Advanced Micro-Fabrication Equipment Inc. Asia

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Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for processing semiconductor work pieces
- Patent number 9,947,562
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for autotuning of RF match
- Patent number 9,099,284
- Issue date Aug 4, 2015
- Advanced Micro-Fabrication Equipment, Inc. Asia
- James Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,095,038
- Issue date Jul 28, 2015
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Shi Gang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing system; a semiconductor processing chamber...
- Patent number 8,715,418
- Issue date May 6, 2014
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement apparatus, and method for confining a plasma
- Patent number 8,608,851
- Issue date Dec 17, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,414,702
- Issue date Apr 9, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Qing Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 8,366,829
- Issue date Feb 5, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station plasma reactor with multiple plasma regions
- Patent number 8,336,488
- Issue date Dec 25, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF matching network of a vacuum processing chamber and correspondin...
- Patent number 8,334,657
- Issue date Dec 18, 2012
- Applied Materials, Inc.
- Yaomin Xia
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitive CVD reactor and methods for plasma CVD process
- Patent number 8,297,225
- Issue date Oct 30, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of sensing and removing residual charge from a pr...
- Patent number 8,111,499
- Issue date Feb 7, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide gas distribution plate and RF electrode for plasma...
- Patent number 7,992,518
- Issue date Aug 9, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Robert Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,935,186
- Issue date May 3, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Qing Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF matching network of a vacuum processing chamber and correspondin...
- Patent number 7,868,556
- Issue date Jan 11, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Yaomin Xia
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vacuum processing chamber and method of processing a semiconductor...
- Patent number 7,682,483
- Issue date Mar 23, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Yaomin Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution assembly for use in a semiconductor work piece pro...
- Patent number 7,658,800
- Issue date Feb 9, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-station workpiece processors, methods of processing semicondu...
- Patent number 7,516,833
- Issue date Apr 14, 2009
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Ryoji Todaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
- Patent number 7,503,996
- Issue date Mar 17, 2009
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

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Patents Applicationslast 30 patents

Information Patent Application
PLASMA CONFINEMENT APPARATUS, AND METHOD FOR CONFINING A PLASMA
- Publication number 20140103805
- Publication date Apr 17, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20130048216
- Publication date Feb 28, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...
- Publication number 20110030900
- Publication date Feb 10, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF SENSING AND REMOVING RESIDUAL CHARGE FROM A PR...
- Publication number 20100271744
- Publication date Oct 28, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...
- Publication number 20100271745
- Publication date Oct 28, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20100126667
- Publication date May 27, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...
- Publication number 20080251207
- Publication date Oct 16, 2008
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA,
- Jinyuan Chen
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Gas distribution assembly for use in a semiconductor work piece pro...
- Publication number 20080092815
- Publication date Apr 24, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
- Publication number 20080011424
- Publication date Jan 17, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald YIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma confinement apparatus, and method for confining a plasma
- Publication number 20070085483
- Publication date Apr 19, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing chamber and method of processing a semiconductor...
- Publication number 20070039165
- Publication date Feb 22, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Yaomin Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-station workpiece processors, methods of processing semicondu...
- Publication number 20070034479
- Publication date Feb 15, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Ryoji Todaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing semiconductor work pieces
- Publication number 20070032097
- Publication date Feb 8, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF matching network of a vacuum processing chamber and correspondin...
- Publication number 20070030091
- Publication date Feb 8, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Yaomin Xia
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Semiconductor processing system; a semiconductor processing chamber...
- Publication number 20070031236
- Publication date Feb 8, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- H01 - BASIC ELECTRIC ELEMENTS

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Trademarklast 30 trademarks

Information Trademark
77407791 - AMEC
- Serial number 77407791
- Registration number 3894260
- Filing date Feb 27, 2008
- Advanced Micro-Fabrication Equipment Inc. Asia
- 37 - Building construction
Information Trademark
77106395 - PRIMO D-RIE
- Serial number 77106395
- Registration number 3742746
- Filing date Feb 13, 2007
- Advanced Micro-Fabrication Equipment Inc. Asia
- 7 - Machines and machine tools
Information Trademark
77106377 - PRIMO HPCVD
- Serial number 77106377
- Filing date Feb 13, 2007
- Advanced Micro-Fabrication Equipment Inc. Asia
- 37 - Building construction
Information Trademark
77106407 - PRIMO D-RIE
- Serial number 77106407
- Registration number 3745009
- Filing date Feb 13, 2007
- Advanced Micro-Fabrication Equipment Inc. Asia
- 37 - Building construction
Information Trademark
78847536 - AMEC
- Serial number 78847536
- Registration number 3839390
- Filing date Mar 28, 2006
- Advanced Micro-Fabrication Equipment Inc. Asia
- 7 - Machines and machine tools

Advanced Micro-Fabrication Equipment Inc. Asia

Organization

Patents Grantslast 30 patents

Method and apparatus for processing semiconductor work pieces

Method and system for autotuning of RF match

ICP source design for plasma uniformity and efficiency enhancement

Semiconductor processing system; a semiconductor processing chamber...

Plasma confinement apparatus, and method for confining a plasma

Plasma processing apparatus

Multi-station decoupled reactive ion etch chamber

Multi-station plasma reactor with multiple plasma regions

RF matching network of a vacuum processing chamber and correspondin...

Capacitive CVD reactor and methods for plasma CVD process

System and method of sensing and removing residual charge from a pr...

Silicon carbide gas distribution plate and RF electrode for plasma...

Plasma processing apparatus

RF matching network of a vacuum processing chamber and correspondin...

Vacuum processing chamber and method of processing a semiconductor...

Gas distribution assembly for use in a semiconductor work piece pro...

Multi-station workpiece processors, methods of processing semicondu...

Multiple frequency plasma chamber, switchable RF system, and proces...

Patents Applicationslast 30 patents

PLASMA CONFINEMENT APPARATUS, AND METHOD FOR CONFINING A PLASMA

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...

SYSTEM AND METHOD OF SENSING AND REMOVING RESIDUAL CHARGE FROM A PR...

ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...

Gas distribution assembly for use in a semiconductor work piece pro...

MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER

Plasma confinement apparatus, and method for confining a plasma

Vacuum processing chamber and method of processing a semiconductor...

Multi-station workpiece processors, methods of processing semicondu...

Method and apparatus for processing semiconductor work pieces

RF matching network of a vacuum processing chamber and correspondin...

Semiconductor processing system; a semiconductor processing chamber...

Trademarklast 30 trademarks

77407791 - AMEC

77106395 - PRIMO D-RIE

77106377 - PRIMO HPCVD

77106407 - PRIMO D-RIE

78847536 - AMEC