Advanced Mask Technology Center GmbH & Co. KG

Organization

Dresden, DE

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Photomask assembly with reflective photomask and method of manufact...
- Patent number 11,537,039
- Issue date Dec 27, 2022
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective photomask and reflection-type mask blank
- Patent number 10,031,409
- Issue date Jul 24, 2018
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Bender
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shape metrology for photomasks
- Patent number 9,405,185
- Issue date Aug 2, 2016
- Advanced Mask Technology Center GmbH & Co. KG
- Clemens Utzny
- G01 - MEASURING TESTING
Information Patent Grant
EUV mask set and methods of manufacturing EUV masks and integrated...
- Patent number 8,932,785
- Issue date Jan 13, 2015
- Advanced Mask Technology Center GmbH & Co. KG
- Clemens Utzny
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask and method of forming a lithographic mask
- Patent number 8,293,431
- Issue date Oct 23, 2012
- Advanced Mask Technology Center GmbH & Co. KG
- Haiko Rolff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask and method for repairing an EUV mask
- Patent number 8,142,958
- Issue date Mar 27, 2012
- Advanced Mask Technology Center GmbH & Co. KG
- Christian Holfeld
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing a photomask, method for patterning a layer or...
- Patent number 7,820,343
- Issue date Oct 26, 2010
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Waiblinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining an exposure dose and exposure apparatus
- Patent number 7,811,727
- Issue date Oct 12, 2010
- Advanced Mask Technology Center GmbH & Co. KG
- Martin Sczyrba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for cleaning a surface of a photomask
- Patent number 7,789,964
- Issue date Sep 7, 2010
- Advanced Mask Technology Center GmbH & Co. KG
- Christian Chovino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern and method of evaluating the transfer properties of a...
- Patent number 7,354,684
- Issue date Apr 8, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask Assembly with Reflective Photomask and Method of Manufact...
- Publication number 20200225571
- Publication date Jul 16, 2020
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK AND REFLECTION-TYPE MASK BLANK
- Publication number 20170108766
- Publication date Apr 20, 2017
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Bender
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHAPE METROLOGY FOR PHOTOMASKS
- Publication number 20150286130
- Publication date Oct 8, 2015
- Advanced Mask Technology Center GmbH & Co. KG
- Clemens Utzney
- G01 - MEASURING TESTING
Information Patent Application
EUV MASK SET AND METHODS OF MANUFACTURING EUV MASKS AND INTEGRATED...
- Publication number 20140106263
- Publication date Apr 17, 2014
- Advanced Mask Technology Center GmbH & Co. KG
- Clemens Utzny
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Mask and Method for Repairing an EUV Mask
- Publication number 20080318138
- Publication date Dec 25, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Christian Holfeld
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask Blank, Photomask and Method of Manufacturing a Photomask
- Publication number 20080318139
- Publication date Dec 25, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for Producing a Photomask, Method for Patterning a Layer or...
- Publication number 20080102382
- Publication date May 1, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Waiblinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system and a photolithography apparatus employing the...
- Publication number 20070263192
- Publication date Nov 15, 2007
- Advanced Mask Technology Center GmbH & Co. KG
- Karsten Bubke
- G02 - OPTICS
Information Patent Application
Method of cleaning a substrate surface from a crystal nucleus
- Publication number 20060236921
- Publication date Oct 26, 2006
- Advanced Mask Technology Center GmbH & Co. KG
- Christian Chovino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Advanced Mask Technology Center GmbH & Co. KG

Organization

Patents Grantslast 30 patents

Photomask assembly with reflective photomask and method of manufact...

Reflective photomask and reflection-type mask blank

Shape metrology for photomasks

EUV mask set and methods of manufacturing EUV masks and integrated...

Lithographic mask and method of forming a lithographic mask

EUV mask and method for repairing an EUV mask

Method for producing a photomask, method for patterning a layer or...

Method for determining an exposure dose and exposure apparatus

Method for cleaning a surface of a photomask

Test pattern and method of evaluating the transfer properties of a...

Patents Applicationslast 30 patents

Photomask Assembly with Reflective Photomask and Method of Manufact...

REFLECTIVE PHOTOMASK AND REFLECTION-TYPE MASK BLANK

SHAPE METROLOGY FOR PHOTOMASKS

EUV MASK SET AND METHODS OF MANUFACTURING EUV MASKS AND INTEGRATED...

EUV Mask and Method for Repairing an EUV Mask

Mask Blank, Photomask and Method of Manufacturing a Photomask

Method for Producing a Photomask, Method for Patterning a Layer or...

Illumination system and a photolithography apparatus employing the...

Method of cleaning a substrate surface from a crystal nucleus

Trademarklast 30 trademarks