The present application is a U.S. non-provisional application which claims priority to Chinese Application No. 201210594610.4, filed on Nov. 22, 2013, which is herein incorporated by reference in its entirety.
The invention belongs to the technical field of electronic ceramic components. More specifically, the invention relates to a ZnO multilayer chip varistor with base metal inner electrodes and a preparation method thereof.
A varistor is a passive electronic component which has the characteristic of nonlinearity with respect to I-V (current-voltage). Varistors are used mainly for overvoltage protection and voltage stabilization. ZnO quickly became the leading varistor material because of its excellent nonlinear characteristics, after being successfully developed in 1968 by Panasonic.
The chip varistor emerged in 1981 which first reported by Panasonic. This chip varistor used technology relating to laminated ceramic green sheets and platinum (Pt) inner electrodes; since that time, ZnO-based varistor featuring low-voltage multilayer chips have been successfully developed. TDK, Mitsubishi, EPCOS and some other companies have undertaken sustained research on the multilayer chip varistor. At the beginning of this century, the 0402-package multilayer varistor was developed in succession by companies including AVX, TDK, LITTELFUSE, AMOTECH, EPCOS and some others. Murata and Panasonic have developed the chip varistor with a smaller 0201-package geometry; the breakdown voltage of this chip varistor is as low as 2.5V, and it can meet the ESD protection requirements of semiconductor devices of different performances and structures. The chip varistor has been researched extensivelr in recent years, with remarkable results being achieved in the basic research on chip varistor materials, as well as its precision manufacturing processes.
Currently single layer varistors typically have a thickness of 1 mm or so, with the film thickness of each layer of ZnO multilayer chip varistor typically being as thin as several tens of micrometers,which allow the breakdown voltage to be reduced by reducing the amounts of grains in single film. National Taiwan University reported the multilayer chip varistor wherein each layer has only 1-2 grains and wherein the thickness is 8 μm after being sintered. Ceramic green sheets having such thickness can also increase the average grain size of ZnO by increasing the sintering temperature, lengthening the sintering time, adding sintering aids, and so on, in order to reduce the breakdown voltage. Currently, multilayer chip varistors mainly employ systems of ZnO materials, with precious metals, such as silver (Ag), palladium (Pd) etc., as inner electrodes, and using a preparation method invoving firing in air.
With the decrease of layer thickness and the increase numbering number of layers, the mass proportion of the materials comprising the inner electrode within low voltage multilayer chip varistor is growing. Because the sintering temperature of ZnO varistor materials is generally higher than 1000° C., the high melting point alloy Ag/Pd (with a molar ratio of 30:70)must by used as the inner electrode material; this alloy accounts for over 50% of the total varistor cost. Further, the sintering process involves a ZnO—Bi2O3 system, with Bi2O3 being highly volatile and prone to reacting with the Pd electrode material, thereby reducing device performance. Many researchers and manufacturers are studying the replacemeny of the Ag/Pd inner electrode with cheaper materials, such as silver (Au) and cooper(Cu), by reducing the sintering temperature of the ZnO chip varistor. In this century, major companies have been attempting to reduce varistor costs as a result of the high costs associated with multilayer chips varistor prepared by this method, in particular due to the sharp increase of Pd and some other noble metal electrodes. Lavrov demonstrated that Cu can be co-fired and can be compatible when used as an electrode with a ZnO varistor ceramic, but the preparation method is very complex (Lavrov et al., Journal of the European Cermaic Society, 24 :2591-5 (2004)); in 2011, Changzhou Star John Technology Co., Ltd. announced a patent about the preparation of ZnO varistors wherein the Ag/Pd electrode is replaced by an electrode of pure Ag, but the cost of Ag electrodes remains high. Methods of reduction and re-oxidation have been used to prepare a multilayer chip varistor using as system of SrTiO3 materials, wherein the base metal is used as the inner electrodes, as in the patent JP2002222703A of TDK, patent JP2005085780A of Panasonic and the patent US20070273468. However, these and other methods suffer from the very low varistor nonlinear coefficient (below 10), which limits the field of potential varistor applications.
The object of the present invention is to prepare a multilayer low-voltage chip varistor with base metal inner electrodes, while meeting the requirements of high nonlinear coefficient and low breakdown voltage. The present invention uses the base metal material nickel (Ni) to replace Ag/Pd and additionally uses some other noble metal materials to prepare the inner electrode slurry. The oxidation of the base metal inner electrode is prevented by co-firing the green body of the multilayer chip varistor with base metal inner electrodes at high temperature in a protective atmosphere. The silver electrodes of both ends of the varistor should then be burned at a relative lower temperature in oxidizing atmosphere.
To achieve the above object, we have provided a method of preparing a ZnO multilayer chip varistor with base metal inner electrodes according to the present invention, comprising the steps of:
Preferably, an oxide of aluminum (Al) and/or an oxide of niobium (Nb) is/are added into the mixture of ZnO and Bi2O3, wherein the oxide aluminum (Al) and/or the oxide of niobium (Nb) is added in a total amount of no greater than 4 mol % of said mizxture of ZnO and Bi2O3.
Preferably, any one or more of an oxide of chromium (Cr), an oxide of antimony (Sb), an oxide of silicon (Si) and an oxide of vanadium (V) is/are added into said mixture of ZnO and Bi2O3, wherein the one or more of an oxide of chromium (Cr), oxide of antimony (Sb), oxide of silicon (Si), and oxide of vanadium (V) is added in a total amount of no greater than 8 mol % of said mixture of ZnO and Bi2O3.
The aim of adding the oxides of Al, or Nb, or Cr, or Sb, or Si, or V of any one or more is to improve the varistor nonlinear coefficient, thereby reducing the leakage current, enhancing the stability and improving the aging characteristics. Preferably, the duration of ball-mill mixing in said step (1) is 3 to 5 hours. Preferably, the oxidation process, i.e. the oxidation of the chip varistor, can be performed simultaneously with the burning of Ag electrodes.
As another aspect of the present invention, a ZnO multilayer chip varistor with base metal inner electrodes based on the above-mentioned method is also provided.
According to another aspect of the present invention, there is provided a ZnO multilayer chip varistor with base metal inner electrodes, wherein the varistor is generated by alternately laminating ceramic chips and inner electrodes, wherein said inner electrode has a base metal of nickel (Ni), and both ends of the varistor are coated with silver (Ag) electrode.
Overall, in comparing the existing technologies with the technical solution designed by present invention, as detailed in steps (1)-(5) above, the advantages of the present invention over the prior art comprise the following:
For clear understanding of the objectives, features and advantages of the invention, a detailed description of the invention will be given below in conjunction with accompanying drawings and specific embodiments. It should be noted that the embodiments are only meant to explain the invention, and not to limit the scope of the invention.
The main material of the varistor in the present invention is ZnO. In addition to ZnO, oxides of Bi, Mn and Co are required ingredients. An oxide of Al and/or an oxide of Nb may be added, or one or more of oxides of Cr, Sb, Si and V may be added.
After the aforementioned oxide are sufficiently mixed, the green sheets are prepared by tape casting, and the base metal inner electrode slurry is printed, the green body is formed by repeating laminating, printing, laminating, and finally being cut into rectangular after being isostatically pressed.
The aforementioned green body is sintered in protective atmosphere, wherein the sintering temperature is between 850° C. and 1150° C., the optimum sintering temperature is related to the ingredients and the proportions thereof. The ceramic body formation is incomplete if the temperature is too low, and electrical properties of the device deteriorate if the temperature is too high. Silver electrode are coated at both ends of the ceramic body and the laminated chip varistor is then prepared by performing heat treatment in oxygen or air at temperature of 500° C. to 800°C.
Advantageously, an oxide of aluminum (Al) and/or an oxide of niobium (Nb) is/are added into the mixture of ZnO and Bi2O3, wherein the oxide of aluminum (Al) and/or the oxide of niobium (Nb) is added in a total amount no greater than 4 mol % of said mixture of ZnO and Bi2O3. Advantageously, any one or more of an oxide of chromium (Cr), an oxide of antimony (Sb), an oxide of silicon (Si) and an oxide of vanadium (V) is/are added into said mixture of ZnO and Bi2O3, wherein the one or more of an oxide of chromium (Cr), oxide of antimony (Sb), oxide of silicon (Si), and oxide of vanadium (V) is added in a the total amount of no greater than 8 mol % of said mixture of ZnO and Bi2O3
The aim of adding the oxides of Al, or Nb, or Cr, or Sb, or Si, or V of any one or more is to improve the varistor nonlinear coefficient, thereby reducing the leakage current, enhancing the stability and improving the aging characteristics. The proportion of the organic solvent and the powders in the present invention can be adjusted according to film quality.
Advantages of the invention over the prior art comprise:
While preferred embodiments of the invention have been described above, the invention is not limited to the disclosure in the embodiments and the accompanying drawings. Any changes or modifications without departing from the spirit of the invention fall within the scope of the invention.
Number | Date | Country | Kind |
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2013 1 0594610 | Nov 2013 | CN | national |
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Number | Date | Country | |
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20150145638 A1 | May 2015 | US |