AIXTRON INC.

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for dielectric deposition
- Patent number 9,359,674
- Issue date Jun 7, 2016
- Aixtron, Inc.
- Stephen Edward Savas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for deposition of high-performance coatings and encapsulated...
- Patent number 9,299,956
- Issue date Mar 29, 2016
- Aixtron, Inc.
- Stephen E. Savas
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methods for plasma processing
- Patent number 9,096,932
- Issue date Aug 4, 2015
- Aixtron, Inc.
- Stephen E. Savas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for plasma processing
- Patent number 9,096,933
- Issue date Aug 4, 2015
- Aixtron, Inc.
- Stephen E. Savas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for coating substrates disposed on a susceptor
- Patent number 8,986,453
- Issue date Mar 24, 2015
- Aixtron Inc.
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for high-throughput chemical vapor deposition
- Patent number 8,906,456
- Issue date Dec 9, 2014
- Aixtron, Inc.
- Piotr Strzyzewski
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Device for the temperature control of the surface temperatures of s...
- Patent number 8,308,867
- Issue date Nov 13, 2012
- Aixtron Inc.
- Walter Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing especially doped layers by means of OVPD or...
- Patent number 8,304,013
- Issue date Nov 6, 2012
- Aixtron Inc.
- Holger Kalisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gas inlet element for a CVD reactor
- Patent number 8,298,337
- Issue date Oct 30, 2012
- Aixtron, Inc.
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor having a process-chamber ceiling which can be lowered
- Patent number 8,157,915
- Issue date Apr 17, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor comprising a gas inlet member
- Patent number 8,152,924
- Issue date Apr 10, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for self-limiting deposition of one or more monolayers
- Patent number 8,114,480
- Issue date Feb 14, 2012
- Aixtron Inc.
- Peter Baumann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor with RF-heated process chamber
- Patent number 8,062,426
- Issue date Nov 22, 2011
- Aixtron Inc.
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of providing uniform gas delivery to a reactor
- Patent number 7,981,472
- Issue date Jul 19, 2011
- Aixtron, Inc.
- Jeremie J. Dalton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transient enhanced atomic layer deposition
- Patent number 7,981,473
- Issue date Jul 19, 2011
- Aixtron, Inc.
- Gi Youl Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing layers containing silicon and germanium
- Patent number 7,732,308
- Issue date Jun 8, 2010
- Aixtron, Inc.
- Marcus Schumacher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

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Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS...
- Publication number 20160289837
- Publication date Oct 6, 2016
- Aixtron, Inc.
- Stephen E. Savas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PLASMA PROCESSING
- Publication number 20150270109
- Publication date Sep 24, 2015
- Aixtron, Inc.
- Stephen E. Savas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Apparatus for Fabricating Dielectric Structures
- Publication number 20150155157
- Publication date Jun 4, 2015
- Aixtron, Inc.
- Kay Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION
- Publication number 20140030434
- Publication date Jan 30, 2014
- AIXTRON INC.
- Piotr Strzyzewski
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVICE FOR TEMPERATURE-CONTROLLED ACCOMMODATION OF A CONTAINER
- Publication number 20090283040
- Publication date Nov 19, 2009
- AIXTRON INC.
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Controlling the Surface Temperature of a S...
- Publication number 20090110805
- Publication date Apr 30, 2009
- AIXTRON INC.
- Johannes Kaeppeler
- C30 - CRYSTAL GROWTH
Information Patent Application
Method and Device for the Depositing of Gallium Nitrite Layers on a...
- Publication number 20080206464
- Publication date Aug 28, 2008
- AIXTRON INC.
- Johannes Kappeler
- C30 - CRYSTAL GROWTH

AIXTRON INC.

Organization

Patents Grantslast 30 patents

Apparatus and method for dielectric deposition

Method for deposition of high-performance coatings and encapsulated...

Methods for plasma processing

Methods for plasma processing

Device for coating substrates disposed on a susceptor

Apparatus and method for high-throughput chemical vapor deposition

Device for the temperature control of the surface temperatures of s...

Methods for depositing especially doped layers by means of OVPD or...

Gas inlet element for a CVD reactor

CVD reactor having a process-chamber ceiling which can be lowered

CVD reactor comprising a gas inlet member

Method for self-limiting deposition of one or more monolayers

CVD reactor with RF-heated process chamber

Methods of providing uniform gas delivery to a reactor

Transient enhanced atomic layer deposition

Process for depositing layers containing silicon and germanium

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS...

METHODS FOR PLASMA PROCESSING

Method and Apparatus for Fabricating Dielectric Structures

APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION

DEVICE FOR TEMPERATURE-CONTROLLED ACCOMMODATION OF A CONTAINER

Apparatus and Method for Controlling the Surface Temperature of a S...

Method and Device for the Depositing of Gallium Nitrite Layers on a...