconductors such as Si, or of III-V and II-VI compound semiconductors such as GaAs, InGaAs, AlInGaAs, AlGaAs, or of combinations thereof, is applied as an at least second layer.
Likewise advantageously, the sacrificial layer is structured.
And also advantageously, the sacrificial layer is partially removed by means of etching.
It is also advantageous if the second and/or all other layers are structured.
And it is also advantageous if the second and all other layers are applied in a structured manner in the region of the waveguides to produce a recess in order to form an intermediate space between the waveguide and the rolled-up layer.
As a result of the invention, it is possible for the first time to provide a wavelength resonator component that allows integrated production with a vertical resonator geometry and in which the coupling of the resonator to waveguides can be suitably controlled, as well as to specify a method with which these waveguide resonator components can be produced in a simple and cost-effective manner.
This is achieved by a waveguide resonator component which comprises either one substrate with at least two waveguides or at least two substrates with at least one waveguide each. For this purpose, a resonator is arranged which, according to the invention, has the shape of a microtube. The tube is thereby connected, directly or via one or multiple layers, in an only partially materially-bonded manner to the substrate(s). If at least two substrates are present, the tube is located between the substrates. The resonant frequency of the resonator during excitation is defined through the material and/or the dimensions and/or the media in and around the resonator.
Therefore, the material and/or the dimensions and/or the media in and around the resonator must be determined depending on the desired signal change (filtering out of frequencies or adding of frequencies) prior to the production of the component, and the microtube must be manufactured accordingly. A subsequent modification of the resonant frequency is possible by changing the media in and around the resonator. The resonant frequency changes, for example, when a liquid or gas flows through the tube.
This function of the microtube in the waveguide resonator component according to the invention can be used as a sensor in order to detect materials in the medium of the microtube.
According to the invention, the tube comprises in the region of each waveguide one recess which results in the formation of an intermediate space between the waveguide and the resonator. This intermediate space can be freely selected with regard to its geometric shape, wherein the size of the space is determined by the dimensions of the microtube on the one hand and, on the other hand, in that the resonance coupling of the waveguide to the resonator is achieved in this manner. Care must be taken that the spatial distance between the waveguide and the resonator is not so great that a resonance coupling no longer occurs.
This can be advantageously achieved by the shape of the recess, which can be concave, curved, jagged or undulated, for example.
Likewise advantageously, the microtube is a rolled-up microtube.
According to the invention, the waveguide resonator component is produced in that at least two waveguides are positioned on at least one substrate, or at least one waveguide each is positioned on at least two substrates.
A first layer is subsequently applied as a sacrificial layer to the one substrate with at least two waveguides or to one of the at least two substrates with at least one waveguide. Advantageously, this sacrificial layer is structured. The shape of the structuring in the region of the waveguides can already determine the shape of the recess.
At least one second layer is applied to the sacrificial layer and advantageously also partially to the substrate. Both the first and also the at least second layer are thereby advantageously only applied in the region of the rolling-up of the layer. However, they can also be applied over the entire substrate or larger regions of the substrate, though in this case the first and the at least second layer must be removed, at least around the regions of the rolling-up of the at least second layer, prior to the rolling-up.
The at least second or each additional layer can also be structured during the application or partial removal.
The thickness of the sacrificial layer, as well as the dimensions of the at least second layer for the production of a recess thereby determine the dimensions of the recess of the tube over the waveguide(s).
Subsequently, or already before the application of the at least second layer, the sacrificial layer, for example the non-exposed parts of a photoresist layer, is at least partially removed.
If the sacrificial layer is partially removed prior to the application of the at least second layer, then it must be preserved at least in the region of the rolling-up.
In any case, the sacrificial layer must be at least partially preserved in the region next to and on the waveguide(s) until the application of the at least second layer.
As a sacrificial layer, individual or multiple layers, also made of different materials, can be applied on top of or next to one another.
The at least second layer can also comprise one or multiple layers and also be composed of different materials arranged on top of or next to one another.
After the application of the at least second layer, the sacrificial layer is partially or completely removed. In a partial removal, the remaining sacrificial layer achieves the adhesion between the rolled-up microtube and the substrate. In the case of a complete removal of the sacrificial layer, the at least second layer must comprise a direct materially-bonded contact to the substrate during the application, so that after the complete removal of the sacrificial layer, the rolled-up microtube adheres to the substrate in a stationary manner in the desired position via the at least second layer.
With this step, it is also possible to remove unnecessary regions of the at least second layer (without any rolling-up).
As a result of the removal of the sacrificial layer, the at least second layer rolls up independently and is then connected, directly or via the remaining parts of the sacrificial layer, to the substrate in a materially-bonded manner over or preferably next to the waveguides. If multiple substrates are to be present, a second substrate is, for example, brought into materially-bonded contact with the rolled-up layer across from the first substrate after the at least second layer is rolled up.
The special advantage of the solution according to the invention is the vertical geometry of the resonator, allowing light waves to be transported between different planes.
It is also particularly advantageous that, according to the invention, a combination of an integrated production, a vertical resonator and a controllable coupling is achieved.
The invention is explained below in greater detail with the aid of several exemplary embodiments. Wherein:
As substrates, two waveguide substrates with the dimensions 5 mm×5 mm are used. These are respectively composed of two silicon layers separated by a silicon dioxide layer (silicon on insulator (SOI)). By means of etching steps, waveguides of silicon with a width of 1 μm, a length of 5 mm, and a height of 250 nm are produced in a silicon layer. One waveguide each is located at the center of a substrate and extends over the entire length of the substrate.
A sacrificial layer of photoresist (AZ 701 MiR) with a thickness of 0.8 μm is applied to one of these substrates across the entire substrate surface. This photoresist layer is structured such that a U-shaped photoresist structure with the outer dimensions 200 μm×200 μm is produced which is centrally arranged on the waveguide along the axis of symmetry of the structure. As a second layer, TiO2 with a thickness of 90 nm is applied by means of electron beam evaporation, so that the U-shaped photoresist structure is completely covered and so that at the two upper ends of the U, the TiO2 layer is applied to the substrate an additional 1 μm past the photoresist structure. The TiO2 layer is then rolled-up parallel to the waveguide by means of a complete disintegration (etching) of the sacrificial layer. The tube then only comprises a materially-bonded contact to the substrate at the two ends.
The tube now has the dimensions 200 μm×20 μm and comprises at the center a recess with the dimensions 50 μm×90 nm.
This arrangement is subsequently connected to the second substrate, wherein the waveguides of the second substrate face downwards, run parallel to the waveguides of the first substrate, and are also centrally aligned with the tube.
Two waveguides of silicon arranged at a distance of 25 μm are produced next to one another on a substrate according to Example 1.
A photoresist layer and a TiO2 layer are applied according to Example 1, wherein an E-shaped structure now in place of a U-shaped structure. The center bar of the E-shaped structure is embodied shorter and arranged over the two waveguides. There is thus no materially-bonded contact of the subsequently rolled-up tube with the waveguides and the substrate. The structuring, removal and rolling-up of the layers occurs according to Example 1.
The microtube obtained after the rolling-up has the dimensions 200 μm×20 μm and shows two recesses with the dimensions 10 μm×180 nm outside the waveguides and one recess with the dimensions 30 μm×90 nm (due to the shorter middle bar of the E-shaped structure) over the waveguides.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10 2013 204 606.5 | Mar 2013 | DE | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/EP2014/055006 | 3/13/2014 | WO | 00 |
