“Soft lithography used to fabricate transistors on curved substrates”; 3-pg. document; [obtained from Internet www.news.uiuc.edu/scitips/00/11softlitho.html]; [page last update Oct. 26, 2001]. |
“Soft Lithography”; 5-pg. document; published Jan. 1998; WTECHyper-Librarian. |
“The future of electronics manufacturing is revealed in the fine print”; Ralph G. Nuzzo; PNAS; vol. 98, No. 9, pp. 4827-4829 (Apr. 24, 2001). |
“Low-Temperature Fabrication of Si Thin-Film Transistor Microstructures by Soft Lithographic Patterning on Curved and Planar Substrates”; Erthardts et al.; Chemistry of Materials, vol. 12, No. 11, pp. 3306-3315 (Nov. 2000). |
“Nucleation and growth of carbon nanotubes by microwave plasma chemical vapor deposition”; Bower et al.; Applied Physics Letters, vol. 77, No. 17, pp. 2767-2769 (Oct. 23, 2000). |
“Large current density from carbon nanotubes field emitters”; Zhu et al.; Applied Physics Letters, vol. 75, No. 6, pp. 873-875 (Aug. 9, 1999). |
“Application of carbon nanotubes as electrodes in gas discharge tubes”; Rosen et al.; Applied Physics Letters, vol. 76, No. 13, pp. 1668-1670 (Mar. 27, 2000). |
“Work functions and valence band states of pristine and Cs-intercalated single-walled carbon nanotube bundles”; Applied Physics Letters, vol. 76, No. 26, pp. 4007-4009 (Jun. 26, 2000). |
“Fabrication and Field Emission Properties of Carbon Nanotube Cathodes”; Bower et al.; 6-pg. document; Proceeding of 1999 MRS Fall Meeting. |
“10 Applications of Carbon Nanotubes”; Ajayan et al.; pp. 274-315. |
“Patterned negative electron affinity photocathodes for maskless electron beam lithography”; Schneider et al.; J. Vac. Sci. Technol.; pp. 3192-3196 (Nov./Dec. 1998). |
“Semiconductor on glass photocathodes for high throughput maskless electron beam lithography”; Baum et al.; J. Vac. Sci. Technol.; pp. 2707-2712 (Nov./Dec.). |
“Physical properties of thin-film field emission cathodes with molybdenum cones”; Spindt et al.; Journal of Applied Physics, vol. 47, No. 12, pp. 5246-5263 (Dec. 1976). |