1. Field of the Invention
This invention relates to an X-ray generating method and an X-ray generating apparatus.
2. Description of the background art
In order to generate high intensity X-ray, it is required to irradiate high density electron beam onto a target. It is difficult, however, to generate a minute focal point onto the target from the high density electron beam because of the large repulsive forces of the electrons of the high density electron beam. In order to mitigate such a problem as not generating the minute focal point, it is proposed to enhance the accelerating voltage of the electrons, but in this case, the electrons are introduced deeply into the target so that the X-ray generated from the deep portions of the target is absorbed into the target and thus, the generating efficiency of the intended X-ray is lowered. When the accelerating voltage is enhanced, the cost of the X-ray generating apparatus may be increased because the X-ray generating apparatus must be insulated entirely.
It is an object of the present invention to provide a new X-ray generating method and apparatus whereby high intensity X-ray can be generated in high efficiency.
In order to achieve the object, this invention relates to a method for generating an X-ray, comprising the steps of:
flattening an electron beam with a circular cross section to form a flat electron beam with a flat cross section, and
irradiating the flat electron beam onto a target, thereby generating an X-ray.
This invention also relates to an apparatus for generating an X-ray, comprising:
a flat electron beam-generating means for flattening an electron beam with a circular cross section to form a flat electron beam with a flat cross section, and
a target for generating an X-ray by irradiating the flat electron beam thereon.
In the present invention, the flat electron beam with the flat cross section is irradiated onto the target, thereby generating the X-ray. Since the flat electron beam is configured such that the cross section of a normal electron beam with a normal circular cross section is flattened against the space charge of the electron beam, the cross section of the flat electron beam can be flattened and narrowed sufficiently even though the electron beam has a sufficient large energy. According to the present invention, therefore, the electron beam with small cross section and high energy density can be generated due to the flat electron beam. As a result, the intended high energy density electron beam can be irradiated onto the target, thereby generating the high intensity X-ray.
The flat electron beam can be generated, for example, by employing a pair of magnets which are opposite to one another such that a uniform magnetic field can be generated and passing the electron beam through the uniform magnetic field such that the electron beam can be at an angle except 90 degrees for the outlet, that is, the end surface of the space end of the pair of magnets.
The flat electron beam can be also generated, for example, by employing a pair of mixed type magnets and passing the electron beam through the mixed type magnets. The mixed type magnets can be made by separate magnets which are obtained by cutting symmetrically a rotational symmetric magnet by four. In this case, a pair of separate magnets opposing to one another are arranged such that the curved surfaces of the separate magnets are opposed one another.
As described above, according to the present invention can be provided the new X-ray generating method and apparatus whereby the high intensity X-ray can be generated in high efficiency.
For better understanding of the present invention, reference is made to the attached drawings, wherein
This invention will be described in detail with reference to the accompanying drawings.
The electron beam emitted from the electron gun 11 is controlled such that the traveling direction of the electron beam is directed at the deflecting magnet 13 by the electromagnet 12. Then, the electron beam is passed through the deflecting magnet 13, so that the cross section of the electron beam is varied to flat shape from circular shape on the function as will be described below. The resultant flat electron beam is irradiated onto the inner side of the side wall 14A of the rotational target 14. In this case, a given X-ray is generated from the irradiating point of the rotational target 14, and taken out of an X-ray transparent window 16. The X-ray transparent window 16 may be made of Be foil.
Since the flat electron beam can be obtained by flattening the electron beam with circular cross section against the space charge of the electron beam, the flat electron beam can be flattened sufficiently and narrowed in cross section even though the flat electron beam has large energy. Therefore, the intended electron beam with minute cross section and high energy density can be obtained easily as the flat electron beam. As a result, when the flat electron beam is irradiated onto the rotational target 14, the intended X-ray with high intensity can be generated.
In this case, the electron beam is introduced between the fan-shaped magnets 131 and 132, and forced by the Lorentz forces directing at the rotational centers 01 and 02 because the deflecting magnet is designed such that the incident electron beams can have the rotational centers 01 and 02. As a result, the electron beam is passed through the fan-shaped magnets 131 and 132 along the fan-shaped side surfaces of the magnets 131 and 132.
On the other hand, as illustrated in
In the upper side (Y>0) of the symmetry plane between the fan-shaped magnets 131 and 132, since the magnetic field B is directed outward, the magnetic field component Bh becomes more than zero (>0). In the lower side (Y<0) of the symmetry plane, since the magnetic field component Bh becomes less than zero (<0). Therefore, if the velocity of the electrons of the electron beam is set to v, some electrons passing through the upper side of the symmetry plane are forced downward by the Lorentz forces originated from the magnetic field component Bh, and the other electrons passing through the lower side of the symmetry plane are forced upward by the Lorentz forces originated from the magnetic field component Bh. As a result, the electrons converges toward the symmetric plane, and thus, as illustrated in
In this case, the magnetic field is expanded outward from the end surface of the space formed by the magnets 133 and 134 along the X-axis as illustrated in
Since the flat electron beam has large energy density, the flat electron beam can heat the irradiating portions of the electron beam in the rotational target 14 up to a temperature near or more than the melting point of the target 14, thereby partially melting the target 14 when the flat electron beam is irradiated onto the target 14. As a result, the intended X-ray with high intensity can be generated high efficiency.
In the embodiment relating to
Although the present invention was described in detail with reference to the above examples, this invention is not limited to the above disclosure and every kind of variation and modification may be made without departing from the scope of the present invention.
In the above embodiment, although the rotational target is employed, another type of target may be employed. Moreover, although the fan-shaped magnet and mixed type magnet are exemplified as the flat electron beam-generating means, another type of magnet may be employed only if the object of the present invention can be realized.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2004-241301 | Aug 2004 | JP | national |