CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG

Organization

OBERKOCHEN, DE

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic objective having a first lens group including only len...
- Patent number 7,289,279
- Issue date Oct 30, 2007
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection objective having adjacently mounted aspheric lens surfaces
- Patent number 7,154,678
- Issue date Dec 26, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Lithographic objective having a first lens group including only len...
- Patent number 7,023,627
- Issue date Apr 4, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,006,595
- Issue date Feb 28, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Device and method for changing the stress-induced birefringence and...
- Patent number 6,937,394
- Issue date Aug 30, 2005
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Rainer Labus
- G02 - OPTICS
Information Patent Grant
Optical system with isolated measuring structure
- Patent number 6,864,988
- Issue date Mar 8, 2005
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Albrecht Hof
- G02 - OPTICS
Information Patent Grant
Method for adjusting a lamp relative to an illuminating beam path o...
- Patent number 6,862,137
- Issue date Mar 1, 2005
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Peter Ott
- G02 - OPTICS
Information Patent Grant
Geometric beamsplitter and method for its fabrication
- Patent number 6,809,871
- Issue date Oct 26, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Matthias Heller
- G02 - OPTICS
Information Patent Grant
Lithographic objective having a first lens group including only len...
- Patent number 6,788,387
- Issue date Sep 7, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus for microlithography
- Patent number 6,788,471
- Issue date Sep 7, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Christian Wagner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system as well as a process for compensating im...
- Patent number 6,784,977
- Issue date Aug 31, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Rudolf von Bünau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging system with polarizer and a crystalline-quartz plat...
- Patent number 6,774,984
- Issue date Aug 10, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies, AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Grant
Mount for an optical element in an optical imaging device
- Patent number 6,744,574
- Issue date Jun 1, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Optical integrator for an illumination device
- Patent number 6,733,165
- Issue date May 11, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Sijbe Abraham Van Der Lei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for polishing or lapping an aspherical surface...
- Patent number 6,733,369
- Issue date May 11, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies, AG
- Siegfried Stacklies
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Diffractive optical element and also optical arrangement comprising...
- Patent number 6,728,036
- Issue date Apr 27, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Bernd Kleemann
- G02 - OPTICS
Information Patent Grant
Microlithographic illumination method and a projection lens for car...
- Patent number 6,728,043
- Issue date Apr 27, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Toralf Gruner
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Catadioptric reduction lens
- Patent number 6,717,746
- Issue date Apr 6, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Projection exposure system
- Patent number 6,707,537
- Issue date Mar 16, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Projection objective having adjacently mounted aspheric lens surfaces
- Patent number 6,646,718
- Issue date Nov 11, 2003
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Illumination system with reduced heat load
- Patent number 6,611,574
- Issue date Aug 26, 2003
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Adjusting apparatus for an optical element in a lens system
- Patent number 6,594,093
- Issue date Jul 15, 2003
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Timo Moeller
- G02 - OPTICS

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Patents Applicationslast 30 patents

Information Patent Application
Illumination system particularly for microlithography
- Publication number 20060245540
- Publication date Nov 2, 2006
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Lithographic objective having a first lens group including only len...
- Publication number 20060176573
- Publication date Aug 10, 2006
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Catadioptric multi-mirror systems for projection lithography
- Publication number 20060109559
- Publication date May 25, 2006
- CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Application
Method for adjusting a lamp relative to an illuminating beam path o...
- Publication number 20050117210
- Publication date Jun 2, 2005
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Peter Ott
- G02 - OPTICS
Information Patent Application
Lithographic objective having a first lens group including only len...
- Publication number 20040228001
- Publication date Nov 18, 2004
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Method for focus detection and an imaging system with a focus-detec...
- Publication number 20040000627
- Publication date Jan 1, 2004
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Method and a device for determining the radiation-damage resistance...
- Publication number 20030223065
- Publication date Dec 4, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Hexin Wang
- G01 - MEASURING TESTING
Information Patent Application
Objective with lenses made of a crystalline material
- Publication number 20030137733
- Publication date Jul 24, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
Method and system for measuring the imaging quality of an optical i...
- Publication number 20030137655
- Publication date Jul 24, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030095622
- Publication date May 22, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Zoom system for an illumination device
- Publication number 20030090638
- Publication date May 15, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jess Koehler
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030086524
- Publication date May 8, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Method and coating system for coating substrates for optical compon...
- Publication number 20030082298
- Publication date May 1, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Point-diffraction interferometer
- Publication number 20030067611
- Publication date Apr 10, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Hugo Matthieu Visser
- G01 - MEASURING TESTING
Information Patent Application
Mount for an optical element in an optical imaging device
- Publication number 20030058551
- Publication date Mar 27, 2003
- CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
Geometric beamsplitter and method for its fabrication
- Publication number 20030026001
- Publication date Feb 6, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Matthias Heller
- G02 - OPTICS
Information Patent Application
Catadioptric reduction lens
- Publication number 20030021040
- Publication date Jan 30, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
Optical system with a plurality of optical elements
- Publication number 20030010902
- Publication date Jan 16, 2003
- CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Albrecht Hof
- G02 - OPTICS
Information Patent Application
Microlithographic illumination method and a projection lens for car...
- Publication number 20020191288
- Publication date Dec 19, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Toralf Gruner
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Attenuating filter for ultraviolet light
- Publication number 20020191310
- Publication date Dec 19, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Bernhard Weigl
- G02 - OPTICS
Information Patent Application
Optical imaging system with polarizer and a crystalline-quartz plat...
- Publication number 20020186462
- Publication date Dec 12, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
Polarizer and microlithography projection system with a polarizer
- Publication number 20020176166
- Publication date Nov 28, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Catadioptric reduction lens
- Publication number 20020167737
- Publication date Nov 14, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jean Claude Perrin
- G02 - OPTICS
Information Patent Application
Optical beam guidance system and method for preventing contaminatio...
- Publication number 20020145808
- Publication date Oct 10, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Ansgar Freitag
- G02 - OPTICS
Information Patent Application
Optical integrator for an illumination device
- Publication number 20020126931
- Publication date Sep 12, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Sijbe Abraham Van Der Lei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Coating of optical elements, in particular for use with ultraviolet...
- Publication number 20020114880
- Publication date Aug 22, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Joerg Dreistein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antireflection coating for ultraviolet light at large angles of inc...
- Publication number 20020114068
- Publication date Aug 22, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Ralf Kuschnereit
- G02 - OPTICS
Information Patent Application
Holding device for an optical element made of a crystalline material
- Publication number 20020108928
- Publication date Aug 15, 2002
- Carl Zeiss Semiconductor Manufacturing Technologies, AG
- Jurgen Hartmaier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antireflection coating for ultraviolet light
- Publication number 20020105721
- Publication date Aug 8, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Hans-Jochen Paul
- G02 - OPTICS

CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG

Organization

Patents Grantslast 30 patents

Lithographic objective having a first lens group including only len...

Projection objective having adjacently mounted aspheric lens surfaces

Lithographic objective having a first lens group including only len...

Illumination system particularly for microlithography

Device and method for changing the stress-induced birefringence and...

Optical system with isolated measuring structure

Method for adjusting a lamp relative to an illuminating beam path o...

Geometric beamsplitter and method for its fabrication

Lithographic objective having a first lens group including only len...

Projection exposure apparatus for microlithography

Projection exposure system as well as a process for compensating im...

Optical imaging system with polarizer and a crystalline-quartz plat...

Mount for an optical element in an optical imaging device

Optical integrator for an illumination device

Method and apparatus for polishing or lapping an aspherical surface...

Diffractive optical element and also optical arrangement comprising...

Microlithographic illumination method and a projection lens for car...

Catadioptric reduction lens

Projection exposure system

Projection objective having adjacently mounted aspheric lens surfaces

Illumination system with reduced heat load

Adjusting apparatus for an optical element in a lens system

Patents Applicationslast 30 patents

Illumination system particularly for microlithography

Lithographic objective having a first lens group including only len...

Catadioptric multi-mirror systems for projection lithography

Method for adjusting a lamp relative to an illuminating beam path o...

Lithographic objective having a first lens group including only len...

Method for focus detection and an imaging system with a focus-detec...

Method and a device for determining the radiation-damage resistance...

Objective with lenses made of a crystalline material

Method and system for measuring the imaging quality of an optical i...

Illumination system particularly for microlithography

Zoom system for an illumination device

Illumination system particularly for microlithography

Method and coating system for coating substrates for optical compon...

Point-diffraction interferometer

Mount for an optical element in an optical imaging device

Geometric beamsplitter and method for its fabrication

Catadioptric reduction lens

Optical system with a plurality of optical elements

Microlithographic illumination method and a projection lens for car...

Attenuating filter for ultraviolet light

Optical imaging system with polarizer and a crystalline-quartz plat...

Polarizer and microlithography projection system with a polarizer

Catadioptric reduction lens

Optical beam guidance system and method for preventing contaminatio...

Optical integrator for an illumination device

Coating of optical elements, in particular for use with ultraviolet...

Antireflection coating for ultraviolet light at large angles of inc...

Holding device for an optical element made of a crystalline material

Antireflection coating for ultraviolet light