CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO., LTD.

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Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...
- Publication number 20250013149
- Publication date Jan 9, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYONIUM SALT PHOTOACID GENERATOR FOR ARF LIGHT SOURCE DRY LITHOGR...
- Publication number 20240351979
- Publication date Oct 24, 2024
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN AND 193 NM DRY PHOTORESIST CONTAINING SAME, AND PREPARATION M...
- Publication number 20240248401
- Publication date Jul 25, 2024
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

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