The present application is related generally to x-ray sources.
X-ray tubes can include electrical insulation. Useful characteristics of such insulation can include proper x-ray transmissivity (high or low), resistance to x-ray damage, high electrical resistivity, and high thermal conductivity.
In a transmission-target x-ray tube, the x-ray window can include a target material for generation of x-rays, and also another material, such as beryllium, for structural support. Useful characteristics of such x-ray windows include high thermal conductivity, high electrical conductivity, high melting point, low cost, and matching x-ray window coefficient of thermal expansion with the structure to which it is mounted.
X-ray tubes can include an electron emitter, such as a filament. Repeated, precise placement of the filament can result in consistent x-ray spot size and location, which can be helpful for users of the x-ray tubes. Due to the small size of filaments, particularly in miniature x-ray tubes, such repeated, precise placement of filaments can be difficult. It would be useful to have consistent x-ray spot size and location in spite of the difficulty of repeated, precise placement of filaments.
DEFINITIONS. The following definitions, including plurals of the same, apply throughout this patent application.
As used herein, the terms “align”, “aligned”, and “aligning” refer to exact alignment, alignment within normal manufacturing tolerances, or near exact alignment, such that any deviation from exact alignment would have negligible effect for ordinary use of the device.
As used herein, the term “identical” means exactly identical, identical within normal manufacturing tolerances, or close to identical, such that any deviation from exactly identical would have negligible effect for ordinary use of the device.
As used herein, the term “kV” means kilovolt(s).
As used herein, the term “mm” means millimeter(s).
As used herein, the term “x-ray tube” is not limited to tubular/cylindrical shaped devices. The term “tube” is used because this is the standard term used for x-ray emitting devices.
Unless explicitly noted otherwise herein, all temperature-dependent values are such values at 25° C.
As illustrated in
X-ray transparent insulation 16 can be sandwiched between the x-ray window 14 and the aperture 13A of the ground plate 13. The x-ray transparent insulation 16 can electrically insulate the x-ray window 14 from the ground plate 13. The x-ray transparent insulation 16 can include two opposite sides 16S. One of the two opposite sides 16S can face the x-ray window 14 and the other of the two opposite sides 16S can facing the ground plate 13. A curved side 16C can extend between the two opposite sides 16S. The curved side 16C of the x-ray transparent insulation 16 can be encircled by or surrounded by x-ray opaque insulation 17. The x-ray transparent insulation 16 likely will block or attenuate some x-rays and the x-ray opaque insulation 17 likely will transmit some x-rays; thus, the terms “transparent” and “opaque” are relative. It can be helpful for x-rays emitted in desired directions (e.g. through the x-ray window 14 and through the aperture 13A of the ground plate 13) to pass through the x-ray transparent insulation 16, and for x-rays emitted in undesirable directions to be blocked by the x-ray opaque insulation 17.
The curved side 16C can be shaped for transmission of x-rays in desired directions and for the x-ray opaque insulation 17 to block x-rays transmitted in undesired directions. For example, as illustrated in
The curved side 16C can be shaped to increase a distance an arc must travel for a short circuit between the anode 11 and the ground plate 13. As illustrated in
The x-ray transparent insulation 16 can have a thickness ThI sufficient for voltage standoff while also minimizing x-ray attenuation. For example, ThI≥0.5 mm, ThI≥1 mm, ThI≥2 mm, or ThI≥3 mm; and ThI≤6 mm, ThI≤7 mm, or ThI≤8 mm, where ThI is a thickness of the x-ray transparent insulation 16 between the two opposite sides 16S. Thus, the shortest distance DC along the curved shape can be greater than the thickness ThI of the x-ray transparent insulation 16.
There can be a gap between the x-ray transparent insulation 16 and the x-ray window 14 to minimize heat transfer from the x-ray window 14 to the x-ray transparent insulation 16. The gap can be free of solid material. Example thicknesses (ThG) of the gap include ThG≥0.5 mm, ThG≥1 mm, or ThG≥2 mm; and ThG≤4 mm, ThG≤5 mm, ThG≤6 mm, ThG≤10 mm.
Illustrated in
Material of the x-ray transparent insulation 16 can be selected based on minimal attenuation of x-rays, resistance to x-ray damage, electrical resistivity, and thermal conductivity. Example materials for the x-ray transparent insulation 16 include aluminum nitride, boron nitride, polyetherimide, or combinations thereof. A material composition of the x-ray window 14 can be identical throughout the x-ray window 14.
As illustrated in
The x-ray window 14 can include a target material for generating x-rays in response to impinging electrons from the cathode. The target material can be spread throughout, and can be spread evenly throughout, the entire x-ray window. The entire x-ray window 14 can be the target material. The x-ray window 14 can be free of beryllium. A material composition of the x-ray window 14 can be identical throughout the x-ray window 14. The x-ray window 14 can have a homogeneous material composition. Instead of being multiple layers of different materials, the x-ray window 14 can be a single layer of material, which can improve the x-ray window 14 durability by avoiding separate layers with different coefficient of thermal expansion.
The x-ray window 14 can be made mostly or totally of a single element. The single element can be molybdenum, rhodium, rhenium, or tungsten. For example, a mass percent of the single element in the x-ray window 14 can be ≥75%, ≥90%, ≥95%, ≥99%, or ≥99.5%. The x-ray window 14 can include two opposite faces 14F, each opposite face 14F exposed to air, another gas, or vacuum. A material composition at each of two opposite faces 14F can include a mass percent of the single element that is ≥75%, ≥90%, ≥95%, ≥99%, or ≥99.5%.
The x-ray window 14 can include additional elements, which can improve the properties of the single element. For example, aluminum, potassium, silicon, or combinations thereof, can be added for smaller grain structure and reduced fatigue cracking. The x-ray window 14 can include lanthanum oxide for improved machinability.
In order to reduce thermal stress in the x-ray window 14, a material composition of the x-ray window 14 and a material composition of the anode 11 can be similar or can be the same. For example, a mass percent of tungsten in the x-ray window 14 and the anode 11, or a portion of the anode 11 to which the x-ray window 14 is attached, can be ≥75%, ≥90%, ≥95%, ≥99%, or ≥99.5%.
The x-ray window 14 can have a thickness ThW designed for sufficient strength, optimal heat transfer, and emission of x-rays. For example, ThW≥0.001 mm, ThW≥0.005 mm, ThW≥0.01 mm, or ThW≥0.025 mm; and ThW≤0.051 mm, ThW≤0.08 mm, ThW≤0.1 mm, or ThW≤0.2 mm.
As illustrated on cathode 12 in
The open channel 63 of the focusing plate 62 can extend between two open holes 65 in the focusing plate 62. The two open holes 65 can be aligned with the pair of electrodes 51, each open hole 65 being aligned with one of the electrodes 51. Following are example relationships between a smallest diameter DO of the two open holes 65 and a width W of the channel, for shaping of the electron beam: DO/W≥1, DO/W≥1.5, DO/W≥2, or DO/W≥2.5; and DO/W≤4.5, DO/W≤6, DO/W≤7, DO/W≤10; the width W being perpendicular to the longitudinal dimension 52 of the filament 12F.
In addition to variation of placement of the filament 12F diagonally across the electrodes 51, there can also be variation of placement of the filament 12F vertically, i.e. in a direction parallel to an axis 41 (see
The focusing plate 62 can include tabs 64 bordering the open channel 63. As illustrated in
The focusing plate 62 can further comprise two additional holes 66, each bend along line 71 of each tab 64 aligned with one of the two additional holes 66. The additional holes 66 can make it easier to bend the tabs 64 along line 71. Following are example relationships between a smallest diameter DO of the two open holes 65 and a largest diameter DA of the two additional holes 66: DO/DA≥1, DO/DA≥1.2, DO/DA≥1.5, or DO/DA≥2; and DO/DA≤2.5, DO/DA≤3.5, DO/DA≤5, DO/DA≤10.
The focusing plate 62 can have a thickness ThP for sufficient focusing plate 62 structural strength, to allow bends in the tabs 64 along lines 71, and for improved shaping of the electron beam. Example thicknesses ThP of the focusing plate 62 include: ThP≥0.001 mm, ThP≥0.005 mm, or ThP≥0.01 mm; and ThP≤0.1 mm, ThP≤0.5 mm, or ThP≤1 mm.
Considerations for selection of materials of the focusing plate 62 include vacuum compatibility, malleability at room temperature, electrical conductivity, and a sufficiently high melting point to avoid focusing plate 62 recrystallization or melting by proximity to the filament 12F. The focusing plate 62 can be metallic. Example materials of the focusing plate 62 include nickel, cobalt, iron, molybdenum, tantalum, niobium, steel, or combinations thereof.
The focusing plate 62 can be used on a transmission-target x-ray tube or a side-window x-ray tube. The focusing plate 62, as used above in alignment with the filament 12F, can result in more consistent x-ray spot size and location in spite of the difficulty of repeated and precise placement of the filament 12F.
A method of aligning an x-ray tube filament 12F with a focusing plate 62 can comprise some or all of the following steps, which can be performed in the following order or other order if so specified. There may be additional steps not described below. These additional steps may be before, between, or after those described. The focusing plate 62 can have other characteristics as described above this method section.
The method can comprise attaching the filament 12F to a cathode 12 (e.g. to electrodes 51); aligning an open channel 63 of the focusing plate 62 with a longitudinal dimension 52 of the filament 12F; attaching the focusing plate 62 to the cathode 12 (attaching to a part of the cathode 12 electrically isolated from one or both of the pair of electrodes 51); and bending tabs 64 of the focusing plate 62 to align with a location of the filament 12F, the tabs 64 bordering the open channel 63. The steps of the method can be performed in the order of the prior sentence.
Aligning the tabs 64 with the filament 12F can help focus the electron beam to create the desired focal shape. Bending the tabs 64 can include aligning the tabs 64 such that an imaginary plane 91, extending between an edge of the tabs 64 at the open channel 63, extends through the filament 12F. The imaginary plane 91 can be perpendicular to an axis 41 (see
The open channel 63 of the focusing plate 62 can extend between two open holes 65 in the focusing plate 62. Aligning the open channel 63 of the focusing plate 62 can further comprise aligning the two open holes 65 with the pair of electrodes 51, each open hole 55 being aligned with one of the electrodes 51.
This is a continuation of U.S. nonprovisional patent application Ser. No. 16/937,307, filed on Jul. 23, 2020, which claims priority to U.S. Provisional Patent Application No. 62/883,242, filed on Aug. 6, 2019, which are incorporated herein by reference.
Number | Date | Country | |
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62883242 | Aug 2019 | US |
Number | Date | Country | |
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Parent | 16937307 | Jul 2020 | US |
Child | 17477022 | US |