C. Itoh Fine Chemical Co., Ltd.

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for producing a thin film resin matrix
- Patent number 5,853,817
- Issue date Dec 29, 1998
- C. Itoh Fine Chemical Co., Ltd.
- Yoichi Murayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma vapor deposition apparatus
- Patent number 5,474,611
- Issue date Dec 12, 1995
- Yoichi Murayama, Shincron Co., Ltd.
- Yoichi Murayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for the surface treatment of a metal by atmospheric pressure...
- Patent number 5,384,167
- Issue date Jan 24, 1995
- E. C. Chemical Co., Ltd.
- Atsushi Nishiwaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reforming surface
- Patent number 5,346,728
- Issue date Sep 13, 1994
- C. Itoh Fine Chemical Co., Ltd.
- Yasuhiko Yoshida
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Thin film capacitor and apparatus for manufacturing same
- Patent number 5,258,886
- Issue date Nov 2, 1993
- C. Itoh Fine Chemical Co., Ltd.
- Yoichi Murayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atmospheric pressure plasma surface treatment process
- Patent number 5,124,173
- Issue date Jun 23, 1992
- E. C. Chemical Co., Ltd.
- Hiroshi Uchiyama
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

C. Itoh Fine Chemical Co., Ltd.

Organization

Patents Grantslast 30 patents

Method for producing a thin film resin matrix

Plasma vapor deposition apparatus

Method for the surface treatment of a metal by atmospheric pressure...

Method for reforming surface

Thin film capacitor and apparatus for manufacturing same

Atmospheric pressure plasma surface treatment process