Claims
- 1. A zeolite having a mole ratio of about 20 or greater of an oxide selected from the group consisting of silicon oxide, germanium oxide and mixtures thereof to an oxide selected from aluminum oxide, gallium oxide, iron oxide, titanium oxide, indium oxide, vanadium oxide and mixtures thereof, and having, after calcination, the X-ray diffraction lines of Table I.
- 2. A zeolite according to claim 1 wherein the oxides comprise silicon oxide and aluminum oxide.
- 3. A zeolite according to claim 1 wherein said zeolite is predominantly in the hydrogen form.
- 4. A zeolite according to claim 1 wherein said zeolite is substantially free of acidity.
- 5. A zeolite according to claim 1 wherein the oxide comprises silicon oxide.
- 6. A zeolite having a composition, as synthesized and in the anhydrous state, in terms of mole ratios as follows:YO2/WcOd 20 or greater M2/n/YO2 0.03-0.20 Q/YO2 0.02-0.08 wherein Y is silicon, germanium or a mixture thereof, W is aluminum, gallium, iron, titanium, indium, vanadium or mixtures thereof, c is 1 or 2; d is 2 when c is 1 or d is 3 or 5 when c is 2; M is an alkali metal cation, alkaline earth metal cation or mixtures thereof; n is the valence of M; and Q is a quaternary ammonium cation having the structure where X- is an anion which is not detrimental to the formation of the zeolite.
- 7. A zeolite according to claim 6 wherein W is aluminum and Y is silicon.
- 8. A zeolite according to claim 6 wherein Y is silicon and no WcOd is present.
- 9. A method of preparing a crystalline material having the RTH crystal structure and having a mole ratio of about 20 or greater of an oxide selected from silicon oxide, germanium oxide and mixtures thereof to an oxide selected from aluminum oxide, gallium oxide, iron oxide, titanium oxide, indium oxide, vanadium oxide and mixtures thereof, said method comprising contacting under crystallization conditions sources of said oxides and a templating agent comprising a quaternary ammonium cation having the structure where X- is an anion which is not detrimental to the formation of the crystalline material.
- 10. The method according to claim 9 wherein the oxides are silicon oxide and aluminum oxide.
- 11. The method of claim 7 wherein the crystalline material has, after calcination, the X-ray diffraction lines of Table I.
- 12. The method according to claim 9 wherein the oxide is silicon oxide.
Parent Case Info
This application is a continuation-in-part of Ser. No. 09/465,237, filed Dec. 15, 1999 now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
4859442 |
Zones et al. |
Aug 1989 |
A |
5268161 |
Nakagawa |
Dec 1993 |
A |
5614166 |
Gies et al. |
Mar 1997 |
A |
5939044 |
Nakagawa et al. |
Aug 1999 |
A |
Non-Patent Literature Citations (2)
Entry |
Vortmann et al., “The Crystal Structure of the new Boron Containing Zeolite RUB-13,” Zeolite Science 1994: Recent Progress and Discussions, Studies in Surface Science and Catalysis, vol. 98, pp. 262-263, 1995.* |
Vortmann et al., “Synthesis and Crystal Structure of the new Borosilicate Zeolite RUB-13,” Microporous Materials, vol. 4, 1995, pp. 111-121. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09/465237 |
Dec 1999 |
US |
Child |
09/712083 |
|
US |