ASELTA NANOGRAPHICS

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GRENOBLE, FR

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Method for determining the dose corrections to be applied to an IC...
- Patent number 10,578,978
- Issue date Mar 3, 2020
- Aselta Nanographics
- Mohamed Saib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the correction of electron proximity effects
- Patent number 10,553,394
- Issue date Feb 4, 2020
- Aselta Nanographics
- Nader Jedidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of applying vertex based corrections to a semiconductor design
- Patent number 10,534,255
- Issue date Jan 14, 2020
- Aselta Nanographics
- Thomas Quaglio
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of performing dose modulation, in particular for electron be...
- Patent number 10,522,328
- Issue date Dec 31, 2019
- Aselta Nanographics
- Mohamed Saib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for calculating the metrics of an IC manufacturing process
- Patent number 10,423,074
- Issue date Sep 24, 2019
- Aselta Nanographics
- Mohamed Saïb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining the parameters of an IC manufacturing proces...
- Patent number 10,295,912
- Issue date May 21, 2019
- Aselta Nanographics
- Mohamed Saib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the parameters of an IC manufacturing proces...
- Patent number 10,156,796
- Issue date Dec 18, 2018
- Aselta Nanographics
- Mohamed Saïb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography method with combined optimization of the radiated energ...
- Patent number 10,157,728
- Issue date Dec 18, 2018
- Aselta Nanographics
- Charles Tiphine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of correcting electron proximity effects using Voigt type sc...
- Patent number 9,934,336
- Issue date Apr 3, 2018
- Aselta Nanographics
- Jean-Herve Tortai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Free form fracturing method for electronic or optical lithography
- Patent number 9,922,159
- Issue date Mar 20, 2018
- Aselta Nanographics
- Charles Tiphine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Free form fracturing method for electronic or optical lithography u...
- Patent number 9,891,519
- Issue date Feb 13, 2018
- Aselta Nanographics
- Serdar Manakli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for preparing a pattern to be printed on a plate...
- Patent number 9,542,505
- Issue date Jan 10, 2017
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jerome Belledent
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for estimating patterns to be printed on a plate or mask by...
- Patent number 9,430,597
- Issue date Aug 30, 2016
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jerome Belledent
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting electronic proximity effects using off-center...
- Patent number 9,224,577
- Issue date Dec 29, 2015
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Patrick Schiavone
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for correcting electronic proximity effects using the deconv...
- Patent number 9,223,926
- Issue date Dec 29, 2015
- Aselta Nanographics
- Sébastien Soulan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Free form fracturing method for electronic or optical lithography
- Patent number 8,984,451
- Issue date Mar 17, 2015
- Aselta Nanographics
- Charles Tiphine
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN
- Publication number 20180267399
- Publication date Sep 20, 2018
- ASELTA NANOGRAPHICS
- Thomas QUAGLIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC...
- Publication number 20180203361
- Publication date Jul 19, 2018
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...
- Publication number 20180204707
- Publication date Jul 19, 2018
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...
- Publication number 20170168401
- Publication date Jun 15, 2017
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING THE METRICS OF AN IC MANUFACTURING PROCESS
- Publication number 20170123322
- Publication date May 4, 2017
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Mohamed SAÏB
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF REDUCING SHOT COUNT IN DIRECT WRITING BY A PARTICLE OR PH...
- Publication number 20170097571
- Publication date Apr 6, 2017
- ASELTA NANOGRAPHICS
- Luc MARTIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...
- Publication number 20170075225
- Publication date Mar 16, 2017
- ASELTA NANOGRAPHICS
- Mohamed SAÏB
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY U...
- Publication number 20160252807
- Publication date Sep 1, 2016
- ASELTA NANOGRAPHICS
- Serdar MANAKLI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR THE CORRECTION OF ELECTRON PROXIMITY EFFECTS
- Publication number 20160211115
- Publication date Jul 21, 2016
- ASELTA NANOGRAPHICS
- Nader JEDIDI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF THE RADIATED ENERG...
- Publication number 20160079033
- Publication date Mar 17, 2016
- ASELTA NANOGRAPHICS
- Charles TIPHINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY
- Publication number 20150154344
- Publication date Jun 4, 2015
- ASELTA NANOGRAPHICS
- Charles TIPHINE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING THE DECONV...
- Publication number 20140344769
- Publication date Nov 20, 2014
- ASELTA NANOGRAPHICS
- Sébastien Soulan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Free Form Fracturing Method for Electronic or Optical Lithography
- Publication number 20140245240
- Publication date Aug 28, 2014
- ASELTA NANOGRAPHICS
- Charles TIPHINE
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...
- Publication number 20140180462
- Publication date Jun 26, 2014
- ASELTA NANOGRAPHICS
- Jerome BELLEDENT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR PREPARING A PATTERN TO BE PRINTED ON A PLATE OR MASK BY...
- Publication number 20140059503
- Publication date Feb 27, 2014
- ASELTA NANOGRAPHICS
- Jerome BELLEDENT
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING OFF-CENTER...
- Publication number 20130043389
- Publication date Feb 21, 2013
- ASELTA NANOGRAPHICS
- Patrick SCHIAVONE
- B82 - NANO-TECHNOLOGY

ASELTA NANOGRAPHICS

Organization

Patents Grantslast 30 patents

Method for determining the dose corrections to be applied to an IC...

Method for the correction of electron proximity effects

Method of applying vertex based corrections to a semiconductor design

Method of performing dose modulation, in particular for electron be...

Method for calculating the metrics of an IC manufacturing process

Method for determining the parameters of an IC manufacturing proces...

Method for determining the parameters of an IC manufacturing proces...

Lithography method with combined optimization of the radiated energ...

Method of correcting electron proximity effects using Voigt type sc...

Free form fracturing method for electronic or optical lithography

Free form fracturing method for electronic or optical lithography u...

Method and system for preparing a pattern to be printed on a plate...

Method for estimating patterns to be printed on a plate or mask by...

Method for correcting electronic proximity effects using off-center...

Method for correcting electronic proximity effects using the deconv...

Free form fracturing method for electronic or optical lithography

Patents Applicationslast 30 patents

METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN

METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC...

METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...

METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...

METHOD FOR CALCULATING THE METRICS OF AN IC MANUFACTURING PROCESS

METHOD OF REDUCING SHOT COUNT IN DIRECT WRITING BY A PARTICLE OR PH...

METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...

FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY U...

METHOD FOR THE CORRECTION OF ELECTRON PROXIMITY EFFECTS

LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF THE RADIATED ENERG...

FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY

METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING THE DECONV...

Free Form Fracturing Method for Electronic or Optical Lithography

METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...

METHOD FOR PREPARING A PATTERN TO BE PRINTED ON A PLATE OR MASK BY...

METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING OFF-CENTER...

Trademarklast 30 trademarks