Patent Application
20210305003
An aspect of the present disclosure relates to an X-ray generation apparatus.
Japanese Unexamined Patent Publication No. 2009-193789 discloses an X-ray generation apparatus that generates X-rays by an electron beam emitted from a cathode being incident on a target. The position of the target is fixed in this X-ray generation apparatus.
In the X-ray generation apparatus as described above, the electron beam is continuously incident on a part of the target, and thus the part is easily damaged and the incident amount of the electron beam is incident is limited. It is conceivable to rotate the target and cause the electron beam to be incident on the rotating target. In this case, it is possible to avoid the electron beam being locally incident on the target and it is possible to increase the incident amount of the electron beam.
However, an increase in the incident amount of the electron beam leads to more reflected electrons reflected without being absorbed by the target. Accordingly, the temperature of a wall portion may rise by reflected electrons being incident on the wall portion disposed so as to face the target. Particularly in a case where a coil for controlling an electron beam is disposed near the wall portion, the coil itself also generates heat by energization, and thus the heat of the coil and the heat of the wall portion may be combined to cause an increase in temperature around the coil. In this case, a defect may arise such as a decline in the controllability of the electron beam by the coil and damage to a peripheral member.
An object of an aspect of the present disclosure is to provide an X-ray generation apparatus capable of suppressing the occurrence of a defect due to heat generation by reflected electrons.
An X-ray generation apparatus according to an aspect of the present invention includes an electron gun configured to emit an electron beam, a rotary anode unit having a target generating an X-ray by receiving the electron beam and configured to rotate the target, a magnetic lens having a coil configured to generate a magnetic force acting on the electron beam between the electron gun and the target, and a wall portion disposed between the target and the coil so as to face the target. The wall portion is provided with an electron passage hole through which the electron beam passes and a flow path configured to allow a coolant to flow.
In the X-ray generation apparatus, the rotary anode unit is configured to rotate the target. Thus, the electron beam can be incident on the rotating target and it is possible to avoid the electron beam being locally incident on the target. As a result, it is possible to increase the incident amount of the electron beam. In addition, the flow path configured such that the coolant flows as well as the electron passage hole through which the electron beam passes is formed in the wall portion disposed between the target and the coil and facing the target. Thus, the wall portion and the magnetic lens can be cooled by letting the coolant flow through the flow path. Accordingly, it is possible to suppress an increase in the temperature of the wall portion and the magnetic lens even in a case where the incident amount of the electron beam to the target increases and the reflected electrons from the target increase. As a result, with the X-ray generation apparatus, it is possible to suppress the occurrence of a defect due to heat generation by reflected electrons.
The flow path may extend so as to be positioned on both sides of the electron passage hole in a second direction perpendicular to a first direction when viewed from the first direction in which the electron beam passes through the electron passage hole. In this case, it is possible to effectively cool the periphery of the electron passage hole where a large amount of reflected electrons are incident.
The flow path may include at least one curved part extending along a circumferential direction of a circle about the electron passage hole when viewed from a first direction in which the electron beam passes through the electron passage hole. In this case, it is possible to effectively cool the periphery of the electron passage hole.
The at least one curved part may include a plurality of curved parts and the plurality of curved parts may be arranged along a third direction perpendicular to the first direction. In this case, it is possible to effectively cool the periphery of the electron passage hole.
The flow path may include a first part and a second part connected to the first part and positioned on a side opposite to the electron passage hole with respect to the first part. The X-ray generation apparatus may be configured such that the coolant flows from the first part to the second part. In this case, since the flow path includes the first part and the second part, it is possible to lengthen the flow path of the coolant and it is possible to effectively cool the wall portion and the magnetic lens. In addition, the periphery of the electron passage hole can be effectively cooled since the coolant flows first to the first part near the electron passage hole.
The wall portion may be formed with an X-ray passage hole through which an X-ray emitted from the target passes. A center of a region where the flow path is formed in the wall portion may be positioned on a side opposite to the X-ray passage hole with respect to the electron passage hole in a case where the center is viewed from a first direction in which the electron beam passes through the electron passage hole. In this case, the degree of freedom for design can be improved in relation to the X-ray passage hole.
The wall portion may include a first wall disposed between the target and the coil so as to face the target and a second wall extending from the first wall along a first direction in which the electron beam passes through the electron passage hole. The second wall may be formed with an X-ray passage hole through which an X-ray emitted from the target passes. The electron passage hole and the flow path may be formed in the first wall. In this case, the degree of freedom for design can be improved in relation to the X-ray passage hole.
A groove may be formed in a surface of the wall portion and the flow path may be defined by the groove being blocked by a housing of the magnetic lens. In this case, the magnetic lens can be effectively cooled. In addition, the manufacturing process can be simplified as compared with a case where the flow path is formed in the wall portion.
The wall portion may constitute a housing of the rotary anode unit. In this case, cooling can be performed by means of the housing of the rotary anode unit.
According to an aspect of the present disclosure, it is possible to provide an X-ray generation apparatus capable of suppressing the occurrence of a defect due to heat generation by reflected electrons.
Hereinafter, an embodiment of the present disclosure will be described in detail with reference to the drawings. In the following description, the same or corresponding elements will be denoted by the same reference signs without redundant description.
As illustrated in
The magnetic lens 4 controls the electron beam EB. The magnetic lens 4 has one or a plurality of coils 4a and a housing 4b accommodating the coils 4a. Each coil 4a is disposed so as to surround a passage 8 through which the electron beam EB passes. Each coil 4a is an electromagnetic coil that generates a magnetic force acting on the electron beam EB between the electron gun 2 and the target 31 by energization. The one or plurality of coils 4a include, for example, a focusing coil that focuses the electron beam EB on the target 31. The one or plurality of coils 4a may include a deflection coil that deflects the electron beam EB. The focusing coil and the deflection coil may be arranged along the passage 8.
The exhaust unit 5 has an exhaust pipe 5a and a vacuum pump 5b. The exhaust pipe 5a is provided in the housing 6 and connected to the vacuum pump 5b. The vacuum pump 5b vacuumizes an internal space S1 defined by the housing 6 via the exhaust pipe 5a. The housing 6 defines the internal space S1 together with the housing 4b of the magnetic lens 4 and maintains the internal space S1 in a vacuumized state. An internal space S2 defined by the housing 36 of the rotary anode unit 3 as well as the passage 8 is vacuumized as a result of the vacuumization by the vacuum pump 5b. The vacuum pump 5b may not be provided in a case where the housing 6 is airtightly sealed in a state where the internal spaces S1 and S2 and the passage 8 are vacuumized.
In the X-ray generation apparatus 1, a voltage is applied to the electron gun 2 in a state where the internal spaces S1 and S2 and the passage 8 are vacuumized and the electron beam EB is emitted from the electron gun 2. The electron beam EB is focused so as to have a desired focus on the target 31 by the magnetic lens 4 and is incident on the target 31 that is rotating. When the electron beam EB is incident on the target 31, the X-ray XR is generated at the target 31 and the X-ray XR is emitted to the outside from the X-ray passage hole 53a.
As illustrated in
The target 31 is formed in an annular plate shape and constitutes an annular electron incident surface 31a. The target support body 32 is formed in a circular flat plate shape. The target 31 has the electron incident surface 31a on which the electron beam EB is incident, a back surface 31b on a side opposite to the electron incident surface 31a, and an inside surface 31c and an outside surface 31d connected to the electron incident surface 31a and the back surface 31b. The electron incident surface 31a and the back surface 31b face each other so as to be parallel to each other. The target support body 32 has a surface (first surface) 32a extending substantially perpendicularly to the rotation axis A, a back surface (second surface) 32b on a side opposite to the surface 32a, and a side surface 32c connected to the surface 32a and the back surface 32b. The surface 32a and the back surface 32b face each other so as to be parallel to each other. A plurality of members may constitute the target 31 although a single member constitutes the target 31 in this example.
A first metal material constituting the target 31 is, for example, a heavy metal such as tungsten, silver, rhodium, molybdenum, or an alloy thereof. A second metal material constituting the target support body 32 is, for example, copper, a copper alloy, or the like. The first metal material and the second metal material are selected such that the thermal conductivity of the second metal material is higher than the thermal conductivity of the first metal material.
The target support body 32 has an outer part 41 to which the target 31 is fixed and an inner part 42 including the rotation axis A (the rotation axis A passes through the inner part 42). The inner part 42 is formed in a circular shape. The outer part 41 is formed in an annular shape and surrounds the inner part 42. A first recessed portion 43 is formed in the surface 32a at the outer part 41. The first recessed portion 43 has an annular recess structure corresponding to the target 31. The first recessed portion 43 extends such that the outside of the first recessed portion 43 is opened along the outer edge of the target support body 32 and is exposed on the side surface 32c.
The surface 32a at the inner part 42 is a continuous flat surface having a circular shape and extending substantially perpendicularly to the rotation axis A. For example, the surface 32a extends perpendicularly to the rotation axis A. “Continuous flat surface” means that, for example, the entire surface is positioned on one plane without a hole, a recessed portion, a projection, or the like being formed. As will be described later, the electron incident surface 31a and the surface 32a are simultaneously polished in the process of manufacturing the rotary anode unit 3, and thus the surface 32a may be a continuous flat surface particularly in a second region R2 (described later) where a second recessed portion 44 serving as the main portion of the surface 32a is formed. The outer edge part outside the second region R2 may be provided with, for example, a balance adjustment hole 42b (described later).
The target 31 is disposed so as to fit in the first recessed portion 43. The entire electron incident surface 31a of the target 31 is positioned on the same plane as the surface 32a of the target support body 32. In this example, the electron incident surface 31a is gaplessly continuous with the surface 32a. In the process of manufacturing the rotary anode unit 3, the electron incident surface 31a and the surface 32a are simultaneously polished after the target 31 is disposed in the first recessed portion 43. As a result, the electron incident surface 31a and the surface 32a are positioned on the same plane. However, there may be a slight height difference between the electron incident surface 31a and the surface 32a due to, for example, the hardness difference between the first metal material constituting the target 31 and the second metal material constituting the target support body 32. For example, in a case where the thickness of the target 31 is approximately several millimeters and the hardness of the first metal material is higher than the hardness of the second metal material, the electron incident surface 31a may protrude by, for example, approximately tens of micrometers with respect to the surface 32a. The meaning of “the electron incident surface 31a and the surface 32a are positioned on the same plane” includes a case where the electron incident surface 31a can be regarded as being positioned substantially on the same plane as the surface 32a although there is such a slight height difference.
The entire back surface 31b of the target 31 is in contact with a bottom surface 43a of the first recessed portion 43. The entire inside surface 31c of the target 31 is in contact with a side surface 43b of the first recessed portion 43. Although the entire back surface 31b of the target 31 and the entire inside surface 31c of the target 31 may be in surface contact with the first recessed portion 43 from the viewpoint of the heat dissipation of the target 31, the back surface 31b and the inside surface 31c may be in contact with the first recessed portion 43 at least in part. The outside surface 31d of the target 31 is positioned on the same plane as the side surface 32c of the target support body 32. The outside surface 31d of the target 31 may protrude from the side surface 32c or be recessed without being positioned on the same plane as the side surface 32c of the target support body 32. Assuming that the thickness (maximum thickness) of the target 31 is t, a contact width W between the bottom surface 43a of the first recessed portion 43 and the target 31 is 2t or more and 8t or less. The flatness and parallelism of the electron incident surface 31a are 15 μm or less.
A surface roughness Ra of the entire electron incident surface 31a of the target 31 is 0.5 μm or less. In other words, the electron incident surface 31a is polished such that the surface roughness Ra is 0.5 μm or less. Accordingly, the surface roughness Ra of the surface 32a is also 0.5 μm or less. The surface roughnesses Ra of both the back surface 31b of the target 31 (surface coming into contact with the bottom surface 43a of the first recessed portion 43) and the bottom surface 43a of the first recessed portion 43 are 0.8 μm or less. The sum of the surface roughness Ra of the back surface 31b and the surface roughness Ra of the bottom surface 43a is 1.6 μm or less. In other words, the back surface 31b and the bottom surface 43a are polished such that the surface roughness Ra is 0.8 μm or less. The surface roughness Ra is an arithmetic average roughness specified by the Japanese Industrial Standards (JIS B 0601).
The second recessed portion 44 is formed in the back surface 32b at the inner part 42. The second recessed portion 44 defines, together with the shaft 33 and the flow path forming member 34, a flow path 45 for allowing a coolant CL1 to flow. As illustrated in
A thickness T1 of a first region R1 where the first recessed portion 43 is formed at the outer part 41 is larger than a thickness T2 of the second region R2 where the second recessed portion 44 is formed at the inner part 42. The thickness T1 is the maximum thickness in the first region R1. The thickness T2 is the minimum thickness in the second region R2. The difference between the thickness T2 of the second region R2 and the thickness t of the target 31 (depth of the first recessed portion 43) is smaller than the difference between the thickness T1 of the first region R1 and the thickness T2 of the second region R2. In this example, the thickness T2 of the second region R2 is smaller than the thickness t of the target 31 (depth of the first recessed portion 43).
Formed at the outer part 41 are a plurality of (16 in this example) insertion holes 41a penetrating through the bottom surface 43a of the first recessed portion 43 and the back surface 32b of the target support body 32. The plurality of insertion holes 41a are arranged at equal intervals along the circumferential direction of a circle about the rotation axis A. Formed at the target 31 are a plurality of (16 in this example) fastening holes 31e penetrating through the electron incident surface 31a and the back surface 31b. The target 31 is detachably fixed to the target support body 32 by a fastening member (not illustrated) inserted through the insertion hole 41a being fastened to the fastening hole 31e. The fastening member may be, for example, a bolt. Brazing, diffusion bonding, or the like as well as the fastening structure may be used for the fixing between the target 31 and the target support body 32.
Formed in the back surface 32b at the inner part 42 are a plurality of (six in this example) fastening holes 42a for fixing the shaft 33. The plurality of fastening holes 42a are arranged at equal intervals along the edge of the second recessed portion 44 and along the circumferential direction of a circle about the rotation axis A. The shaft 33 is detachably fixed to the target support body 32 by a fastening member (not illustrated) inserted through an insertion hole 33a of the shaft 33 being fastened to the fastening hole 42a. The fastening member may be, for example, a bolt.
Formed in the back surface 32b at the inner part 42 are a plurality of (36 in this example) the balance adjustment holes 42b for adjusting the weight balance of the rotary anode unit 3. The plurality of balance adjustment holes 42b are arranged at equal intervals along the circumferential direction of a circle about the rotation axis A. It is possible to adjust the weight balance of the rotary anode unit 3 by, for example, fixing a weight (not illustrated) to one or a plurality of holes selected from the plurality of balance adjustment holes 42b. The weight may be fixed to the target support body 32 by, for example, a fastening member such as a bolt being fastened to the balance adjustment hole 42b. The weight balance of the rotary anode unit 3 may be adjusted by the balance adjustment hole 42b being enlarged by shaving or the like. The balance adjustment hole 42b may be provided at the outer edge part of the surface 32a that is outside the second region R2 as described above. The weight balance of the rotary anode unit 3 may be adjusted by weight addition or partial removal with respect to the location in the target support body 32 other than the balance adjustment hole 42b. A configuration for adjusting the weight balance of the rotary anode unit 3 may be provided in this manner in the region that is an outer edge with respect to the rotation axis A, particularly in the region that is outside the region where the flow path 45 is formed.
The shaft 33 and the flow path forming member 34 are fixed to the target support body 32 from the back surface 32b side. A part of the shaft 33 is disposed at the first part 44a of the second recessed portion 44. The shaft 33 is fixed to the target support body 32 by the fastening member fastened to the fastening hole 42a as described above. The flow path forming member 34 has a tubular portion 34a and a flange portion 34b protruding outward from an end portion of the tubular portion 34a. The tubular portion 34a is formed in a cylindrical shape and disposed in the shaft 33. The flange portion 34b is formed in a disk shape and faces each of the surface of the second recessed portion 44 and the shaft 33 at an interval. The flow path forming member 34 is fixed to the non-rotating portion (not illustrated) of the rotary anode unit 3 so as not to rotate together with the target support body 32 and the shaft 33.
The second recessed portion 44, the shaft 33, and the flow path forming member 34 define the flow path 45 for allowing the coolant CL1 to flow. The coolant CL1 is a liquid coolant such as water and antifreeze. The flow path 45 has a first part 45a formed between the shaft 33 and the tubular portion 34a and the flange portion 34b of the flow path forming member 34, a second part 45b formed between the target support body 32 and the flange portion 34b of the flow path forming member 34, and a third part 45c formed in the tubular portion 34a of the flow path forming member 34. The coolant CL1 is supplied to the first part 45a from, for example, a coolant supply device (not illustrated). The coolant supply device may be a chiller capable of supplying the coolant CL1 adjusted to a predetermined temperature. The coolant CL1 supplied to the first part 45a flows through the second part 45b and is discharged at the third part 45c.
The rotary anode unit 3 further includes a drive unit 35 rotationally driving the target 31, the target support body 32, and the shaft 33 and the housing 36 accommodating the target 31, the target support body 32, the shaft 33, and the flow path forming member 34 (
As described above, in the rotary anode unit 3, the target support body 32 is formed of the second metal material higher in thermal conductivity than the first metal material constituting the target 31. Thus, the cooling performance can be improved. In addition, the first recessed portion 43 where the target 31 is disposed is formed in the surface 32a at the outer part 41 of the target support body 32 and the second recessed portion 44 defining the flow path 45 for allowing the coolant CL1 to flow is formed in the back surface 32b at the inner part 42 of the target support body 32. The thickness T1 of the first region R1 where the first recessed portion 43 is formed at the outer part 41 is larger than the thickness T2 of the second region R2 where the second recessed portion 44 is formed at the inner part 42. Thus, it is possible to increase the heat capacity of the first region R1 and enhance the cooling efficiency in the second region R2. As a result, the heat generated in the target 31 can be stored in the first region R1 and the heat stored in the first region R1 can be efficiently cooled in the second region R2. Accordingly, the cooling performance is enhanced in the rotary anode unit 3. Further, the electron incident surface 31a of the target 31 is positioned on the same plane as the surface 32a of the target support body 32 extending substantially perpendicularly to the rotation axis A. As a result, the workability of polishing work on the electron incident surface 31a and the surface 32a is enhanced.
The X-ray generation apparatus 1 was prepared and evaluated as a confirmation experiment. In a case where the cooling performance is not sufficient, the temperature of the target support body 32 may become as high as 100° C. or more and the coolant CL1 may be boiled. However, the coolant CL1 was not heated to the point of boiling during a 1,000-hour operation. No deformation or damage occurred in the target 31. A change of 3% or more did not occur in the dose of the X-ray XR.
The difference between the thickness T2 of the second region R2 and the thickness t of the target 31 is smaller than the difference between the thickness T1 of the first region R1 and the thickness T2 of the second region R2. As a result, it is possible to easily transmit the heat generated in the target 31 to the first region R1 having a large-heat capacity while further enhancing the cooling efficiency in the second region R2.
The surface roughnesses Ra of both the bottom surface 43a of the first recessed portion 43 and the back surface 31b of the target 31 coming into contact with the bottom surface 43a are 1.6 μm or less. As a result, the target 31 and the target support body 32 can be suitably brought into surface contact with each other and the cooling efficiency can be further enhanced. In other words, the surface area of the contact surface between the target 31 and the target support body 32 can be increased.
The surface roughness Ra of the electron incident surface 31a of the target 31 is 0.5 μm or less. As a result, it is possible to emit a large amount of X-rays from the target 31 when an electron beam is incident. In other words, it is possible to suppress self-absorption in which the X-rays emitted from the target 31 are blocked by the unevenness of the surface of the electron incident surface 31a. When the surface of the electron incident surface 31a is uneven, stress concentration occurs at the uneven part. However, it is possible to mitigate such stress concentration by reducing the surface roughness of the electron incident surface 31a.
The contact width W between the target 31 and the bottom surface 43a of the first recessed portion 43 is 2t or more and 8t or less. Since the contact width W is 2t or more, it is possible to increase the contact area between the target 31 and the target support body 32 and it is possible to further enhance the cooling efficiency. In addition, since the contact width W is 8t or less, it is possible to ensure the area of the second region R2 and it is possible to further enhance the cooling efficiency in the second region R2.
The insertion hole 41a penetrating through the bottom surface 43a of the first recessed portion 43 and the back surface 32b of the target support body 32 is formed at the outer part 41. The target 31 is fixed to the target support body 32 by the fastening member inserted through the insertion hole 41a. As a result, the target 31 and the target support body 32 can be more closely fixed.
The rotary anode unit 3 is provided with the shaft 33 fixed to the target support body 32 from the back surface 32b side and defining the flow path 45 together with the second recessed portion 44. As a result, the target support body 32 can be rotated via the shaft 33 and the flow path 45 can be defined by the second recessed portion 44 and the shaft 33.
The rotary anode unit 3 is provided with the flow path forming member 34. The flow path forming member 34 has the tubular portion 34a disposed in the shaft 33 and the flange portion 34b protruding outward from the tubular portion 34a. The flow path forming member 34 defines the flow path 45 together with the second recessed portion 44 and the shaft 33. As a result, the flow path 45 can be defined by the second recessed portion 44, the shaft 33, and the flow path forming member 34.
As illustrated in
The second wall 53 is formed in a plate shape and extends from the first wall 52 along the X direction. The X-ray passage hole 53a through which the X-ray XR emitted from the target 31 passes is formed in the second wall 53. The X-ray passage hole 53a penetrates the second wall 53 along the Z direction (third direction) perpendicular to the X direction. The window member 7 is provided on the outer surface of the second wall 53 so as to airtightly block the X-ray passage hole 53a. The window member 7 is formed of a metal material or the like and in a flat plate shape and transmits the X-ray XR. Beryllium (Be) is an example of the metal material that constitutes the window member 7.
As illustrated in
The second surface 52c faces the housing 4b of the magnetic lens 4. In this example, the second surface 52c and the housing 4b are in contact with each other. The second surface 52c includes an abutting part 52d. The abutting part 52d is a flat surface and extends perpendicularly to the X direction. The outer surface of the housing 4b of the magnetic lens 4 abuts against the abutting part 52d. The outer surfaces of the housing 4b and the housing 6 and the second surface 52c (abutting part 52d) are joined by, for example, brazing or diffusion bonding. The housing 36 of the rotary anode unit 3 may be detachably attached to the housing 4b and the housing 6. In that case, an airtight sealing member such as an O-ring may be interposed between the second surface 52c (abutting part 52d) and the housings 4b and 6.
A flow path 61 for allowing a coolant CL2 to flow is formed in the first wall 52. A groove 62 is formed at the abutting part 52d of the second surface 52c of the first wall 52. The flow path 61 is defined by the groove 62 being blocked by the housing 4b of the magnetic lens 4. The coolant CL2 is supplied to the flow path 61 from, for example, a coolant supply device (not illustrated). The coolant supply device may be a chiller capable of supplying the coolant CL2 adjusted to a predetermined temperature. The coolant CL2 is a liquid coolant such as water and antifreeze.
The flow path 61 includes a plurality of (three in this example) connection portions 64A to 64C alternately interconnecting the plurality of curved parts 63. The connection portions 64A to 64C extend in a curved manner. The flow path 61 further includes a linear part 65 interconnecting the supply position P1 and the curved part 63 and a linear part 66 interconnecting the curved part 63 and the discharge position P2.
A curved part 63A, which is closest to the electron passage hole 52a among the plurality of curved parts 63, is positioned on both sides of the electron passage hole 52a in the Y direction (second direction perpendicular to the first direction). In other words, the flow path 61 extends on both sides of the electron passage hole 52a in the Y direction so as to sandwich the electron passage hole 52a (to surround the electron passage hole 52a in a U shape).
In the flow path 61, the coolant CL2 flows from the supply position P1 to the discharge position P2. In the flow path 61, the part on the upstream side (side close to the supply position P1) is disposed closer to the electron passage hole 52a than the part on the downstream side (discharge position P2 side). For example, the curved part 63A is disposed closer to the electron passage hole 52a than the curved part 63 other than the curved part 63A. In other words, the flow path 61 includes a first part (the curved part 63A) and a second part (the curved part 63 other than the curved part 63A) connected to the first part and positioned on the side opposite to the electron passage hole 52a with respect to the first part and the X-ray generation apparatus 1 is configured such that the coolant CL2 flows from the first part to the second part. In this manner, a coolant is first introduced (a coolant that is lower in temperature is introduced) into the region that is close to the electron passage hole 52a, and thus the cooling efficiency of the structure near the electron passage hole 52a can be improved. In the vicinity of the electron passage hole 52a, the temperature is likely to increase due to the effect of the electron beam EB (reflected electrons from the target 31 in particular).
A center C of a region RG where the flow path 61 is formed in the first wall 52 is positioned on the side opposite to the X-ray passage hole 53a (upper side in
As described above, in the X-ray generation apparatus 1, the rotary anode unit 3 is configured to rotate the target 31. Thus, the electron beam EB can be incident on the rotating target 31 and it is possible to avoid the electron beam EB being locally incident on the target 31. As a result, it is possible to increase the incident amount of the electron beam EB. In addition, the flow path 61 configured such that the coolant CL2 flows as well as the electron passage hole 52a through which the electron beam EB passes is formed in the first wall 52 (wall portion 51) disposed between the target 31 and the coil 4a and facing the target 31. As a result, the wall portion 51 and the magnetic lens 4 can be cooled by letting the coolant CL2 flow through the flow path 61. Accordingly, it is possible to suppress an increase in the temperature of the wall portion 51 and the magnetic lens 4 even in a case where the incident amount of the electron beam EB to the target 31 increases and the reflected electrons from the target 31 increase. As a result, with the X-ray generation apparatus 1, it is possible to suppress the occurrence of defects due to heat generation by reflected electrons. In other words, it is possible to suppress the occurrence of a defect due to an increase in temperature around the coil 4a resulting from the combination of the heat generated in the wall portion 51 by the reflected electrons reflected without being absorbed by the target 31 and the heat generated in the coil 4a by energization. Examples of the defect include a decline in the controllability of the electron beam EB by the coil 4a and damage to a peripheral member. In a case where the temperature of the coil 4a is high, the dimension or position of the focal point of the X-ray XR may fluctuate due to a decline in the controllability of the electron beam EB. In addition, the vacuum may be broken due to damage to the window member 7 or the housing 36. Those defects can be suppressed in the X-ray generation apparatus 1.
The X-ray generation apparatus 1 was prepared and evaluated as a confirmation experiment. As a result, it has been confirmed that a rise in the temperature of the wall portion 51 and the magnetic lens 4 is suppressed. During a 1,000-hour operation, the dimension and position of the focal point of the X-ray XR did not fluctuate significantly. No abnormality occurred in the window member 7.
The flow path 61 extends so as to be positioned on both sides of the electron passage hole 52a in the Y direction when viewed from the X direction. As a result, it is possible to effectively cool the periphery of the electron passage hole 52a where a large amount of reflected electrons are incident.
The flow path 61 includes the plurality of curved parts 63 extending along the circumferential direction of a circle about the electron passage hole 52a when viewed from the X direction. As a result, the periphery of the electron passage hole 52a can be effectively cooled.
The flow path 61 includes the plurality of curved parts 63 arranged along the Z direction. As a result, the periphery of the electron passage hole 52a can be effectively cooled.
The flow path 61 includes the first part (curved part 63A) and the second part (curved part 63 other than the curved part 63A) connected to the first part and positioned on the side opposite to the electron passage hole 52a with respect to the first part. The X-ray generation apparatus 1 is configured such that the coolant CL2 flows from the first part to the second part. In other words, the X-ray generation apparatus 1 is provided with a coolant supply device configured such that the coolant CL2 flows from the first part to the second part. As a result, since the flow path 61 includes the first part and the second part, it is possible to lengthen the flow path of the coolant CL2 and it is possible to effectively cool the wall portion 51 and the magnetic lens 4. In addition, the periphery of the electron passage hole 52a can be effectively cooled since the coolant CL2 flows first to the first part near the electron passage hole 52a.
The X-ray passage hole 53a through which X-rays emitted from the target 31 pass is formed in the wall portion 51. When viewed from the X direction, the center C of the region RG where the flow path 61 is formed in the wall portion 51 is positioned on the side opposite to the X-ray passage hole 53a (upper side in
The X-ray passage hole 53a is formed in the second wall 53 and the electron passage hole 52a and the flow path 61 are formed in the first wall 52. As a result, the degree of freedom for design can be improved in relation to the X-ray passage hole 53a.
The groove 62 is formed in the second surface 52c of the wall portion 51 and the flow path 61 is defined by the groove 62 being blocked by the housing 4b of the magnetic lens 4. As a result, the magnetic lens 4 can be effectively cooled. In addition, the manufacturing process can be simplified as compared with a case where the flow path 61 is formed inside the wall portion 51.
The wall portion 51 constitutes the housing 36 of the rotary anode unit 3. As a result, cooling can be performed by means of the housing 36 of the rotary anode unit 3.
The target 31 and the target support body 32 may be configured as in the modification example that is illustrated in
The present disclosure is not limited to the above-described embodiment and modification example. For example, the materials and shapes of the configurations are not limited to the materials and shapes described above and various materials and shapes can be adopted. In the embodiment described above, the surface roughnesses Ra of both the bottom surface 43a of the first recessed portion 43 and the back surface 31b of the target 31 are 0.8 μm or less. Alternatively, the surface roughnesses Ra may be different from each other insofar as the sum of the surface roughnesses Ra of both is 1.6 μm or less. In the embodiment described above, the flow path 61 is defined by the groove 62 being blocked by the housing 4b of the magnetic lens 4.
Alternatively, the flow path 61 may be formed as a hole inside the wall portion 51. Alternatively, the wall portion 51 itself may be provided with a lid-shaped member for blocking the groove 62. The flow path 61 may be formed in the wall portion that constitutes the housing 4b of the magnetic lens 4 instead of the wall portion 51 that constitutes the housing 36 of the rotary anode unit 3.
